公开(公告)号：US20110240878A1

公开(公告)日：2011-10-06

申请号：US12754381

申请日：2010-04-05

申请人： Victor Benveniste ,  Bon-Woong Koo ,  Shardul Patel ,  Frank Sinclair

发明人： Victor Benveniste ,  Bon-Woong Koo ,  Shardul Patel ,  Frank Sinclair

IPC分类号： H01J27/02 ,  H01J37/317

CPC分类号： H01J37/3171 ,  H01J37/08 ,  H01J2237/002

摘要： An ion source is provided that utilizes the same dopant gas supplied to the chamber to generate the desired process plasma to also provide temperature control of the chamber walls during high throughput operations. The ion source includes a chamber having a wall that defines an interior surface. A liner is disposed within the chamber and has at least one orifice to supply the dopant gas to an inside of the chamber. A gap is defined between at least a portion of the interior surface of the chamber wall and the liner. A first conduit is configured to supply dopant gas to the gap where the dopant gas has a flow rate within the gap. A second conduit is configured to remove the dopant gas from the gap, wherein the flow rate of the dopant gas within the gap acts as a heat transfer media to regulate the temperature of the interior of the chamber.

摘要翻译： 提供了一种离子源，其利用提供给腔室的相同掺杂剂气体来产生所需的工艺等离子体，以在高通量操作期间提供室壁的温度控制。 离子源包括具有限定内表面的壁的室。 衬套设置在腔室内并且具有至少一个孔口以将掺杂剂气体供应到腔室的内部。 在室壁的内表面的至少一部分和衬垫之间限定间隙。 第一管道被配置为向掺杂剂气体在间隙内具有流速的间隙提供掺杂剂气体。 第二导管构造成从间隙去除掺杂剂气体，其中间隙内的掺杂剂气体的流速用作传热介质以调节室内部的温度。

公开(公告)号：US07897945B2

公开(公告)日：2011-03-01

申请号：US12237963

申请日：2008-09-25

申请人： Thomas Parrill ,  Victor Benveniste

发明人： Thomas Parrill ,  Victor Benveniste

IPC分类号： H01J37/30

CPC分类号： H01J37/3171 ,  H01J37/20 ,  H01J2237/201 ,  H01J2237/3109 ,  H01J2237/31701 ,  H01L21/26506

摘要： Ion implanters incorporating multibeam ion sources are used to meet process dose and energy demands associated with fabricating a thin lamina for use in photovoltaic devices. The thin lamina are formed by ion implantation followed by cleaving.

摘要翻译： 结合多波束离子源的离子注入机用于满足制造用于光伏器件的薄层相关的工艺剂量和能量需求。 薄层通过离子注入形成，然后切割。

公开(公告)号：US20100116983A1

公开(公告)日：2010-05-13

申请号：US12616589

申请日：2009-11-11

申请人： Victor Benveniste ,  James S. Buff ,  Frank Sinclair ,  Joseph C. Olson

发明人： Victor Benveniste ,  James S. Buff ,  Frank Sinclair ,  Joseph C. Olson

IPC分类号： H01J49/30 ,  G21K5/00 ,  H01J37/08

CPC分类号： H01J37/05 ,  H01J37/08 ,  H01J37/3171 ,  H01J49/30 ,  H01J2237/022 ,  H01J2237/055 ,  H01J2237/057 ,  H01J2237/083 ,  H01J2237/31705

摘要： A ribbon beam mass analyzer having a first and second solenoid coils and steel yoke arrangement. Each of the solenoid coils have a substantially “racetrack” configuration defining a space through which an ion ribbon beam travels. The solenoid coils are spaced apart along the direction of travel of the ribbon beam. Each of the solenoid coils generates a uniform magnetic field to accommodate mass resolution of wide ribbon beams to produce a desired image of ions generated from an ion source.

摘要翻译： 带状光束质量分析仪，具有第一和第二电磁线圈和钢轭装置。 每个电磁线圈具有大致“跑道”结构，其限定了离子带束通过该空间行进的空间。 螺线管线圈沿着带状束的行进方向间隔开。 每个电磁线圈产生均匀的磁场以适应宽带束的质量分辨率，以产生从离子源产生的离子的期望图像。

公开(公告)号：US20080169426A1

公开(公告)日：2008-07-17

申请号：US11622619

申请日：2007-01-12

申请人： Kenneth H. Purser ,  James S. Buff ,  Victor Benveniste

发明人： Kenneth H. Purser ,  James S. Buff ,  Victor Benveniste

IPC分类号： G21K1/093

CPC分类号： H01J37/141 ,  H01J37/153 ,  H01J37/3171 ,  H01J2237/1501 ,  H01J2237/1526 ,  H01J2237/24528

摘要： A technique for reducing magnetic fields at an implant location is disclosed. In one particular exemplary embodiment, the technique may be realized as an apparatus and method for reducing magnetic fields at an implant location. The apparatus and method may comprise a corrector-bar assembly comprising a set of magnetic core members, a plurality of coils distributed along the set of magnetic core members, and connecting elements to connect ends of the set of magnetic core members with each other to form a rectangular corrector-bar configuration. The corrector-bar assembly may be positioned at an exit region of a magnetic deflector to improve uniformity of a ribbon beam having a plurality of beamlets exiting from the magnetic deflector and the rectangular corrector-bar configuration may provide a desired magnetic field clamping action.

摘要翻译： 公开了一种用于在植入位置减小磁场的技术。 在一个特定的示例性实施例中，该技术可以被实现为用于减少植入位置处的磁场的装置和方法。 该装置和方法可以包括校正棒组件，其包括一组磁芯构件，沿着该组磁芯构件分布的多个线圈，以及连接元件，以使该组磁芯构件的端部彼此连接以形成 一个矩形校正器配置。 校正棒组件可以定位在磁偏转器的出口区域处，以改善具有从磁偏转器离开的多个子束的带状束的均匀性，并且矩形校正器配置可以提供期望的磁场夹紧动作。

公开(公告)号：US20050218343A1

公开(公告)日：2005-10-06

申请号：US10815586

申请日：2004-04-01

申请人： Victor Benveniste

发明人： Victor Benveniste

IPC分类号： H01J37/05 ,  H01J37/317

CPC分类号： H01J37/05 ,  H01J37/3171

摘要： Ion implantation systems are provided, comprising a dispersion system located between an ion source and a mass analyzer, that operates to selectively pass an extracted ion beam from the ion source toward the mass analyzer or to direct a dispersed ion beam toward the mass analyzer, where the dispersed ion beam has fewer ions of an undesired mass range than the extracted ion beam.

摘要翻译： 提供离子注入系统，其包括位于离子源和质量分析器之间的分散系统，其操作以选择性地将离子源从离子源向质量分析器传递，或者将分散的离子束引导到质量分析器，其中 分散的离子束具有比提取的离子束更少的不期望质量范围的离子。

公开(公告)号：US20050061997A1

公开(公告)日：2005-03-24

申请号：US10669186

申请日：2003-09-24

申请人： Victor Benveniste

发明人： Victor Benveniste

IPC分类号： H01J37/30 ,  H01J37/317 ,  H01J37/08

CPC分类号： H01J37/3171 ,  H01J37/3007 ,  H01J2237/057 ,  H01J2237/152 ,  H01J2237/31701 ,  H01J2237/31713

摘要： The present invention employs a mass analyzer comprised of a pair of permanent magnets to select a desired species from multiple species within a ribbon type ion beam. These permanent magnets provide a substantially uniform magnetic field of adequate magnitude in a small region not attainable with electromagnets that applies a specific force in a desired direction. The force is applied to passing particles of a ribbon ion beam and causes paths of the particles to alter according to their respective mass. As a result, a selected species can be obtained from a beam by the force causing rejected species and/or contaminants to fail passing through the mass analyzer (e.g., by impacting the magnets themselves and/or another barrier present in the analyzer). As a result of the mass analyzer, dopant/species sources that generate multiple species can be employed instead of sources that only supply a single dopant/species.

摘要翻译： 本发明采用由一对永久磁铁构成的质量分析器，从带状离子束内的多种物质中选择所需物质。 这些永磁体通过在期望的方向施加特定力的电磁体不能达到的小区域中提供足够大的基本均匀的磁场。 将力施加到带状离子束的通过颗粒，并且使颗粒的路径根据其相应的质量而改变。 结果，可以通过使得被排出的物质和/或污染物通过质量分析器的力（例如通过冲击磁体本身和/或分析仪中存在的另一个屏障）的力从光束获得所选择的物质。 作为质量分析器的结果，可以使用产生多种物质的掺杂剂/物质源，而不是仅提供单一掺杂剂/物质的源。