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31.发明授权
公开(公告)号：US5892164A
公开(公告)日：1999-04-06
申请号：US62534
申请日：1998-04-17
CPC分类号： B22F3/1007 , C22C33/02 , C22C33/0264 , B22F2003/023 , B22F2998/00 , B22F2999/00
摘要： Fine powders of iron with less than 5% by weight graphite, copper, and an organic binder can be formed into shapes having a green density of up to about 7.4 g/cc and sintered in a hydrogen containing atmosphere to yield parts having minimum variations in physical properties. Incorporation of small quantities of copper, e.g. 1% or less by weight, negates variations in physical properties of sintered parts that were subjected to variations in the hydrogen content of the sintering atmosphere.
摘要翻译： 具有小于5重量％的石墨，铜和有机粘合剂的铁的细粉末可以形成为具有高达约7.4g / cc的生坯密度的形状，并且在含氢气氛中烧结以产生具有最小变化的部分 物理性质。 掺入少量的铜，例如 1重量％以下时，不利于烧结气氛中氢含量变化的烧结体的物性变化。
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32.发明授权Deposition of tungsten films from mixtures of tungsten hexafluoride organohydrosilanes and hydrogen 失效从六氟化钨有机氢硅烷和氢气的混合物中沉积钨膜
公开(公告)号：US5433975A
公开(公告)日：1995-07-18
申请号：US116178
申请日：1993-09-02
CPC分类号： C23C16/14 , C23C16/08 , H01L21/28556
摘要： A method of depositing tungsten films comprising heating a substrate to a temperature above 200.degree. C. in a chemical vapor deposition reactor, flowing a stream of carrier gas over the substrate in the reactor, and simultaneously introducing mixtures of WF.sub.6 and organohydrosilanes into the reactor.
摘要翻译： 一种沉积钨膜的方法，包括在化学气相沉积反应器中将衬底加热至高于200℃的温度，将载气流在反应器中的衬底上流动，同时将WF 6和有机氢硅烷的混合物引入反应器中。
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33.发明授权Process for producing furnace atmospheres by deoxygenating non-cryogenically generated nitrogen with dissociated ammonia 失效通过用解离的氨将非低温法生成的氮脱氧生产炉气氛的方法
公开(公告)号：US5290480A
公开(公告)日：1994-03-01
申请号：US995618
申请日：1992-12-22
CPC分类号： C21D1/763 , B22F3/1007 , B23K35/383 , C01B3/047 , Y02E60/364
摘要： A process for producing low-cost furnace atmospheres suitable for annealing and heat treating ferrous and non-ferrous metals and alloys, brazing metals and ceramics, sealing glass to metals, and sintering non-ferrous metal and ceramic powders from non-cryogenically produced nitrogen containing from 0.05 to 5.0% residual oxygen is presented. The disclosed process involves 1) mixing non-cryogenically produced nitrogen with a predetermined amount of dissociated ammonia, 2) passing the mixture through a low-pressure drop catalytic reactor, 3) converting the residual oxygen to an acceptable form such as moisture and reducing the residual oxygen level to below about 10 ppm, and 4) using the resultant gaseous mixture for annealing and heat treating ferrous and non-ferrous metals and alloys, brazing metals and ceramics, sealing glass to metals, and sintering non-ferrous metal and ceramic powders. The key feature of the disclosed process involves the use of a novel low-pressure drop catalytic reactor for converting residual oxygen with dissociated ammonia to moisture.
摘要翻译： 一种生产低成本炉气氛的方法，适用于退火和热处理黑色金属和有色金属及合金，钎焊金属和陶瓷，将玻璃与金属密封，并从非低温法生产的氮中烧结有色金属和陶瓷粉末 提供0.05至5.0％的残余氧气。 所公开的方法包括1）将非低温法生产的氮与预定量的离解氨混合，2）使混合物通过低压滴催化反应器，3）将残余氧转化成可接受的形式如水分，并将 残余氧气水平低于约10ppm，以及4）使用所得气体混合物进行退火和热处理黑色金属和有色金属和合金，钎焊金属和陶瓷，将玻璃密封到金属上，并烧结有色金属和陶瓷粉末 。 所公开方法的主要特征是使用一种新型的低压滴催化反应器将残留的氧气与解离的氨转化成水分。
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34.发明授权
公开(公告)号：US5124179A
公开(公告)日：1992-06-23
申请号：US582515
申请日：1990-09-13
CPC分类号： C23C16/46 , C23C16/271 , C23C16/279
摘要： The method for depositing multilayers of PCD film onto the substrate comprises chemically depositing a polycrystalline diamond layers onto the substrate at deposition temperatures in the range of 650.degree. to 825.degree. C., interrupting the deposition process with a cool-down step and then depositing at least one other layer under the same deposition conditions. The method enables one to deposit PCD films having a thickness of at least 12 microns for applications on flat as well as curved substrates having wide use in the electronics industry. Thick PCD films of this invention have been found to be ideal for dissipating heat from radio frequency (RF) and microwave (MW) devices.
摘要翻译： 将PCD膜的多层膜沉积到衬底上的方法包括在650℃至825℃的沉积温度下将多晶金刚石层化学沉积到衬底上，用冷却步骤中断沉积过程，然后沉积在 在相同的沉积条件下至少另外一层。 该方法使得能够沉积具有至少12微米厚度的PCD膜用于在电子工业中广泛使用的平面以及弯曲基板上的应用。 已经发现本发明的厚PCD膜对于从射频（RF）和微波（MW）装置散热是理想的。
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公开(公告)号：US5009966A
公开(公告)日：1991-04-23
申请号：US409541
申请日：1989-09-19
CPC分类号： C23C28/00 , C23C16/0281 , Y10S428/936 , Y10T428/12535 , Y10T428/12576 , Y10T428/12611 , Y10T428/12625 , Y10T428/12806 , Y10T428/12868 , Y10T428/12931
摘要： The invention discloses a coated substrate product comprised of a titanium of titanium alloy substrate, at least one thin interlayer composed of a non-reactive noble metal and a hard outer coating selected from the group comprised of a ceramic, a hard metal, a hard metal compound and a diamond-like carbon, wherein at least the non-reactive noble metal interlayer which is immediately adjacent to the titanium or titanium alloy substrate is deposited onto the substrate by means of an electroless plating procedure, and the hard outer coating is deposited onto the non-reactive interlayer(s) by means of known chemical and physical vapor deposition techniques. The invention also discloses a method for making these coated substrate products.
摘要翻译： 本发明公开了一种由钛合金基板钛，至少一层由非反应性贵金属构成的薄层和选自陶瓷，硬质金属，硬质金属 化合物和类金刚石碳，其中至少与钛或钛合金基底紧邻的非反应性贵金属中间层通过化学镀方法沉积到基底上，并将硬外涂层沉积到 非反应性中间层通过已知的化学和物理气相沉积技术。 本发明还公开了一种制备这些涂覆的基底产品的方法。
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公开(公告)号：US4990372A
公开(公告)日：1991-02-05
申请号：US388104
申请日：1989-07-31
申请人： Swaminathan Sunder , Diwakar Garg , Paul N. Dyer
发明人： Swaminathan Sunder , Diwakar Garg , Paul N. Dyer
摘要： A method is described for improving the erosion and abrasion wear resistance and hardness of the internal wear surfaces of structures such as nozzles, jets, ducts, chutes, powder handling tubes, valve housings, conveyors, drill bushings and the like. A substantially pure tungsten layer is chemical vapor deposited on the internal wear surface of the body of the structure followed by a chemical vapor deposited top coating comprising a mixture of tungsten and tungsten carbide. The tungsten carbide is selected from the group consisting of W.sub.2 C, W.sub.3 C, and mixtures thereof and is fine grained, non-columnar and has a substantially layered microstructure. Also described are structures formed by the method.
摘要翻译： 描述了一种用于改善诸如喷嘴，喷嘴，管道，滑槽，粉末处理管，阀壳体，输送机，钻井套管等结构的内部磨损表面的耐蚀磨损性和硬度的方法。 基本上纯的钨层被化学气相沉积在结构体的内部磨损表面上，随后是包含钨和碳化钨的混合物的化学气相沉积顶部涂层。 碳化钨选自W2C，W3C及其混合物，并且是细晶粒，非柱状的并且具有基本上分层的微结构。 还描述了通过该方法形成的结构。
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公开(公告)号：US4945640A
公开(公告)日：1990-08-07
申请号：US319774
申请日：1989-03-07
IPC分类号： C23C16/00 , B32B27/14 , C23C16/08 , C23C16/14 , C23C16/30 , C23C16/32 , C23C28/00 , C23C30/00
摘要： A method is described for improving the erosion and abrasion resistance of a sharp edged metal structure. A base layer of a noble metal is formed on the surface of the body of the structure followed by a chemical vapor deposited outer coating comprising a mixture of tungsten and tungsten carbide. The tungsten carbide is selected from the group consisting of W.sub.2 C, W.sub.3 C, and mixtures thereof and is fine grained, non-columnar and having a substantially layered microstructure. Also described is a sharp edged metal structure formed by the method.
摘要翻译： 描述了一种用于改善尖锐金属结构的耐腐蚀和耐磨性的方法。 在结构体的表面上形成贵金属的基层，然后是包含钨和碳化钨混合物的化学气相沉积外涂层。 碳化钨选自W2C，W3C及其混合物，并且是细晶粒，非柱状的并且具有基本上分层的微观结构。 还描述了通过该方法形成的尖锐的金属结构。
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公开(公告)号：US4855188A
公开(公告)日：1989-08-08
申请号：US153738
申请日：1988-02-08
申请人： Diwakar Garg , Paul N. Dyer , Leslie E. Schaffer , Ernest L. Wrecsics , Duane Dimos , Carl F. Mueller
发明人： Diwakar Garg , Paul N. Dyer , Leslie E. Schaffer , Ernest L. Wrecsics , Duane Dimos , Carl F. Mueller
CPC分类号： C23C28/00 , C23C16/14 , C23C16/30 , Y10T428/12576 , Y10T428/12583 , Y10T428/1284 , Y10T428/12944
摘要： A highly erosive and abrasive wear resistant composite coating system is described in which an intermediate layer of substantially pure tungsten is deposited on a substrate. An outer layer is then deposited comprised of a mixture of tungsten and tungsten carbide, with the tungsten carbide consisting of W.sub.2 C, W.sub.3 C or a mixture of both. The thickness of the intermediate layer is sufficient to confer substantial erosive and abrasive wear resistance characteristics on the composite coating system. The ratio of the thickness of the intermediate layer to the thickness of the outer layer is controlled and is at least above 0.30 in the cases of W+W.sub.3 C, W+W.sub.2 C+W.sub.3 C and W+W.sub.2 C coatings.
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公开(公告)号：US4626342A
公开(公告)日：1986-12-02
申请号：US792393
申请日：1985-10-29
申请人： Diwakar Garg , Swaminathan Sunder
发明人： Diwakar Garg , Swaminathan Sunder
CPC分类号： C10G1/086
摘要： An improved process for catalytic solvent refining or hydroliquefaction of non-anthracitic coal at elevated temperatures under hydrogen pressure in a solvent comprises using as catalyst a mixture of a 1,2- or 1,4-quinone and an alkaline compound, selected from ammonium, alkali metal, and alkaline earth metal oxides, hydroxides or salts of weak acids.
摘要翻译： 催化溶剂精制或在高温下在氢气压力下在溶剂中的非无烟煤的水解液的改进方法包括使用1,2-或1,4-醌与碱性化合物的混合物，其选自铵， 碱金属和碱土金属氧化物，弱酸的氢氧化物或盐。
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公开(公告)号：US4617106A
公开(公告)日：1986-10-14
申请号：US780507
申请日：1985-07-26
申请人： Diwakar Garg
发明人： Diwakar Garg
CPC分类号： C10G1/086
摘要： Improved catalysts for catalytic solvent refining or hydroliquefaction of non-anthracitic coal at elevated temperatures under hydrogen pressure in a hydrogen donor solvent comprise a combination of zinc or copper, or a compound thereof, and a Group VI or non-ferrous Group VIII metal, or a compound thereof.
摘要翻译： 改进的催化溶剂精炼或在氢气供给溶剂中的氢气压力下在高温下的非无烟煤的水解液的催化剂包括锌或铜或其化合物和VI族或有色金属VIII族金属的组合，或 其化合物。
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