公开(公告)号：US20020170320A1

公开(公告)日：2002-11-21

申请号：US10154511

申请日：2002-05-23

Inventor： Gerhard Schotz ,  Jan Vydra

IPC: C03B037/018

CPC classification number: C03C13/045 ,  C03B19/1453 ,  C03B37/01446 ,  C03B2201/21 ,  C03B2201/23 ,  C03C3/06 ,  C03C25/002 ,  C03C25/607 ,  C03C2201/21 ,  C03C2201/23

Abstract: A core glass for making a preform for an optical fiber particularly useful for the transmission of ultraviolet radiation and methods for making the core glass are disclosed. The core glass is obtained by the flame hydrolysis of a silicon compound, deposition of finely granular SiO2 on a substrate with direct vitrification and formation of a synthetic quartz glass. The quartz glass has a hydrogen content of less than 1null1018 molecules/cm3.

Abstract translation: 公开了一种用于制造用于传输紫外线辐射的特别有用的光纤预制棒的芯玻璃和用于制造芯玻璃的方法。 核心玻璃通过硅化合物的火焰水解获得，通过直接玻璃化沉积细颗粒SiO 2并形成合成石英玻璃。 石英玻璃的氢含量小于1×1018分子/ cm3。

公开(公告)号：US20020121115A1

公开(公告)日：2002-09-05

申请号：US10028837

申请日：2001-12-20

Applicant: 3M Innovative Properties Company

Inventor： James B. Carpenter ,  John P. Stedman ,  James R. Bylander ,  Gordon Wiegand ,  Nicholas A. Stacey ,  Anthony W. Gatica ,  Dale Elder ,  James F. Brennan III ,  Bryon J. Cronk

IPC: C03B037/01

CPC classification number: C03C25/00 ,  C03C3/06 ,  C03C25/6226 ,  C03C2201/21 ,  C03C2201/31 ,  G02B6/02114 ,  G02B6/02123 ,  G02B6/02185

Abstract: A method for increasing the photosensitivity of a selected portion of an optical fiber and for producing a grating in the selected portion of an optical fiber. The method includes the step of placing the selected portion of the optical fiber in a hydrogen containing atmosphere. The volume of the hydrogen-containing atmosphere immediately surrounding only the selected portion of the optical fiber is heated to a temperature of at least 250null C. Only the selected portion of the optical fiber is exposed to the heated volume of the hydrogen-containing atmosphere at a temperature of at least 250null C. for a predetermined time.

Abstract translation: 一种用于增加光纤的选定部分的光敏性并用于在光纤的所选部分中产生光栅的方法。 该方法包括将所选择的光纤部分放置在含氢气氛中的步骤。 立即围绕光纤的选定部分的含氢气体的体积被加热到至少250℃的温度。只有选定的光纤部分暴露于含氢气氛的加热体积 在至少250℃的温度下进行预定的时间。

公开(公告)号：US06442973B1

公开(公告)日：2002-09-03

申请号：US09235409

申请日：1999-01-22

Applicant: Norio Komine ,  Seishi Fujiwara ,  Akiko Yoshida ,  Hiroki Jinbo

Inventor： Norio Komine ,  Seishi Fujiwara ,  Akiko Yoshida ,  Hiroki Jinbo

IPC: C03B1906

CPC classification number: C03C4/0085 ,  C03B19/1423 ,  C03B19/1453 ,  C03B2201/07 ,  C03B2201/21 ,  C03B2201/23 ,  C03B2207/06 ,  C03B2207/12 ,  C03B2207/20 ,  C03B2207/36 ,  C03C3/06 ,  C03C2201/11 ,  C03C2201/21 ,  C03C2201/23 ,  C03C2203/42 ,  C03C2203/44 ,  C03C2203/46 ,  C03C2203/52

Abstract: A method is provided for manufacturing a synthetic silica glass. The method includes the steps of maintaining a silica glass member, which is formed using a flame hydrolysis method and having an OH group concentration of about 500 ppm to about 1300 ppm, at a predetermined holding temperature for a predetermined period of time so as to substantially relax the structure of the silica glass member. The method further includes the step of subsequently cooling the silica glass member to a first predetermined temperature at a cooling rate of about 10 K/hour or less, and thereafter, cooling the silica glass member to a second predetermined temperature at a cooling rate of about 1 K/hour or less. The method further includes the step of further cooling the silica glass member to a third predetermined temperature at a cooling rate of about 10 K/hour or less.

Abstract translation: 提供了一种制造合成石英玻璃的方法。 该方法包括以下步骤：在预定的保持温度下，使用火焰水解法形成并具有约500ppm至约1300ppm的OH基浓度的二氧化硅玻璃构件， 放松石英玻璃构件的结构。 该方法还包括以约10K /小时以下的冷却速度随后将石英玻璃构件冷却至第一预定温度的步骤，然后以大约的冷却速度将石英玻璃构件冷却至第二预定温度 1 K /小时以下。 该方法还包括以约10K /小时或更低的冷却速度将石英玻璃构件进一步冷却至第三预定温度的步骤。

公开(公告)号：US20020102083A1

公开(公告)日：2002-08-01

申请号：US10023291

申请日：2001-12-14

Inventor： George E. Berkey ,  Dana C. Bookbinder ,  Richard M. Fiacco ,  Dale R. Powers

IPC: G02B006/16 ,  C03B037/018

CPC classification number: C03C25/607 ,  C03B37/01446 ,  C03B37/0146 ,  C03B37/01486 ,  C03B2201/075 ,  C03B2201/22 ,  C03B2201/31 ,  C03C3/06 ,  C03C13/045 ,  C03C13/047 ,  C03C2201/21 ,  C03C2201/22 ,  C03C2203/54 ,  G02B6/02

Abstract: Optical waveguide fiber having low water peak as well as optical waveguide fiber preforms and methods of making optical waveguide fiber preforms from which low water peak and/or low hydrogen aged attenuation optical waveguide fibers are formed, including optical waveguide fiber and preforms made via OVD. The fibers may be hydrogen resistant, i.e. exhibit low hydrogen aged attenuation. A low water peak, hydrogen resistant optical waveguide fiber is disclosed which exhibits an optical attenuation at a wavelength of about 1383 nm which is less than or equal to an optical attenuation exhibited at a wavelength of about 1310 nm.

Abstract translation: 具有低水峰的光波导纤维以及光波导纤维预制件以及制造出低水峰值和/或低氢老化衰减光波导纤维的光波导纤维预制棒的方法，包括通过OVD制造的光波导纤维和预制棒。 纤维可以是耐氢性的，即表现出低氢老化衰减。 公开了一种低水峰，耐氢光波导纤维，其在约1383nm的波长处表现出光衰减，其小于或等于在约1310nm的波长处显示的光衰减。

公开(公告)号：US06380109B1

公开(公告)日：2002-04-30

申请号：US09511716

申请日：2000-02-23

Applicant: Jun Abe ,  Seiki Ejima ,  Akira J. Ikushima ,  Takumi Fujiwara

Inventor： Jun Abe ,  Seiki Ejima ,  Akira J. Ikushima ,  Takumi Fujiwara

IPC: C03C1304

CPC classification number: C03C23/009 ,  C03B19/1453 ,  C03B2201/21 ,  C03B2201/23 ,  C03B2201/31 ,  C03B2203/26 ,  C03C3/06 ,  C03C23/002 ,  C03C23/007 ,  C03C23/0095 ,  C03C2201/21 ,  C03C2201/23 ,  C03C2201/31 ,  C03C2203/54 ,  G02F1/3555 ,  G02F1/3558

Abstract: There is disclosed second-order nonlinear glass material wherein a part having second-order nonlinearity contain Ge, H and OH and second-order nonlinear optical constant d of 1 pm/V or more, and a method for producing second-order nonliner glass material comprising treating a porous class material containing Ge with hydrohen, sintering it and subjecting it to a ultraviolet poling treatment. There can be provided second-order nonlinger glass material having second-order nonlinearity which is a sufficiently high and has a sufficiently long lifetime for a practical purpose, in use of the glass material for optical elements or the like.

Abstract translation: 公开了二次非线性玻璃材料，其中具有二次非线性的部分包含Ge，H和OH以及二阶非线性光学常数d为1μm/ V以上，以及二阶非线性玻璃材料的制造方法 包括用氢氧化物处理含有Ge的多孔类材料，烧结并对其进行紫外线极化处理。 在使用光学元件等的玻璃材料时，可以提供具有二次非线性的二阶非线性玻璃材料，该二阶非线性度足够高并且在实际应用中具有足够长的使用寿命。

公开(公告)号：US06374639B2

公开(公告)日：2002-04-23

申请号：US09933749

申请日：2001-08-22

Applicant: Norio Komine ,  Seishi Fujiwara ,  Hiroki Jinbo

Inventor： Norio Komine ,  Seishi Fujiwara ,  Hiroki Jinbo

IPC: C03B1914

CPC classification number: C03B19/14 ,  C03B19/1423 ,  C03B19/1484 ,  C03B37/014 ,  C03B37/0142 ,  C03B2201/07 ,  C03B2201/12 ,  C03B2201/23 ,  C03B2207/06 ,  C03B2207/12 ,  C03B2207/20 ,  C03B2207/30 ,  C03B2207/36 ,  C03B2207/66 ,  C03C3/06 ,  C03C4/0085 ,  C03C2201/12 ,  C03C2201/21 ,  C03C2201/23 ,  C03C2203/42 ,  C03C2203/46 ,  G03F7/2004 ,  Y10S65/90

Abstract: A method is provided for manufacturing a silica glass that is substantially free of chlorine. The method includes the step of separately expelling a silicon tetrafluoride gas, a combustion gas, and a combustible gas from a burner made of silica glass, the flow velocity of the silicon tetrafluoride gas being within the range of about 9 slm/cm2 to about 20 slm/cm2. The method further includes the steps of producing minute silica glass particles by reacting the silicon tetrafluoride gas with water produced by a reaction of the combustion gas with the combustible gas, depositing the minute silica glass particles on a target, and producing the silica glass by fusing and vitrifying the minute silica glass particles deposited on the target.

Abstract translation: 提供了一种制造基本上不含氯的石英玻璃的方法。 该方法包括从由石英玻璃制成的燃烧器分别排出四氟化硅气体，燃烧气体和可燃气体的步骤，四氟化硅气体的流速在约9slm / cm 2至约20的范围内 slm / cm2。 该方法还包括以下步骤：通过使四氟化硅气体与通过燃烧气体与可燃气体的反应产生的水反应生成微小的二氧化硅玻璃颗粒，将微小二氧化硅玻璃颗粒沉积在靶材上，并通过熔融制备石英玻璃 并使沉积在靶上的微小二氧化硅玻璃颗粒玻璃化。

公开(公告)号：US20020018942A1

公开(公告)日：2002-02-14

申请号：US09841517

申请日：2001-04-24

Inventor： John T. Brown ,  Stephen C. Currie ,  Lisa A. Moore ,  Susan L. Schiefelbein ,  Robert S. Pavlik JR.

IPC: B32B015/00 ,  B32B009/00 ,  B32B017/06 ,  G03G016/00 ,  G03F009/00 ,  C03B037/10 ,  C03B037/018 ,  G02B006/18 ,  C03B037/075 ,  C03C013/00 ,  C03B019/06 ,  C03B019/00 ,  G02B006/00

CPC classification number: G03F7/70216 ,  C03B19/1407 ,  C03B19/1415 ,  C03B19/1423 ,  C03B19/1453 ,  C03B37/01202 ,  C03B37/01406 ,  C03B37/01413 ,  C03B37/0142 ,  C03B37/0146 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/12 ,  C03B2201/20 ,  C03B2201/21 ,  C03B2207/06 ,  C03B2207/14 ,  C03B2207/20 ,  C03B2207/30 ,  C03B2207/32 ,  C03B2207/36 ,  C03B2207/38 ,  C03B2207/40 ,  C03B2207/46 ,  C03B2207/54 ,  C03C3/06 ,  C03C4/0085 ,  C03C2201/12 ,  C03C2201/20 ,  C03C2201/21 ,  C03C2201/23 ,  C03C2201/30 ,  C03C2201/32 ,  C03C2203/54 ,  G03F1/60 ,  G03F7/70958 ,  Y02P40/57

Abstract: High purity direct deposit vitrified silicon oxyfluoride glass suitable for use as a photomask substrates for photolithography applications in the VUV wavelength region below 190 nm is disclosed. The inventive direct deposit vitrified silicon oxyfluoride glass is transmissive at wavelengths around 157 nm, making it particularly useful as a photomask substrate at the 157 nm wavelength region. The inventive photomask substrate is a dry direct deposit vitrified silicon oxyfluoride glass which exhibits very high transmittance in the vacuum ultraviolet (VUV) wavelength region while maintaining the excellent thermal and physical properties generally associated with high purity fused silica. In addition to containing fluorine and having little or no OH content, the inventive direct deposit vitrified silicon oxyfluoride glass suitable for use as a photomask substrate at 157 nm is also characterized by having less than 1null1017 molecules/cm3 of molecular hydrogen and low chlorine levels.

Abstract translation: 公开了适用于在190nm以下的VUV波长区域中用于光刻应用的光掩模基板的高纯度直接沉积玻璃化硅氧氟化物玻璃。 本发明的直接沉积玻璃化硅氧氟化物玻璃在157nm波长附近是透射的，使其特别适用于157nm波长区域的光掩模衬底。 本发明的光掩模基材是在真空紫外（VUV）波长区域中显示非常高的透射率的干直接沉积玻璃化硅氧氟化物玻璃，同时保持通常与高纯度熔融二氧化硅相关的优异的热和物理性能。 除了含氟且具有很少或不含OH含量之外，本发明的适用于157nm的光掩模衬底的直接沉积玻璃化氟氧化硅玻璃的特征还在于具有小于1×10 17分子/ cm 3的分子氢和低氯水平。

公开(公告)号：US06333283B1

公开(公告)日：2001-12-25

申请号：US09369425

申请日：1999-08-06

Applicant: Akira Urano ,  Toshio Danzuka ,  Tatsuhiko Saito ,  Yasuhiko Shishido ,  Masaharu Mogi ,  Michihisa Kyoto

Inventor： Akira Urano ,  Toshio Danzuka ,  Tatsuhiko Saito ,  Yasuhiko Shishido ,  Masaharu Mogi ,  Michihisa Kyoto

IPC: C03C306

CPC classification number: G02B6/102 ,  C03B19/1453 ,  C03B32/00 ,  C03B37/01446 ,  C03B37/14 ,  C03B37/15 ,  C03B2201/07 ,  C03B2201/12 ,  C03B2201/21 ,  C03B2201/23 ,  C03C3/06 ,  C03C4/0085 ,  C03C13/045 ,  C03C23/002 ,  C03C23/0025 ,  C03C23/003 ,  C03C23/0035 ,  C03C23/0095 ,  C03C25/6208 ,  C03C2201/21 ,  C03C2201/23 ,  C03C2203/50 ,  G02B6/02 ,  Y02P40/57 ,  Y10S501/905

Abstract: A process of manufacturing a silica glass article comprising the steps of: (1) irradiating a silica glass article with electromagnetic waves to generate defects therein; and (2) immersing the thus irradiated silica glass article in an atmosphere comprising a hydrogen gas, thereby providing the resulting silica glass article with a characteristic that is effective for preventing it substantially from increasing its absorption within an ultraviolet region due to ultraviolet ray irradiation. Also disclosed are a silica glass article or a glass fiber produced according to the manufacturing process.

Abstract translation: 一种制造石英玻璃制品的方法，包括以下步骤：（1）用电磁波照射石英玻璃制品以在其中产生缺陷; 和（2）将这样照射的二氧化硅玻璃制品浸入包括氢气的气氛中，从而使得到的石英玻璃制品具有有效地防止紫外线辐射在紫外线区域内大幅吸收的特征。 还公开了根据制造方法制造的石英玻璃制品或玻璃纤维。

公开(公告)号：US06291377B1

公开(公告)日：2001-09-18

申请号：US09150613

申请日：1998-09-10

Applicant: Norio Komine ,  Seishi Fujiwara ,  Hiroki Jinbo

Inventor： Norio Komine ,  Seishi Fujiwara ,  Hiroki Jinbo

IPC: C03C306

CPC classification number: C03B19/14 ,  C03B19/1423 ,  C03B19/1484 ,  C03B37/014 ,  C03B37/0142 ,  C03B2201/07 ,  C03B2201/12 ,  C03B2201/23 ,  C03B2207/06 ,  C03B2207/12 ,  C03B2207/20 ,  C03B2207/30 ,  C03B2207/36 ,  C03B2207/66 ,  C03C3/06 ,  C03C4/0085 ,  C03C2201/12 ,  C03C2201/21 ,  C03C2201/23 ,  C03C2203/42 ,  C03C2203/46 ,  G03F7/2004 ,  Y10S65/90

Abstract: A method is provided for manufacturing a silica glass that is substantially free of chlorine. The method includes the step of separately expelling a silicon tetrafluoride gas, a combustion gas, and a combustible gas from a burner made of silica glass, the flow velocity of the silicon tetrafluoride gas being within the range of about 9 slm/cm2 to about 20 slm/cm2. The method further includes the steps of producing minute silica glass particles by reacting the silicon tetrafluoride gas with water produced by a reaction of the combustion gas with the combustible gas, depositing the minute silica glass particles on a target, and producing the silica glass by fusing and vitrifying the minute silica glass particles deposited on the target.

Abstract translation: 提供了一种制造基本上不含氯的石英玻璃的方法。 该方法包括从由石英玻璃制成的燃烧器分别排出四氟化硅气体，燃烧气体和可燃气体的步骤，四氟化硅气体的流速在约9slm / cm 2至约20的范围内 slm / cm2。 该方法还包括以下步骤：通过使四氟化硅气体与通过燃烧气体与可燃气体的反应产生的水反应生成微小的二氧化硅玻璃颗粒，将微小二氧化硅玻璃颗粒沉积在靶材上，并通过熔融制备石英玻璃 并使沉积在靶上的微小二氧化硅玻璃颗粒玻璃化。

公开(公告)号：US20240111087A1

公开(公告)日：2024-04-04

申请号：US18337144

申请日：2023-06-19

Applicant: NKT Photonics A/S

Inventor： Thomas Tanggaard ALKESKJOLD ,  Casper Laur BYG ,  Christian Jakobsen ,  Jens Kristian LYNGSØE ,  Kim G. JESPERSEN ,  Jeppe JOHANSEN ,  Martin Dybendal MAACK ,  Martin Erland Vestergaard PEDERSEN ,  Carsten L. THOMSEN

IPC: G02B6/036 ,  C03B37/027 ,  C03B37/10 ,  C03C13/04 ,  C03C25/106 ,  C03C25/1065 ,  C03C25/607 ,  G02B6/02 ,  G02B6/14 ,  G02F1/365

CPC classification number: G02B6/03694 ,  C03B37/02781 ,  C03B37/0279 ,  C03B37/10 ,  C03C13/045 ,  C03C13/046 ,  C03C25/1061 ,  C03C25/1062 ,  C03C25/1068 ,  C03C25/607 ,  G02B6/02347 ,  G02B6/02357 ,  G02B6/02361 ,  G02B6/02395 ,  G02B6/14 ,  G02F1/365 ,  C03B2201/02 ,  C03B2201/12 ,  C03B2201/21 ,  C03B2201/22 ,  C03B2203/14 ,  C03B2203/23 ,  C03B2203/42 ,  C03C2201/21 ,  C03C2201/22 ,  G02B6/02366 ,  G02F1/3528

Abstract: A Photonic Crystal Fiber (PCF) a method of its production and a supercontinuum light source comprising such PCF. The PCF has a longitudinal axis and includes a core extending along the length of said longitudinal axis and a cladding region surrounding the core. At least the cladding region includes a plurality of microstructures in the form of inclusions extending along the longitudinal axis of the PCF in at least a microstructured length section. In at least a degradation resistant length section of the microstructured length section the PCF includes hydrogen and/or deuterium. In at least the degradation resistant length section the PCF further includes a main coating surrounding the cladding region, which main coating is hermetic for the hydrogen and/or deuterium at a temperature below Th, wherein Th is at least about 50° C., preferably 50° C.