RINSE SOLUTION FOR LITHOGRAPHY AND PATTERN FORMATION METHOD EMPLOYING THE SAME
    41.
    发明申请
    RINSE SOLUTION FOR LITHOGRAPHY AND PATTERN FORMATION METHOD EMPLOYING THE SAME 审中-公开
    用于使用其的图形和图案形成方法的RINSE解决方案

    公开(公告)号:US20130164694A1

    公开(公告)日:2013-06-27

    申请号:US13812737

    申请日:2011-08-09

    IPC分类号: G03F7/40 G03F7/20

    CPC分类号: G03F7/405

    摘要: The present invention provides a rinse solution for lithography and a pattern formation method using the solution. They can improve prevention of both the pattern collapse and the melting at the same time. The solution contains water and a particular nitrogen-containing compound having an organic group, such as, alkyl amine or the like. The rinse solution may further contain a nonionic surfactant, if necessary.

    摘要翻译: 本发明提供了一种用于光刻的冲洗溶液和使用该溶液的图案形成方法。 它们可以同时改善模式崩溃和熔化的预防。 溶液含有水和具有有机基团的特定含氮化合物,例如烷基胺等。 如果需要,漂洗溶液还可以含有非离子表面活性剂。

    Negative photoresist compositions
    42.
    发明申请
    Negative photoresist compositions 有权
    负光致抗蚀剂组合物

    公开(公告)号:US20070231735A1

    公开(公告)日:2007-10-04

    申请号:US11390716

    申请日:2006-03-28

    IPC分类号: G03C1/00

    摘要: The present invention relates to a negative photoresist composition comprising, a) at least one alkali-soluble polymer, where the polymer comprises at least one unit of structure 1, where, R′ is selected independently from hydrogen, (C1-C4)alkyl, chlorine, bromine and m is an integer from 1 to 4; b) at least one monomer of structure 1, where, W is a multivalent linking group, R1 to R6 are independently selected from hydrogen, hydroxyl, (C1-C20) alkyl and chlorine, X1 and X2 are independently oxygen or N—R7, where R7 is hydrogen or (C1-C20) alkyl, and n is and integer equal to or greater than 1, and c) at least one photoinitiator. The invention also relates to a process for imaging the negative photoresist composition.

    摘要翻译: 本发明涉及负性光致抗蚀剂组合物,其包含:a)至少一种碱溶性聚合物,其中聚合物包含至少一个结构单元1,其中R'独立地选自氢,(C 1 < 烷基,氯,溴,m为1至4的整数; b)结构1的至少一种单体,其中W是多价连接基团,R 1至R 6独立地选自氢,羟基,(C

    Positive-acting radiation-sensitive mixture and recording material
produced therewith
    43.
    发明授权
    Positive-acting radiation-sensitive mixture and recording material produced therewith 失效
    正向辐射敏感性混合物和由其制成的记录材料

    公开(公告)号:US5498506A

    公开(公告)日:1996-03-12

    申请号:US362491

    申请日:1995-01-09

    摘要: The invention relates to a radiation-sensitive mixture comprising a) a binder which is insoluble in water but soluble or at least swellable in aqueous alkaline solution, b) a compound which forms an acid under the action of actinic radiation and c) a compound which contains at least one C-O-C or C-O-Si bond which can be cleaved by an acid, wherein said mixture additionally contains 0.1 to 70 mol %, based on the maximum amount of acid which can theoretically be produced from the compound b), of at least one compound having at least one nitrogen atom in an amine or amide bond. The mixture is used in particular in the production of electronic components. The invention also relates to a recording material having a substrate and a radiation-sensitive coating.

    摘要翻译: PCT No.PCT / EP93 / 01430 Sec。 371日期1995年1月9日 102(e)1995年4月9日PCT PCT 1993年6月7日PCT公布。 出版物WO94 / 01805 日本1990年1月20日。本发明涉及一种辐射敏感性混合物,其包含a)不溶于水但在碱性水溶液中可溶或至少可溶胀的粘合剂,b)在光化反应的作用下形成酸的化合物 辐射和c)含有至少一个可被酸裂解的COC或CO-Si键的化合物,其中所述混合物另外含有0.1-70mol%,基于理论上可从 化合物b),至少一种在胺或酰胺键中具有至少一个氮原子的化合物。 该混合物特别用于生产电子元件。 本发明还涉及具有基底和辐射敏感性涂层的记录材料。

    Positive radiation-sensitive mixture, and radiation-sensitive recording
material produced therefrom for high-energy radiation
    46.
    发明授权
    Positive radiation-sensitive mixture, and radiation-sensitive recording material produced therefrom for high-energy radiation 失效
    积极的辐射敏感性混合物和用于高能量辐射的辐射敏感记录材料

    公开(公告)号:US5217843A

    公开(公告)日:1993-06-08

    申请号:US491817

    申请日:1990-03-12

    CPC分类号: G03F7/0045

    摘要: A positive radiation-sensitive mixture is disclosed which contains a compound which forms an acid under the action of high-energy radiation, and an acid-cleavable compound, wherein the compound which forms an acid contains aliphatically bound halogen (chlorine or bromine) and has a pK.sub.a value of less than about 12 or is a derivative of a compound having such a pK.sub.a value which can be converted into the free compound by acid catalysis. A positive recording material and a process for recording high-energy radiation using the material are also disclosed. The mixture, and in particular the recording material produced therefrom, has relatively high sensitivity and improved resolution and, in addition, does not exhibit image fogging after development.

    摘要翻译: 公开了一种阳离子敏感性混合物,其包含在高能量辐射的作用下形成酸的化合物和酸可分解的化合物,其中形成酸的化合物含有脂族结合的卤素(氯或溴)并具有 pKa值小于约12,或者是具有这样的pKa值的化合物的衍生物,其可以通过酸催化转化成游离化合物。 还公开了正记录材料和使用该材料记录高能辐射的方法。 混合物,特别是由其制备的记录材料具有相对高的灵敏度和改进的分辨率,此外,显影后不会发生图像起雾。

    Heterocyclic compounds containing 4,6-bis-trichloromethyl-s-triazin-2-ly
groups
    48.
    发明授权
    Heterocyclic compounds containing 4,6-bis-trichloromethyl-s-triazin-2-ly groups 失效
    含有4,6-BIS-TRICHLOROMETHYL-S-TRIAZIN-2-LY组的杂环化合物

    公开(公告)号:US5055579A

    公开(公告)日:1991-10-08

    申请号:US317595

    申请日:1989-03-01

    摘要: Compounds of general formula I are disclosed ##STR1## wherein L denotes a hydrogen atom, an aryl radial or a substituent of the formula ##STR2## M denotes an alkylene radical or alkenylene radical or a 1,2-arylene radical,Q denotes a sulfur, selenium or oxygen atom, a dialkylmethylene group, an alken 1,2-ylene radical, a 1,2-phenylene radical or an N-R.sup.1 group,denotes an alkyl, aralkyl, aryloxyalkyl or alkoxyalkyl radical,R.sup.2 and R.sup.3 denote a hydrogen atom or a 4,6-bis-trichloromethyl-s-triazin-2-yl group, andn is 0 or 1.The compounds are suitable for use as photoinitiators in photosensitive systems that are induced to reaction by free radicals or acid cations. The compounds are characterized by high sensitivity in the visible spectral region.

    摘要翻译: 公开了通式I的化合物,其中L表示氢原子,芳基放射状或式的取代基M表示亚烷基或亚烯基或1,2-亚芳基,Q 表示硫,硒或氧原子,二烷基亚甲基,烯1,2-亚基,1,2-亚苯基或N-R 1基,表示烷基,芳烷基,芳氧基烷基或烷氧基烷基,R 2和R 3 表示氢原子或4,6-双 - 三氯甲基-s-三嗪-2-基,n为0或1.该化合物适合用作感光体系中的光引发剂,其被诱导自由基反应或 酸性阳离子。 该化合物的特征在于可见光谱区域的高灵敏度。

    Polyvinyl acetal with hydroxy aliphatic acetal groups useful in
photosensitive negative working compositions
    49.
    发明授权
    Polyvinyl acetal with hydroxy aliphatic acetal groups useful in photosensitive negative working compositions 失效
    具有用于感光负性组合物的羟基脂肪族缩醛基的聚乙烯醇缩醛

    公开(公告)号:US4940646A

    公开(公告)日:1990-07-10

    申请号:US135316

    申请日:1987-12-21

    申请人: Georg Pawlowski

    发明人: Georg Pawlowski

    摘要: A polyvinyl acetal is described which contains 4 to 40 mol-% vinyl alcohol units, 1 to 20 mol-% vinyl acetate units, 0 to 85 mol-% vinyl acetal units derived from an aldehyde free of OH groups and 1 to 85 mol-% vinyl acetal units derived from an aldehyde containing OH groups. The polymer is suitable as binder for photosensitive mixtures, in particular for the preparation of printing plates and photoresists. The layers obtained therewith can be developed with neutral or weakly alkaline, purely aqueous solutions and produce printing plates with a high print run performance and good ink receptivity.

    摘要翻译: 描述了一种聚乙烯醇缩醛,其包含4至40mol%的乙烯醇单元,1至20mol%的乙酸乙烯酯单元,0至85mol%的乙烯基缩醛单元,其衍生自不含OH基团的醛和1至85mol- 衍生自含OH基团的醛的乙烯基缩醛单元。 该聚合物适用于光敏混合物的粘合剂,特别是用于制备印刷版和光致抗蚀剂。 由此获得的层可以用中性或弱碱性纯水溶液显影,并产生具有高印刷运行性能和良好的油墨接受性的印刷版。

    Light-sensitive diazonium resin mixture and light-sensitive diazonium
resin containing recording material with organic peroxide compound
    50.
    发明授权
    Light-sensitive diazonium resin mixture and light-sensitive diazonium resin containing recording material with organic peroxide compound 失效
    光敏重氮树脂混合物和含有有机过氧化物的记录材料的感光重氮树脂

    公开(公告)号:US4828959A

    公开(公告)日:1989-05-09

    申请号:US53011

    申请日:1987-05-22

    CPC分类号: G03F7/0166

    摘要: A light-sensitive mixture that contains a diazonium salt polycondensation product, a polymeric binder and an organic peroxide which has a scorch temperature of at least 100.degree. C. and, above this temperaure, is capable of forming free radicals is especially useful for the preparation of planographic printing plates, the print run of which can be extended by burning-in the exposed and developed plate. The light-sensitive mixture has a long storage life in the dark.

    摘要翻译: 含有重氮盐缩聚产物,聚合物粘合剂和有机过氧化物的光敏混合物,其焦烧温度至少为100℃,高于该温度,能够形成自由基特别适用于制备 的平版印刷版,其印刷版可以通过在暴露和显影的板中燃烧而延长。 光敏混合物在黑暗中具有长的储存寿命。