公开(公告)号：US20110086077A1

公开(公告)日：2011-04-14

申请号：US12745509

申请日：2008-11-21

申请人： Keith R. McCrea ,  Robert S. Ward ,  Yuan Tian

发明人： Keith R. McCrea ,  Robert S. Ward ,  Yuan Tian

IPC分类号： A61L15/22 ,  A61K38/39 ,  A61P17/02

CPC分类号： A61L15/60 ,  A61L15/225 ,  A61L15/26 ,  A61L26/0019 ,  A61L26/0076 ,  A61L26/008 ,  C08L83/04

摘要： A silicone hydrogel formulation may contains random and/or block copolymers or oligomers or macromers. The silicone copolymer is copolymerized or blended with other polymers or monomers or macromers to obtain final formulation. The silicone hydrogel may contain crosslinking groups to provide a complete or partially crosslinked final structure. The silicone hydrogel formulation may be pre-formed as a film or other structure, or it may be polymerized during application as in the case of an adhesive formulation. A wound dressing comprising a silicone hydrogel formed as a film, either prior to application to a wound or in situ on a wound, which film has gas permeability, moisture permeability, and high water content, wherein said silicone hydrogel is formed from a polymerizable silicone such as a difunctional polydimethylsiloxane methacrylate and crosslinking agents such as N,N-dimethyllacrylamide (DMA), 2-hydroxyethyl methacrylate (HEMA), and trimethylsiloxy silane (TRIS).

摘要翻译： 硅氧烷水凝胶制剂可以含有无规和/或嵌段共聚物或低聚物或大分子单体。 硅氧烷共聚物与其它聚合物或单体或大分子单体共聚或共混以获得最终配方。 硅氧烷水凝胶可以含有交联基团以提供完全或部分交联的最终结构。 硅氧烷水凝胶制剂可以预先形成为膜或其它结构，或者可以在使用时聚合，如在粘合剂制剂的情况下。 一种伤口敷料，其包含在施加到伤口之前或原位在伤口上形成的膜的硅酮水凝胶，该膜具有透气性，透湿性和高含水量，其中所述硅氧水凝胶由可聚合硅氧烷形成 例如甲基丙烯酸二官能聚二甲基硅氧烷和N，N-二甲基丙烯酰胺（DMA），甲基丙烯酸2-羟乙酯（HEMA）和三甲基甲硅烷氧基硅烷（TRIS）等交联剂。

公开(公告)号：US07884107B2

公开(公告)日：2011-02-08

申请号：US11769030

申请日：2007-06-27

申请人： Yao Ma ,  Brian Robert Lahue ,  Gerald W. Shipps, Jr. ,  Yaolin Wang ,  Stephane L. Bogen ,  Matthew Ernst Voss ,  Latha G. Nair ,  Yuan Tian ,  Ronald J. Doll ,  Zhuyan Guo ,  Corey O. Strickland ,  Rumin Zhang ,  Mark A. McCoy ,  Weidong Pan ,  Elise M. Siegel ,  Craig R. Gibeau

发明人： Yao Ma ,  Brian Robert Lahue ,  Gerald W. Shipps, Jr. ,  Yaolin Wang ,  Stephane L. Bogen ,  Matthew Ernst Voss ,  Latha G. Nair ,  Yuan Tian ,  Ronald J. Doll ,  Zhuyan Guo ,  Corey O. Strickland ,  Rumin Zhang ,  Mark A. McCoy ,  Weidong Pan ,  Elise M. Siegel ,  Craig R. Gibeau

IPC分类号： A61K31/54 ,  C07D413/00 ,  C07D403/00 ,  C07D405/00

CPC分类号： C07D409/14 ,  C07D401/06 ,  C07D401/14

摘要： In its many embodiments, the present invention discloses novel compounds, as inhibitors of HDM2 protein methods for preparing such compounds, pharmaceutical compositions including one or more such compounds, methods of treatment, prevention, inhibition, of one or more diseases associated with the HDM2 protein or P53 using such compounds or pharmaceutical compositions.

摘要翻译： 在其许多实施方案中，本发明公开了作为HDM2蛋白的制备方法的抑制剂的新型化合物，包括一种或多种这样的化合物的药物组合物，治疗，预防，抑制与HDM2蛋白相关的一种或多种疾病的方法 或P53使用这些化合物或药物组合物。

公开(公告)号：US07671162B2

公开(公告)日：2010-03-02

申请号：US11211734

申请日：2005-08-26

申请人： Robert S. Ward ,  Keith R. McCrea ,  Yuan Tian ,  James P. Parakka

发明人： Robert S. Ward ,  Keith R. McCrea ,  Yuan Tian ,  James P. Parakka

IPC分类号： C08G18/00 ,  C08G77/04 ,  C08G77/22

CPC分类号： C08G18/6287 ,  A61L27/18 ,  A61L29/06 ,  A61L31/06 ,  C08G18/0823 ,  C08G18/12 ,  C08G18/283 ,  C08G18/2865 ,  C08G18/289 ,  C08G18/5024 ,  C08G18/5039 ,  C08G18/6283 ,  C08G18/6795 ,  C08L75/04 ,  C08G18/3228

摘要： Polymers whose surfaces are modified by endgroups that include amphipathic surface-modifying moieties. An amphipathic endgroup of a polymer molecule is an endgroup that contains at least two moieties of significantly differing composition, such that the amphipathic endgroup spontaneously rearranges its positioning in a polymer body to position the moiety on the surface of the body, depending upon the composition of the medium with which the body is in contact, when that re-positioning causes a reduction in interfacial energy. An example of an amphipathic surface-modifying endgroup is one that has both a hydrophobic moiety and a hydrophilic moiety in a single endgroup. For instance, a hydrophilic poly(ethylene oxide) terminated with a hydrophilic hydroxyl group is not surface active in air when the surface-modifying endgroup is bonded to a more hydrophobic base polymer. If the hydroxyl group on the oligomeric poly(ethylene oxide) is replaced by a hydrophobic methoxy ether terminus, the poly(ethylene oxide) becomes surface active in air, and allows the poly(ethylene oxide) groups to crystallize in the air-facing surface. In this example, immersion in water destroys the crystallinity as the poly(ethylene oxide) sorbs water and the hydrophobic methoxy group retreats below the surface of the polymer. Also disclosed are methods and articles of manufacture that make use of these polymers.

摘要翻译： 其表面被包括两亲表面改性部分的端基修饰的聚合物。 聚合物分子的两亲端基是含有至少两个具有显着不同组成的部分的端基，使得两亲性端基在聚合物体中自发地重排其定位，以将该部分定位在身体的表面上，这取决于 当该重新定位导致界面能量降低时，与身体接触的介质。 两亲性表面改性端基的实例是在单个端基具有疏水部分和亲水部分的实例。 例如，当表面改性端基键合到更疏水的基础聚合物上时，用亲水羟基封端的亲水性聚（环氧乙烷）在空气中不是表面活性的。 如果低聚聚（环氧乙烷）上的羟基被疏水性甲氧基醚末端所代替，则聚（环氧乙烷）在空气中变得表面活性，并允许聚（环氧乙烷）基团在面向空气的表面中结晶 。 在该实施例中，当聚（环氧乙烷）吸附水和疏水性甲氧基在聚合物表面下方退缩时，浸入水中会破坏结晶度。 还公开了利用这些聚合物的方法和制品。

公开(公告)号：US07652041B2

公开(公告)日：2010-01-26

申请号：US11332674

申请日：2006-01-12

申请人： Ruth S. Adams ,  Emily F. Calderwood ,  Alexandra E. Gould ,  Paul D. Greenspan ,  Matthew J LaMarche ,  Yuan Tian ,  Tricia J. Vos

发明人： Ruth S. Adams ,  Emily F. Calderwood ,  Alexandra E. Gould ,  Paul D. Greenspan ,  Matthew J LaMarche ,  Yuan Tian ,  Tricia J. Vos

IPC分类号： C07D403/02 ,  C07D413/02 ,  A61K31/44

CPC分类号： C07D213/73 ,  C07D213/56 ,  C07D213/68 ,  C07D213/74 ,  C07D213/75 ,  C07D213/78 ,  C07D213/79 ,  C07D213/81 ,  C07D213/84 ,  C07D231/18 ,  C07D233/32 ,  C07D237/24 ,  C07D239/34 ,  C07D239/47 ,  C07D261/12 ,  C07D277/64 ,  C07D401/04 ,  C07D401/12 ,  C07D401/14 ,  C07D405/12 ,  C07D405/14 ,  C07D413/04 ,  C07D413/12 ,  C07D413/14 ,  C07D473/02 ,  C07D473/30 ,  C07D487/04

摘要： The present invention provides novel cinnamide compounds useful as inhibitors of protein kinases. The invention also provides pharmaceutical compositions comprising the compounds of the invention and methods of using the compositions in the treatment of various diseases.

摘要翻译： 本发明提供了可用作蛋白激酶抑制剂的新颖的肉桂酰胺化合物。 本发明还提供包含本发明化合物的药物组合物和使用该组合物治疗各种疾病的方法。

公开(公告)号：US20070144915A1

公开(公告)日：2007-06-28

申请号：US11613918

申请日：2006-12-20

申请人： Yuan Tian ,  Renhe Jia ,  Feng Liu ,  Yongqi Hu ,  Stan Tsai ,  Liang-Yuh Chen ,  Robert Ewald

发明人： Yuan Tian ,  Renhe Jia ,  Feng Liu ,  Yongqi Hu ,  Stan Tsai ,  Liang-Yuh Chen ,  Robert Ewald

IPC分类号： B23H7/00 ,  H05K3/07

CPC分类号： C25F3/02 ,  B23H5/08 ,  H01L21/32125

摘要： Compositions and methods for processing a substrate having a conductive material layer disposed thereon are provided. In one embodiment, a method of electrochemically processing a substrate using a conductive polishing article is provided. The method includes disposing a substrate having a conductive material layer formed thereon in a process apparatus comprising a cathode coupled to the conductive polishing article and an anode, wherein the substrate is in electrical contact with the anode, supplying a polishing composition comprising a cathodic inhibitor and an anodic inhibitor, forming a protective film on the cathode to prevent corrosion of the cathode, and polishing the substrate. In another embodiment, a composition for processing a substrate having a conductive material layer disposed thereon is provided which composition includes a corrosion inhibitor selected from the group of an amino acid based inhibitor, a polymeric based corrosion inhibitor, an oxidizer, a chelating inhibitor or combinations thereof.

摘要翻译： 提供了用于处理其上设置有导电材料层的基板的组合物和方法。 在一个实施例中，提供了使用导电抛光制品电化学处理衬底的方法。 该方法包括将包括形成在其上的导电材料层的衬底放置在包括耦合到导电抛光制品的阴极和阳极的处理装置中，其中衬底与阳极电接触，提供包含阴极抑制剂的抛光组合物， 阳极抑制剂，在阴极上形成保护膜以防止阴极腐蚀，并抛光衬底。 在另一个实施方案中，提供了一种用于处理其上设置有导电材料层的基材的组合物，其组成包括选自氨基酸基抑制剂，聚合物基腐蚀抑制剂，氧化剂，螯合抑制剂或组合的腐蚀抑制剂 其中。

公开(公告)号：US20060169597A1

公开(公告)日：2006-08-03

申请号：US11356352

申请日：2006-02-15

申请人： Feng Liu ,  Tianbao Du ,  Alain Duboust ,  Wei-Yung Hsu ,  Robert Ewald ,  Yuan Tian ,  You Wang ,  Stan Tsai

发明人： Feng Liu ,  Tianbao Du ,  Alain Duboust ,  Wei-Yung Hsu ,  Robert Ewald ,  Yuan Tian ,  You Wang ,  Stan Tsai

IPC分类号： B23H9/00 ,  B23H7/00

CPC分类号： C25F3/02 ,  B23H5/08

摘要： Polishing compositions and methods for removing conductive materials from a substrate surface are provided. In one aspect, a composition includes an acid based electrolyte system, a corrosion inhibitor having an azole group, an organic acid salt, a pH adjusting agent to provide a pH between about 2 and about 10, and a solvent, and a solvent. The composition may be used in a conductive material removal process including disposing a substrate having a conductive material layer formed thereon in a process apparatus comprising an electrode, providing the composition between the electrode and substrate, applying a bias between the electrode and the substrate, and removing conductive material from the conductive material layer. The polishing compositions and methods described herein improve the effective removal rate of materials from the substrate surface, such as copper, with a reduction in planarization type defects and yielding a desirable surface finish.

摘要翻译： 提供了抛光组合物和从衬底表面去除导电材料的方法。 在一个方面，组合物包括酸基电解质体系，具有唑基的腐蚀抑制剂，有机酸盐，pH调节剂以提供约2至约10的pH以及溶剂和溶剂。 该组合物可以用于导电材料去除工艺中，包括在包括电极的工艺设备中设置其上形成有导电材料层的衬底，在电极和衬底之间提供组合物，在电极和衬底之间施加偏压，以及 从导电材料层去除导电材料。 本文所述的抛光组合物和方法提高了材料从衬底表面（例如铜）的有效去除速率，同时平坦化型缺陷减少并产生理想的表面光洁度。

公开(公告)号：US20060021974A1

公开(公告)日：2006-02-02

申请号：US10948958

申请日：2004-09-24

申请人： Feng Liu ,  Stan Tsai ,  Martin Wohlert ,  Yuan Tian ,  Renhe Jia ,  Yongqi Hu ,  Liang-Yuh Chen

发明人： Feng Liu ,  Stan Tsai ,  Martin Wohlert ,  Yuan Tian ,  Renhe Jia ,  Yongqi Hu ,  Liang-Yuh Chen

IPC分类号： C03C15/00 ,  C09K13/00

CPC分类号： H01L21/7684 ,  C25F3/16 ,  C25F3/26 ,  H01L21/32125

摘要： Polishing compositions and methods for removing conductive materials from a substrate surface are provided. In one aspect, a composition is provided for removing at least a conductive material from a substrate surface including sulfuric acid or derivative, phosphoric acid or derivative, a first chelating agent including an organic salt, a pH adjusting agent to provide a pH between about 2 and about 10 and a solvent. The composition may further include a second chelating agent. The composition may be used in a single step or two step electrochemical mechanical planarization process. The polishing compositions and methods described herein improve the effective removal rate of materials from the substrate surface, such as tungsten, with a reduction in planarization type defects.

摘要翻译： 提供了抛光组合物和从衬底表面去除导电材料的方法。 在一个方面，提供一种组合物，用于从包括硫酸或衍生物，磷酸或衍生物的底物表面至少去除导电材料，包括有机盐的第一螯合剂，pH调节剂以提供约2 约10和溶剂。 组合物还可以包括第二螯合剂。 组合物可以用于单步或两步电化学机械平面化工艺。 本文所述的抛光组合物和方法提高了材料从衬底表面（例如钨）的有效去除速率，同时平坦化型缺陷的减少。

公开(公告)号：US20050077188A1

公开(公告)日：2005-04-14

申请号：US10940603

申请日：2004-09-14

申请人： Daxin Mao ,  Renhe Jia ,  Zhihong Wang ,  Yuan Tian ,  Feng Liu ,  Vladimir Galburt ,  Sen Ko ,  Stan Tsai ,  Liang-Yuh Chen

发明人： Daxin Mao ,  Renhe Jia ,  Zhihong Wang ,  Yuan Tian ,  Feng Liu ,  Vladimir Galburt ,  Sen Ko ,  Stan Tsai ,  Liang-Yuh Chen

IPC分类号： B23H5/08 ,  B24B37/013 ,  B24B49/04 ,  B24B49/10 ,  C25F7/00 ,  H01L21/304 ,  H01L21/3063 ,  C25F3/00

CPC分类号： B24B37/013 ,  B23H5/08 ,  B24B49/04 ,  B24B49/10

摘要： A method and apparatus for electrochemically processing a substrate is provided. In one embodiment, a method for electrochemically processing a substrate includes the steps of establishing an electrically-conductive path through an electrolyte between an exposed layer of barrier material on the substrate and an electrode, electrochemically removing a portion of the exposed layer during a first electrochemical processing step in a barrier processing station, detecting an endpoint of the first electrochemical processing step at or just prior to breakthrough of the exposed layer of barrier material, electrochemically processing the exposed layer of barrier material in a second electrochemical processing step in the barrier processing station, and detecting an endpoint of the second electrochemical processing step.

摘要翻译： 提供了一种用于电化学处理衬底的方法和设备。 在一个实施例中，用于电化学处理衬底的方法包括以下步骤：在基底上的暴露的阻挡材料层与电极之间建立通过电解质的导电路径，在第一次电化学过程中电化学去除暴露层的一部分 在屏障处理站中的处理步骤，在暴露的阻挡材料层的穿透之前或之前检测第一电化学处理步骤的端点，在屏障处理站中的第二电化学处理步骤中电化学处理阻挡材料的暴露层 并且检测第二电化学处理步骤的端点。

公开(公告)号：US09023767B2

公开(公告)日：2015-05-05

申请号：US12776141

申请日：2010-05-07

申请人： Christopher Chad Shelton ,  Yuan Tian ,  Yueming Li

发明人： Christopher Chad Shelton ,  Yuan Tian ,  Yueming Li

IPC分类号： C40B30/04 ,  C07K14/47 ,  G01N33/542 ,  G01N33/573

CPC分类号： G01N33/573 ,  C07K14/4711 ,  G01N33/542 ,  G01N2333/4709 ,  G01N2333/948 ,  G01N2500/02 ,  G01N2800/2814 ,  G01N2800/2821

摘要： Polypeptide substrates based on modifications or fragments of the various APP isoforms, assay methods based on the use of these substrates, and screening methods directed toward identifying inhibitors of γ-secretase activity. The assay methods and the screening methods are adapted for use in high throughput multi-well plate assay apparatuses. In many embodiments the substrate polypeptides are labeled for ease of detection, and/or may bind specific ligands that themselves are labeled. Generally the labels promote high specificity as well as high sensitivity of detection. These features render the assay and screening methods that employ the labeled substrates especially suited for use in high throughput assay formats. This disclosure further identifies small polypeptides based on a subsequence motif of Aβ that are shown herein to be potent inhibitors of the activity of γ-secretase.

摘要翻译： 基于各种APP同种型的修饰或片段的多肽底物，基于这些底物的使用的测定方法以及用于鉴定γ-分泌酶活性抑制剂的筛选方法。 测定方法和筛选方法适用于高通量多孔板测定装置。 在许多实施方案中，底物多肽被标记以便于检测，和/或可以结合其本身被标记的特异性配体。 通常，标记物具有高度的特异性和高灵敏度的检测。 这些特征使得使用标记底物的测定和筛选方法特别适用于高通量测定形式。 本公开进一步基于A＆bgr的亚序列基序识别小多肽; 这在本文中显示为γ-分泌酶活性的有效抑制剂。

公开(公告)号：US07884171B2

公开(公告)日：2011-02-08

申请号：US12638371

申请日：2009-12-15

申请人： Robert S. Ward ,  Keith R. McCrea ,  Yuan Tian ,  James P. Parakka

发明人： Robert S. Ward ,  Keith R. McCrea ,  Yuan Tian ,  James P. Parakka

IPC分类号： C08G18/00 ,  C08G77/04 ,  C08G77/22

CPC分类号： C08G18/6287 ,  A61L27/18 ,  A61L29/06 ,  A61L31/06 ,  C08G18/0823 ,  C08G18/12 ,  C08G18/283 ,  C08G18/2865 ,  C08G18/289 ,  C08G18/5024 ,  C08G18/5039 ,  C08G18/6283 ,  C08G18/6795 ,  C08L75/04 ,  C08G18/3228

摘要： Polymers whose surfaces are modified by endgroups that include amphipathic surface-modifying moieties. An amphipathic endgroup of a polymer molecule is an endgroup that contains at least two moieties of significantly differing composition, such that the amphipathic endgroup spontaneously rearranges its positioning in a polymer body to position the moiety on the surface of the body, depending upon the composition of the medium with which the body is in contact, when that re-positioning causes a reduction in interfacial energy. An example of an amphipathic surface-modifying endgroup is one that has both a hydrophobic moiety and a hydrophilic moiety in a single endgroup. For instance, a hydrophilic poly(ethylene oxide) terminated with a hydrophilic hydroxyl group is not surface active in air when the surface-modifying endgroup is bonded to a more hydrophobic base polymer. If the hydroxyl group on the oligomeric poly(ethylene oxide) is replaced by a hydrophobic methoxy ether terminus, the poly(ethylene oxide) becomes surface active in air, and allows the poly(ethylene oxide) groups to crystallize in the air-facing surface. In this example, immersion in water destroys the crystallinity as the poly(ethylene oxide) sorbs water and the hydrophobic methoxy group retreats below the surface of the polymer. Also disclosed are methods and articles of manufacture that make use of these polymers.

摘要翻译： 其表面被包括两亲表面改性部分的端基修饰的聚合物。 聚合物分子的两亲端基是含有至少两个具有显着不同组成的部分的端基，使得两亲性端基在聚合物体中自发地重排其定位，以将该部分定位在身体的表面上，这取决于 当该重新定位导致界面能量降低时，与身体接触的介质。 两亲性表面改性端基的实例是在单个端基具有疏水部分和亲水部分的实例。 例如，当表面改性端基键合到更疏水的基础聚合物上时，用亲水羟基封端的亲水性聚（环氧乙烷）在空气中不是表面活性的。 如果低聚聚（环氧乙烷）上的羟基被疏水性甲氧基醚末端所代替，则聚（环氧乙烷）在空气中变得表面活性，并允许聚（环氧乙烷）基团在面向空气的表面中结晶 。 在该实施例中，当聚（环氧乙烷）吸附水和疏水性甲氧基在聚合物表面下方退缩时，浸入水中会破坏结晶度。 还公开了利用这些聚合物的方法和制品。