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公开(公告)号：US20110051760A1
公开(公告)日：2011-03-03
申请号：US12925860
申请日：2010-11-01
IPC分类号： H01S3/10
CPC分类号： H01S3/13 , G03F7/70575 , H01S3/134 , H01S3/136
摘要： According to aspects of an embodiment of the disclosed subject matter, a line narrowed high average power high pulse repetition laser micro-photolithography light source bandwidth control method and apparatus are disclosed which may comprise a bandwidth metrology module measuring the bandwidth of a laser output light pulse beam pulse produced by the light source and providing a bandwidth measurement; a bandwidth error signal generator receiving the bandwidth measurement and a bandwidth setpoint and providing a bandwidth error signal; an active bandwidth controller providing a fine bandwidth correction actuator signal and a coarse bandwidth correction actuator signal responsive to the bandwidth error. The fine bandwidth correction actuator and the coarse bandwidth correction actuator each may induce a respective modification of the light source behavior that reduces bandwidth error. The coarse and fine bandwidth correction actuators each may comprise a plurality of bandwidth correction actuators.
摘要翻译： 根据所公开主题的实施例的方面，公开了一种窄的高平均功率高脉冲重复激光微光刻光源带宽控制方法和装置，其可以包括测量激光输出光脉冲带宽的带宽测量模块 由光源产生的光束脉冲并提供带宽测量; 接收带宽测量和带宽设定点并提供带宽误差信号的带宽误差信号发生器; 有源带宽控制器提供精细的带宽校正致动器信号和响应于带宽误差的粗略带宽校正致动器信号。 精细带宽校正致动器和粗带宽校正致动器各自可以引起减少带宽误差的光源特性的相应修改。 粗略和精细带宽校正致动器各自可以包括多个带宽校正致动器。
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公开(公告)号：US07852889B2
公开(公告)日：2010-12-14
申请号：US11510037
申请日：2006-08-25
IPC分类号： H01S3/086 , H01S3/097 , H01S3/1055 , H01S3/22
CPC分类号： H01S3/13 , G03F7/70575 , H01S3/134 , H01S3/136
摘要： According to aspects of an embodiment of the disclosed subject matter, a line narrowed high average power high pulse repetition laser micro-photolithography light source bandwidth control method and apparatus are disclosed which may comprise a bandwidth metrology module measuring the bandwidth of a laser output flight pulse beam pulse produced by the light source and providing a bandwidth measurement; a bandwidth error signal generator receiving the bandwidth measurement and a bandwidth setpoint and providing a bandwidth error signal; an active bandwidth controller providing a fine bandwidth correction actuator signal and a coarse bandwidth correction actuator signal responsive to the bandwidth error. The fine bandwidth correction actuator and the coarse bandwidth correction actuator each may induce a respective modification of the light source behavior that reduces bandwidth error. The coarse and fine bandwidth correction actuators each may comprise a plurality of bandwidth correction actuators.
摘要翻译： 根据所公开的主题的实施例的方面，公开了一种窄的高平均功率高脉冲重复激光微光刻光源带宽控制方法和装置，其可以包括测量激光输出飞行脉冲带宽的带宽测量模块 由光源产生的光束脉冲并提供带宽测量; 接收带宽测量和带宽设定点并提供带宽误差信号的带宽误差信号发生器; 有源带宽控制器提供精细的带宽校正致动器信号和响应于带宽误差的粗略带宽校正致动器信号。 精细带宽校正致动器和粗带宽校正致动器各自可以引起减少带宽误差的光源特性的相应修改。 粗略和精细带宽校正致动器各自可以包括多个带宽校正致动器。
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公开(公告)号：US07830942B2
公开(公告)日：2010-11-09
申请号：US11900527
申请日：2007-09-11
CPC分类号： H01S3/225 , H01S3/1305 , H01S3/134
摘要： A method and apparatus is disclosed which may comprise: a gas discharge laser system energy controller which may comprise: a laser system energy controller providing a first laser operating parameter control signal based on an error signal related to a value of the output energy of the laser system compared to a target value for output energy and an energy controller model of the value of the first laser operating parameter necessary to change the value of the laser system output energy to the target value; a first laser system operating parameter control signal modifier providing a modification to the first laser system operating parameter control signal based upon a controller signal modification model of the impact of a second laser system operating parameter on the value of the first laser system operating parameter necessary to change the value of the output energy to the target value.
摘要翻译： 公开了一种方法和装置，其可以包括：气体放电激光系统能量控制器，其可以包括：激光系统能量控制器，其基于与激光器的输出能量的值相关的误差信号提供第一激光器操作参数控制信号 系统与输出能量的目标值相比，以及将激光系统输出能量的值改变为目标值所需的第一激光器操作参数的值的能量控制器模型; 第一激光系统操作参数控制信号修改器，其基于第二激光系统操作参数对第一激光系统操作参数的值的控制器信号修改模型，提供对第一激光系统操作参数控制信号的修改， 将输出能量的值更改为目标值。
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34.发明授权Multi-chambered excimer or molecular fluorine gas discharge laser fluorine injection control 有权多室准分子或分子氟气放电激光氟注射控制公开(公告)号：US07741639B2
公开(公告)日：2010-06-22
申请号：US10953100
申请日：2004-09-29
申请人： Herve A. Besaucele , Wayne J. Dunstan , Toshihiko Ishihara , Robert N. Jacques , Fedor B. Trintchouk
发明人： Herve A. Besaucele , Wayne J. Dunstan , Toshihiko Ishihara , Robert N. Jacques , Fedor B. Trintchouk
IPC分类号： H01S3/22
CPC分类号： H01S3/036 , H01S3/225 , H01S3/2316 , H01S3/2366
摘要： A multi-chambered excimer or molecular halogen gas discharge laser system comprising at least one oscillator chamber and at least one amplifier chamber producing oscillator output laser light pulses that are amplified in the at least one power chamber, having a fluorine injection control system and a method of using same is disclosed, which may comprise: a halogen gas consumption estimator: estimating the amount of halogen gas that has been consumed in one of the at least one oscillator chamber based upon at least a first operating parameter of one of the least one oscillator chamber and the at least one amplifier chamber, and the difference between a second operating parameter of the at least one oscillator chamber and the at least one amplifier chamber, and estimating the amount of halogen gas that has been consumed in the other of the at least one oscillator chamber and the at least one amplifier chamber based upon at least a third operating parameter of the other of the at least one oscillator chamber and the at least one amplifier chamber, and producing an output representative of an estimated halogen gas consumption in the at least one oscillator chamber and of the halogen gas consumption in the at least one amplifier chamber, and a halogen gas injection controller determining the amount of halogen gas injection for the at least one oscillator chamber and the at least one amplifier chamber based upon the estimated fluorine consumption outputs from the fluorine consumption estimator and a cost function comprising a plurality of weighted injection decision determinations.
摘要翻译： 一种多腔准分子或分子卤素气体放电激光系统，包括至少一个振荡器室和至少一个产生振荡器的放大器室输出在至少一个功率室中放大的激光脉冲，具有氟注入控制系统和方法 其中可以包括：卤素气体消耗估计器：基于至少一个振荡器之一的至少一个振荡器中的至少一个振荡器的至少一个振荡器的至少第一操作参数来估计在所述至少一个振荡器腔室中的一个中消耗的卤素气体的量 室和至少一个放大器室，以及所述至少一个振荡器室和所述至少一个放大器室的第二操作参数之间的差异，并且估计至少在另一个中消耗的卤素气体的量 基于所述至少一个的另一个的至少第三操作参数，所述至少一个振荡器室和所述至少一个放大器室 e振荡器室和所述至少一个放大器室，并且产生代表所述至少一个振荡器室中的估计的卤素气体消耗量的输出和所述至少一个放大器室中的卤素气体消耗量，以及卤素气体注入控制器确定 基于来自氟消耗估计器的估计的氟消耗量输出和包括多个加权喷射判定确定的成本函数，至少一个振荡室和至少一个放大器室的卤素气体喷射量。
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公开(公告)号：US20070195836A1
公开(公告)日：2007-08-23
申请号：US11510037
申请日：2006-08-25
IPC分类号： H01S3/13
CPC分类号： H01S3/13 , G03F7/70575 , H01S3/134 , H01S3/136
摘要： According to aspects of an embodiment of the disclosed subject matter, a line narrowed high average power high pulse repetition laser micro-photolithography light source bandwidth control method and apparatus are disclosed which may comprise a bandwidth metrology module measuring the bandwidth of a laser output flight pulse beam pulse produced by the light source and providing a bandwidth measurement; a bandwidth error signal generator receiving the bandwidth measurement and a bandwidth setpoint and providing a bandwidth error signal; an active bandwidth controller providing a fine bandwidth correction actuator signal and a coarse bandwidth correction actuator signal responsive to the bandwidth error. The fine bandwidth correction actuator and the coarse bandwidth correction actuator each may induce a respective modification of the light source behavior that reduces bandwidth error. The coarse and fine bandwidth correction actuators each may comprise a plurality of bandwidth correction actuators.
摘要翻译： 根据所公开的主题的实施例的方面，公开了一种窄的高平均功率高脉冲重复激光微光刻光源带宽控制方法和装置，其可以包括测量激光输出飞行脉冲带宽的带宽测量模块 由光源产生的光束脉冲并提供带宽测量; 接收带宽测量和带宽设定点并提供带宽误差信号的带宽误差信号发生器; 有源带宽控制器提供精细的带宽校正致动器信号和响应于带宽误差的粗略带宽校正致动器信号。 精细带宽校正致动器和粗带宽校正致动器各自可以引起减少带宽误差的光源特性的相应修改。 粗略和精细带宽校正致动器各自可以包括多个带宽校正致动器。
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公开(公告)号：US07116695B2
公开(公告)日：2006-10-03
申请号：US10953249
申请日：2004-09-28
申请人： Robert N. Jacques
发明人： Robert N. Jacques
IPC分类号： H01S3/223
CPC分类号： H01S3/105 , G03F7/70025 , G03F7/70041 , H01S3/0085 , H01S3/10069
摘要： An apparatus and method for producing laser output light pulses in bursts of pulses, at a selected pulse repetition rate, forming a laser output light beam, separated by an off time is disclosed, which may comprise a laser output light pulse beam parameter adjustment system, which may comprise a laser output light pulse beam parameter error detector providing a beam parameter error signal representative of the difference between the beam parameter and a selected target value for the beam parameter; a beam parameter adjustment mechanism; a beam parameter adjustment mechanism controller providing a beam parameter adjustment signal to the beam parameter adjustment mechanism based upon the value of the beam parameter error signal; a slow transient compensator providing a slow transient inversion signal modifying the beam parameter adjustment signal based upon the value of the beam parameter error signal. The apparatus and method may further comprise a beam parameter error scaling mechanism providing a normalized beam parameter error signal determined from the value of the beam parameter error signal; and the beam parameter adjustment mechanism controller and the slow transient controller providing, respectively, the beam parameter adjustment signal and the slow transient inversion signal based upon the normalized beam parameter error signal. The beam parameter adjustment mechanism controller may provide the beam parameter adjustment signal based upon a controller function that minimizes the average actual wavelength error or a windowed standard deviation of the actual wavelength error.
摘要翻译： 公开了一种以选定的脉冲重复频率脉冲串产生激光输出光脉冲的装置和方法，形成由关闭时间分离的激光输出光束，其可以包括激光输出光脉冲束参数调节系统， 其可以包括激光输出光脉冲束参数误差检测器，其提供表示波束参数与波束参数的选定目标值之间的差的波束参数误差信号; 光束参数调整机构; 光束参数调整机构控制器，基于所述光束参数误差信号的值向所述光束参数调整机构提供光束参数调整信号; 缓慢的瞬态补偿器提供基于波束参数误差信号的值来修改波束参数调整信号的慢速瞬态反转信号。 所述装置和方法还可以包括：波束参数误差缩放机构，其提供根据波束参数误差信号的值确定的归一化波束参数误差信号; 光束参数调整机构控制器和慢速瞬态控制器分别基于归一化的波束参数误差信号分别提供光束参数调整信号和慢瞬态反转信号。 光束参数调整机构控制器可以基于最小化实际波长误差的平均实际波长误差或窗口标准偏差的控制器功能来提供波束参数调整信号。
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公开(公告)号：US20100309939A1
公开(公告)日：2010-12-09
申请号：US12806308
申请日：2010-08-10
IPC分类号： H01S3/13
CPC分类号： H01S3/225 , H01S3/08022 , H01S3/09702 , H01S3/1301 , H01S3/134 , H01S3/2308 , H01S3/2366
摘要： A method and apparatus are disclosed for controlling bandwidth in a multi-portion laser system comprising a first line narrowed oscillator laser system portion providing a line narrowed seed pulse to an amplifier laser system portion, may comprise utilizing a timing difference curve defining a relationship between a first laser system operating parameter other than bandwidth and the timing difference and also a desired point on the curve defining a desired timing difference, wherein each unique operating point on the curve corresponds to a respective bandwidth value; determining an actual offset from the timing difference at the desired point on the curve to an actual operating point on the curve; determining an error between the actual offset and a desired offset corresponding to a desired bandwidth; modifying the firing differential timing to remove the error between the actual offset and the desired offset.
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公开(公告)号：US07835414B2
公开(公告)日：2010-11-16
申请号：US11796065
申请日：2007-04-25
IPC分类号： H01S3/22
CPC分类号： H01S3/036 , G03F7/70025 , G03F7/70525 , G03F7/70975 , H01S3/0014 , H01S3/1305 , H01S3/1306 , H01S3/134 , H01S3/2251 , H01S3/2256
摘要： A method and apparatus are disclosed which may comprise predicting the gas lifetime for a gas discharge laser light source for a photolithography process, the light source comprising a halogen containing lasing gas may comprise: utilizing at least one of a plurality of laser operating input and/or output parameters; utilizing a set of at least one parameter of utilization in the photolithography process to determine a gas use model in relation to the respective input or output parameter; predicting the end of gas life based upon the model and a measurement of the respective input or output parameter. The parameter may comprise a pulse utilization pattern. The method and apparatus may comprise performing gas management for a gas discharge laser light source for a photolithography process, the light source comprising a halogen containing lasing gas comprising: utilizing periodic and frequent partial gas refills comprising an inject comprising a mixture of halogen gas and bulk gas in generally the same ration as the premix ratio provided to the laser in a full gas refill, and in an amount less than two percent of the total gas pressure prior to the injection.
摘要翻译： 公开了一种方法和装置，其可以包括预测用于光刻工艺的气体放电激光光源的气体寿命，包括含卤素的激光气体的光源可以包括：利用多个激光操作输入和/ 或输出参数; 在光刻工艺中利用一组至少一个利用参数来确定相对于相应输入或输出参数的气体使用模型; 基于模型和相应的输入或输出参数的测量来预测气体寿命的结束。 该参数可以包括脉冲利用模式。 该方法和装置可以包括对用于光刻工艺的气体放电激光光源执行气体管理，该光源包括含卤素的激光气体，其包括：利用周期性和频繁的部分气体再填充，其包括含有卤素气体和体积的混合物 气体通常与在全气体再填充中提供给激光器的预混合比率相同，并且其量小于喷射前的总气体压力的2％。
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公开(公告)号：US07756171B2
公开(公告)日：2010-07-13
申请号：US12255347
申请日：2008-10-21
申请人： Robert N. Jacques
发明人： Robert N. Jacques
CPC分类号： H01S3/104 , G03F7/70025 , G03F7/70558 , H01S3/0057 , H01S3/034 , H01S3/2325
摘要： A laser control system contains an oscillator gas chamber and an amplifier gas chamber. A first voltage input is operatively connected to deliver electrical pulses to a first pair of electrodes within the oscillator gas chamber and a second pair of electrodes within the amplifier gas chamber. An output of the gas chambers is an energy dose calculated by a trapezoidal window. A control circuit connects to the first voltage input for modifying the first voltage input. A feedback control loop communicates an output of the gas chambers to the control circuit for modifying the first voltage input.
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公开(公告)号：US07751453B2
公开(公告)日：2010-07-06
申请号：US12255385
申请日：2008-10-21
申请人： Robert N. Jacques
发明人： Robert N. Jacques
CPC分类号： H01S3/104 , H01S3/0057 , H01S3/034 , H01S3/2325
摘要： A laser control system contains an oscillator gas chamber and an amplifier gas chamber. A first voltage input is operatively connected to deliver electrical pulses to a first pair of electrodes within the oscillator gas chamber and a second pair of electrodes within the amplifier gas chamber. An output of the gas chambers is an energy dose calculated by a trapezoidal window. A control circuit connects to the first voltage input for modifying the first voltage input. A feedback control loop communicates an output of the gas chambers to the control circuit for modifying the first voltage input.
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