公开(公告)号：US08189195B2

公开(公告)日：2012-05-29

申请号：US11798039

申请日：2007-05-09

申请人： Arie Jeffrey Den Boef ,  Hugo Augustinus Joseph Cramer ,  Mircea Dusa ,  Irwan Dani Setija

发明人： Arie Jeffrey Den Boef ,  Hugo Augustinus Joseph Cramer ,  Mircea Dusa ,  Irwan Dani Setija

IPC分类号： G01B11/00 ,  G01B11/14 ,  G01B11/04 ,  G01N21/00

CPC分类号： G03F1/84 ,  G03F7/7065

摘要： A method of measuring a property of a substrate includes generating a patterned mask configured to cause a radiation beam passing through the mask to acquire the pattern, simulating radiating the substrate with a patterned radiation beam that has been patterned using the mask to obtain a simulated pattern, determining at least one location of the simulated pattern that is prone to patterning errors, and irradiating the substrate with the patterned radiation beam using a lithographic process. The method also includes measuring an accuracy of at least one property of the at least one location of the pattern on the substrate that has been determined as being prone to patterning errors, and adjusting the lithographic process according to the measuring.

摘要翻译： 测量衬底性质的方法包括：生成图案化掩模，其被配置为使通过掩模的辐射束获得图案，模拟使用掩模图案化的图案化辐射束来辐射衬底以获得模拟图案 ，确定易于图案化错误的模拟图案的至少一个位置，以及使用光刻工艺用图案化的辐射束照射衬底。 该方法还包括测量已经被确定为易于图案化错误的衬底上的图案的至少一个位置的至少一个特性的精度，以及根据测量来调整光刻处理。

公开(公告)号：US20110085176A1

公开(公告)日：2011-04-14

申请号：US12884107

申请日：2010-09-16

申请人： Hugo Augustinus Joseph Cramer ,  Henricus Johannes Lambertus Megens

发明人： Hugo Augustinus Joseph Cramer ,  Henricus Johannes Lambertus Megens

IPC分类号： G01B11/24

CPC分类号： G03F1/84 ,  G03F7/70625

摘要： A system and method determine an approximate structure of an object on a substrate. This may be applied in model based metrology of microscopic structures to assess critical dimension or overlay performance of a lithographic apparatus. A scatterometer is used to determine approximate structure of an object, such as a grating on a stack, on a substrate. The wafer substrate has an upper layer and an underlying layer. The substrate has a first scatterometry target region, including the grating on a stack object. The grating on a stack is made up of the upper and underlying layers. The upper layer is patterned with a periodic grating. The substrate further has a neighboring second scatterometry target region, where the upper layer is absent. The second region has just the unpatterned underlying layers.

摘要翻译： 系统和方法确定基板上的物体的近似结构。 这可以应用于基于模型的微观结构计量学以评估光刻设备的临界尺寸或覆盖性能。 散射仪用于确定物体的近似结构，例如堆叠上的光栅，在衬底上。 晶片衬底具有上层和下层。 衬底具有包括堆叠物体上的光栅的第一散射测量目标区域。 堆叠上的光栅由上层和下层组成。 上层用周期性光栅图案化。 衬底还具有相邻的第二散射测量目标区域，其中上层不存在。 第二个地区只是没有图案的下层。

公开(公告)号：US20110027704A1

公开(公告)日：2011-02-03

申请号：US12846652

申请日：2010-07-29

申请人： Hugo Augustinus Joseph Cramer ,  Arie Jeffrey Den Boef ,  Henricus Johannes Lambertus Megens ,  Hendrik Jan Hidde Smilde ,  Andrianus Johannes Hendrikus Schellekens ,  Michael Kubis

发明人： Hugo Augustinus Joseph Cramer ,  Arie Jeffrey Den Boef ,  Henricus Johannes Lambertus Megens ,  Hendrik Jan Hidde Smilde ,  Andrianus Johannes Hendrikus Schellekens ,  Michael Kubis

IPC分类号： G03F7/20 ,  G03B27/54 ,  G06K9/00

CPC分类号： G03F7/70641 ,  G01B11/02 ,  G01B11/22 ,  G01B11/24 ,  G01B11/30 ,  G01N21/47 ,  G01N21/88 ,  G03F7/70608 ,  G03F7/70625 ,  G03F7/70633 ,  G03F7/7065

摘要： In a method of determining the focus of a lithographic apparatus used in a lithographic process on a substrate, the lithographic process is used to form a structure on the substrate, the structure having at least one feature which has an asymmetry in the printed profile which varies as a function of the focus of the lithographic apparatus on the substrate. A first image of the periodic structure is formed and detected while illuminating the structure with a first beam of radiation. The first image is formed using a first part of non-zero order diffracted radiation. A second image of the periodic structure is foamed and detected while illuminating the structure with a second beam of radiation. The second image is formed using a second part of the non-zero order diffracted radiation which is symmetrically opposite to the first part in a diffraction spectrum. The ratio of the intensities of the measured first and second portions of the spectra is determined and used to determine the asymmetry in the profile of the periodic structure and/or to provide an indication of the focus on the substrate. In the same instrument, an intensity variation across the detected portion is determined as a measure of process-induced variation across the structure. A region of the structure with unwanted process variation can be identified and excluded from a measurement of the structure.

摘要翻译： 在确定在基板上的光刻工艺中使用的光刻设备的焦点的方法中，使用光刻工艺在基板上形成结构，该结构具有至少一个特征，该特征在印刷图案中具有不对称性 作为光刻设备在基板上的焦点的函数。 在用第一辐射束照射结构的同时形成和检测周期性结构的第一图像。 第一图像使用非零阶衍射辐射的第一部分形成。 周期性结构的第二图像被发泡并被检测，同时用第二辐射束照射结构。 使用在衍射光谱中与第一部分对称相对的非零级衍射辐射的第二部分形成第二图像。 确定测量的第一和第二部分光谱的强度的比率并用于确定周期性结构的轮廓的不对称性和/或提供焦点在基底上的指示。 在相同的仪器中，被检测部分的强度变化被确定为整个结构的过程引起的变化的量度。 可以从结构的测量中识别并排除具有不期望的工艺变化的结构区域。

公开(公告)号：US20090135424A1

公开(公告)日：2009-05-28

申请号：US12258719

申请日：2008-10-27

申请人： Antoine Gaston Marie Kiers ,  Arie Jeffrey Den Boef ,  Hugo Augustinus Joseph Cramer

发明人： Antoine Gaston Marie Kiers ,  Arie Jeffrey Den Boef ,  Hugo Augustinus Joseph Cramer

IPC分类号： G06F15/00 ,  G01B11/00

CPC分类号： G03F7/70633 ,  G01N21/47 ,  G03F1/36 ,  G03F1/68

摘要： In a method for determining a structure parameter of a target pattern, a first series of calibration spectra are determined from at least one reference pattern, each spectra being determined using a different known value of at least one structure parameter of the respective reference pattern. The first series of calibration spectra does not take into account parameters of an apparatus used to produce the reference pattern. A representation of each of the first series calibration spectra is stored in a central library. A second series of calibration spectra corresponding to at least one of the stored spectra for a target spectrum is determined using the parameters of the apparatus for measuring the target spectrum. A measured target spectrum is produced by directing a beam of radiation onto the target pattern. The measured target spectrum and the second series of calibration spectra are compared, where this comparison is used to derive a value for the structure parameter of the target pattern.

摘要翻译： 在用于确定目标图案的结构参数的方法中，从至少一个参考图案确定第一系列校准光谱，每个光谱使用相应参考图案的至少一个结构参数的不同已知值来确定。 第一系列校准光谱没有考虑用于产生参考图案的装置的参数。 每个第一系列校准光谱的表示存储在中央库中。 使用用于测量目标光谱的装置的参数来确定对应于目标光谱的存储光谱中的至少一个的第二系列校准光谱。 通过将辐射束引导到目标图案上来产生测量的目标光谱。 比较测量的目标光谱和第二系列校准光谱，其中该比较用于导出目标图案的结构参数的值。

公开(公告)号：US20080170780A1

公开(公告)日：2008-07-17

申请号：US11653441

申请日：2007-01-16

申请人： Hugo Augustinus Joseph Cramer ,  Antoine Gaston Marie Kiers ,  Durk Oeds Van Der Ploeg ,  Goce Naumoski ,  Roland Mark Van Weel

发明人： Hugo Augustinus Joseph Cramer ,  Antoine Gaston Marie Kiers ,  Durk Oeds Van Der Ploeg ,  Goce Naumoski ,  Roland Mark Van Weel

IPC分类号： G06K9/00

CPC分类号： G03F7/70625

摘要： Building of a model profile for a target is disclosed. An embodiment of the method includes importing an image of a known object and superimposing, on this image, either by hand or automatically, an estimated profile. The estimated profile is defined mathematically and adjusted segment by segment in order to match the image such that the adjusted estimated profile may be stored alongside a diffraction spectrum associated with the image. Alternatively or additionally, a user may trace (or free-draw) the profile of a known image and subsequently map a shape-definer of a mathematical function such as a polynomial equation, a spline or a vector onto the estimated profile in order to obtain a profile and one or more variables of that profile that may be used to reconstruct the profile of an unknown object from its diffraction pattern.

摘要翻译： 披露了目标的模型配置文件的构建。 该方法的一个实施例包括导入已知对象的图像并且在该图像上手动或自动地叠加估计的轮廓。 估计轮廓被数学地定义并且逐段地调整，以便匹配图像，使得调整的估计轮廓可以与与图像相关联的衍射谱一起存储。 或者或另外，用户可以跟踪（或自由绘制）已知图像的轮廓，并且随后将诸如多项式方程，样条或矢量的数学函数的形状定义器映射到估计轮廓上，以获得 该轮廓的轮廓和一个或多个变量可用于从其衍射图案重建未知物体的轮廓。

公开(公告)号：US06993296B2

公开(公告)日：2006-01-31

申请号：US10368709

申请日：2003-02-19

申请人： Arthur C. Leyh ,  Joseph Cramer, III ,  Christopher Kurby ,  Brian Storm

发明人： Arthur C. Leyh ,  Joseph Cramer, III ,  Christopher Kurby ,  Brian Storm

IPC分类号： H04B1/44

CPC分类号： H03G3/344 ,  H04B1/1027 ,  H04B17/309 ,  H04B17/318 ,  H04B17/345 ,  H04W48/16 ,  H04W88/06

摘要： A method for increase receiver efficiency in a multimode communication device includes a first step of monitoring a received signal strength of a neighboring cell on a receiver channel. A next step includes determining a noise on the receiver channel from a transmitter power amplifier of the communication device. A next step includes comparing the level of interference with a predetermined threshold and with respect to the signal strength. A next step includes blanking the receiver when the transmitter power amplifier of the communication device is on and if the predetermined threshold is not exceeded indicating excessive self-interference.

摘要翻译： 一种用于在多模式通信设备中提高接收机效率的方法包括：监视接收机信道上相邻小区的接收信号强度的第一步骤。 下一步包括从通信设备的发射机功率放大器确定接收机信道上的噪声。 下一步包括将干扰电平与预定阈值相比较，并相对于信号强度进行比较。 下一步骤包括当通信设备的发射机功率放大器接通时消隐接收机，如果不超过预定阈值，表示过度的自身干扰。