Multi-chamber gas discharge laser bandwidth control through discharge timing
    1.
    发明授权
    Multi-chamber gas discharge laser bandwidth control through discharge timing 有权
    多室气体放电激光带宽控制通过放电时序

    公开(公告)号:US08102889B2

    公开(公告)日:2012-01-24

    申请号:US12806308

    申请日:2010-08-10

    IPC分类号: H01S3/00

    摘要: A method and apparatus are disclosed for controlling bandwidth in a multi-portion laser system comprising a first line narrowed oscillator laser system portion providing a line narrowed seed pulse to an amplifier laser system portion, may comprise utilizing a timing difference curve defining a relationship between a first laser system operating parameter other than bandwidth and the timing difference and also a desired point on the curve defining a desired timing difference, wherein each unique operating point on the curve corresponds to a respective bandwidth value; determining an actual offset from the timing difference at the desired point on the curve to an actual operating point on the curve; determining an error between the actual offset and a desired offset corresponding to a desired bandwidth; modifying the firing differential timing to remove the error between the actual offset and the desired offset.

    摘要翻译: 公开了一种用于控制多部分激光系统中的带宽的方法和装置,其包括向放大器激光系统部分提供线窄化种子脉冲的第一线窄化振荡器激光器系统部分,可以包括利用定时差分曲线来定义 第一激光系统操作参数而不是带宽和定时差,并且还在曲线上的期望点定义期望的时序差,其中曲线上的每个唯一操作点对应于相应的带宽值; 确定曲线上期望点处的定时差与曲线上的实际工作点的实际偏移; 确定实际偏移与对应于期望带宽的期望偏移之间的误差; 修改击发差分定时以消除实际偏移和所需偏移之间的误差。

    Multi-chamber gas discharge laser bandwidth control through discharge timing
    2.
    发明授权
    Multi-chamber gas discharge laser bandwidth control through discharge timing 有权
    多室气体放电激光带宽控制通过放电时序

    公开(公告)号:US07830934B2

    公开(公告)日:2010-11-09

    申请号:US11323604

    申请日:2005-12-29

    IPC分类号: H01S3/00

    摘要: A method and apparatus are disclosed for controlling bandwidth in a multi-portion laser system comprising a first line narrowed oscillator laser system portion providing a line narrowed seed pulse to an amplifier laser system portion, may comprise utilizing a timing difference curve defining a relationship between a first laser system operating parameter other than bandwidth and the timing difference and also a desired point on the curve defining a desired timing difference, wherein each unique operating point on the curve corresponds to a respective bandwidth value; determining an actual offset from the timing difference at the desired point on the curve to an actual operating point on the curve; determining an error between the actual offset and a desired offset corresponding to a desired bandwidth; modifying the firing differential timing to remove the error between the actual offset and the desired offset.

    摘要翻译: 公开了一种用于控制多部分激光系统中的带宽的方法和装置,其包括向放大器激光系统部分提供线窄化种子脉冲的第一线窄化振荡器激光器系统部分,可以包括利用定时差分曲线来定义 第一激光系统操作参数而不是带宽和定时差,并且还在曲线上的期望点定义期望的时序差,其中曲线上的每个唯一操作点对应于相应的带宽值; 确定曲线上期望点处的定时差与曲线上的实际工作点的实际偏移; 确定实际偏移与对应于期望带宽的期望偏移之间的误差; 修改击发差分定时以消除实际偏移和所需偏移之间的误差。

    Multi-chamber gas discharge laser bandwidth control through discharge timing

    公开(公告)号:US20100309939A1

    公开(公告)日:2010-12-09

    申请号:US12806308

    申请日:2010-08-10

    IPC分类号: H01S3/13

    摘要: A method and apparatus are disclosed for controlling bandwidth in a multi-portion laser system comprising a first line narrowed oscillator laser system portion providing a line narrowed seed pulse to an amplifier laser system portion, may comprise utilizing a timing difference curve defining a relationship between a first laser system operating parameter other than bandwidth and the timing difference and also a desired point on the curve defining a desired timing difference, wherein each unique operating point on the curve corresponds to a respective bandwidth value; determining an actual offset from the timing difference at the desired point on the curve to an actual operating point on the curve; determining an error between the actual offset and a desired offset corresponding to a desired bandwidth; modifying the firing differential timing to remove the error between the actual offset and the desired offset.

    High repetition rate laser produced plasma EUV light source

    公开(公告)号:US20080197297A1

    公开(公告)日:2008-08-21

    申请号:US11471434

    申请日:2006-06-20

    IPC分类号: G01J3/10

    摘要: An EUV light source apparatus and method are disclosed, which may comprise a pulsed laser providing laser pulses at a selected pulse repetition rate focused at a desired target ignition site; a target formation system providing discrete targets at a selected interval coordinated with the laser pulse repetition rate; a target steering system intermediate the target formation system and the desired target ignition site; and a target tracking system providing information about the movement of target between the target formation system and the target steering system, enabling the target steering system to direct the target to the desired target ignition site. The target tracking system may provide information enabling the creation of a laser firing control signal, and may comprise a droplet detector comprising a collimated light source directed to intersect a point on a projected delivery path of the target, having a respective oppositely disposed light detector detecting the passage of the target through the respective point, or a detector comprising a linear array of a plurality of photo-sensitive elements aligned to a coordinate axis, the light from the light source intersecting a projected delivery path of the target, at least one of the which may comprise a plane-intercept detection device. The droplet detectors may comprise a plurality of droplet detectors each operating at a different light frequency, or a camera having a field of view and a two dimensional array of pixels imaging the field of view. The apparatus and method may comprise an electrostatic plasma containment apparatus providing an electric plasma confinement field at or near a target ignition site at the time of ignition, with the target tracking system providing a signal enabling control of the electrostatic plasma containment apparatus. The apparatus and method may comprise a vessel having and intermediate wall with a low pressure trap allowing passage of EUV light and maintaining a differential pressure across the low pressure trap. The apparatus and method may comprise a magnetic plasma confinement mechanism creating a magnetic field in the vicinity of the target ignition site to confine the plasma to the target ignition site, which may be pulsed and may be controlled using outputs from the target tracking system.