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公开(公告)号：US20130004893A1
公开(公告)日：2013-01-03
申请号：US13341456
申请日：2011-12-30
申请人： Vipul Jain , Owendi Ongayi , Suzanne Coley , Anthony Zampini
发明人： Vipul Jain , Owendi Ongayi , Suzanne Coley , Anthony Zampini
摘要： Organic coating compositions, particularly antireflective coating compositions, are provided that comprise that comprise a component that comprises one or more parabanic acid moieties. Preferred compositions of the invention are useful to reduce reflection of exposing radiation from a substrate back into an overcoated photoresist layer and/or function as a planarizing, conformal or via-fill layer.
摘要翻译： 提供了有机涂料组合物，特别是抗反射涂料组合物，其包含包含一种或多种对映异构酸部分的组分。 本发明的优选组合物可用于减少来自衬底的曝光辐射反射回外涂光致抗蚀剂层的反射和/或作为平坦化，保形或通孔填充层的功能。
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公开(公告)号：US20110033801A1
公开(公告)日：2011-02-10
申请号：US12782397
申请日：2010-05-18
申请人： Anthony Zampini , Gerald B. Wayton , Vipul Jain , Cong Liu , Suzanne Coley , Owendi Ongayi
发明人： Anthony Zampini , Gerald B. Wayton , Vipul Jain , Cong Liu , Suzanne Coley , Owendi Ongayi
IPC分类号： G03F7/004 , C09D177/00 , G03F7/20
CPC分类号： G03F7/11 , C09D167/02 , G03F7/0045 , G03F7/091 , H01L21/0271
摘要： Coating compositions for use with an overcoated photoresist are provided where the coating composition comprises a resin containing cyanurate groups and hydrophobic groups. The coating composition can enhance resolution of an overcoated photoresist relief image.
摘要翻译： 提供用于外涂光致抗蚀剂的涂料组合物，其中涂料组合物包含含有氰尿酸酯基团和疏水基团的树脂。 涂料组合物可以增强外涂光致抗蚀剂浮雕图像的分辨率。
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公开(公告)号：US07700256B2
公开(公告)日：2010-04-20
申请号：US10313954
申请日：2002-12-06
申请人： George G. Barclay , Ashish Pandya , Wang Yueh , Anthony Zampini , Gary Ganghui Teng , Zhibiao Mao
发明人： George G. Barclay , Ashish Pandya , Wang Yueh , Anthony Zampini , Gary Ganghui Teng , Zhibiao Mao
CPC分类号： G03F7/039 , G03F7/0045 , Y10S430/106 , Y10S430/111
摘要： The present invention relates to new polymers that contain repeat units of phenol and photoacid-labile esters that contain an alicyclic group, preferably a bulky group that suitably may contain 7 to about 20 carbons, such as an alkyladamantyl, ethylfencyl, tricyclo decanyl, or pinanyl group. Polymers of the invention are useful as a component of chemically-amplified positive-acting resists.
摘要翻译： 本发明涉及包含苯酚重复单元和含有脂环族基团的光酸不稳定酯的新聚合物，优选适合含有7至约20个碳原子的大体积基团，例如烷基金刚烷基，乙基戊基，三环癸烷基或蒎烷基 组。 本发明的聚合物可用作化学增效正性抗蚀剂的组分。
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公开(公告)号：US07605439B2
公开(公告)日：2009-10-20
申请号：US11512140
申请日：2006-08-29
IPC分类号： H01L21/76
CPC分类号： G03F7/0752 , G03F7/0757 , G03F7/091 , G03F7/11 , H01L21/0276 , H01L21/3081
摘要： The invention includes new organic-containing compositions that can function as an antireflective layer for an overcoated photoresist. Compositions of the invention also can serve effectively as a hard mask layer by exhibiting a sufficient plasma etch selectivity from an undercoated layer. Preferred compositions of the invention have a high Si content and comprise a blend of distinct resins.
摘要翻译： 本发明包括可用作外涂光致抗蚀剂的抗反射层的新的含有机组合物。 通过从底涂层显示出足够的等离子体蚀刻选择性，本发明的组合物也可有效地用作硬掩模层。 本发明的优选组合物具有高Si含量并且包含不同树脂的共混物。
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公开(公告)号：US07390609B2
公开(公告)日：2008-06-24
申请号：US10793427
申请日：2004-03-03
申请人： Anthony Zampini , Tao Zhang , Jaihyoung Lee
发明人： Anthony Zampini , Tao Zhang , Jaihyoung Lee
CPC分类号： G03F7/0757 , C08G77/24 , G03F7/0046 , G03F7/0382 , G03F7/0392 , G03F7/0395 , G03F7/0397 , Y10S430/106 , Y10S430/108 , Y10S430/115
摘要： New polymers are provided that have non-carbon tetravalent species (Si, Ti, Ge, Zr, Sn) and photoimageable compositions that contain such polymers. Preferred polymers are organic, e.g. one or more polymer repeat units comprise carbon atom(s). Particularly preferred are polymers that comprise SiO2 or TiO2 repeat units and which can be highly useful as a resin component of resists imaged at short wavelengths such as sub-300 nm and sub-200 nm.
摘要翻译： 提供具有含有这种聚合物的非碳四价物质（Si，Ti，Ge，Zr，Sn）和可光成像的组合物的新型聚合物。 优选的聚合物是有机的。 一个或多个聚合物重复单元包含碳原子。 特别优选的是包含SiO 2或TiO 2重复单元的聚合物，其可以作为在短波长例如亚300nm成像的抗蚀剂的树脂组分非常有用， 亚200 nm。
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公开(公告)号：US20070057253A1
公开(公告)日：2007-03-15
申请号：US11512140
申请日：2006-08-29
申请人： Dana Gronbeck , Amy Kwok , Chi Truong , Michael Gallagher , Anthony Zampini
发明人： Dana Gronbeck , Amy Kwok , Chi Truong , Michael Gallagher , Anthony Zampini
CPC分类号： G03F7/0752 , G03F7/0757 , G03F7/091 , G03F7/11 , H01L21/0276 , H01L21/3081
摘要： The invention includes new organic-containing compositions that can finction as. an antireflective layer for an overcoated photoresist. Compositions of the invention also can serve effectively as a hard mask layer by exhibiting a sufficient plasma etch selectivity from an undercoated layer. Preferred compositions of the invention have a high Si content and comprise a blend of distinct resins.
摘要翻译： 本发明包括新的含有机物的组合物，其可以作为。 用于外涂光致抗蚀剂的抗反射层。 通过从底涂层显示出足够的等离子体蚀刻选择性，本发明的组合物也可有效地用作硬掩模层。 本发明的优选组合物具有高Si含量并且包含不同树脂的共混物。
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公开(公告)号：US20060228646A1
公开(公告)日：2006-10-12
申请号：US11385012
申请日：2006-03-20
申请人： Anthony Zampini , Edward Pavelchek
发明人： Anthony Zampini , Edward Pavelchek
IPC分类号： G03C1/00
CPC分类号： G03F7/091 , Y10T428/31786
摘要： Organic coating composition are provided including antireflective coating compositions that can reduce reflection of exposing radiation from a substrate back into an overcoated photoresist layer and/or function as a planarizing or via-fill layer. Preferred compositions of the invention comprise contain a crosslinker component that is resistant to sublimination or other migration crosslinker from the composition coating layer during lithographic processing.
摘要翻译： 提供了有机涂料组合物，包括抗反射涂料组合物，其可以减少从衬底暴露辐射的反射回到外涂光致抗蚀剂层和/或作为平坦化或通孔填充层的功能。 本发明的优选组合物包括在光刻加工期间从组合物涂层中含有对升华或其它迁移交联剂具有抗性的交联剂组分。
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公开(公告)号：US20060147730A1
公开(公告)日：2006-07-06
申请号：US11235669
申请日：2005-09-26
IPC分类号： B32B9/04
CPC分类号： H01L21/02304 , H01L21/02118 , H01L21/02282 , H01L21/3121 , H01L27/101 , H01L27/11502 , H01L28/55 , Y10T428/31663
摘要： A silane adhesion promoter composition is useful in producing a ferroelectric polymer film that is especially suitable for use in a data processing device. Also disclosed is a film stack and a data processing device comprising a ferroelectric film produced using the silane adhesion promoter
摘要翻译： 硅烷粘合促进剂组合物可用于制造特别适用于数据处理装置的铁电聚合物膜。 还公开了一种膜堆叠和数据处理装置，其包括使用硅烷粘合促进剂制造的铁电体膜
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公开(公告)号：US06492086B1
公开(公告)日：2002-12-10
申请号：US09414738
申请日：1999-10-08
申请人： George G. Barclay , Ashish Pandya , Wang Yueh , Anthony Zampini , Gary Ganghui Teng , Zhibiao Mao
发明人： George G. Barclay , Ashish Pandya , Wang Yueh , Anthony Zampini , Gary Ganghui Teng , Zhibiao Mao
IPC分类号： G03F7039
CPC分类号： G03F7/039 , G03F7/0045 , Y10S430/106 , Y10S430/111
摘要： The present invention relates to new polymers that contain repeat units of phenol and photoacid-labile esters that contain an alicyclic group, preferably a bulky group that suitably may contain 7 to about 20 carbons, such as an alkyladamantyl, ethylfencyl, tricyclo decanyl, or pinanyl group. Polymers of the invention are useful as a component of chemically-amplified positive-acting resists.
摘要翻译： 本发明涉及包含苯酚重复单元和含有脂环族基团的光酸不稳定酯的新聚合物，优选适合含有7至约20个碳原子的大体积基团，例如烷基金刚烷基，乙基戊基，三环癸烷基或蒎烷基 组。 本发明的聚合物可用作化学增效正性抗蚀剂的组分。
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50.发明授权Purification process of novolar resins using acid treated chelating cation exchange resin 失效使用酸处理的螯合阳离子交换树脂对酚醛树脂的净化过程
公开(公告)号：US5679766A
公开(公告)日：1997-10-21
申请号：US163895
申请日：1993-12-07
申请人： Anthony Zampini
发明人： Anthony Zampini
CPC分类号： G03F7/0236 , C08F6/003 , C08G8/04
摘要： The invention is for a process of removal of dissolved cation contaminants from a resin solution. The process of the invention involves providing a chelating ion exchange resin modified by treatment with an acid and contact of said solution with said modified exchange resin for a time sufficient to remove ionic metal impurities. The invention is useful for removal of ionic contaminants from resin solutions used in the preparation of photoresists.
摘要翻译： 本发明是用于从树脂溶液中除去溶解的阳离子污染物的方法。 本发明的方法涉及提供通过用酸处理改性的螯合离子交换树脂，并将所述溶液与所述改性交换树脂接触足以除去离子金属杂质的时间。 本发明可用于从用于制备光致抗蚀剂的树脂溶液中除去离子污染物。
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