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    Lithographic apparatus comprising a substrate table and a surface substrate actuator
    5.
    发明授权
    Lithographic apparatus comprising a substrate table and a surface substrate actuator 有权
    光刻设备包括基片台和表面基片致动器

    公开(公告)号：US09110387B2

    公开(公告)日：2015-08-18

    申请号：US13477748

    申请日：2012-05-22

    申请人： Hans Butler ,  Jan Van Eijk ,  Sven Antoin Johan Hol ,  Johannes Petrus Martinus Bernardus Vermeulen ,  Yang-Shan Huang

    发明人： Hans Butler ,  Jan Van Eijk ,  Sven Antoin Johan Hol ,  Johannes Petrus Martinus Bernardus Vermeulen ,  Yang-Shan Huang

    IPC分类号： G03F7/20

    CPC分类号： G03F7/70783 ,  G03F7/70758

    摘要： A lithographic apparatus includes an illumination system configured to condition a radiation beam and a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam. The lithographic apparatus further includes a substrate table constructed to hold a substrate; a positioner constructed to position the substrate table; a projection system configured to project the patterned radiation beam onto a target portion of the substrate; a substrate surface actuator arranged to engage a part of a surface of the substrate facing the projection system, and a position controller configured to control a position of the substrate table, the position controller being arranged to drive the positioner and the substrate surface actuator.

    摘要翻译： 光刻设备包括被配置为调节辐射束和构造成支撑图案形成装置的支撑件的照明系统，所述图案形成装置能够在其横截面中赋予辐射束图案以形成图案化的辐射束。 所述光刻设备还包括构造成保持基板的基板台; 定位器，其被构造成定位所述衬底台; 投影系统，被配置为将所述图案化的辐射束投影到所述基板的目标部分上; 衬底表面致动器，布置成接合面向投影系统的衬底的表面的一部分;以及位置控制器，其被配置为控制衬底台的位置，位置控制器布置成驱动定位器和衬底表面致动器。

    LITHOGRAPHIC APPARATUS COMPRISING A SUBSTRATE TABLE
    6.
    发明申请
    LITHOGRAPHIC APPARATUS COMPRISING A SUBSTRATE TABLE 有权
    包含基板的平面设备

    公开(公告)号：US20120300188A1

    公开(公告)日：2012-11-29

    申请号：US13477748

    申请日：2012-05-22

    申请人： Hans Butler ,  Jan Van Eijk ,  Sven Antoin Johan Hol ,  Johannes Petrus Martinus Bernardus Vermeulen ,  Yang-Shan Huang

    发明人： Hans Butler ,  Jan Van Eijk ,  Sven Antoin Johan Hol ,  Johannes Petrus Martinus Bernardus Vermeulen ,  Yang-Shan Huang

    IPC分类号： G03B27/60

    CPC分类号： G03F7/70783 ,  G03F7/70758

    摘要： A lithographic apparatus includes an illumination system configured to condition a radiation beam and a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam. The lithographic apparatus further includes a substrate table constructed to hold a substrate; a positioner constructed to position the substrate table; a projection system configured to project the patterned radiation beam onto a target portion of the substrate; a substrate surface actuator arranged to engage a part of a surface of the substrate facing the projection system, and a position controller configured to control a position of the substrate table, the position controller being arranged to drive the positioner and the substrate surface actuator.

    摘要翻译： 光刻设备包括被配置为调节辐射束和构造成支撑图案形成装置的支撑件的照明系统，所述图案形成装置能够在其横截面中赋予辐射束图案以形成图案化的辐射束。 所述光刻设备还包括构造成保持基板的基板台; 定位器，其被构造成定位所述衬底台; 投影系统，被配置为将所述图案化的辐射束投影到所述基板的目标部分上; 衬底表面致动器，布置成接合面向投影系统的衬底的表面的一部分;以及位置控制器，其被配置为控制衬底台的位置，位置控制器布置成驱动定位器和衬底表面致动器。

    IMPRINT LITHOGRAPHY APPARATUS
    7.
    发明申请
    IMPRINT LITHOGRAPHY APPARATUS 有权

    公开(公告)号：US20110008483A1

    公开(公告)日：2011-01-13

    申请号：US12821806

    申请日：2010-06-23

    申请人： Andre Bernardus Jeunink ,  Vadim Yevgenyevich Banine ,  Hans Butler ,  Engelbertus Antonius Fransiscus Van Der Pasch ,  Johannes Petrus Martinus Bernardus Vermeulen ,  Yvonne Wendela Kruijt-Stegeman

    发明人： Andre Bernardus Jeunink ,  Vadim Yevgenyevich Banine ,  Hans Butler ,  Engelbertus Antonius Fransiscus Van Der Pasch ,  Johannes Petrus Martinus Bernardus Vermeulen ,  Yvonne Wendela Kruijt-Stegeman

    IPC分类号： B29C59/00

    CPC分类号： G03F7/0002 ,  B82Y10/00 ,  B82Y40/00 ,  G03F9/00

    摘要： An imprint lithography apparatus is disclosed that includes a structure located away from a substrate holder and extending across the substrate holder, and such that an imprint template arrangement is, in use, located between the structure and the substrate holder, wherein the structure has one or more arrays of lines or one or more encoders, and the substrate or substrate holder and the imprint template have a corresponding one or more encoders that face towards one or more of the one or more arrays of lines or one or more arrays of lines that face towards one or more of the one or more encoders, and the configuration determination arrangement is configured to determine a relative configuration between the substrate or substrate holder and the structure, and/or a relative configuration between the imprint template arrangement and the structure, and/or a relative configuration between the imprint template arrangement and the substrate or substrate holder.

    摘要翻译： 公开了一种压印光刻设备，其包括远离衬底保持器并延伸穿过衬底保持器的结构，并且使得压印模板布置在使用中位于结构和衬底保持器之间，其中结构具有一个或 更多的线阵列或一个或多个编码器，并且衬底或衬底保持器和压印模板具有对应的一个或多个编码器，其面向一个或多个线阵列或一个或多个面阵列阵列 朝向一个或多个编码器中的一个或多个，并且配置确定装置被配置为确定衬底或衬底保持器与结构之间的相对配置，和/或压印模板布置和结构之间的相对配置，和/ 或压印模板布置和基板或基板保持器之间的相对配置。

    Multi-stage system, a control method therefor, and a lithographic apparatus
    10.
    发明授权
    Multi-stage system, a control method therefor, and a lithographic apparatus 有权
    多级系统及其控制方法以及光刻设备

    公开(公告)号：US08913229B2

    公开(公告)日：2014-12-16

    申请号：US13477669

    申请日：2012-05-22

    申请人： Hans Butler ,  Johannes Petrus Martinus Bernardus Vermeulen

    发明人： Hans Butler ,  Johannes Petrus Martinus Bernardus Vermeulen

    IPC分类号： G03F7/20

    CPC分类号： G03F7/70725 ,  G03F7/70716 ,  G05B19/418 ,  H02P25/06 ,  Y02P90/04

    摘要： A method for controlling a multi-stage system includes a stator extending parallel to a first direction; a first and second stage that are moveable relative to the stator; the stages being provided with a magnet system to generate a magnetic field, and the stator being provided with coils to interact with the magnetic fields to position the stages relative to the stator, the method including: determining the position of the stages; selecting a first and a second subset of coils that are capable of having a non-negligible interaction with the magnetic field of respectively the first and the second stage; activating the coils of both subsets, wherein activating the coils includes determining the coils that are part of both subsets; and excluding a coil that is part of both subsets from activating.

    摘要翻译： 一种用于控制多级系统的方法包括：平行于第一方向延伸的定子; 相对于定子可移动的第一和第二阶段; 所述阶段设置有磁体系统以产生磁场，并且所述定子设置有线圈以与所述磁场相互作用以相对于所述定子定位所述级，所述方法包括：确定所述级的位置; 选择能够分别与第一和第二阶段的磁场具有不可忽略的相互作用的线圈的第一和第二子集; 激活两个子集的线圈，其中激活线圈包括确定作为两个子集的一部分的线圈; 并排除作为两个子集的一部分激活的线圈。