公开(公告)号：US20060018003A1

公开(公告)日：2006-01-26

申请号：US11216930

申请日：2005-08-30

Applicant: Andrew Huibers ,  Satyadev Patel

Inventor： Andrew Huibers ,  Satyadev Patel

IPC: G02B26/00

CPC classification number: G02B26/0841

Abstract: A micromirror of a micromirror array of a spatial light modulator used in display systems comprises a mirror plate attached to a hinge that is supported by two posts formed on a substrate. Also the mirror plate is operable to rotate along a rotation axis that is parallel to but offset from a diagonal of the mirror plate when viewed from the top. An imaginary line connecting the two posts is not parallel to either diagonal of the mirror plate.

公开(公告)号：US06985277B2

公开(公告)日：2006-01-10

申请号：US11034318

申请日：2005-01-11

Applicant: Andrew Huibers ,  Satyadev Patel

Inventor： Andrew Huibers ,  Satyadev Patel

IPC: G02B26/00

CPC classification number: B82Y30/00 ,  G02B26/0841 ,  H04N5/7458

Abstract: A spatial light modulator is disclosed, along with a method for making such a modulator that comprises an array of micromirror devices. The center-to-center distance and the gap between adjacent micromirror devices are determined corresponding to the light source being used so as to optimize optical efficiency and performance quality. The micromirror device comprises a hinge support formed on a substrate and a hinge that is held by the hinge support. A mirror plate is connected to the hinge via a contact, and the distance between the mirror plate and the hinge is determined according to desired maximum rotation angle of the mirror plate, the optimum gap and pitch between the adjacent micromirrors.In a method of fabricating such spatial light modulator, one sacrificial layer is deposited on a substrate followed by forming the mirror plates, and another sacrificial layer is deposited on the mirror plates followed by forming the hinge supports. The two sacrificial layers are removed via the small gap between adjacent mirror devices with spontaneous vapor phase chemical etchant. Also disclosed is a projection system that comprises such a spatial light modulator, as well as a light source, condensing optics, wherein light from the light source is focused onto the array of micromirrors, projection optics for projecting light selectively reflected from the array of micromirrors onto a target, and a controller for selectively actuating the micromirrors in the array.

Abstract translation: 公开了一种空间光调制器，以及用于制造这样的调制器的方法，该调制器包括微镜器件阵列。 根据所使用的光源确定中心到中心的距离和相邻的微反射镜装置之间的间隙，以优化光学效率和性能质量。 微反射镜装置包括形成在基底上的铰链支撑件和由铰链支撑件保持的铰链。 镜板通过触点连接到铰链，并且根据镜板的期望的最大旋转角度，相邻微镜之间的最佳间隙和间距来确定镜板和铰链之间的距离。 在制造这种空间光调制器的方法中，将一个牺牲层沉积在衬底上，随后形成镜板，并且另一牺牲层沉积在镜板上，随后形成铰链支架。 通过具有自发气相化学蚀刻剂的相邻反射镜装置之间的小间隙去除两个牺牲层。 还公开了一种投影系统，其包括这样的空间光调制器以及光源，聚光光学器件，其中来自光源的光聚焦到微镜阵列上，用于投射从微镜阵列反射的光的投影光学器件 以及用于选择性地致动阵列中的微镜的控制器。

公开(公告)号：US06980349B1

公开(公告)日：2005-12-27

申请号：US10927560

申请日：2004-08-25

Applicant: Andrew Huibers ,  Satyadev Patel

Inventor： Andrew Huibers ,  Satyadev Patel

IPC: G02B26/00 ,  G02B26/08

CPC classification number: G02B26/0841

Abstract: A spatial light modulator is disclosed, along with methods for making such a modulator. The spatial light modulator comprises an array of micromirrors each of which comprises a deflectable and reflective mirror plate. For enabling the deflection of the mirror plate, incisions are made within the area of the mirror plate with each incision being fully enclosed within the area of the mirror plate. The incisions collectively define a deformable hinge that is on the same plane as the mirror plate at the non-deflected state.

Abstract translation: 公开了一种空间光调制器以及用于制造这种调制器的方法。 空间光调制器包括微镜阵列，每个微镜包括可偏转和反射的反射镜板。 为了使镜片的偏转能够在镜板的区域内形成切口，每个切口被完全封闭在镜板的区域内。 切口共同地限定了在非偏转状态下与镜板在同一平面上的可变形铰链。

公开(公告)号：US06965468B2

公开(公告)日：2005-11-15

申请号：US10627302

申请日：2003-07-24

Applicant: Andrew Huibers ,  Satyadev Patel

Inventor： Andrew Huibers ,  Satyadev Patel

IPC: B81C20060101 ,  G02B26/00 ,  G02B26/08 ,  G02F1/29 ,  H04N5/74

CPC classification number: B82Y30/00 ,  G02B26/0841 ,  H04N5/7458

Abstract: A spatial light modulator is disclosed, along with a method for making such a modulator that comprises an array of micromirror devices. The center-to-center distance and the gap between adjacent micromirror devices are determined corresponding to the light source being used so as to optimize optical efficiency and performance quality. The micromirror device comprises a hinge support formed on a substrate and a hinge that is held by the hinge support. A mirror plate is connected to the hinge via a contact, and the distance between the mirror plate and the hinge is determined according to desired maximum rotation angle of the mirror plate, the optimum gap and pitch between the adjacent micromirrors. In a method of fabricating such spatial light modulator, one sacrificial layer is deposited on a substrate followed by forming the mirror plates, and another sacrificial layer is deposited on the mirror plates followed by forming the hinge supports. The two sacrificial layers are removed via the small gap between adjacent mirror devices with spontaneous vapor phase chemical etchant. Also disclosed is a projection system that comprises such a spatial light modulator, as well as a light source, condensing optics, wherein light from the light source is focused onto the array of micromirrors, projection optics for projecting light selectively reflected from the array of micromirrors onto a target, and a controller for selectively actuating the micromirrors in the array.

公开(公告)号：US20050206993A1

公开(公告)日：2005-09-22

申请号：US11135699

申请日：2005-05-24

Applicant: Jonathan Doan ,  Satyadev Patel ,  Peter Heureux

Inventor： Jonathan Doan ,  Satyadev Patel ,  Peter Heureux

IPC: G02B26/08 ,  G02B26/00

CPC classification number: G02B26/0841 ,  G02B26/0833

Abstract: To protect the structural layers from being eroded in the etching process, a protection layer is deposited on the exposed structural layers of the micromirror. The protection layer is deposited before etching and removed after etching.

Abstract translation: 为了保护结构层在蚀刻过程中不被腐蚀，保护层沉积在微镜的暴露的结构层上。 在蚀刻之前沉积保护层并在蚀刻后除去。

公开(公告)号：US20050196896A1

公开(公告)日：2005-09-08

申请号：US11110184

申请日：2005-04-19

Applicant: Satyadev Patel ,  Andrew Huibers ,  Chris Spindt ,  Peter Heureux

Inventor： Satyadev Patel ,  Andrew Huibers ,  Chris Spindt ,  Peter Heureux

IPC: G09G3/34

CPC classification number: G09G3/346 ,  G02B26/0833 ,  G09G2300/0426 ,  G09G2300/0465

Abstract: Disclosed herein is a micromirror array device that comprises an array of reflective deflectable mirror plates each being associated with one single addressing electrode to be deflected to an ON state angle. A light transmissive electrode is disposed proximate to the mirror plates for deflecting the mirror plates to a non-zero OFF angle. The mirror plates are arranged in the array with a center-to-centre distance of 10.17 microns or less.

Abstract translation: 本文公开了一种微镜阵列器件，其包括反射偏转镜板阵列，每个反射镜阵列与一个单个寻址电极相关联以被偏转到ON状态角。 透光电极设置在靠近镜板的位置，用于将镜板偏转到非零OFF角度。 镜面阵列布置在阵列中，中心距离为10.17微米或更小。

公开(公告)号：US20050191790A1

公开(公告)日：2005-09-01

申请号：US11102295

申请日：2005-04-07

Applicant: Satyadev Patel ,  Andrew Huibers ,  Steve Chiang

Inventor： Satyadev Patel ,  Andrew Huibers ,  Steve Chiang

IPC: B81B3/00 ,  B81B7/00 ,  B81C1/00 ,  B81C99/00 ,  G02B26/08 ,  H01L21/44 ,  H01L21/48

CPC classification number: B81C1/00214 ,  B81B7/0077 ,  B81B2201/042 ,  B81C1/00333 ,  B81C1/00896 ,  B81C1/00904 ,  B81C2203/0118 ,  B82Y30/00 ,  G02B26/0833 ,  H01L24/97 ,  H01L2224/48091 ,  H01L2224/97 ,  H01L2924/01005 ,  H01L2924/01006 ,  H01L2924/01013 ,  H01L2924/01018 ,  H01L2924/01019 ,  H01L2924/0102 ,  H01L2924/01023 ,  H01L2924/01027 ,  H01L2924/01033 ,  H01L2924/01039 ,  H01L2924/01049 ,  H01L2924/01054 ,  H01L2924/01058 ,  H01L2924/01072 ,  H01L2924/01074 ,  H01L2924/01077 ,  H01L2924/01079 ,  H01L2924/01082 ,  H01L2924/01322 ,  H01L2924/04953 ,  H01L2924/09701 ,  H01L2924/10253 ,  H01L2924/10329 ,  H01L2924/12036 ,  H01L2924/12042 ,  H01L2924/12044 ,  H01L2924/14 ,  H01L2924/1433 ,  H01L2924/15787 ,  H01L2924/19041 ,  H01L2924/19042 ,  H01L2924/3025 ,  H01L2924/00014 ,  H01L2224/85 ,  H01L2924/00

Abstract: A method for forming a MEMS device is disclosed, where a final release step is performed just prior to a wafer bonding step to protect the MEMS device from contamination, physical contact, or other deleterious external events. Without additional changes to the MEMS structure between release and wafer bonding and singulation, except for an optional stiction treatment, the MEMS device is best protected and overall process flow is improved. The method is applicable to the production of any MEMS device and is particularly beneficial in the making of fragile micromirrors.

公开(公告)号：US20050170614A1

公开(公告)日：2005-08-04

申请号：US11093927

申请日：2005-03-29

Applicant: Satyadev Patel ,  Andrew Huibers ,  Steve Chiang

Inventor： Satyadev Patel ,  Andrew Huibers ,  Steve Chiang

IPC: B81B3/00 ,  B81B7/00 ,  B81C1/00 ,  B81C99/00 ,  G02B26/08 ,  H01L21/301 ,  H01L21/00 ,  H01L21/44

CPC classification number: B81C1/00214 ,  B81B7/0077 ,  B81B2201/042 ,  B81C1/00333 ,  B81C1/00896 ,  B81C1/00904 ,  B81C2203/0118 ,  B82Y30/00 ,  G02B26/0833 ,  H01L24/97 ,  H01L2224/48091 ,  H01L2224/97 ,  H01L2924/01005 ,  H01L2924/01006 ,  H01L2924/01013 ,  H01L2924/01018 ,  H01L2924/01019 ,  H01L2924/0102 ,  H01L2924/01023 ,  H01L2924/01027 ,  H01L2924/01033 ,  H01L2924/01039 ,  H01L2924/01049 ,  H01L2924/01054 ,  H01L2924/01058 ,  H01L2924/01072 ,  H01L2924/01074 ,  H01L2924/01077 ,  H01L2924/01079 ,  H01L2924/01082 ,  H01L2924/01322 ,  H01L2924/04953 ,  H01L2924/09701 ,  H01L2924/10253 ,  H01L2924/10329 ,  H01L2924/12036 ,  H01L2924/12042 ,  H01L2924/12044 ,  H01L2924/14 ,  H01L2924/1433 ,  H01L2924/15787 ,  H01L2924/19041 ,  H01L2924/19042 ,  H01L2924/3025 ,  H01L2924/00014 ,  H01L2224/85 ,  H01L2924/00

Abstract: A method for forming a MEMS device is disclosed, where a final release step is performed just prior to a wafer bonding step to protect the MEMS device from contamination, physical contact, or other deleterious external events. Without additional changes to the MEMS structure between release and wafer bonding and singulation, except for an optional stiction treatment, the MEMS device is best protected and overall process flow is improved. The method is applicable to the production of any MEMS device and is particularly beneficial in the making of fragile micromirrors.

公开(公告)号：US20050157375A1

公开(公告)日：2005-07-21

申请号：US11056752

申请日：2005-02-11

Applicant: Jonathan Doan ,  Andrew Huibers ,  Satyadev Patel ,  James Dunphy ,  Dmitri Simonian ,  Hongqin Shi ,  Jianglong Zhang

Inventor： Jonathan Doan ,  Andrew Huibers ,  Satyadev Patel ,  James Dunphy ,  Dmitri Simonian ,  Hongqin Shi ,  Jianglong Zhang

IPC: G02B26/00

CPC classification number: B82Y30/00

Abstract: Disclosed herein is a micromirror device having in-plane deformable hinge to which a deflectable and reflective mirror plate is attached. The mirror plate rotates to different angles in response to an electrostatic field established between the mirror plate and an addressing electrode associated with the mirror plate.

Abstract translation: 本文公开了一种具有面向可变形铰链的微反射镜装置，可偏转和反射的反射镜板附接到该反射镜。 响应于在镜板和与镜板相关联的寻址电极之间建立的静电场，镜板旋转到不同的角度。

公开(公告)号：US20050054135A1

公开(公告)日：2005-03-10

申请号：US10969380

申请日：2004-10-19

Applicant: Satyadev Patel ,  Jonathan Doan ,  Andrew Huibers

Inventor： Satyadev Patel ,  Jonathan Doan ,  Andrew Huibers

IPC: B81B7/00 ,  B81C20060101 ,  B81C1/00 ,  H01L21/00 ,  H01L21/76

CPC classification number: B81C1/00793 ,  B81B2201/042 ,  B81C2201/053

Abstract: A method for processing microelectromechanical devices is disclosed herein. The method prevents the diffusion and interaction between sacrificial layers and structure layers of the microelectromechanical devices by providing selected barrier layers between consecutive sacrificial and structure layers.

Abstract translation: 本文公开了一种用于处理微机电装置的方法。 该方法通过在连续的牺牲层和结构层之间提供选定的阻挡层来防止牺牲层与微机电器件的结构层之间的扩散和相互作用。