Heating device, coating/developing system, heating method, coating/developing method, and recording medium having program for executing heating method or coating/developing method
    31.
    发明授权
    Heating device, coating/developing system, heating method, coating/developing method, and recording medium having program for executing heating method or coating/developing method 有权
    加热装置,涂布/显影系统,加热方法,涂布/显影方法和具有用于执行加热方法或涂布/显影方法的程序的记录介质

    公开(公告)号:US08927906B2

    公开(公告)日:2015-01-06

    申请号:US13018877

    申请日:2011-02-01

    CPC分类号: B05C21/00 G03F7/20 H05B3/20

    摘要: The disclosed heating device is to perform a heating process on an exposed substrate formed with a resist film before a developing process, the device including a heating part to perform a heating process on the exposed substrate, the heating part including a plurality of two-dimensionally arranged heating elements; a seating part provided at an upper side of the heating part, on which the substrate is disposed; and a control part to correct a setting temperature of the heating part based on temperature correction values, and to control the heating part based on the corrected setting temperature, during the heating process on one substrate by the heating part, wherein the temperature correction values being previously obtained from measured critical dimensions of the resist pattern in another substrate formed with the resist pattern through the heating process by the heating part and then the developing process.

    摘要翻译: 所公开的加热装置是在显影处理之前对形成有抗蚀剂膜的暴露的基板进行加热处理,该装置包括加热部分,以对暴露的基板进行加热处理,加热部分包括多个二维 布置加热元件; 设置在所述加热部的上侧的座部,所述基板设置在所述加热部的上侧; 以及控制部,其基于温度校正值校正加热部的设定温度,并且在由加热部在一个基板上的加热处理期间,基于校正的设定温度来控制加热部,其中,温度校正值为 先前由通过加热部分的加热处理形成的抗蚀剂图案的另一个衬底中的抗蚀剂图案的测量的临界尺寸获得,然后通过显影过程获得。

    SUBSTRATE MEASURING METHOD, COMPUTER-READABLE RECORDING MEDIUM RECORDING PROGRAM THEREON, AND SUBSTRATE MEASURING SYSTEM
    32.
    发明申请
    SUBSTRATE MEASURING METHOD, COMPUTER-READABLE RECORDING MEDIUM RECORDING PROGRAM THEREON, AND SUBSTRATE MEASURING SYSTEM 有权
    基板测量方法,计算机可读记录介质程序及基板测量系统

    公开(公告)号:US20080074657A1

    公开(公告)日:2008-03-27

    申请号:US11856308

    申请日:2007-09-17

    IPC分类号: G01N21/00

    CPC分类号: H01L21/67253 H01L21/67248

    摘要: In the present invention, for measurement of line widths, for example, at 36 locations within a substrate processed in a coating and developing treatment system, the 36 measurement points are divided and, for example, six substrates are used to measure the line widths at all of measurement points. In this event, the line widths at six measurement points are measured in each of the substrate, which exist in substrate regions different for each substrate. Then, the measurement results of the line widths at the measurement points of the substrates are combined, so that the line widths at 36 measurement points are finally detected. According to the present invention, the measurements of product substrates can be performed without decreasing the throughput of processing of the product substrates.

    摘要翻译: 在本发明中,为了测量线宽度,例如在涂布和显影处理系统中处理的基板内的36个位置处,36个测量点被分割,并且例如使用六个基板来测量线宽 所有测量点。 在这种情况下,在每个衬底中测量六个测量点处的线宽度,每个衬底存在于对于每个衬底不同的衬底区域中。 然后,将基板的测定点的线宽度的测定结果合并,最终检测36个测定点的线宽。 根据本发明,可以在不降低产品基板的加工生产能力的情况下进行产品基板的测量。

    Liquid cooling system and electronic apparatus using the same
    37.
    发明申请
    Liquid cooling system and electronic apparatus using the same 失效
    液体冷却系统及使用其的电子设备

    公开(公告)号:US20050047091A1

    公开(公告)日:2005-03-03

    申请号:US10791823

    申请日:2004-03-04

    摘要: A liquid cooling system for use in an electronic apparatus, being super small-sized and thin in the shape and being suitable for cooling a heat-generation part, such as, a semiconductor element having large amount of heat generation, for example, with maintaining the corrosion resistance thereof for a long time period, comprises: a pump for supplying a cooling liquid; a heat-receiving jacket, being supplied with the cooling liquid, for receiving heat from an electronic parts; a radiator, being supplied with the cooling liquid passing through the heat-receiving jacket, for radiation heat; and flow passages for circulating the cooling liquid in a route passing through the radiator back to said pump, wherein an ion exchange bag, having an ion exchange resin and a bag enclosing it therein, is disposed in a part of the constituent parts of the liquid cooling system, and/or the ion exchange bag is exchangeable.

    摘要翻译: 一种用于电子设备的液体冷却系统,其尺寸超薄,形状小,适合于冷却发热部件,例如具有大量发热量的半导体元件,例如维持 其耐腐蚀性长时间包括:用于供应冷却液的泵; 供给冷却液的热接收套,用于从电子部件接收热量; 散热器,供给通过热接收护套的冷却液用于辐射热; 以及用于使通过散热器的路线中的冷却液循环回到所述泵的流路,其中具有离子交换树脂的离子交换袋和其中包围的离子交换袋设置在液体的组成部分的一部分中 冷却系统和/或离子交换袋是可交换的。

    Resist pattern slimming treatment method
    40.
    发明申请
    Resist pattern slimming treatment method 审中-公开
    抗皱图案减肥治疗方法

    公开(公告)号:US20100291491A1

    公开(公告)日:2010-11-18

    申请号:US12662343

    申请日:2010-04-13

    IPC分类号: G03F7/38

    CPC分类号: G03F7/38 H01L21/0273

    摘要: A resist pattern slimming treatment method of performing a slimming treatment on a resist pattern formed on a substrate includes: a slimming treatment step of performing a slimming treatment on the resist pattern by applying a reactant solubilizing the resist pattern onto the resist pattern, then performing a heat treatment on the resist pattern under a heat treatment condition determined in advance, and then performing a developing treatment on the resist pattern; and a first line width measurement step of measuring a line width of the resist pattern before the slimming treatment step. The heat treatment condition is determined based on a measurement value of the line width measured in the first line width measurement step.

    摘要翻译: 对形成在基板上的抗蚀剂图案进行减肥处理的抗蚀剂图案减肥处理方法包括:减肥处理步骤,通过将抗蚀剂图案溶解在抗蚀剂图案上来进行抗蚀剂图案的减肥处理,然后进行 在预先确定的热处理条件下对抗蚀剂图案进行热处理,然后对抗蚀剂图案进行显影处理; 以及第一线宽测量步骤,用于在减肥处理步骤之前测量抗蚀剂图案的线宽。 基于在第一线宽测量步骤中测量的线宽的测量值来确定热处理条件。