公开(公告)号：US12033830B2

公开(公告)日：2024-07-09

申请号：US17944157

申请日：2022-09-13

Applicant: ASML Netherlands B.V.

Inventor： Weiming Ren ,  Xuerang Hu ,  Qingpo Xi ,  Xuedong Liu

IPC: H01J37/244 ,  H01J37/153 ,  H01J37/28

CPC classification number: H01J37/244 ,  H01J37/153 ,  H01J37/28 ,  H01J2237/0453 ,  H01J2237/24475 ,  H01J2237/2448

Abstract: Systems and methods of enhancing imaging resolution by reducing crosstalk between detection elements of a secondary charged-particle detector in a multi-beam apparatus are disclosed. The multi-beam apparatus may comprise an electro-optical system for projecting a plurality of secondary charged-particle beams from a sample onto a charged-particle detector. The electro-optical system may include a first pre-limit aperture plate comprising a first aperture configured to block peripheral charged-particles of the plurality of secondary charged-particle beams, and a beam-limit aperture array comprising a second aperture configured to trim the plurality of secondary charged-particle beams. The charged-particle detector may include a plurality of detection elements, wherein a detection element of the plurality of detection elements is associated with a corresponding trimmed beam of the plurality of secondary charged-particle beams.

公开(公告)号：US11961697B2

公开(公告)日：2024-04-16

申请号：US18144131

申请日：2023-05-05

Applicant: ASML Netherlands B.V.

Inventor： Xuerang Hu ,  Xuedong Liu ,  Weiming Ren ,  Zhong-Wei Chen

IPC: H01J37/09 ,  H01J37/12 ,  H01J37/14 ,  H01J37/147 ,  H01J37/15 ,  H01J37/153 ,  H01J37/28

CPC classification number: H01J37/09 ,  H01J37/12 ,  H01J37/1472 ,  H01J37/153 ,  H01J37/28 ,  H01J2237/0453 ,  H01J2237/1205 ,  H01J2237/1534 ,  H01J2237/24592 ,  H01J2237/2817

Abstract: A multi-beam apparatus for multi-beam inspection with an improved source conversion unit providing more beamlets with high electric safety, mechanical availability and mechanical stabilization has been disclosed. The source-conversion unit comprises an image-forming element array having a plurality of image-forming elements, an aberration compensator array having a plurality of micro-compensators, and a pre-bending element array with a plurality of pre-bending micro-deflectors. In each of the arrays, adjacent elements are placed in different layers, and one element may comprise two or more sub-elements placed in different layers. The sub-elements of a micro-compensator may have different functions such as micro-lens and micro-stigmators.

公开(公告)号：US11721521B2

公开(公告)日：2023-08-08

申请号：US17697842

申请日：2022-03-17

Applicant: ASML Netherlands B.V.

Inventor： Weiming Ren ,  Xuedong Liu ,  Xuerang Hu ,  Zhong-wei Chen

IPC: H01J37/31 ,  H01J37/14 ,  H01J37/30 ,  H01J37/28 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/317 ,  H01J37/147

CPC classification number: H01J37/3177 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/1471 ,  H01J37/1472 ,  H01J37/28 ,  H01J37/3007 ,  H01J2237/151 ,  H01J2237/1501 ,  H01J2237/1508 ,  H01J2237/2446 ,  H01J2237/2448 ,  H01J2237/24475 ,  H01J2237/2804 ,  H01J2237/2817

Abstract: The present disclosure proposes a crossover-forming deflector array of an electro-optical system for directing a plurality of electron beams onto an electron detection device. The crossover-forming deflector array includes a plurality of crossover-forming deflectors positioned at or at least near an image plane of a set of one or more electro-optical lenses of the electro-optical system, wherein each crossover-forming deflector is aligned with a corresponding electron beam of the plurality of electron beams.

公开(公告)号：US11569060B2

公开(公告)日：2023-01-31

申请号：US16651344

申请日：2018-09-25

Applicant: ASML Netherlands B.V.

Inventor： Xuedong Liu

IPC: H01J37/26 ,  H01J37/12 ,  H01J37/141 ,  H01J37/147 ,  H01J37/28

Abstract: Apparatus and methods for adjusting beam condition of charged particles are disclosed. According to certain embodiments, the apparatus includes one or more first multipole lenses displaced above an aperture, the one or more first multipole lenses being configured to adjust a beam current of a charged-particle beam passing through the aperture. The apparatus also includes one or more second multipole lenses displaced below the aperture, the one or more second multipole lenses being configured to adjust at least one of a spot size and a spot shape of the beam.

公开(公告)号：US11302514B2

公开(公告)日：2022-04-12

申请号：US16536284

申请日：2019-08-08

Applicant: ASML Netherlands B.V.

Inventor： Weiming Ren ,  Xuedong Liu ,  Xuerang Hu ,  Zong-wei Chen

IPC: H01J37/28 ,  H01J37/06 ,  H01J37/10 ,  H01J37/147

Abstract: Systems and methods for observing a sample in a multi-beam apparatus are disclosed. A charged particle optical system may include a deflector configured to form a virtual image of a charged particle source and a transfer lens configured to form a real image of the charged particle source on an image plane. The image plane may be formed at least near a beam separator that is configured to separate primary charged particles generated by the source and secondary charged particles generated by interaction of the primary charged particles with a sample. The image plane may be formed at a deflection plane of the beam separator. The multi-beam apparatus may include a charged-particle dispersion compensator to compensate dispersion of the beam separator. The image plane may be formed closer to the transfer lens than the beam separator, between the transfer lens and the charged-particle dispersion compensator.

公开(公告)号：US11289304B2

公开(公告)日：2022-03-29

申请号：US16608741

申请日：2018-04-04

Applicant: ASML Netherlands B.V.

Inventor： Xuerang Hu ,  Weiming Ren ,  Xuedong Liu ,  Zhong-wei Chen

IPC: H01J37/147 ,  H01J37/12 ,  H01J37/26

Abstract: Disclosed herein is an apparatus comprising: a first electrically conductive layer; a second electrically conductive layer; a plurality of optics element s between the first electrically conductive layer and the second electrically conductive layer, wherein the plurality of optics elements are configured to influence a plurality of beams of charged particles; a third electrically conductive layer between the first electrically conductive layer and the second electrically conductive layer; and an electrically insulating layer physically connected to the optics elements, wherein the electrically insulating layer is configured to electrically insulate the optics elements from the first electrically conductive layer, and the second electrically conductive layer.

公开(公告)号：US11107657B2

公开(公告)日：2021-08-31

申请号：US16866482

申请日：2020-05-04

Applicant: ASML Netherlands B.V.

Inventor： Weiming Ren ,  Shuai Li ,  Xuedong Liu ,  Zhongwei Chen

IPC: H01J37/28 ,  H01J37/147 ,  H01J37/05 ,  H01J37/063 ,  H01J37/304 ,  H01J29/51 ,  H01J37/12

Abstract: A multi-beam apparatus for observing a sample with high resolution and high throughput is proposed. In the apparatus, a source-conversion unit changes a single electron source into a virtual multi-source array, a primary projection imaging system projects the array to form plural probe spots on the sample, and a condenser lens adjusts the currents of the plural probe spots. In the source-conversion unit, the image-forming means is on the upstream of the beamlet-limit means, and thereby generating less scattered electrons. The image-forming means not only forms the virtual multi-source array, but also compensates the off-axis aberrations of the plurality of probe spots.

公开(公告)号：US11062877B2

公开(公告)日：2021-07-13

申请号：US16734219

申请日：2020-01-03

Applicant: ASML Netherlands B.V.

Inventor： Shuai Li ,  Weiming Ren ,  Xuedong Liu ,  Juying Dou ,  Xuerang Hu ,  Zhongwei Chen

IPC: H01J37/28 ,  H01J37/10 ,  H01J37/20 ,  H01J37/244

Abstract: A multi-beam apparatus for observing a sample with high resolution and high throughput and in flexibly varying observing conditions is proposed. The apparatus uses a movable collimating lens to flexibly vary the currents of the plural probe spots without influencing the intervals thereof, a new source-conversion unit to form the plural images of the single electron source and compensate off-axis aberrations of the plural probe spots with respect to observing conditions, and a pre-beamlet-forming means to reduce the strong Coulomb effect due to the primary-electron beam.

公开(公告)号：US20200051779A1

公开(公告)日：2020-02-13

申请号：US16536284

申请日：2019-08-08

Applicant: ASML Netherlands B.V.

Inventor： Weiming REN ,  Xuedong Liu ,  Xuerang Hu ,  Zong-wei Chen

IPC: H01J37/28 ,  H01J37/10 ,  H01J37/147 ,  H01J37/06

Abstract: Systems and methods for observing a sample in a multi-beam apparatus are disclosed. A charged particle optical system may include a deflector configured to form a virtual image of a charged particle source and a transfer lens configured to form a real image of the charged particle source on an image plane. The image plane may be formed at least near a beam separator that is configured to separate primary charged particles generated by the source and secondary charged particles generated by interaction of the primary charged particles with a sample. The image plane may be formed at a deflection plane of the beam separator. The multi-beam apparatus may include a charged-particle dispersion compensator to compensate dispersion of the beam separator. The image plane may be formed closer to the transfer lens than the beam separator, between the transfer lens and the charged-particle dispersion compensator.

公开(公告)号：US10395886B2

公开(公告)日：2019-08-27

申请号：US15216258

申请日：2016-07-21

Applicant: ASML Netherlands B.V.

Inventor： Weiming Ren ,  Xuedong Liu ,  Xuerang Hu ,  Zhongwei Chen

IPC: H01J37/14 ,  H01J37/147 ,  H01J37/06 ,  H01J37/10 ,  H01J37/28

Abstract: A multi-beam apparatus for observing a sample with high resolution and high throughput is proposed. In the apparatus, a source-conversion unit forms plural and parallel images of one single electron source by deflecting plural beamlets of a parallel primary-electron beam therefrom, and one objective lens focuses the plural deflected beamlets onto a sample surface and forms plural probe spots thereon. A movable condenser lens is used to collimate the primary-electron beam and vary the currents of the plural probe spots, a pre-beamlet-forming means weakens the Coulomb effect of the primary-electron beam, and the source-conversion unit minimizes the sizes of the plural probe spots by minimizing and compensating the off-axis aberrations of the objective lens and condenser lens.