公开(公告)号：US07038600B2

公开(公告)日：2006-05-02

申请号：US09929265

申请日：2001-08-14

申请人： Willem Marie Julia Marcel Coene ,  Johan Cornelis Talstra ,  Antonius Adriaan Maria Staring ,  Jacobus Petrus Josephus Heemskerk

发明人： Willem Marie Julia Marcel Coene ,  Johan Cornelis Talstra ,  Antonius Adriaan Maria Staring ,  Jacobus Petrus Josephus Heemskerk

IPC分类号： H03M7/00 ,  G06Q99/00 ,  H04K1/00 ,  H04L9/00

CPC分类号： H03M5/145 ,  G11B20/00086 ,  G11B20/00579 ,  G11B20/0063 ,  G11B20/1426 ,  G11B2020/1461 ,  G11B2020/1469 ,  H03M5/14 ,  H03M7/46

摘要： A method and device for adding or extracting a secondary information signal to/from a runlength-limited code sequence, includes detecting a polarity of a runlength at a first predetermined position of the runlength-limited code sequence and setting a parameter reflecting the degree of freedom that is present in the runlength-limited channel code, e.g., the selection of a merging bit pattern in the CD-standard, on the basis of the detected polarity so as to obtain a predetermined polarity of a runlength at a subsequent second predetermined position of the runlength-limited code sequence. The predetermined polarity then corresponds to a binary value of the secondary information. Thus, a side-channel with a small capacity is provided, which is positioned very close to the physical channel such that the secondary information is hard to be detected from the EFM bit stream. Therefore, the side-channel can be used as a hidden channel for copy protection purposes.

摘要翻译： 一种用于向游程长度限制代码序列添加或提取辅助信息信号的方法和装置，包括检测游程受限码序列的第一预定位置处的游程长度的极性，并设置反映自由度的参数 存在于游程长度限制信道码中，例如，基于检测到的极性来选择CD标准中的合并位模式，以便获得在随后的第二预定位置处的游程长度的预定极性 运行长度限制代码序列。 预定的极性然后对应于辅助信息的二进制值。 因此，提供了具有小容量的侧信道，其被定位成非常接近物理信道，使得从EFM比特流难以检测到辅助信息。 因此，侧信道可以用作隐藏通道，用于复制保护。

公开(公告)号：US06654332B2

公开(公告)日：2003-11-25

申请号：US09929055

申请日：2001-08-14

申请人： Willem Marie Julia Marcel Coene ,  Job Cornelis Oostveen ,  Aloysius Michael Josephus Maria Spruijt ,  Paulus Reinier Joannes Van Roosmalen ,  Jan Harm De Boer

发明人： Willem Marie Julia Marcel Coene ,  Job Cornelis Oostveen ,  Aloysius Michael Josephus Maria Spruijt ,  Paulus Reinier Joannes Van Roosmalen ,  Jan Harm De Boer

IPC分类号： G11B576

CPC分类号： G11B20/00405 ,  G11B20/00086 ,  G11B20/0021 ,  G11B20/00586 ,  G11B20/00601 ,  G11B20/10 ,  G11B20/1423

摘要： The invention relates to a method for generating a primary binary signal having a predetermined spectral shape in a predetermined frequency range, in particular having a notch in the power spectrum in a predetermined frequency range. In order to avoid crosstalk between a primary binary signal and a secondary binary signal it is proposed according to the invention that data-words are modulated into channel-words forming the channel bitstream of the primary binary signal and that the modulation of the data-words is chosen such that the predetermined spectral shape of the channel bitstream of the primary binary signal is achieved by using an evaluation criterion based on a spectral weight function the shape of which is tailored to the spectral extent of the channel bitstream of a secondary binary signal. The invention is in particular useful for generating a primary binary signal which is used in the lead-in area of an optical record carrier where a wobble is used in the secondary binary signal for storing a wobble key. The invention relates further to a device for generating the channel bitstream of a primary binary signal, to a primary binary signal and to a record carrier for storing such a binary signal.

公开(公告)号：US06486804B2

公开(公告)日：2002-11-26

申请号：US09853185

申请日：2001-05-10

申请人： Willem Marie Julia Marcel Coene

发明人： Willem Marie Julia Marcel Coene

IPC分类号： H03M700

CPC分类号： G11B20/1426 ,  H03M5/145

摘要： A method of converting a stream of databits of a binary information signal into a stream of databits of a constrained binary channel signal, a device for encoding, a signal, a record carrier, a method for decoding, and a device for decoding. The signal is constructed by repetitively or alternately using channel codes C1 and C2. Since two channel words with opposite parities are available in the channel code C2 for each information word, and the same state is established, predetermined properties of the constrained binary channel signal can be influenced. Since the method further comprises the step of substituting, in dependence upon a value of a predetermined property of the binary channel signal, a channel word for a substitute channel word, wherein the substituted channel word and the substitute channel word establish the same state, predetermined properties of the constrained binary channel signal can be further influenced.

摘要翻译： 一种将二进制信息信号的数据位流转换为受限二进制信道信号的数据位流，用于编码的设备，信号，记录载体，解码方法以及用于解码的设备的方法。 信号通过重复地或者交替地使用信道码C1和C2构成。 由于具有相反奇偶校验的两个通道字在每个信息字的通道代码C2中可用，并且建立相同的状态，所以可以影响受限二进制信道信号的预定属性。 由于该方法还包括根据二进制信道信号的预定属性的值代替替代信道字的信道字，其中替代信道字和替代信道字建立相同状态，预定 受限二进制信道信号的属性可以进一步受到影响。

公开(公告)号：US09140998B2

公开(公告)日：2015-09-22

申请号：US13294057

申请日：2011-11-10

申请人： Hendrik Jan Hidde Smilde ,  Arno Jan Bleeker ,  Patrick Warnaar ,  Willem Marie Julia Marcel Coene ,  Michael Kubis

发明人： Hendrik Jan Hidde Smilde ,  Arno Jan Bleeker ,  Patrick Warnaar ,  Willem Marie Julia Marcel Coene ,  Michael Kubis

IPC分类号： G06F17/00 ,  G06F15/18 ,  G01N21/55 ,  G03F7/20

CPC分类号： G03F7/70633 ,  G03F7/70483 ,  G03F7/70625 ,  G03F7/70641 ,  G06N99/005

摘要： Methods are disclosed for measuring target structures formed by a lithographic process on a substrate. A grating structure within the target is smaller than an illumination spot and field of view of a measurement optical system. The optical system has a first branch leading to a pupil plane imaging sensor and a second branch leading to a substrate plane imaging sensor. A spatial light modulator is arranged in an intermediate pupil plane of the second branch of the optical system. The SLM imparts a programmable pattern of attenuation that may be used to correct for asymmetries between the first and second modes of illumination or imaging. By use of specific target designs and machine-learning processes, the attenuation patterns may also be programmed to act as filter functions, enhancing sensitivity to specific parameters of interest, such as focus.

摘要翻译： 公开了用于测量由基板上的光刻工艺形成的目标结构的方法。 目标内的光栅结构小于测量光学系统的照明点和视场。 光学系统具有通向光瞳平面成像传感器的第一分支和通向基板平面成像传感器的第二分支。 空间光调制器被布置在光学系统的第二分支的中间光瞳平面中。 SLM赋予可编程的衰减模式，其可用于校正第一和第二照明模式或成像之间的不对称性。 通过使用特定的目标设计和机器学习过程，衰减模式也可以被编程为充当滤波器功能，增强对诸如焦点的特定参数的敏感性。

公开(公告)号：US08553218B2

公开(公告)日：2013-10-08

申请号：US12973248

申请日：2010-12-20

申请人： Patricius Aloysius Jacobus Tinnemans ,  Henricus Petrus Maria Pellemans ,  Gerbrand Van Der Zouw ,  Willem Marie Julia Marcel Coene

发明人： Patricius Aloysius Jacobus Tinnemans ,  Henricus Petrus Maria Pellemans ,  Gerbrand Van Der Zouw ,  Willem Marie Julia Marcel Coene

IPC分类号： G01N21/00

CPC分类号： G01N21/93 ,  G01N21/4785 ,  G01N21/4788

摘要： Calibration of an angularly resolved scatterometer is performed by measuring a target in two or more different arrangements. The different arrangements cause radiation being measured in an outgoing direction to be different combinations of radiation illuminating the target from ingoing directions. A reference mirror measurement may also be performed. The measurements and modeling of the difference between the first and second arrangements is used to estimate separately properties of the ingoing and outgoing optical systems. The modeling may account for symmetry of the respective periodic target. The modeling typically accounts for polarizing effects of the ingoing optical elements, the outgoing optical elements and the respective periodic target. The polarizing effects may be described in the modeling by Jones calculus or Mueller calculus. The modeling may include a parameterization in terms of basis functions such as Zernike polynomials.

摘要翻译： 角度分辨散射仪的校准是通过以两种或多种不同布置测量目标进行的。 不同的布置导致在输出方向上测量的辐射是将目标与入射方向照射的辐射的不同组合。 还可以执行参考镜测量。 使用第一和第二布置之间的差异的测量和建模来分别估计输入和输出光学系统的特性。 建模可以考虑相应周期性目标的对称性。 该模型通常考虑入射光学元件，输出光学元件和相应周期性靶的偏振效应。 极化效应可以在由琼斯微积分或米勒微积分建模中描述。 该建模可以包括基于诸如Zernike多项式的基函数的参数化。

公开(公告)号：US08520212B2

公开(公告)日：2013-08-27

申请号：US13000212

申请日：2009-07-10

申请人： Willem Marie Julia Marcel Coene ,  Hugo Augustinus Joseph Cramer ,  Irwan Dani Setija

发明人： Willem Marie Julia Marcel Coene ,  Hugo Augustinus Joseph Cramer ,  Irwan Dani Setija

IPC分类号： G01N21/55

CPC分类号： G01N21/55 ,  G03F7/70625

摘要： Scatterometry method and apparatus are useful in a lithographic apparatus and device manufacturing. A back focal plane diffraction intensity image of a measurement projection system configured to project a radiation beam onto a target portion of a substrate is measured. A beam of radiation having a first wavelength is directed to the substrate. A diffraction image of a zeroth diffraction order and higher order diffraction from a diffraction structure in the substrate is provided. A first layer (4) of the diffractionstructure provides a diffraction image having only a zeroth diffraction order. A second layer (5) has a periodic structure (6a, 6b) configured such that a lowest spatial frequency of the periodic structure is lower than spatial frequencies of interest of the first structure. From the diffraction image originating from diffraction of the radiation beam in both the first and second layer a critical dimension metrology parameter is determined.

摘要翻译： 散射测定方法和装置在光刻设备和器件制造中是有用的。 测量被配置为将辐射束投影到基板的目标部分上的测量投影系统的后焦平面衍射强度图像。 具有第一波长的辐射束被引导到基板。 提供了衍射图像的零衍射级和衍射结构的基底中的高阶衍射。 衍射结构的第一层（4）提供仅具有零级衍射级的衍射图像。 第二层（5）具有周期性结构（6a，6b），其被配置为使得周期性结构的最低空间频率低于第一结构的感兴趣的空间频率。 从第一和第二层中的辐射束的衍射衍射图像，确定临界尺寸计量参数。

公开(公告)号：US08411287B2

公开(公告)日：2013-04-02

申请号：US12855394

申请日：2010-08-12

申请人： Hendrik Jan Hidde Smilde ,  Arno Jan Bleeker ,  Arie Jeffrey Den Boef ,  Armand Eugene Albert Koolen ,  Henricus Petrus Maria Pellemans ,  Reinder Teun Plug ,  Willem Marie Julia Marcel Coene

发明人： Hendrik Jan Hidde Smilde ,  Arno Jan Bleeker ,  Arie Jeffrey Den Boef ,  Armand Eugene Albert Koolen ,  Henricus Petrus Maria Pellemans ,  Reinder Teun Plug ,  Willem Marie Julia Marcel Coene

IPC分类号： G01B11/14

CPC分类号： G03F7/70633 ,  G03F7/70616

摘要： A metrology apparatus is arranged to illuminate a plurality of targets with an off-axis illumination mode. Images of the targets are obtained using only one first order diffracted beam. Where the target is a composite grating, overlay measurements can be obtained from the intensities of the images of the different gratings. Overlay measurements can be corrected for errors caused by variations in the position of the gratings in an image field.

摘要翻译： 计量装置被布置成以离轴照明模式照亮多个目标。 仅使用一个一阶衍射光束获得目标图像。 在目标是复合光栅的地方，可以从不同光栅的图像的强度获得覆盖测量。 可以对由图像场中的光栅位置的变化引起的误差来校正叠加测量。

公开(公告)号：US08363220B2

公开(公告)日：2013-01-29

申请号：US12760784

申请日：2010-04-15

申请人： Willem Marie Julia Marcel Coene ,  Karel Diederick Van Der Mast ,  Maurits Van Der Schaar

发明人： Willem Marie Julia Marcel Coene ,  Karel Diederick Van Der Mast ,  Maurits Van Der Schaar

IPC分类号： G01B11/00

CPC分类号： G03F7/70633

摘要： A method of determining an overlay error in which asymmetry of a first order of a diffraction pattern is modeled as being a weighted sum of harmonics. Both the first order harmonic and higher order harmonics are non-negligible and weights for both are calculated. The weights are calculated using three or more of sets of superimposed patterns using a least mean square method.

摘要翻译： 一种确定重叠误差的方法，其中衍射图案的一阶的不对称性被建模为加权和谐和。 一阶谐波和高次谐波都不可忽略，两者的权重都被计算出来。 使用最小均方法，使用三个或更多个叠加图案来计算权重。

公开(公告)号：US08223347B2

公开(公告)日：2012-07-17

申请号：US12822422

申请日：2010-06-24

申请人： Hendrik Jan Hidde Smilde ,  Willem Marie Julia Marcel Coene

发明人： Hendrik Jan Hidde Smilde ,  Willem Marie Julia Marcel Coene

IPC分类号： G01N21/47 ,  G01B11/00

CPC分类号： G03F7/70633 ,  G03F7/705 ,  G03F7/70516

摘要： A method of determining an overlay error between two successive layers produced by a lithographic process on a substrate, including using the lithographic process to form a calibration structure including a periodic structure of the same pitch on each of the layers, such that an overlaid pair of periodic structures is formed, the structures being parallel, but offset relative to each other by an overlay amount. A spectrum produced by directing a beam of radiation onto the calibration structure is measured and compared with one or more modeled spectra so as to determine values of the grating parameters for the calibration structure from the measured spectrum. The lithographic process is used to form further overlaid periodic structures on the same or one or more subsequent substrates, the determined grating parameter values for the calibration structure being used to determine overlay amounts for the further overlaid periodic structures.

摘要翻译： 一种确定由光刻工艺在衬底上产生的两个连续层之间的重叠误差的方法，包括使用光刻工艺形成包括在每个层上相同间距的周期性结构的校准结构，使得重叠的一对 形成周期性结构，结构是平行的，但是相对于彼此偏移了重叠量。 测量通过将辐射束引导到校准结构上产生的光谱，并将其与一个或多个建模光谱进行比较，以便根据测量的光谱确定校准结构的光栅参数的值。 光刻工艺用于在相同或一个或多个后续衬底上形成进一步覆盖的周期性结构，所确定的校准结构的光栅参数值用于确定进一步覆盖的周期性结构的重叠量。

公开(公告)号：US20110304851A1

公开(公告)日：2011-12-15

申请号：US13000212

申请日：2009-07-10

申请人： Willem Marie Julia Marcel Coene ,  Hugo Augustinus Joseph Cramer ,  Irwan Dani Setija

发明人： Willem Marie Julia Marcel Coene ,  Hugo Augustinus Joseph Cramer ,  Irwan Dani Setija

IPC分类号： G01N21/55 ,  G03F7/20

CPC分类号： G01N21/55 ,  G03F7/70625

摘要： Scatterometry method and apparatus are useful in a lithographic apparatus and device manufacturing. A back focal plane diffraction intensity image of a measurement projection system configured to project a radiation beam onto a target portion of a substrate is measured. A beam of radiation having a first wavelength is directed to the substrate. A diffraction image of a zeroth diffraction order and higher order diffraction from a diffraction structure in the substrate is provided. A first layer (4) of the diffractionstructure provides a diffraction image having only a zeroth diffraction order. A second layer (5) has a periodic structure (6a, 6b) configured such that a lowest spatial frequency of the periodic structure is lower than spatial frequencies of interest of the first structure. From the diffraction image originating from diffraction of the radiation beam in both the first and second layer a critical dimension metrology parameter is determined.

摘要翻译： 散射测定方法和装置在光刻设备和器件制造中是有用的。 测量被配置为将辐射束投影到基板的目标部分上的测量投影系统的后焦平面衍射强度图像。 具有第一波长的辐射束被引导到基板。 提供了衍射图像的零衍射级和衍射结构的基底中的高阶衍射。 衍射结构的第一层（4）提供仅具有零级衍射级的衍射图像。 第二层（5）具有周期性结构（6a，6b），其被配置为使得周期性结构的最低空间频率低于第一结构的感兴趣的空间频率。 从第一和第二层中的辐射束的衍射衍射图像，确定临界尺寸计量参数。