公开(公告)号：US20110033175A1

公开(公告)日：2011-02-10

申请号：US12864792

申请日：2009-01-19

申请人： Shigeru Kasai ,  Hiroyuki Miyashita ,  Tomohiro Suzuki ,  Masatake Yoneda ,  Kazuhiro Ooya

发明人： Shigeru Kasai ,  Hiroyuki Miyashita ,  Tomohiro Suzuki ,  Masatake Yoneda ,  Kazuhiro Ooya

IPC分类号： F27D11/12

CPC分类号： H01L21/67109 ,  H01L21/268 ,  H01L21/324 ,  H01L21/67115

摘要： An annealing apparatus includes heating sources 17a and 17b provided to face a wafer W, the heating sources 17a and 17b having LEDs 33 emitting lights to the wafer; light-transmitting members 18a and 18b for transmitting the lights emitted from the LEDs 33; and cooling members 4a and 4b made of aluminum and provided to directly contact with the heating sources 17a and 17b, respectively. The heating sources 17a and 17b include a plurality of LED arrays having supporters 32 made of AlN, each having one surface on which the LEDs 33 are adhered by using a silver paste 56; and other surface on which thermal diffusion members 50 made of copper are adhered by using a solder 57. The LED arrays 34 are fixed to the cooling member 4a(4b) by using screws via a silicon grease.

摘要翻译： 退火装置包括设置成面向晶片W的加热源17a和17b，具有向该晶片发光的LED 33的加热源17a和17b; 用于透射从LED 33发射的光的透光构件18a和18b; 以及由铝制成并分别与加热源17a和17b直接接触的冷却构件4a和4b。 加热源17a和17b包括多个LED阵列，其具有由AlN制成的支撑体32，每个具有一个表面，其上通过使用银膏56粘附LED 33; 和由铜制成的热扩散构件50的其他表面通过使用焊料57粘附在其上。LED阵列34通过使用经由硅油脂的螺钉固定到冷却构件4a（4b）。

公开(公告)号：US07846255B2

公开(公告)日：2010-12-07

申请号：US11578572

申请日：2005-04-14

申请人： Masatake Yoneda ,  Shigeru Kasai ,  Masahiro Shimizu

发明人： Masatake Yoneda ,  Shigeru Kasai ,  Masahiro Shimizu

IPC分类号： C23C16/00 ,  C23F1/00 ,  H01L21/306 ,  H01L21/683 ,  B23B31/28

CPC分类号： H01L21/67115 ,  H01L21/324 ,  H01L21/67109 ,  Y10T279/23

摘要： Processing equipment for an object to be processed is provided with a process container, the internal of which can be evacuated, a gas introducing means for introducing a prescribed gas into the process container, a supporting table provided in the process container, a ring-shaped supporting part provided on the supporting table for supporting the object to be processed, a plurality of thermoelectric conversion elements provided on an upper plane of the supporting table on an inner side of the supporting part, an element storing space evacuating means for evacuating inside the element storing space formed by a lower plane of the object to be treated, which is supported by the supporting part, an upper plane of the supporting table and the supporting part.

摘要翻译： 用于待处理物体的加工设备设置有可以抽真空的处理容器，用于将预定气体引入处理容器的气体引入装置，设置在处理容器中的支撑台，环形 支撑部件，设置在支撑台上，用于支撑待处理物体;多个热电转换元件，设置在支撑台的内侧的支撑台的上平面上;元件收纳空间抽出装置， 由被支撑部支撑的待处理对象的下平面形成的空间，支撑台的上平面和支撑部。

公开(公告)号：US20100150534A1

公开(公告)日：2010-06-17

申请号：US11993223

申请日：2006-06-21

申请人： Shigeru Kasai

发明人： Shigeru Kasai

IPC分类号： F27B5/06

CPC分类号： H01L21/67115 ,  H01L21/2686 ,  H01L21/324

摘要： A heat treating device including a treatment room for accommodating therein a substrate, a plurality of light sources, which is disposed above the treatment room, for irradiating the substrate, a first reflector, whose inner surface is a reflective surface of a dome shape, for reflecting and directing a part of light emitted from each light source to the substrate, and a plurality of second reflectors, each of which is provided for each light source, for reflecting and focusing light emitted from each light source and directing it to the substrate. The reflective surface of each of the second reflectors is a part of a spheroidal surface or a curved surface approximate to it surrounding a first focal point in such a manner that the first focal point is formed at a position near each light source and a second focal point is formed on a side of the substrate.

摘要翻译： 一种热处理装置，包括：处理室，用于容纳基板;多个光源，设置在所述处理室的上方，用于照射所述基板;第一反射器，其内表面为圆顶形状的反射面， 将从每个光源发射的光的一部分反射并引导到基板;以及多个第二反射器，每个第二反射器设置用于每个光源，用于反射和聚焦从每个光源发射的光并将其引导到基板。 每个第二反射器的反射表面是球形表面或围绕第一焦点的弯曲表面的一部分，使得第一焦点形成在靠近每个光源的位置，第二焦点 点形成在基板的一侧。

公开(公告)号：US20090032650A1

公开(公告)日：2009-02-05

申请号：US12167509

申请日：2008-07-03

申请人： Takeshi MAEHARA ,  Hideshi Iwasa ,  Yuusuke Watanabe ,  Kunihiko Kinugasa ,  Hajime Mori ,  Kiyofumi Saiki ,  Ken Okuda ,  Tsuyoshi Hagiwara ,  Noboru Saito ,  Masanobu Watanabe ,  Shigeru Kasai

发明人： Takeshi MAEHARA ,  Hideshi Iwasa ,  Yuusuke Watanabe ,  Kunihiko Kinugasa ,  Hajime Mori ,  Kiyofumi Saiki ,  Ken Okuda ,  Tsuyoshi Hagiwara ,  Noboru Saito ,  Masanobu Watanabe ,  Shigeru Kasai

IPC分类号： F16L3/08

CPC分类号： G21C13/032 ,  F16L3/02 ,  G21C15/25 ,  G21C17/032 ,  G21Y2002/303 ,  G21Y2004/301 ,  Y02E30/40

摘要： A reactor metering pipe fixing device fixes a reactor metering pipe disposed in a reactor to a cylindrical outer surface of a jet pump diffuser and reduces stress that may be induced in a weld zone in the reactor metering pipe. An outer holding member 41 is held on the cylindrical outer surface 18a of a jet pump diffuser 18 by a C-shaped holding member 30. The reactor metering pipe 19 is clamped from radial directions by the outer holding member 41 and inner holding members 42 and 43. Wedges 44 and 45 are wedged into a gap between the cylindrical outer surface 18a and the inner holding member 42 and a gap between the cylindrical outer surface 18a and the inner holding member 43 to fix the reactor metering pipe 19 firmly to the cylindrical outer surface 18a.

摘要翻译： 反应器计量管固定装置将设置在反应器中的反应器计量管固定到喷射泵扩散器的圆柱形外表面，并减少可能在反应器计量管中的焊接区域中引起的应力。 外保持构件41通过C形保持构件30保持在喷射泵扩散器18的圆筒形外表面18a上。反应器计量管19通过外保持构件41和内保持构件42沿径向夹紧， 楔形件44和45楔入圆柱形外表面18a和内保持构件42之间的间隙以及圆柱形外表面18a和内保持构件43之间的间隙，以将反应器计量管19牢固地固定到圆柱形外 表面18a。

公开(公告)号：US20080230180A1

公开(公告)日：2008-09-25

申请号：US11578572

申请日：2005-04-14

申请人： Masatake Yoneda ,  Shigeru Kasai ,  Masahiro Shimizu

发明人： Masatake Yoneda ,  Shigeru Kasai ,  Masahiro Shimizu

IPC分类号： C23C16/44 ,  C23F1/02

CPC分类号： H01L21/67115 ,  H01L21/324 ,  H01L21/67109 ,  Y10T279/23

摘要： Processing equipment for an object to be processed is provided with a process container, the internal of which can be evacuated, a gas introducing means for introducing a prescribed gas into the process container, a supporting table provided in the process container, a ring-shaped supporting part provided on the supporting table for supporting the object to be processed, a plurality of thermoelectric conversion elements provided on an upper plane of the supporting table on an inner side of the supporting part, an element storing space evacuating means for evacuating inside the element storing space formed by a lower plane of the object to be treated, which is supported by the supporting part, an upper plane of the supporting table and the supporting part.

摘要翻译： 用于待处理物体的加工设备设置有可以抽真空的处理容器，用于将预定气体引入处理容器的气体引入装置，设置在处理容器中的支撑台，环形 支撑部件，设置在支撑台上，用于支撑待处理物体;多个热电转换元件，设置在支撑台的内侧的支撑台的上平面上;元件收纳空间抽出装置， 由被支撑部支撑的待处理对象的下平面形成的空间，支撑台的上平面和支撑部。

公开(公告)号：US20080163818A1

公开(公告)日：2008-07-10

申请号：US12000010

申请日：2007-12-06

申请人： Tetsuya Saito ,  Shigeru Kasai

发明人： Tetsuya Saito ,  Shigeru Kasai

IPC分类号： H01L21/683 ,  C23C16/00

CPC分类号： C23C16/4408 ,  C23C16/4401 ,  C23C16/4411 ,  C23C16/4586 ,  H01L21/67098 ,  H01L21/67103 ,  H01L21/67109 ,  H01L21/67115 ,  H01L21/68792

摘要： A substrate heating apparatus of the present invention, which heats a substrate mounted on a mount table 104 having heating means 108, in a processing vessel 102, includes a supporting part 202 made from a first material to support the mount table, a sealing part 204 made from a second material different from the first material in heat conductivity to seal the supporting part and the processing vessel and a joint part 206 for joining the supporting part and the sealing part in an airtight manner. With the constitution, by selecting the first material and the second material of different heat conductivities properly, it is possible to reduce a heat gradient between the top of the mount table and the bottom of the mount table. As a result, it is possible to shorten a supporting structure for the mount table, in length.

摘要翻译： 本发明的基板加热装置将处理容器102中安装有具有加热装置108的安装台104的基板加热的基板加热装置包括由第一材料制成以支撑安装台的支撑部分202，密封部分204 由不同于导热性的第一材料的第二材料制成以密封支撑部分和处理容器，以及用于以气密方式接合支撑部分和密封部分的接合部分206。 通过构成，通过适当地选择不同导热率的第一材料和第二材料，可以减小安装台的顶部和安装台的底部之间的热梯度。 结果，可以缩短安装台的支撑结构的长度。

公开(公告)号：US20070163713A1

公开(公告)日：2007-07-19

申请号：US10525207

申请日：2003-08-25

申请人： Shigeru Kasai ,  Sumi Tanaka ,  Tetsuya Saito ,  Norihiko Yamamoto ,  Kenichi Yanagitani

发明人： Shigeru Kasai ,  Sumi Tanaka ,  Tetsuya Saito ,  Norihiko Yamamoto ,  Kenichi Yanagitani

IPC分类号： C23F1/00

CPC分类号： H01L21/67017 ,  C23C16/4481 ,  Y10T137/0324

摘要： A processing system that can supply a material gas produced inside a material reservoir tank into a processing apparatus while generating almost no pressure loss is provided. In a processing system comprising: a processing apparatus including a gas injection means 42 for injecting a specific material gas into a processing vessel 26 in order to provide specific processing to an object to be processed W, said material gas being produced from a metallic compound material M with low vapor pressure; and a gas supply system 24 for supplying said specific material gas to said gas injection means, said gas injection means is a shower head portion and said gas supply system provides: a gas passage 56 extending upwardly from said showerhead portion; a material reservoir tank 58 attached to the upper-end portion of said gas passage for containing said metallic compound material therein; and an open/close valve 60 for opening/closing said gas passage.

摘要翻译： 提供了一种处理系统，其能够在几乎不产生压力损失的同时将材料储存罐内产生的原料气体提供到处理设备中。 一种处理系统，包括：处理装置，包括用于将特定材料气体注入处理容器26中的气体注入装置42，以便对被处理物体W进行特定处理，所述原料气体由金属化合物材料 M蒸汽压低; 以及用于向所述气体注入装置供应所述特定材料气体的气体供应系统24，所述气体注入装置是淋浴喷头部分，所述气体供应系统提供：从所述喷头部分向上延伸的气体通道56; 附着在所述气体通道的上端部分的材料储存罐58，用于在其中容纳所述金属化合物材料; 以及用于打开/关闭所述气体通道的打开/关闭阀60。

公开(公告)号：US20060144519A1

公开(公告)日：2006-07-06

申请号：US11370780

申请日：2006-03-08

申请人： Toshiaki Kitamura ,  Koichi Rokuyama ,  Shigeru Kasai ,  Takashi Ogino ,  Yuki Osada

发明人： Toshiaki Kitamura ,  Koichi Rokuyama ,  Shigeru Kasai ,  Takashi Ogino ,  Yuki Osada

IPC分类号： C23F1/00

CPC分类号： H01J37/32174 ,  H01J37/32082 ,  H01J37/32183 ,  H01P5/026 ,  H01P5/04

摘要： A plasma generating method generates plasma in a treating chamber by controlling a high-frequency generating unit to generate a high-frequency signal and by feeding the high-frequency signal to the treating chamber through an impedance matching device. The plasma generating method includes controlling the impedance matching device, when the plasma is generated in the treating chamber, so as to satisfy a preset matching condition, and then controlling the high-frequency generating unit to generate and feed the high-frequency signal of the power generating the plasma, to the treating chamber.

摘要翻译： 等离子体产生方法通过控制高频发生单元产生高频信号并通过阻抗匹配装置将高频信号馈送到处理室来在处理室中产生等离子体。 等离子体产生方法包括当在处理室中产生等离子体时，控制阻抗匹配装置，以便满足预设的匹配条件，然后控制高频产生单元以产生和馈送高频信号 产生等离子体的功率到处理室。

公开(公告)号：US20060137613A1

公开(公告)日：2006-06-29

申请号：US10545399

申请日：2004-02-13

申请人： Shigeru Kasai

发明人： Shigeru Kasai

IPC分类号： C23C16/00

CPC分类号： H01J37/3222 ,  H01J37/32192

摘要： A compact plasma generating apparatus providing high efficiency of plasma excitation is presented. A plasma generating apparatus (100) comprises a microwave generating apparatus (10) for generating microwaves, a coaxial waveguide (20) having a coaxial structure comprising an inner tube (20a) and an outer tube (20b), a monopole antenna (21) being attached to one end of said inner tube (20a), for directing the microwaves generated by said microwave generating apparatus (10) to the monopole antenna (21), a resonator (22) composed of dielectric material for holding the monopole antenna (21), and a chamber (23) in which a specific process gas is fed for plasma excitation. The chamber (23) has an open surface and the resonator (22) is placed on this open surface, and the process gas is excited by the microwaves radiated from the monopole antenna (21) through the resonator (22) into the interior of the chamber (23) to generate plasma.

摘要翻译： 提出了一种提供高效等离子体激发的小型等离子体发生装置。 一种等离子体产生装置（100），包括用于产生微波的微波产生装置（10），具有同轴结构的同轴波导（20），其包括内管（20b）和外管（20b），单极天线 21）连接到所述内管（20A）的一端，用于将由所述微波发生装置（10）产生的微波引导到单极天线（21），由用于保持单极子的电介质材料构成的谐振器 天线（21）和其中为等离子体激发而供给特定工艺气体的腔室（23）。 腔室（23）具有开口表面，并且谐振器（22）被放置在该开放表面上，并且处理气体被从单极天线（21）通过谐振器（22）辐射的微波激发到内部 室（23）以产生等离子体。

公开(公告)号：US20050264386A1

公开(公告)日：2005-12-01

申请号：US11137453

申请日：2005-05-26

申请人： Yoshifumi Chida ,  Kei Chiba ,  Tatsumi Ide ,  Shigeru Kasai

发明人： Yoshifumi Chida ,  Kei Chiba ,  Tatsumi Ide ,  Shigeru Kasai

IPC分类号： H01H50/56 ,  H01H50/04 ,  H01H50/26 ,  H01H50/54 ,  H01H50/64 ,  H01H67/02

CPC分类号： H01H50/546

摘要： An electromagnetic relay is provided which is small in size and is capable of controlling two circuits of an ordinarily-open contact, which has a large current-carrying capacity and high interrupting capability, and which is excellent in resistance against shock and vibration. Movable contactors are held, through bow-shaped movable contactor springs, to two -shaped holding frames each being electrically separated and being mechanically connected via a card made of a highly heat-resistant resin in a card block. Thick-plate shaped movable contacts, which are attached to the movable contactors in a fixed manner, are electrically connected or disconnected to fixed contacts in a base block, in synchronization with operations of an armature of an electro-magnet block. In order to improve a current-carrying capability and interrupting capability, there are provided two pieces of ordinarily-open contacts which are connected in series to each other, and between which an interval is doubled, in each of two circuits.

摘要翻译： 提供了一种电磁继电器，其尺寸小，并且能够控制具有大的载流能力和高中断能力的通常开路触点的两个电路，并且具有优异的抗冲击和振动性。 可移动接触器通过弓形活动接触器弹簧固定到两个形状的保持框架各自电气分离，并通过卡片块中由高耐热树脂制成的卡片机械连接。 与电磁块的电枢的操作同步地，以固定的方式附接到活动接触器的厚板形可动触头与基座中的固定触点电连接或断开。 为了提高载流能力和中断能力，在两个电路中的每一个中提供两个彼此串联连接的通常开路的触点，并且间隔被加倍。