公开(公告)号：US20090103066A1

公开(公告)日：2009-04-23

申请号：US12244326

申请日：2008-10-02

申请人： Hans BUTLER ,  Marc Wilhelmus Maria Van Der Wijst ,  Cornelius Adrianus Lambertus De Hoon

发明人： Hans BUTLER ,  Marc Wilhelmus Maria Van Der Wijst ,  Cornelius Adrianus Lambertus De Hoon

IPC分类号： G03B27/42 ,  G01B11/14

CPC分类号： G03F7/70775 ,  G03F7/709 ,  G05D19/02

摘要： A control system for controlling a position or position related quantity of an object is provided. A measurement system is configured to measure a position or position related quantity of the object. A controller is configured to provide a control signal on the basis of the measured position or position related quantity. A actuator actuates the object on the basis of the control signal. A filter unit, which may be a partial order filter unit, filters the measured position or position related quantity.

摘要翻译： 提供了一种用于控制物体的位置或位置相关量的控制系统。 测量系统被配置为测量对象的位置或位置相关量。 控制器被配置为基于所测量的位置或位置相关量提供控制信号。 执行器基于控制信号致动物体。 可以是部分级过滤器单元的过滤器单元过滤所测量的位置或位置相关量。

公开(公告)号：US07116399B2

公开(公告)日：2006-10-03

申请号：US10844570

申请日：2004-05-13

申请人： Wilhelmus Josephus Box ,  Antonius Johannes Josephus Van Dijsseldonk ,  Dominicus Jacobus Petrus Adrianus Franken ,  Martinus Hendrikus Antonius Leenders ,  Erik Roelof Loopstra ,  Josephus Jacobus Smits ,  Marc Wilhelmus Maria Van Der Wijst

发明人： Wilhelmus Josephus Box ,  Antonius Johannes Josephus Van Dijsseldonk ,  Dominicus Jacobus Petrus Adrianus Franken ,  Martinus Hendrikus Antonius Leenders ,  Erik Roelof Loopstra ,  Josephus Jacobus Smits ,  Marc Wilhelmus Maria Van Der Wijst

IPC分类号： G03B27/42 ,  G03B27/54 ,  G02B7/02

CPC分类号： G03F7/70808 ,  G03F7/70825 ,  G03F7/70833 ,  G03F7/70858 ,  G03F7/70891 ,  G03F7/709 ,  G03F7/70991

摘要： A lithographic projection apparatus contains a projection system configured to project a patterned beam of radiation onto a target portion of a substrate. The projection system contains one or more optically active mirrors and heat shields located to intercept heat radiation to or from the mirrors and/or their support. The heat shields are actively cooled and the mirrors and the heat shields and the mirrors are supported separately on a support frame to reduce vibration of the mirrors due to active cooling. The heat shields may include heat shields that intercept heat radiation to or from the support and/or respective heat shields for individual mirrors that intercept heat radiation to or from the mirrors.

摘要翻译： 光刻投影设备包含投影系统，该投影系统配置成将图案化的辐射束投影到基板的目标部分上。 投影系统包含一个或多个光学反射镜和隔热罩，其被定位成拦截到达镜子和/或其支撑件的热辐射。 热屏蔽被主动冷却，镜子和隔热罩和镜子分别支撑在支撑框架上，以减少由于主动冷却引起的反射镜振动。 隔热罩可以包括热屏蔽件，该隔热板截取向支撑和/或相应的隔热板的热辐射，用于隔离到或从反射镜散发的各个反射镜。

公开(公告)号：US06977713B2

公开(公告)日：2005-12-20

申请号：US10729376

申请日：2003-12-08

申请人： Bernardus Antonius Johannes Luttikhuis ,  Pertrus Rutgerus Bartray ,  Wilhelmus Josephus Box ,  Martinus Hendrikus Antonius Leenders ,  Marc Wilhelmus Maria Van Der Wijst

发明人： Bernardus Antonius Johannes Luttikhuis ,  Pertrus Rutgerus Bartray ,  Wilhelmus Josephus Box ,  Martinus Hendrikus Antonius Leenders ,  Marc Wilhelmus Maria Van Der Wijst

IPC分类号： G21K5/02 ,  F16F15/04 ,  G03F7/20 ,  H01L21/027 ,  G03B27/42 ,  G03B27/52

CPC分类号： G03F7/70858

摘要： A lithographic apparatus includes an illumination system for providing a beam of radiation, a support structure constructed to support a patterning device, which serves to impart the projection beam with a pattern in its cross-section, a substrate table for holding a substrate, a projection system that projects the patterned beam onto a target portion of the substrate, and a reference frame with a position sensor and the substrate being located thereon. The apparatus further includes a heat transport system having a heating element, in thermal interaction with at least one of the projection system and the reference frame, for heat transport to or from at least one of the projection system and the reference frame, wherein the heat transport system, is coupled to a further frame which is mechanically isolated from the reference frame.

摘要翻译： 光刻设备包括用于提供辐射束的照明系统，构造成支撑图案形成装置的支撑结构，其用于使投影光束在其横截面上具有图案，用于保持衬底的衬底台，用于保持衬底的突起 将图案化光束投影到基板的目标部分上的系统，以及具有位置传感器并且基板位于其上的参考框架。 该装置还包括具有加热元件的热​​传输系统，其与投影系统和参考框架中的至少一个进行热相互作用，用于传输到投影系统和参考框架中的至少一个的热传递，其中热量 传输系统耦合到与参考系机械隔离的另一帧。

公开(公告)号：US09715171B2

公开(公告)日：2017-07-25

申请号：US12964459

申请日：2010-12-09

申请人： Hans Butler ,  Johannes Petrus Martinus Bernardus Vermeulen ,  Marc Wilhelmus Maria Van Der Wijst ,  Jeroen Pieter Starreveld ,  Cornelius Adrianus Lambertus De Hoon ,  Francois Xavier Debiesme

发明人： Hans Butler ,  Johannes Petrus Martinus Bernardus Vermeulen ,  Marc Wilhelmus Maria Van Der Wijst ,  Jeroen Pieter Starreveld ,  Cornelius Adrianus Lambertus De Hoon ,  Francois Xavier Debiesme

IPC分类号： B29C59/02 ,  G03F7/00 ,  F16F15/03 ,  F16F9/53 ,  F16F15/00 ,  F16F15/027 ,  B82Y10/00 ,  B82Y40/00 ,  B29C43/02

CPC分类号： G03F7/0002 ,  B29C2043/025 ,  B82Y10/00 ,  B82Y40/00 ,  F16F9/535 ,  F16F15/002 ,  F16F15/0275 ,  F16F15/03

摘要： An imprint lithography apparatus includes an actuator configured to displace an imprint template holder relative to a substrate holder to perform an imprint process. The imprint template holder and/or the substrate holder being supported on a support structure, the support structure being mounted to a vibration isolation system that is mounted to a base of the apparatus. The vibration isolation system is configured to provide a vibration isolation of the support structure relative to the base. A control unit is configured to control the actuator during the imprint process. The control unit is arranged to control an adjustable member of the vibration isolation system to adjust a dynamical characteristic of the vibration isolation system during at least part of the imprint process so as to reduce a displacement of the support structure relative to the base due to a force exerted on the support structure during the imprint process.

公开(公告)号：US08908144B2

公开(公告)日：2014-12-09

申请号：US11527729

申请日：2006-09-27

申请人： Rogier Herman Mathijs Groeneveld ,  Antonius Johannes Josephus Van Dijsseldonk ,  Dominicus Jacobus Petrus Adrianus Franken ,  Bastiaan Stephanus Hendricus Jansen ,  Robertus Johannes Marinus De Jongh ,  Marc Wilhelmus Maria Van Der Wijst ,  Maurice Willem Jozef Etiënne Wijckmans

发明人： Rogier Herman Mathijs Groeneveld ,  Antonius Johannes Josephus Van Dijsseldonk ,  Dominicus Jacobus Petrus Adrianus Franken ,  Bastiaan Stephanus Hendricus Jansen ,  Robertus Johannes Marinus De Jongh ,  Marc Wilhelmus Maria Van Der Wijst ,  Maurice Willem Jozef Etiënne Wijckmans

IPC分类号： G03B27/42 ,  G03F7/20

CPC分类号： G03F7/709 ,  G03F7/70833

摘要： A lithographic apparatus is disclosed that includes a support constructed to support a patterning device, the patterning device being capable of imparting a radiation beam with a pattern in its cross-section to form a patterned radiation beam and a substrate table constructed to hold a substrate. Further, the lithographic apparatus includes a projection system configured to project the patterned radiation beam onto a target portion of the substrate, the projection system being mounted to a reference element of the lithographic apparatus by a resilient mount to reduce a transfer of high frequency vibration from the reference element to the projection system and a control system to counteract a position error of the substrate table and the support relative to the projection system.

摘要翻译： 公开了一种光刻设备，其包括构造成支撑图案形成装置的支撑件，所述图案形成装置能够在其横截面中赋予具有图案的辐射束以形成图案化的辐射束，以及构造成保持衬底的衬底台。 此外，光刻设备包括投影系统，其配置成将图案化的辐射束投影到基板的目标部分上，投影系统通过弹性安装件安装到光刻设备的参考元件，以减少高频振动从 投影系统的参考元件和用于抵消衬底台和支撑件相对于投影系统的位置误差的控制系统。

公开(公告)号：US08619232B2

公开(公告)日：2013-12-31

申请号：US12627118

申请日：2009-11-30

申请人： Hans Butler ,  Marc Wilhelmus Maria Van Der Wijst

发明人： Hans Butler ,  Marc Wilhelmus Maria Van Der Wijst

IPC分类号： G03B27/54

CPC分类号： F16F15/002 ,  G03F7/709

摘要： A method for damping an object in two or more degrees of freedom, including measuring a position quantity at each of the two or more measurement locations; extracting from the measured position quantities a measurement signal for each dynamic mode; feeding the measurement signal of a dynamic mode to a controller unit associated with the respective dynamic mode, the controller unit providing for each dynamic mode an output signal on the basis of the respective measurement signal; and providing a control signal to each of the two or more actuators, the control signal for each actuator being based on output signals of one or more controller units.

摘要翻译： 一种用于在两个或多个自由度中阻尼物体的方法，包括测量两个或更多个测量位置中的每一个处的位置量; 从测量位置数量提取每个动态模式的测量信号; 将动态模式的测量信号馈送到与相应动态模式相关联的控制器单元，所述控制器单元基于相应的测量信号为每个动态模式提供输出信号; 并且向所述两个或更多个致动器中的每一个提供控制信号，每个致动器的控制信号基于一个或多个控制器单元的输出信号。

公开(公告)号：US08457385B2

公开(公告)日：2013-06-04

申请号：US13019587

申请日：2011-02-02

申请人： Marc Wilhelmus Maria Van Der Wijst ,  Engelbertus Antonius Fransiscus Van Der Pasch ,  Koen Jacobus Johannes Maria Zaal

发明人： Marc Wilhelmus Maria Van Der Wijst ,  Engelbertus Antonius Fransiscus Van Der Pasch ,  Koen Jacobus Johannes Maria Zaal

IPC分类号： G06K9/00

CPC分类号： G03F7/7085 ,  G03F7/70425 ,  G03F7/70775 ,  G03F7/70783

摘要： An encoder-type measurement system is configured to measure a position dependent signal of a movable object, the measurement system including at least one sensor mountable on the movable object a sensor target object mountable on a substantially stationary frame, and a mounting device configured to mount the sensor target object on the substantially stationary frame. The measurement system further includes a compensation device configured to compensate movements and/or deformations of the sensor target object with respect to the substantially stationary frame. The compensation device may include a passive or an active damping device and/or a feedback position control system. In an alternative embodiment, the compensation device includes a gripping device which fixes the position of the sensor target object during a high accuracy movement of the movable object.

摘要翻译： 编码器型测量系统被配置为测量可移动物体的位置相关信号，所述测量系统包括可安装在可移动物体上的至少一个传感器，可安装在基本上固定的框架上的传感器目标物体，以及安装装置， 传感器目标物体在基本上固定的框架上。 测量系统还包括补偿装置，其被配置为补偿传感器目标物体相对于基本上静止的框架的运动和/或变形。 补偿装置可以包括无源或主动阻尼装置和/或反馈位置控制系统。 在替代实施例中，补偿装置包括夹持装置，其在可移动物体的高精度运动期间固定传感器目标物体的位置。

公开(公告)号：US20120147355A1

公开(公告)日：2012-06-14

申请号：US13398890

申请日：2012-02-17

申请人： Hans BUTLER ,  Martinus Agnes Willem CUIJPERS ,  Christiaan Alexander HOOGENDAM ,  Robertus Johannes Marinus DE JONGH ,  Michael Jozef Mathijs RENKENS ,  Marc Wilhelmus Maria VAN DER WIJST ,  Maurice Willem Jozef Etiënne WIJCKMANS ,  Robertus Leonardus TOUSAIN ,  Ronald Petrus Hendricus FAASSEN ,  Adrianus Hendrik KOEVOETS

发明人： Hans BUTLER ,  Martinus Agnes Willem CUIJPERS ,  Christiaan Alexander HOOGENDAM ,  Robertus Johannes Marinus DE JONGH ,  Michael Jozef Mathijs RENKENS ,  Marc Wilhelmus Maria VAN DER WIJST ,  Maurice Willem Jozef Etiënne WIJCKMANS ,  Robertus Leonardus TOUSAIN ,  Ronald Petrus Hendricus FAASSEN ,  Adrianus Hendrik KOEVOETS

IPC分类号： G03B27/58

CPC分类号： G03F7/709 ,  G03F7/70758 ,  G03F7/70766

摘要： A positioning system to position a table within a base frame of a lithographic apparatus, the positioning system including first and second actuators and a controller. The first actuator exerting an actuation force on the table. The first actuator being connected to a balance mass constructed and arranged to absorb a reaction force of the first actuator. The controller and second actuator constructed and arranged to exert a compensation force and/or torque to compensate a torque caused by the actuation force exerted by the first actuator on the balance mass.

摘要翻译： 一种定位系统，用于将平台定位在光刻设备的基架内，所述定位系统包括第一和第二致动器以及控制器。 第一执行器在桌子上施加致动力。 第一致动器连接到构造和布置成吸收第一致动器的反作用力的平衡块。 控制器和第二致动器构造和布置成施加补偿力和/或扭矩以补偿由第​​一致动器施加在平衡块上的致动力引起的扭矩。

公开(公告)号：US08144310B2

公开(公告)日：2012-03-27

申请号：US12409919

申请日：2009-03-24

申请人： Hans Butler ,  Martinus Agnes Willem Cuijpers ,  Christiaan Alexander Hoogendam ,  Robertus Johannes Marinus De Jongh ,  Michael Jozef Mathijs Renkens ,  Marc Wilhelmus Maria Van Der Wijst ,  Maurice Willem Jozef Etiënne Wijckmans ,  Robertus Leonardus Tousain ,  Ronald Petrus Hendricus Faassen ,  Adrianus Hendrik Koevoets

发明人： Hans Butler ,  Martinus Agnes Willem Cuijpers ,  Christiaan Alexander Hoogendam ,  Robertus Johannes Marinus De Jongh ,  Michael Jozef Mathijs Renkens ,  Marc Wilhelmus Maria Van Der Wijst ,  Maurice Willem Jozef Etiënne Wijckmans ,  Robertus Leonardus Tousain ,  Ronald Petrus Hendricus Faassen ,  Adrianus Hendrik Koevoets

IPC分类号： G03B27/58 ,  G03B27/42

CPC分类号： G03F7/709 ,  G03F7/70758 ,  G03F7/70766

摘要： A positioning system to position a table within a base frame of a lithographic apparatus, the positioning system including first and second actuators and a controller. The first actuator exerting an actuation force on the table. The first actuator being connected to a balance mass constructed and arranged to absorb a reaction force of the first actuator. The controller and second actuator constructed and arranged to exert a compensation force and/or torque to compensate a torque caused by the actuation force exerted by the first actuator on the balance mass.

摘要翻译： 一种定位系统，用于将平台定位在光刻设备的基架内，所述定位系统包括第一和第二致动器以及控制器。 第一执行器在桌子上施加致动力。 第一致动器连接到构造和布置成吸收第一致动器的反作用力的平衡块。 控制器和第二致动器构造和布置成施加补偿力和/或扭矩以补偿由第​​一致动器施加在平衡块上的致动力引起的扭矩。

公开(公告)号：US20110163477A1

公开(公告)日：2011-07-07

申请号：US12964459

申请日：2010-12-09

申请人： Hans Butler ,  Johannes Petrus Martinus Bernardus Vermeulen ,  Marc Wilhelmus Maria Van Der Wijst ,  Jeroen Pieter Starreveld ,  Cornelius Adrianus Lambertus De Hoon ,  Francois Xavier Debiesme

发明人： Hans Butler ,  Johannes Petrus Martinus Bernardus Vermeulen ,  Marc Wilhelmus Maria Van Der Wijst ,  Jeroen Pieter Starreveld ,  Cornelius Adrianus Lambertus De Hoon ,  Francois Xavier Debiesme

IPC分类号： B29C59/02

CPC分类号： G03F7/0002 ,  B29C2043/025 ,  B82Y10/00 ,  B82Y40/00 ,  F16F9/535 ,  F16F15/002 ,  F16F15/0275 ,  F16F15/03

摘要： An imprint lithography apparatus includes an actuator configured to displace an imprint template holder relative to a substrate holder to perform an imprint process. The imprint template holder and/or the substrate holder being supported on a support structure, the support structure being mounted to a vibration isolation system that is mounted to a base of the apparatus. The vibration isolation system is configured to provide a vibration isolation of the support structure relative to the base. A control unit is configured to control the actuator during the imprint process. The control unit is arranged to control an adjustable member of the vibration isolation system to adjust a dynamical characteristic of the vibration isolation system during at least part of the imprint process so as to reduce a displacement of the support structure relative to the base due to a force exerted on the support structure during the imprint process.

摘要翻译： 压印光刻设备包括致动器，其构造成使压印模板保持器相对于衬底保持器移位以执行压印处理。 压印模板保持器和/或衬底保持器被支撑在支撑结构上，支撑结构安装到安装到设备的基座上的隔振系统。 隔振系统构造成提供支撑结构相对于底座的隔振。 控制单元构造成在压印过程中控制致动器。 控制单元布置成控制隔振系统的可调节构件，以在至少部分压印过程中调节隔振系统的动态特性，以便减少支撑结构相对于底座的位移，这是由于 在压印过程中施加在支撑结构上的力。