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54 条记录 (耗时 0.029 秒)

    Laser beam positioning system
    42.
    发明授权
    Laser beam positioning system 有权
    激光束定位系统

    公开(公告)号：US08692151B2

    公开(公告)日：2014-04-08

    申请号：US13076231

    申请日：2011-03-30

    申请人： Leonid M. Tertitski ,  Krishna Kumar Kuttannair ,  Aaron Muir Hunter ,  Stephen Moffatt

    发明人： Leonid M. Tertitski ,  Krishna Kumar Kuttannair ,  Aaron Muir Hunter ,  Stephen Moffatt

    IPC分类号： H01L21/00

    CPC分类号： B23K26/127 ,  B23K26/0006 ,  B23K26/0823 ,  B23K26/0876 ,  B23K26/12 ,  B23K26/352 ,  B23K2101/40 ,  B23K2103/52 ,  B23K2103/56 ,  Y10T29/41

    摘要： A method and apparatus for targeting a beam of radiation is provided. A beam steering mirror and a beam capture mirror are movably disposed along an optical pathway. A controller moves the beam steering mirror and the beam capture mirror in an x-y plane, and rotates the mirrors, to target the beam to a target location on a surface, while keeping the optical path length substantially constant for all target locations on the surface. The surface is rotated by a rotational actuator to bring all target locations to positions accessible by the beam targeting optics. Imprecision in targeting and optical path length may be compensated by providing an actuated aperture at the beam entry point and/or a variable focus lens with an optical range finding detector, all in communication with the controller.

    摘要翻译： 提供了一种用于瞄准辐射束的方法和装置。 光束导向镜和光束捕获镜沿着光学路径可移动地设置。 控制器将光束导向反射镜和光束捕获镜移动到x-y平面中，并且使反射镜旋转以将光束瞄准到表面上的目标位置，同时保持光学表面上的所有目标位置的光程长度基本恒定。 该表面由旋转致动器旋转以将所有目标位置移动到由光束瞄准光学器件接近的位置。 可以通过在光束入口点处提供致动孔径和/或具有光学测距探测器的可变焦距透镜来全部与控制器通信来补偿瞄准和光路长度的不精确性。

    APPARATUS AND METHOD FOR MEASURING RADIATION ENERGY DURING THERMAL PROCESSING
    44.
    发明申请
    APPARATUS AND METHOD FOR MEASURING RADIATION ENERGY DURING THERMAL PROCESSING 有权
    用于在热处理过程中测量辐射能量的装置和方法

    公开(公告)号：US20130280824A1

    公开(公告)日：2013-10-24

    申请号：US13903387

    申请日：2013-05-28

    申请人： Joseph M. Ranish ,  Blake Koelmel ,  Aaron Muir Hunter

    发明人： Joseph M. Ranish ,  Blake Koelmel ,  Aaron Muir Hunter

    IPC分类号： H01L21/66

    CPC分类号： H01L22/10 ,  H01L21/67115 ,  H01L21/67248

    摘要： Embodiments of the present invention provide apparatus and method for reducing heating source radiation influence in temperature measurement during thermal processing. In one embodiment of the present invention, background radiant energy, such as an energy source of a thermal processing chamber, is marked within a selected spectrum, a characteristic of the background is then determined by measuring radiant energy at a reference wavelength within the selected spectrum and a comparing wavelength just outside the selected spectrum.

    摘要翻译： 本发明的实施例提供了用于在热处理期间减少加热源辐射对温度测量的影响的装置和方法。 在本发明的一个实施例中，将背景辐射能（例如热处理室的能量源）标记在所选择的光谱内，然后通过测量所选光谱内的参考波长的辐射能来确定背景的特性 以及刚好在所选频谱之外的比较波长。

    LASER NOISE ELIMINATION IN TRANSMISSION THERMOMETRY
    45.
    发明申请
    LASER NOISE ELIMINATION IN TRANSMISSION THERMOMETRY 有权
    传感器热噪声消除噪声

    公开(公告)号：US20130264316A1

    公开(公告)日：2013-10-10

    申请号：US13789982

    申请日：2013-03-08

    申请人： Jiping Li ,  Aaron Muir Hunter ,  Thomas Haw

    发明人： Jiping Li ,  Aaron Muir Hunter ,  Thomas Haw

    IPC分类号： B23K26/00 ,  G01J5/02 ,  G01N21/59

    摘要： Apparatus and methods for measuring the temperature of a substrate are disclosed. The apparatus includes a source of temperature-indicating radiation, a detector for the temperature-indicating radiation, and a decorrelator disposed in an optical path between the source of temperature-indicating radiation and the detector for the temperature-indicating radiation. The decorrelator may be a broadband amplifier and/or a mode scrambler. A broadband amplifier may be a broadband laser, Bragg grating, a fiber Bragg grating, a Raman amplifier, a Brillouin amplifier, or combinations thereof. The decorrelator is selected to emit radiation that is transmitted, at least in part, by the substrate being monitored. The source is matched to the decorrelator such that the emission spectrum of the source is within the gain bandwidth of the decorrelator, if the decorrelator is a gain-driven device.

    摘要翻译： 公开了用于测量衬底温度的装置和方法。 该装置包括温度指示辐射源，用于温度指示辐射的检测器，以及设置在温度指示辐射源和温度指示辐射检测器之间的光路中的去相关器。 解相关器可以是宽带放大器和/或模式扰频器。 宽带放大器可以是宽带激光器，布拉格光栅，光纤布拉格光栅，拉曼放大器，布里渊放大器或其组合。 选择去相关器以发射至少部分由被监测的衬底透射的辐射。 如果解相关器是增益驱动装置，则源与去相关器匹配，使得源的发射光谱在解相关器的增益带宽内。

    Methods of solid phase recrystallization of thin film using pulse train annealing method
    48.
    发明授权
    Methods of solid phase recrystallization of thin film using pulse train annealing method 有权
    使用脉冲串退火法对薄膜进行固相重结晶的方法

    公开(公告)号：US08247317B2

    公开(公告)日：2012-08-21

    申请号：US12764723

    申请日：2010-04-21

    申请人： Stephen Moffatt ,  Aaron Muir Hunter ,  Bruce E. Adams

    发明人： Stephen Moffatt ,  Aaron Muir Hunter ,  Bruce E. Adams

    IPC分类号： H01L21/20

    CPC分类号： H01L21/02686 ,  C30B13/24 ,  C30B29/06 ,  H01L21/02521

    摘要： Embodiments of the present invention provide methods of solid phase recrystallization of thin film using a plurality of pulses of electromagnetic energy. In one embodiment, the methods of the present invention may be used to anneal an entire substrate surface or selected regions of a surface of a substrate by delivering a plurality of pluses of energy to a crystalline seed region or layer upon which an amorphous layer is deposited to recrystallize the amorphous layer so that it has the same grain structure and crystal orientation as that of the underlying crystalline seed region or layer.

    摘要翻译： 本发明的实施例提供使用多个电磁能脉冲进行薄膜固相重结晶的方法。 在一个实施例中，本发明的方法可以用于通过将多个能量递送到沉积非晶层的结晶种子区域或层来退火整个衬底表面或衬底的表面的选定区域 使非晶层重结晶，使其具有与下面的结晶种子区域或层相同的晶粒结构和晶体取向。

    Pyrometer for laser annealing system
    49.
    发明授权
    Pyrometer for laser annealing system 有权
    激光退火系统用高温计

    公开(公告)号：US08232503B2

    公开(公告)日：2012-07-31

    申请号：US12886809

    申请日：2010-09-21

    申请人： Jiping Li ,  Bruce E. Adams ,  Timothy N. Thomas ,  Aaron Muir Hunter ,  Abhilash J. Mayur ,  Rajesh S. Ramanujam

    发明人： Jiping Li ,  Bruce E. Adams ,  Timothy N. Thomas ,  Aaron Muir Hunter ,  Abhilash J. Mayur ,  Rajesh S. Ramanujam

    IPC分类号： B23K26/08

    CPC分类号： B23K26/0665 ,  B23K26/03 ,  B23K26/032 ,  B23K26/034 ,  B23K26/18 ,  B23K2101/40

    摘要： In a laser annealing system for workpieces such as semiconductor wafers, a pyrometer wavelength response band is established within a narrow window lying between the laser emission band and a fluorescence emission band from the optical components of the laser system, the pyrometer response band lying in a wavelength region at which the optical absorber layer on the workpiece has an optical absorption coefficient as great as or greater than the underlying workpiece. A multi-layer razor-edge interference filter having a 5-8 nm wavelength cut-off edge transition provides the cut-off of the laser emission at the bottom end of the pyrometer response band.

    摘要翻译： 在用于诸如半导体晶片的工件的激光退火系统中，在位于激光发射带和来自激光系统的光学部件的荧光发射带之间的狭窄窗口内建立高温计波长响应带，高温计响应带位于 工件上的光吸收层的光吸收系数大于或大于下面工件的波长区域。 具有5-8nm波长截止边缘跃迁的多层剃刀边缘干涉滤光器提供在高温计响应带的底端处的激光发射的截止。