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公开(公告)号：US20060023192A1
公开(公告)日：2006-02-02
申请号：US10902697
申请日：2004-07-30
申请人： Cheng-Qun Gui
发明人： Cheng-Qun Gui
IPC分类号： G03B27/54
CPC分类号： G03F7/70275 , G03B27/54
摘要： A lithographic apparatus includes an illumination system that supplies a beam of radiation, an array of individually controllable elements that pattern the beam, a substrate table for supporting a substrate, and a projection system that projects the patterned beam onto a target portion of the substrate. The projection system comprises an array of lenses arranged to receive the patterned beam, divide the patterned beam into a plurality of substantially polygonal portions, and focus each substantially polygonal portion to form a respective radiation spot on the target portion of the substrate. In one example, the illumination system comprises an illuminator arranged to receive a beam of radiation from a radiation source, the illuminator comprising an array of lenses arranged to divide the beam of radiation from the source into a plurality of substantially polygonal portions and to focus each substantially polygonal portion onto a respective one of the array of individually controllable elements.
摘要翻译： 光刻设备包括提供辐射束的照明系统，对光束进行图案化的独立可控元件的阵列，用于支撑衬底的衬底台以及将图案化光束投影到衬底的目标部分上的投影系统。 投影系统包括布置成接收图案化光束的透镜阵列，将图案化的光束分成多个基本上多边形的部分，并且聚焦每个基本上多边形的部分以在基板的目标部分上形成相应的辐射光点。 在一个示例中，照明系统包括被布置成从辐射源接收辐射束的照明器，照明器包括透镜阵列，其布置成将来自光源的辐射束分成多个基本上多边形的部分并且将每个 基本上多边形部分到独立可控元件阵列中的相应一个。
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32.发明申请公开(公告)号：US20110188016A1
公开(公告)日：2011-08-04
申请号：US13119884
申请日：2009-09-21
申请人： Pieter Willem Herman De Jager , Vadim Yevgenyevich Banine , Jozef Petrus Henricus Benschop , Cheng-Qun Gui , Johannes Onvlee , Erwin Johan Van Zwet
发明人： Pieter Willem Herman De Jager , Vadim Yevgenyevich Banine , Jozef Petrus Henricus Benschop , Cheng-Qun Gui , Johannes Onvlee , Erwin Johan Van Zwet
IPC分类号： G03B27/52
CPC分类号： G03F7/70183 , G03F7/70275 , G03F7/70291 , G03F7/70391 , G03F7/704
摘要： In an embodiment, a lithographic apparatus is disclosed that includes a modulator configured to expose an exposure area of the substrate to a plurality of beams modulated according to a desired pattern and a projection system configured to project the modulated beams onto the substrate. The modulator may be moveable with respect the exposure area and/or the projection system may have an array of lenses to receive the plurality of beams, the array of lenses moveable with respect to the exposure area.
摘要翻译： 在一个实施例中，公开了一种光刻设备，其包括调制器，该调制器被配置为将基板的曝光区域暴露于根据期望图案调制的多个光束;以及投影系统，该投影系统被配置为将经调制的光束投影到基板上。 调制器可以相对于曝光区域可移动，和/或投影系统可以具有用于接收多个光束的透镜阵列，透镜阵列可相对于曝光区域移动。
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公开(公告)号：US07911586B2
公开(公告)日：2011-03-22
申请号：US12412437
申请日：2009-03-27
CPC分类号： G03F7/70275 , G03F7/70283 , G03F7/70291 , G03F7/70308
摘要： Provided is a method and system for facilitating use of a plurality of individually controllable elements to modulate the intensity of radiation received at each focusing element of an array of focusing elements to control the intensity of the radiation in the areas on the substrate onto which the focusing elements direct the radiation.
摘要翻译： 提供了一种用于促进使用多个可单独控制的元件来调制在聚焦元件阵列的每个聚焦元件处接收的辐射强度的方法和系统，以控制在其上聚焦的基底上的区域中的辐射强度 元素引导辐射。
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34.发明授权公开(公告)号：US07643128B2
公开(公告)日：2010-01-05
申请号：US11646609
申请日：2006-12-28
CPC分类号： G03B27/52 , G02B17/061 , G03F7/70233 , G03F7/70308 , G03F7/706 , G03F7/70791
摘要： An exposure system for manufacturing flat panel displays (FPDs) includes a reticle stage adapted to support a reticle. A substrate stage is adapted to support a substrate. A reflective optical system is adapted to image the reticle onto the substrate. The reflective optical system includes a primary mirror including a first mirror and a second mirror, and a secondary mirror. The reflective optical system has sufficient degrees of freedom for both alignment and correction of third order aberrations when projecting an image of the reticle onto the substrate by reflections off the first mirror, the secondary mirror, and the second mirror.
摘要翻译： 用于制造平板显示器（FPD）的曝光系统包括适于支撑掩模版的掩模版台。 衬底台适于支撑衬底。 反射光学系统适于将掩模版成像到基底上。 反射光学系统包括主镜，包括第一镜和第二镜以及次镜。 当通过第一反射镜，次反射镜和第二反射镜的反射将掩模版的图像投影到基板上时，反射光学系统具有足够的自由度用于三阶像差的对准和校正。
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公开(公告)号：US07522266B2
公开(公告)日：2009-04-21
申请号：US11593041
申请日：2006-11-06
CPC分类号： G03F7/70275 , G03F7/70283 , G03F7/70291 , G03F7/70308
摘要： Provided is a method and system for facilitating use of a plurality of individually controllable elements to modulate the intensity of radiation received at each focusing element of an array of focusing elements to control the intensity of the radiation in the areas on the substrate onto which the focusing elements direct the radiation.
摘要翻译： 提供了一种用于促进使用多个可单独控制的元件来调制在聚焦元件阵列的每个聚焦元件处接收的辐射强度的方法和系统，以控制在其上聚焦的基底上的区域中的辐射强度 元素引导辐射。
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公开(公告)号：US07333177B2
公开(公告)日：2008-02-19
申请号：US10999159
申请日：2004-11-30
申请人： Cheng-Qun Gui
发明人： Cheng-Qun Gui
CPC分类号： G03F7/70291 , G03F7/70508
摘要： A lithographic method and apparatus used to pattern an object. An illumination system supplies a beam of radiation. An array of individually controllable elements patterns the beam. The patterned beam is projected by a projection system on to a substrate supported on a substrate table. Individual elements of the array are periodically addressed to load an image frame on to the array appropriate to the pattern to be imparted to the beam at any given instant in time taking into account the image to be projected onto the substrate. In any given frame loading operation, only those individual controllable elements that must change state are addressed to reduce the amount of data required to be transferred during the frame loading operation.
摘要翻译： 用于对对象进行图案化的光刻方法和装置。 照明系统提供辐射束。 独立可控元件的阵列使光束成像。 图案化的光束通过投影系统投射到支撑在基板台上的基板上。 周期性地寻址阵列的各个元件以将图像帧加载到适合于要在任何给定时刻赋予波束的图案的阵列，同时考虑到要投影到基底上的图像。 在任何给定的帧加载操作中，仅寻址必须改变状态的各个可控元件被寻址以减少在帧加载操作期间要传送的数据量。
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公开(公告)号：US07324186B2
公开(公告)日：2008-01-29
申请号：US11485958
申请日：2006-07-14
CPC分类号： G03F7/7025 , G03F7/70258 , G03F7/70275 , G03F7/70291 , G03F7/70791 , G03F7/70816 , G03F7/70825 , G03F7/7085
摘要： An arrangement for adjusting the position on a substrate of a patterned beam generated by a light engine relative to the substrate. The arrangement moves an array of focusing elements, each of which focuses a portion of the patterned beam onto a point on the substrate, relative to an array of individually controllable elements to impart the pattern to the patterned beam.
摘要翻译： 一种用于调整由光引擎相对于衬底产生的图案化光束的衬底上的位置的装置。 该排列移动一组聚焦元件，每个聚焦元件相对于独立可控元件的阵列将图案化束的一部分聚焦到衬底上的一个点上，以将图案赋予图案化的束。
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公开(公告)号：US20070265792A1
公开(公告)日：2007-11-15
申请号：US11431107
申请日：2006-05-10
CPC分类号： H01L21/67138 , H01L23/544 , H01L24/11 , H01L24/742 , H01L2223/54473 , H01L2224/16 , H01L2924/01006 , H01L2924/01029 , H01L2924/01033 , H01L2924/01046 , H01L2924/01047 , H01L2924/01061 , H01L2924/01074 , H01L2924/01075 , H01L2924/01079 , H01L2924/01082 , H01L2924/01322 , H01L2924/14
摘要： A method for locating, forming, or both locating and forming, bumps of material on a substrate having a plurality of devices, the method includes receiving data which indicates the number and location of the devices on the substrate, then using a flip-chip bumping apparatus to locate, form, or both locate and form, bumps of material on the devices, the positions of the devices being determined using the data.
摘要翻译： 一种用于在具有多个器件的衬底上定位，形成或两者定位和形成材料凸起的方法，所述方法包括接收指示衬底上器件的数量和位置的数据，然后使用倒装芯片凸起 定位，形成或两者定位和形成设备上材料的凸块的装置，使用数据确定装置的位置。
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公开(公告)号：US20070206172A1
公开(公告)日：2007-09-06
申请号：US11717174
申请日：2007-03-13
申请人： Cheng-Qun Gui , Arno Bleeker , Pieter De Jager , Joost Sytsma
发明人： Cheng-Qun Gui , Arno Bleeker , Pieter De Jager , Joost Sytsma
IPC分类号： G03B27/72
CPC分类号： G03F7/70208 , G03F7/70275 , G03F7/70283 , G03F7/70291
摘要： Provided is a radiation distribution system for distributing the radiation from an illumination system to two or more patterning means, each for patterning beams of radiation, which are subsequently projected onto a substrate.
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40.发明授权Method of calibrating a lithographic apparatus, alignment method, computer program, data storage medium, lithographic apparatus, and device manufacturing method 失效光刻设备的校准方法，校准方法，计算机程序，数据存储介质，光刻设备和器件制造方法公开(公告)号：US07253884B2
公开(公告)日：2007-08-07
申请号：US10845521
申请日：2004-05-14
CPC分类号： G03F9/7019 , G03F9/7003 , G03F9/7011 , G03F9/7084
摘要： In one method of compensating for the distortion of front-to-backside alignment optics, a displacement vector between the estimated position of a substrate mark and the actual position of a substrate mark is calculated. An optical correction array is also calculated by moving a reference substrate by a fixed amount and comparing how far an image of a point on the back side of a reference substrate moves to how far a corresponding point on the front side of the substrate moves. The displacement vector and optical correction array may then be used to accurately calculate the position of further substrates.
摘要翻译： 在补偿前后对准光学元件的失真的一种方法中，计算衬底标记的估计位置与衬底标记的实际位置之间的位移矢量。 还通过将参考基板移动固定量并且比较参考基板的背面上的点的图像移动到基板的正面上的对应点移动多远的距离来计算光学校正阵列。 然后可以使用位移矢量和光学校正阵列来精确地计算另外的衬底的位置。
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