公开(公告)号：US20090298295A1

公开(公告)日：2009-12-03

申请号：US12505801

申请日：2009-07-20

Applicant: Hirohisa KIKUYAMA ,  Masayuki MIYASHITA ,  Tatsuhiro YABUNE ,  Tadahiro OHMI

Inventor： Hirohisa KIKUYAMA ,  Masayuki MIYASHITA ,  Tatsuhiro YABUNE ,  Tadahiro OHMI

IPC: H01L21/465

CPC classification number: C03C15/00 ,  C03C15/02

Abstract: A surface treatment solution for finely processing a glass substrate containing multiple ingredients like the one used for the construction of a liquid crystal-based or organic electroluminescence-based flat panel display device, without evoking crystal precipitation and surface roughness.An etching solution of the invention contains, in addition to hydrofluoric acid (HF), at least one acid whose dissociation constant is larger than that of HF. The concentration of the acid in the solution is adjusted.

Abstract translation: 一种表面处理溶液，用于微细加工含有用于构建液晶或有机电致发光的平板显示装置的多种成分的玻璃基板，而不会引起晶体析出和表面粗糙度。 除了氢氟酸（HF）外，本发明的蚀刻溶液还含有至少一种其解离常数大于HF的酸。 调节溶液中酸的浓度。

公开(公告)号：US20090274604A1

公开(公告)日：2009-11-05

申请号：US11887324

申请日：2006-06-09

Applicant: Hirohisa Kikuyama ,  Masayuki Miyashita ,  Masashide Waki ,  Tomohiko Satonaga ,  Kazuhiko Shogami

Inventor： Hirohisa Kikuyama ,  Masayuki Miyashita ,  Masashide Waki ,  Tomohiko Satonaga ,  Kazuhiko Shogami

IPC: C01B35/00

CPC classification number: C01B35/061

Abstract: A production method of high purity silver tetrafluoroborate, capable of producing silver tetrafluoroborate (AgBF4) at purity higher than the conventional, without using an organic solvent. The production method of the present invention is characterized in that the method comprises the step of: reacting silver fluoride with boron trifluoride in the presence of anhydrous hydrofluoric acid. Boron trifluoride is delivered into a solution obtained by dissolving or suspending silver fluoride in an anhydrous hydrofluoric acid solution.

Abstract translation: 高纯度四氟硼酸银的制备方法，其能够生产纯度高于常规的四氟硼酸银（AgBF 4），而不使用有机溶剂。 本发明的制备方法的特征在于该方法包括在无水氢氟酸存在下使氟化银与三氟化硼反应的步骤。 将三氟化硼输送到通过将氟化银溶解或悬浮在无水氢氟酸溶液中获得的溶液中。

公开(公告)号：US07498579B2

公开(公告)日：2009-03-03

申请号：US10569488

申请日：2004-08-25

Applicant: Tsuguo Fukuda ,  Hirohisa Kikuyama ,  Tomohiko Satonaga ,  Hikaru Koike

Inventor： Tsuguo Fukuda ,  Hirohisa Kikuyama ,  Tomohiko Satonaga ,  Hikaru Koike

IPC: G01T1/20 ,  C09K11/02

CPC classification number: G01T1/2023 ,  A61B6/037 ,  A61B6/4258

Abstract: A scintillator, characterized in that it comprises crystals of Pr1-xCexF3 [wherein 0

Abstract translation: 闪烁体，其特征在于其包含Pr1-xCexF3 [其中0

公开(公告)号：US20070189957A1

公开(公告)日：2007-08-16

申请号：US10592372

申请日：2005-03-11

Applicant: Hirohisa Kikuyama ,  Masahide Waki ,  Shinji Hashiguchi ,  Kenji Aoki

Inventor： Hirohisa Kikuyama ,  Masahide Waki ,  Shinji Hashiguchi ,  Kenji Aoki

IPC: C01G31/02 ,  C01G33/00

CPC classification number: C01G33/00 ,  C01G35/00

Abstract: The object of the invention is to provide tantalum oxide and/or niobium oxide in the form of hollow particles. Disclosed is a method comprising adding hydrazine or an aqueous solution of hydrazine to (1) an aqueous solution of a tantalum compound and/or a niobium compound, to (2) an aqueous solution of fluorotantalic acid and/or fluoroniobic acid, or to (3) a solution obtained by dissolving crystallized fluorotantalic acid and/or crystallized fluoroniobic acid in water, to produce tantalum hydroxide and/or niobium hydroxide, and firing the tantalum hydroxide and/or niobium hydroxide.

Abstract translation: 本发明的目的是提供中空颗粒形式的氧化钽和/或氧化铌。 公开了一种方法，其包括向（1）钽化合物和/或铌化合物的水溶液中加入肼或肼的水溶液，加入（2）氟代花青酸和/或氟铌酸的水溶液或（ 3）通过将结晶的氟代花青酸和/或结晶的氟铌酸溶解在水中而制得的氢氧化钽和/或氢氧化铌获得的溶液，以及氢氧化钽和/或氢氧化铌的烧制。

公开(公告)号：US07214362B2

公开(公告)日：2007-05-08

申请号：US10505803

申请日：2003-02-27

Applicant: Hirohisa Kikuyama ,  Masahide Waki ,  Hiroto Izumi ,  Hirofumi Yazaki ,  Kenji Aoki ,  Shinji Hashiguchi ,  Masatsugu Kawawaki ,  Yuko Murakami

Inventor： Hirohisa Kikuyama ,  Masahide Waki ,  Hiroto Izumi ,  Hirofumi Yazaki ,  Kenji Aoki ,  Shinji Hashiguchi ,  Masatsugu Kawawaki ,  Yuko Murakami

IPC: C01G35/00 ,  C01G33/00

CPC classification number: C22B3/0005 ,  C01G33/00 ,  C01G33/003 ,  C01G35/00 ,  C01G35/003 ,  C22B34/24 ,  Y02P10/234

Abstract: An object of the present invention is to provide a method for purifying a highly pure niobium compound and/or tantalum compound, the method enabling the purification of a highly pure niobium compound and tantalum compound in a simplified manner at a low cost. The object is met by providing a method comprising adding an organic solvent to an aqueous solution containing a niobium compound and/or tantalum compound together with impurities, and then performing extraction via the solution. A niobium compound and/or tantalum compound dissolved in a solution is allowed to precipitate, and said aqueous solution is obtained by dissolving the precipitate in water.

Abstract translation: 本发明的目的是提供一种纯化铌化合物和/或钽化合物的纯化方法，该方法能够以低成本简便地纯化铌化合物和钽化合物。 通过提供一种包括向含有铌化合物和/或钽化合物以及杂质的水溶液中加入有机溶剂，然后通过溶液进行萃取的方法来满足目的。 溶解在溶液中的铌化合物和/或钽化合物析出，所述水溶液通过将沉淀物溶解在水中得到。

公开(公告)号：US20060020147A1

公开(公告)日：2006-01-26

申请号：US10514192

申请日：2003-04-17

Applicant: Hirohisa Kikuyama ,  Masahide Waki ,  Shinji Hashiguchi ,  Tetsuo Nishida ,  Yasutaka Tashiro ,  Kenji Aoki

Inventor： Hirohisa Kikuyama ,  Masahide Waki ,  Shinji Hashiguchi ,  Tetsuo Nishida ,  Yasutaka Tashiro ,  Kenji Aoki

IPC: C07C209/84

CPC classification number: H01G9/038 ,  C07C209/84 ,  H01G11/62 ,  H01M6/166 ,  H01M10/0568 ,  H01M2300/0025 ,  Y02E60/13 ,  C07C211/63

Abstract: Provided is a method for purifying a quaternary alkyl ammonium salt enabling the obtainment of a particulate quaternary alkyl ammonium salt having a low water content at a high yield which is suitably used as an electrolyte in an electrolytic solution. The method for the purification of a quaternary alkyl ammonium salt comprises dispersing a quaternary alkyl ammonium salt to be purified into an organic solvent to allow it to form a suspension there. The alkyl groups constituting the quaternary alkyl ammonium salt have 1 to 5 carbon atoms each. The quaternary alkyl ammonium salt to be purified is dispersed into the organic solvent to make a suspension, and then the particles are washed with an alcohol solvent.

Abstract translation: 本发明提供一种纯化季铵烷基铵盐的方法，其能够以高收率获得低水含量的季铵烷基铵盐，其适合用作电解液中的电解质。 纯化季烷基铵盐的方法包括将要纯化的季烷基铵盐分散在有机溶剂中以使其在那里形成悬浮液。 构成季烷基铵盐的烷基各有1〜5个碳原子。 将要纯化的季烷基铵盐分散在有机溶剂中以制成悬浮液，然后用醇溶剂洗涤颗粒。

公开(公告)号：US20050255035A1

公开(公告)日：2005-11-17

申请号：US10505802

申请日：2003-02-27

Applicant: Hirohisa Kikuyama ,  Masahide Waki ,  Hiroto Izumi ,  Hirofumi Yazaki ,  Kenji Aoki ,  Shinji Hashiguchi ,  Masatsugu Kawawaki ,  Yuko Murakami

Inventor： Hirohisa Kikuyama ,  Masahide Waki ,  Hiroto Izumi ,  Hirofumi Yazaki ,  Kenji Aoki ,  Shinji Hashiguchi ,  Masatsugu Kawawaki ,  Yuko Murakami

IPC: C01G33/00 ,  C01G35/00 ,  C22B3/20 ,  C22B3/22 ,  C22B3/44 ,  C22B34/24

CPC classification number: C01G33/003 ,  C01G33/00 ,  C01G35/00 ,  C01G35/003 ,  C01P2006/80 ,  C22B3/20 ,  C22B3/22 ,  C22B3/44 ,  C22B34/24 ,  Y02P10/234

Abstract: The present invention provides a method enabling the high purification of a niobium compound and/or tantalum compound in a simplified manner at a low cost. This is accomplished by providing a method enabling the high purification of a niobium compound and/or tantalum compound comprising the steps of preparing a solution containing niobium and/or tantalum, allowing a precipitate comprising niobium and/or tantalum to develop, separating the precipitate by filtration from the filtrate, converting the precipitate to a liquid melt or taking the filtrate, and separating a niobium compound from a tantalum compound or vice versa by utilizing the difference in solubility to the solvent between the niobium compound and the tantalum compound.

Abstract translation: 本发明提供了一种能够以低成本简便地进行铌化合物和/或钽化合物的高纯化的方法。 这是通过提供一种能够高效纯化铌化合物和/或钽化合物的方法实现的，包括以下步骤：制备含有铌和/或钽的溶液，使包含铌和/或钽的沉淀物显影，分离沉淀物 从滤液过滤，将沉淀物转化为液体熔融物或取出滤液，并通过利用铌化合物和钽化合物之间的溶剂的溶解度差异将钽铌化合物与钽化合物分离，反之亦然。

公开(公告)号：US06666973B1

公开(公告)日：2003-12-23

申请号：US09890754

申请日：2002-02-12

Applicant: Hirohisa Kikuyama ,  Toshirou Fukudome ,  Masayuki Miyashita

Inventor： Hirohisa Kikuyama ,  Toshirou Fukudome ,  Masayuki Miyashita

IPC: C02F104

CPC classification number: C02F9/00 ,  C02F1/02 ,  C02F1/025 ,  C02F1/5236 ,  C02F1/76 ,  C02F2101/105 ,  C02F2101/14 ,  C02F2303/18

Abstract: A method is provided for fixing and eliminating fluorine and phosphorus in waste water wherein the waste water includes a fluorophosphate compound in which hydrochloric acid is added to the waste water including the fluorophosphate compound. The waste water to which hydrochloric acid has been added is heated in order to decompose the fluorophosphate compound into hydrogen fluoride and phosphoric acid, while hydrogen chloride gas located within a treating vessel in which the waste water is contained is introduced into a condenser provided outside of the treating vessel, and then a calcium salt is added to the waste water after decomposition in order to fix and eliminate fluorine and phosphorus.

Abstract translation: 提供了一种用于固定和除去废水中的氟和磷的方法，其中废水包括其中向包含氟磷酸盐化合物的废水中加入盐酸的氟磷酸盐化合物。 加入盐酸的废水被加热，以将氟磷酸盐化合物分解为氟化氢和磷酸，而位于其中含有废水的处理容器内的氯化氢气体被引入设置在 处理容器，然后在分解后将钙盐加入到废水中，以固定和消除氟和磷。

公开(公告)号：US06258411B1

公开(公告)日：2001-07-10

申请号：US09300773

申请日：1999-04-27

Applicant: Tadahiro Ohmi ,  Kazuo Chiba ,  Yutaka Mikasa ,  Kenji Ishigaki ,  Nobuhiro Miki ,  Matagoro Maeno ,  Hirohisa Kikuyama

Inventor： Tadahiro Ohmi ,  Kazuo Chiba ,  Yutaka Mikasa ,  Kenji Ishigaki ,  Nobuhiro Miki ,  Matagoro Maeno ,  Hirohisa Kikuyama

IPC: B05D304

CPC classification number: H01L21/6835 ,  C23C28/021 ,  C23C28/027 ,  H01S3/0305 ,  H01S3/225 ,  Y10S428/936 ,  Y10S428/938

Abstract: An industrial material such as metal, ceramics or plastics whose surface has a film passivated by fluoridation and a process of manufacturing the above industrial material. The industrial material comprises a substrate, a nickel alloy film formed on the substrate and containing nickel, semimetal and/or other metal whose fluoride becomes a volatile compound, and a fluorine passivated film formed at least on a surface of the nickel alloy film in such a manner that the fluorine passivated film contains nickel and does not contain said other metal or the semimetal, and satisfies stoichiometric ratio. The process of manufacturing an industrial material comprises the steps of performing grounding treatment of a surface of a substrate, forming a nickel alloy film, on the surface of the substrate, containing nickel, semimetal and/or other metal, and forming a fluorine passivated film on the nickel alloy film.

Abstract translation: 一种工业材料，例如金属，陶瓷或塑料，其表面具有通过氟化钝化的膜和制造上述工​​业材料的工艺。 工业材料包括基板，形成在基板上的含有镍，半金属和/或其他金属的镍合金膜，其中氟化物成为挥发性化合物，以及至少在镍合金膜的表面上形成的氟钝化膜 氟钝化膜含有镍并且不含有所述其他金属或半金属，并且满足化学计量比的方式。 制造工业材料的方法包括以下步骤：在包含镍，半金属和/或其它金属的基板的表面上进行基板的表面的接地处理，形成镍合金膜，并形成氟钝化膜 在镍合金膜上。

公开(公告)号：US6027571A

公开(公告)日：2000-02-22

申请号：US66354

申请日：1998-06-29

Applicant: Hirohisa Kikuyama ,  Masayuki Miyashita ,  Tatsuhiro Yabune ,  Tadahiro Ohmi

Inventor： Hirohisa Kikuyama ,  Masayuki Miyashita ,  Tatsuhiro Yabune ,  Tadahiro Ohmi

IPC: C23F1/24 ,  H01L21/308 ,  H01L21/311 ,  H01L21/3213 ,  C09K13/00 ,  C09K13/08 ,  C23G1/02

CPC classification number: H01L21/31111 ,  H01L21/32134

Abstract: A fine surface treatment for micromachining having an etching speed whose difference is smaller to oxide films each obtained by a different method as well as conditions of forming film or having different concentration of various impurities such as P, B and As in the film, and also having a practical etching speed to each of the films. The surface treatment for micromachining contains 0.1 to 8 weight percent of hydrogen fluoride and not less than 40 weight percent to not more than 47 weight percent of ammonium fluoride. It should be noted that it is preferable the surface treatment agent contains 0.001 to 1 weight percent of surfactant.

Abstract translation: PCT No.PCT / JP97 / 02978第 371日期：1998年4月28日 102（e）1998年4月28日PCT PCT 1997年8月27日PCT公布。 公开号WO98 / 09320 日期1998年3月5日对于通过不同的方法获得的氧化膜的蚀刻速度差异小的微加工的微细加工的表面处理以及形成膜或不同浓度的各种杂质如P，B和As的条件 膜，并且还具有对每个膜的实际蚀刻速度。 微加工的表面处理包含0.1至8重量％的氟化氢和不少于40重量％至不超过47重量％的氟化铵。 另外，表面处理剂优选含有0.001〜1重量％的表面活性剂。