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公开(公告)号:US20220375878A1
公开(公告)日:2022-11-24
申请号:US17881739
申请日:2022-08-05
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor: Chih-Chia Hu , Chun-Chiang Kuo , Sen-Bor Jan , Ming-Fa Chen , Hsien-Wei Chen
IPC: H01L23/58 , H01L23/522 , H01L23/532 , H01L29/06 , H01L23/00 , H01L25/00 , H01L25/065
Abstract: A structure includes a first die and a second die. The first die includes a first bonding layer having a first plurality of bond pads disposed therein and a first seal ring disposed in the first bonding layer. The first bonding layer extends over the first seal ring. The second die includes a second bonding layer having a second plurality of bond pads disposed therein. The first plurality of bond pads is bonded to the second plurality of bond pads. The first bonding layer is bonded to the second bonding layer. An area interposed between the first seal ring and the second bonding layer is free of bond pads.
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公开(公告)号:US20220375793A1
公开(公告)日:2022-11-24
申请号:US17874741
申请日:2022-07-27
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor: Ming-Fa Chen , Tzuan-Horng Liu , Chao-Wen Shih
IPC: H01L21/768 , H01L25/00 , H01L25/065 , H01L23/00
Abstract: An embodiment is a method including forming a first interconnect structure over a first substrate, the first interconnect structure comprising dielectric layers and metallization patterns therein, patterning the first interconnect structure to form a first opening, coating the first opening with a barrier layer, etching a second opening through the barrier layer and the exposed portion of the first substrate, depositing a liner in the first opening and the second opening, filling the first opening and the second opening with a conductive material, and thinning the first substrate to expose a portion of the conductive material in the second opening, the conductive material extending through the first interconnect structure and the first substrate forming a through substrate via.
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公开(公告)号:US11502062B2
公开(公告)日:2022-11-15
申请号:US17334025
申请日:2021-05-28
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor: Ming-Fa Chen , Tzuan-Horng Liu , Chao-Wen Shih , Sung-Feng Yeh , Nien-Fang Wu
IPC: H01L25/065 , H01L23/31 , H01L21/56 , H01L23/522 , H01L23/00 , H01L23/544 , H01L23/528 , H01L25/00 , H01L21/3105 , H01L21/768 , H01L21/78 , H01L21/683 , H01L23/48 , H01L21/66
Abstract: In an embodiment, a device includes: a bottom integrated circuit die having a first front side and a first back side; a top integrated circuit die having a second front side and a second back side, the second back side being bonded to the first front side, the top integrated circuit die being free from through substrate vias (TSVs); a dielectric layer surrounding the top integrated circuit die, the dielectric layer being disposed on the first front side, the dielectric layer and the bottom integrated circuit die being laterally coterminous; and a through via extending through the dielectric layer, the through via being electrically coupled to the bottom integrated circuit die, surfaces of the through via, the dielectric layer, and the top integrated circuit die being planar.
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公开(公告)号:US20220359326A1
公开(公告)日:2022-11-10
申请号:US17872916
申请日:2022-07-25
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor: Chen-Hua Yu , Sung-Feng Yeh , Ming-Fa Chen , Hsien-Wei Chen , Tzuan-Horng Liu
IPC: H01L23/31 , H01L23/538 , H01L23/48 , H01L23/522
Abstract: A device package includes a first die directly bonded to a second die at an interface, wherein the interface comprises a conductor-to-conductor bond. The device package further includes an encapsulant surrounding the first die and the second die and a plurality of through vias extending through the encapsulant. The plurality of through vias are disposed adjacent the first die and the second die. The device package further includes a plurality of thermal vias extending through the encapsulant and a redistribution structure electrically connected to the first die, the second die, and the plurality of through vias. The plurality of thermal vias is disposed on a surface of the second die and adjacent the first die.
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公开(公告)号:US20220319941A1
公开(公告)日:2022-10-06
申请号:US17808632
申请日:2022-06-24
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor: Hsien-Wei Chen , Ming-Fa Chen , Chen-Hua Yu
IPC: H01L23/28 , H01L25/065 , H01L23/367 , H01L25/00
Abstract: A package and a method of forming the same are provided. The package includes: a die stack bonded to a carrier, the die stack including a first integrated circuit die, the first integrated circuit die being a farthest integrated circuit die of the die stack from the carrier, a front side of the first integrated circuit die facing the carrier; a die structure bonded to the die stack, the die structure including a second integrated circuit die, a backside of the first integrated circuit die being in physical contact with a backside of the second integrated circuit die, the backside of the first integrated circuit die being opposite the front side of the first integrated circuit die; a heat dissipation structure bonded to the die structure adjacent the die stack; and an encapsulant extending along sidewalls of the die stack and sidewalls of the heat dissipation structure.
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公开(公告)号:US20220301890A1
公开(公告)日:2022-09-22
申请号:US17328001
申请日:2021-05-24
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor: Hsien-Wei Chen , Ming-Fa Chen , Ying-Ju Chen
IPC: H01L21/56 , H01L21/78 , H01L23/31 , H01L23/538
Abstract: A method of forming an integrated circuit package includes attaching a first die to an interposer. The interposer includes a first die connector and a second die connector on the interposer and a first dielectric layer covering at least one sidewall of the first die connector and at least one sidewall of the second die connector. The first die is coupled to the first die connector and to the first dielectric layer and the second die connector is exposed by the first die. The method further includes recessing the first dielectric layer to expose at least one sidewall of the second die connector and attaching a second die to the interposer, the second die being coupled to the second die connector.
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公开(公告)号:US20220278074A1
公开(公告)日:2022-09-01
申请号:US17186984
申请日:2021-02-26
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor: Ming-Fa Chen , Chao-Wen Shih , Sung-Feng Yeh
IPC: H01L23/00 , H01L23/48 , H01L25/065 , H01L25/18
Abstract: A package structure and method of manufacturing is provided, whereby a bonding dielectric material layer is provided at a back side of a wafer, a bonding dielectric material layer is provided at a front side of an adjoining wafer, and wherein the bonding dielectric material layers are fusion bonded to each other.
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公开(公告)号:US20220278063A1
公开(公告)日:2022-09-01
申请号:US17745225
申请日:2022-05-16
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor: Chih-Chia Hu , Ching-Pin Yuan , Sung-Feng Yeh , Sen-Bor Jan , Ming-Fa Chen
IPC: H01L23/00 , H01L23/544 , H01L25/065 , H01L23/522
Abstract: A semiconductor device including a first die and a second die bonded to one another. The first die includes a first passivation layer over a substrate, and first bond pads in the first passivation layer. The second die includes a second passivation layer, which may be bonded to the first passivation layer, and second bond pads in the second passivation layer, which may be bonded to the first bond pads. The second bond pads include inner bond pads and outer bond pads. The outer bond pads may have a greater diameter than the inner bond pads as well as the first bond pads.
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公开(公告)号:US11417619B2
公开(公告)日:2022-08-16
申请号:US16547596
申请日:2019-08-22
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor: Ming-Fa Chen , Hsien-Wei Chen , Sung-Feng Yeh
IPC: H01L25/04 , H01L23/00 , H01L25/065 , H01L23/31 , H01L23/48 , H01L23/528 , H01L25/00 , H01L21/768 , H01L21/56 , H01L21/78
Abstract: A package includes a first die, a second die, an encapsulant, and through insulating vias (TIV). The first die has a first bonding structure. The first bonding structure includes a first dielectric layer and first connectors embedded in the first dielectric layer. The second die has a second bonding structure. The second bonding structure includes a second dielectric layer and second connectors embedded in the second dielectric layer. The first dielectric layer is hybrid bonded to the second dielectric layer. The first connectors are hybrid bonded to the second connectors. The encapsulant laterally encapsulates the second die. The TIVs penetrate through the encapsulant and are connected to the first bonding structure.
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公开(公告)号:US11417587B2
公开(公告)日:2022-08-16
申请号:US16856044
申请日:2020-04-23
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor: Hsien-Wei Chen , Jie Chen , Ming-Fa Chen , Sung-Feng Yeh
Abstract: A package structure including a first semiconductor die, a first insulating encapsulation, a bonding enhancement film, a second semiconductor die and a second insulating encapsulation is provided. The first insulating encapsulation laterally encapsulates a first portion of the first semiconductor die. The bonding enhancement film is disposed on a top surface of the first insulating encapsulation and laterally encapsulates a second portion of the first semiconductor die, wherein a top surface of the bonding enhancement film is substantially leveled with a top surface of the semiconductor die. The second semiconductor die is disposed on and bonded to the first semiconductor die and the bonding enhancement film. The second insulating encapsulation laterally encapsulates the second semiconductor die.
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