利索-全球专利检索

  1. 登录
  2. 注册

搜索结果

50 条记录 (耗时 0.032 秒)

    Scatterometry method and measurement system for lithography
    1.
    发明授权
    Scatterometry method and measurement system for lithography 有权
    散光方法和光刻测量系统

    公开(公告)号：US08520212B2

    公开(公告)日：2013-08-27

    申请号：US13000212

    申请日：2009-07-10

    申请人： Willem Marie Julia Marcel Coene ,  Hugo Augustinus Joseph Cramer ,  Irwan Dani Setija

    发明人： Willem Marie Julia Marcel Coene ,  Hugo Augustinus Joseph Cramer ,  Irwan Dani Setija

    IPC分类号： G01N21/55

    CPC分类号： G01N21/55 ,  G03F7/70625

    摘要： Scatterometry method and apparatus are useful in a lithographic apparatus and device manufacturing. A back focal plane diffraction intensity image of a measurement projection system configured to project a radiation beam onto a target portion of a substrate is measured. A beam of radiation having a first wavelength is directed to the substrate. A diffraction image of a zeroth diffraction order and higher order diffraction from a diffraction structure in the substrate is provided. A first layer (4) of the diffractionstructure provides a diffraction image having only a zeroth diffraction order. A second layer (5) has a periodic structure (6a, 6b) configured such that a lowest spatial frequency of the periodic structure is lower than spatial frequencies of interest of the first structure. From the diffraction image originating from diffraction of the radiation beam in both the first and second layer a critical dimension metrology parameter is determined.

    摘要翻译： 散射测定方法和装置在光刻设备和器件制造中是有用的。 测量被配置为将辐射束投影到基板的目标部分上的测量投影系统的后焦平面衍射强度图像。 具有第一波长的辐射束被引导到基板。 提供了衍射图像的零衍射级和衍射结构的基底中的高阶衍射。 衍射结构的第一层（4）提供仅具有零级衍射级的衍射图像。 第二层（5）具有周期性结构（6a，6b），其被配置为使得周期性结构的最低空间频率低于第一结构的感兴趣的空间频率。 从第一和第二层中的辐射束的衍射衍射图像，确定临界尺寸计量参数。

    Scatterometry Method and Measurement System for Lithography
    2.
    发明申请
    Scatterometry Method and Measurement System for Lithography 有权
    散光方法和光刻测量系统

    公开(公告)号：US20110304851A1

    公开(公告)日：2011-12-15

    申请号：US13000212

    申请日：2009-07-10

    申请人： Willem Marie Julia Marcel Coene ,  Hugo Augustinus Joseph Cramer ,  Irwan Dani Setija

    发明人： Willem Marie Julia Marcel Coene ,  Hugo Augustinus Joseph Cramer ,  Irwan Dani Setija

    IPC分类号： G01N21/55 ,  G03F7/20

    CPC分类号： G01N21/55 ,  G03F7/70625

    摘要： Scatterometry method and apparatus are useful in a lithographic apparatus and device manufacturing. A back focal plane diffraction intensity image of a measurement projection system configured to project a radiation beam onto a target portion of a substrate is measured. A beam of radiation having a first wavelength is directed to the substrate. A diffraction image of a zeroth diffraction order and higher order diffraction from a diffraction structure in the substrate is provided. A first layer (4) of the diffractionstructure provides a diffraction image having only a zeroth diffraction order. A second layer (5) has a periodic structure (6a, 6b) configured such that a lowest spatial frequency of the periodic structure is lower than spatial frequencies of interest of the first structure. From the diffraction image originating from diffraction of the radiation beam in both the first and second layer a critical dimension metrology parameter is determined.

    摘要翻译： 散射测定方法和装置在光刻设备和器件制造中是有用的。 测量被配置为将辐射束投影到基板的目标部分上的测量投影系统的后焦平面衍射强度图像。 具有第一波长的辐射束被引导到基板。 提供了衍射图像的零衍射级和衍射结构的基底中的高阶衍射。 衍射结构的第一层（4）提供仅具有零级衍射级的衍射图像。 第二层（5）具有周期性结构（6a，6b），其被配置为使得周期性结构的最低空间频率低于第一结构的感兴趣的空间频率。 从第一和第二层中的辐射束的衍射衍射图像，确定临界尺寸计量参数。

    Coder and a Method of Coding For Codes With a Parity-Complementary Word Assignment Having a Constraint of D1=,R=2
    4.
    发明申请
    Coder and a Method of Coding For Codes With a Parity-Complementary Word Assignment Having a Constraint of D1=,R=2 有权
    编码器和编码代码的方法，其中具有约束D1 =，R = 2的奇偶互补字分配

    公开(公告)号：US20090015446A1

    公开(公告)日：2009-01-15

    申请号：US12097570

    申请日：2006-12-08

    申请人： Willem Marie Julia Marcel Coene ,  Andries Pieter Hekstra ,  Hiroyuki Yamagishi ,  Makoto Noda

    发明人： Willem Marie Julia Marcel Coene ,  Andries Pieter Hekstra ,  Hiroyuki Yamagishi ,  Makoto Noda

    IPC分类号： H03M7/00

    CPC分类号： G11B20/1426 ,  G11B20/10055 ,  G11B20/10296 ,  G11B2020/1453 ,  G11B2020/1457 ,  H03M5/145 ,  H03M7/40 ,  H03M13/29 ,  H03M13/31 ,  H03M13/3761 ,  H03M13/3972 ,  H03M13/41

    摘要： Presently known d=1 codes have long trains consisting of consecutive 2T runs and an overall high frequency of occurrence of the shortest 2T runs that reduce the performance of the bit detector By using a code with an MTR constraint of 2 an improvement in the bit detection is achieved. A code constructed in a systematic way that provides an MTR constraint of 2 is presented. A variation of such a code is disclosed where one sub-code is used, where coding states are divided into coding classes and where code words are divided into code word types. Then, for a given sub-code, an code word of type t can be concatenated with an code word of the next sub-code if said subsequent code word of said next sub-code belongs to one of coding states of the coding class with index Tmax+1 t. In the code according to the invention the overall code has the property that the respective channel bit sequences that are encoded from the same message-bit sequence, starting from any possible state of the finite-state-machine, for each of the two values of a DC-control bit, that is part of a given user word have opposite parities for the sequences generated from the starting state up to the state where both encoder paths merge. For the case that the encoder paths do not merge, there is no such constraint. Finally, a new d=1, k=10 sliding-block decodable RLL code is disclosed with the following properties: (i) it has an r=2 constraint which is the lowest MTR value that is compatible with a rate R=⅔; (ii) it enables practical SISO-RLL decoding because of its compact 2-to-3 mapping; and (iii) the new code uses a parity-complementary word assignment4 (PCWA) for DC-control.

    摘要翻译： 目前已知的d = 1代码具有由连续的2T运行组成的长列，并且总体出现最短的2T运行的频率，从而降低位检测器的性能通过使用MTR约束为2的代码，改进了位检测 已完成。 提出了一种以系统方式构建的代码，其提供MTR约束为2的代码。 公开了这样的代码的变型，其中使用一个子代码，其中编码状态被分为编码类别以及代码字被分成代码字类型。 然后，对于给定子码，如果所述下一子码的所述后续码字属于编码类的编码状态之一，则可以将类型t的码字与下一子码的码字连接， 指数Tmax + 1t。 在根据本发明的代码中，总代码具有以下特性：从相同消息比特序列编码的各个信道比特序列，从有限状态机的任何可能状态开始，对于两个值的 作为给定用户字的一部分的DC控制位对于从起始状态直到两个编码器路径合并的状态产生的序列具有相反的奇偶校验。 对于编码器路径不合并的情况，没有这样的限制。 最后，公开了一种新的d = 1，k = 10滑块可解码的RLL码，具有以下特性：（i）它具有r = 2约束，其是与速率R = 2 / 3; （ii）由于其紧凑的2对3映射，它使实用的SISO-RLL解码成为可能; 和（iii）新的代码使用奇偶互补字分配4（PCWA）进行DC控制。

    Coder and a method of coding for codes having a Repeated Maximum Transition Run constraint of 2
    6.
    发明授权
    Coder and a method of coding for codes having a Repeated Maximum Transition Run constraint of 2 失效
    编码器和编码具有重复最大转换运行约束的代码的方法2

    公开(公告)号：US07403138B2

    公开(公告)日：2008-07-22

    申请号：US11575079

    申请日：2005-09-08

    申请人： Willem Marie Julia Marcel Coene

    发明人： Willem Marie Julia Marcel Coene

    IPC分类号： H03M5/00

    CPC分类号： G11B20/1426 ,  G11B2020/1453 ,  H03M5/145

    摘要： Presently known codes have long trains consisting of 2T runs that reduce the performance of the bit detector. By using a code with an RMTR constraint of 2 an improvement in the bit detection is achieved. A code constructed is a systematic way that provides an RMTR constraint of 2 is presented. Several variations of such a code are disclosed where one or more sub-codes are used, where coding states are divided into coding classes and where code words are divided into code word types. Then, for a given sub-code, a code word type t can be concatenated with a code word of the next sub-code if the subsequent code word of the next sub-code belongs to one of coding states of the coding class with index Tmax+1−t.

    摘要翻译： 目前已知的代码具有由2T运行组成的长列车，降低了位检测器的性能。 通过使用RMTR约束为2的代码，实现了位检测的改进。 构建的代码是提供RMTR约束为2的系统方法。 公开了这样的代码的几个变型，其中使用一个或多个子代码，其中编码状态被分为编码类别以及代码字被划分为代码字类型。 然后，对于给定的子代码，如果下一子代码的后续代码字属于具有索引的编码类的编码状态之一，则代码字类型t可以与下一子代码的代码字连接 最大+ 1-t。

    Substrate, an inspection apparatus, and a lithographic apparatus
    8.
    发明授权
    Substrate, an inspection apparatus, and a lithographic apparatus 有权
    基板，检查装置和光刻设备

    公开(公告)号：US09081304B2

    公开(公告)日：2015-07-14

    申请号：US13059408

    申请日：2009-07-09

    申请人： Hendrik Jan Hidde Smilde ,  Willem Marie Julia Marcel Coene

    发明人： Hendrik Jan Hidde Smilde ,  Willem Marie Julia Marcel Coene

    IPC分类号： G03B27/42 ,  G03F7/20

    CPC分类号： G03F7/70683 ,  G03F7/70625 ,  G03F7/70633 ,  Y10T428/24802

    摘要： A target for measuring an overlay error or a critical dimension of a substrate comprises a grating. In one example, lines of the grating are arranged at an angle of about 45° with respect to edges of the target. As a consequence, the diffraction order of the grating reflection has its sub-maxima not aligned along the line on which the other diffraction orders are positioned, and overlap of intensity with other diffraction orders is reduced.

    摘要翻译： 用于测量衬底的重叠误差或临界尺寸的目标包括光栅。 在一个示例中，光栅的线相对于目标的边缘以大约45°的角度布置。 因此，光栅反射的衍射级别具有沿其它衍射级所在的线不对准的亚极大值，并且强度与其他衍射级的重叠减小。

    Calibration Method and Apparatus
    9.
    发明申请
    Calibration Method and Apparatus 有权
    校准方法和装置

    公开(公告)号：US20110178785A1

    公开(公告)日：2011-07-21

    申请号：US12973248

    申请日：2010-12-20

    申请人： Patricius Aloysius Jacobus TINNEMANS ,  Henricus Petrus Maria Pellemans ,  Gerbrand Van Der Zouw ,  Willem Marie Julia Marcel Coene

    发明人： Patricius Aloysius Jacobus TINNEMANS ,  Henricus Petrus Maria Pellemans ,  Gerbrand Van Der Zouw ,  Willem Marie Julia Marcel Coene

    IPC分类号： G06F17/10

    CPC分类号： G01N21/93 ,  G01N21/4785 ,  G01N21/4788

    摘要： Calibration of an angularly resolved scatterometer is performed by measuring a target in two or more different arrangements. The different arrangements cause radiation being measured in an outgoing direction to be different combinations of radiation illuminating the target from ingoing directions. A reference mirror measurement may also be performed. The measurements and modeling of the difference between the first and second arrangements is used to estimate separately properties of the ingoing and outgoing optical systems. The modeling may account for symmetry of the respective periodic target. The modeling typically accounts for polarizing effects of the ingoing optical elements, the outgoing optical elements and the respective periodic target. The polarizing effects may be described in the modeling by Jones calculus or Mueller calculus. The modeling may include a parameterization in terms of basis functions such as Zernike polynomials.

    摘要翻译： 角度分辨散射仪的校准是通过以两种或多种不同布置测量目标进行的。 不同的布置导致在输出方向上测量的辐射是将目标与入射方向照射的辐射的不同组合。 还可以执行参考镜测量。 使用第一和第二布置之间的差异的测量和建模来分别估计输入和输出光学系统的特性。 建模可以考虑相应周期性目标的对称性。 该模型通常考虑入射光学元件，输出光学元件和相应周期性靶的偏振效应。 极化效应可以在由琼斯微积分或米勒微积分建模中描述。 该建模可以包括基于诸如Zernike多项式的基函数的参数化。