摘要:
A radiation-sensitive polymer and a mixture containing this radiation-sensitive polymer as a binder are disclosed. A process for the preparation of the radiation-sensitive polymer binder and a positive-working radiation-sensitive recording material which is prepared using the radiation-sensitive mixture are also disclosed.
摘要:
Polyfunctional compounds containing .alpha.-diazo-.beta.-keto ester units and sulfonate units are disclosed. The polyfunctional compounds have high sensitivity in the deep UV and high thermal stability. Processes for producing the compounds are disclosed. A preferred process first synthesizes .beta.-ketoester/sulfonate precursors and then uses diazo transfer to convert the precursors into the novel compounds. Radiation-sensitive mixtures containing the compounds are also disclosed.
摘要:
A positive-working radiation-sensitive mixture is disclosed which contains as essential constituents:a) an .alpha.-carbonyl-.alpha.-sulfonyl-diazomethane, which forms a strong acid on irradiation, of the general formula I ##STR1## in which R.sup.1 and R.sup.2, independently of one another, denote an alkyl-, cycloalkyl-, aryl- or heteroaryl radicalb) a compound having at least one C--O--C or C--O--Si bond which can be cleaved by acid, andc) a water-insoluble binder which is soluble or at least swellable in aqueous-alkaline solutions.The radiation-sensitive mixture according to the invention is notable for a high sensitivity over a wide spectral range. It also exhibits a high thermal stability and does not form any corrosive photoylsis products on exposure to light.
摘要:
Radiation-sensitive polymers, a mixture containing these radiation-sensitive polymers as binder, and a process for the preparation of the radiation-sensitive polymer binders are disclosed. A positive radiation-sensitive recording material containing the radiation-sensitive polymer is also disclosed.
摘要:
A positive-working radiation-sensitive mixture is disclosed which contains as essential constituents:a) an .alpha.,.alpha.-bis(sulfonyl)diazomethane, which forms a strong acid on irradiation, of the general formula ##STR1## in which R is an optionally substituted alkyl, cycloalkyl, aryl or heteroaryl radical,b) a compound having at least one C--O--C or C--O--Si--bond which can be cleaved by acid, andc) a water-insoluble binder which is soluble or at least swellable in aqueous alkaline solutions.The radiation-sensitive mixture according to the invention is notable for a high sensitivity over a wide spectral range. It also exhibits a high thermal stability and does not form any corrosive photolysis products on exposure to light.
摘要:
A positive-working radiation-sensitive mixture is described which essentially contains a photoactive component and a water-insoluble binder which is soluble, or at least swellable, in aqueous alkaline solution, wherein a compound is used, as photoactive component, which contains .alpha.-diazo-.beta.-keto ester units and sulfonate units of the formula I ##STR1## in which R.sup.1 and R.sup.2, independently of one another, are an unsubstituted or substituted aliphatic, cycloaliphatic, araliphatic or aromatic radical having 4 to 20 carbon atoms, it being possible for individual CH.sub.2 groups to be replaced by oxygen or sulfur atoms or by N or NH groups and/or contain keto groups,X is an unsubstituted or substituted aliphatic, cycloaliphatic, carbocyclic, heterocyclic or araliphatic radical having 2 to 22 carbon atoms, it being possible for individual CH.sub.2 groups to be replaced by oxygen or sulfur atoms or by the groups --NR.sup.3 --, --C(O)--0--, --C(O)--NR.sup.3 --, ##STR2## --NR.sup.3 --C(O)--NR.sup.4 --, --O--C(O)--NR.sup.3 --, ##STR3## or --O--C(O)--O--, or CH groups to be replaced by ##STR4## in which R.sup.3 and R.sup.4, independently of one another, are hydrogen or an unsubstituted or substituted aliphatic, carbocyclic or araliphatic radical,m is an integer from 3 to 8,n is an integer from 1 to 3, and m>n.The radiation-sensitive mixture is especially suitable for exposure to radiation having a wavelength of about 190 to 300 nm.
摘要:
A positively operating radiation-sensitive mixture comprising a binder which is insoluble in water but soluble or at least swellable in aqueous alkaline solution, and as a photoactive component a polyfunctional .alpha.-diazo-.beta.-keto ester of the general formula I ##STR1## in which R.sup.1 denotes an aliphatic, cycloaliphatic or araliphatic or aromatic radical having 4 to 20 carbon atoms, in which individual CH.sub.2 groups can be replaced by oxygen or sulfur atoms or by ##STR2## or NH groups and/or contain keto groups, X denotes an aliphatic, cycloaliphatic, carbocyclic, heterocyclic or araliphatic radical having 2 to 22 carbon atoms, in which individual CH.sub.2 groups can be replaced by oxygen or sulfur atoms or by the groups --NR.sup.2 --, --C(O)--O--, --C(O)--NR.sup.2 --, --C(O)-- ##STR3## --NR.sup.2 --C(O)--NR.sup.3 --, --O--C(O)--NR.sup.2 --, --C(O)-- ##STR4## or --O--C(O)--O--, or CH groups can be replaced by ##STR5## in which R.sup.2 and R.sup.3 independently of one another represent hydrogen or an aliphatic, carbocyclic or araliphatic radical,m denotes an integer from 2 to 10 andn denotes an integer from 0 to 2, whereinm-n is .gtoreq.2,is described.The radiation-sensitive mixture is particularly suitable for exposure using radiation of wavelength 190 to 300 nm.
摘要:
Compounds having repeating units of the formula I ##STR1## in which R.sup.1 is an alkylene, cycloalkylene, alkenylene, alkynylene, or arylenebisalkyl group, in which one or more aliphatic CH.sub.2 groups may be replaced by oxygen or sulfur atoms,R.sup.2 is an alkyl, alkenyl, alkynyl, cycloalkyl, alkoxyalkyl, aryl, aralkyl or aryloxyalkyl radical,R.sup.3 is an alkyl or aryl radical,X is --CO--, --O--CO-- or --NH--CO--, andn is an integer greater than 1, especially from 3 to 50.are cleavable by acid and, in combination with photolytic acid donors and alkali-soluble binders, are constituents of positive-working mixtures which are used especially in recording materials for UV radiation and high-energy radiation. The materials are distinguished by a high resolution in conjunction with high image contrast.
摘要:
A negative-working radiation-sensitive mixture containinga) a compound which contains at least one --CBr.sub.3 group bound to an atom not linked in turn to a hydrogen atom,b) an alkoxymethylated melamine andc) a water-insoluble polymeric binder which is soluble, or at least swellable, in aqueous alkaline solutions and contains phenolic OH groups,wherein(1) the mixture has an absorption of
摘要:
Ligomeric sulfonic acid derivatives having repeating units of the formula I ##STR1## in which R.sup.1 is an alkyl, haloalkyl or aryl radical,R.sup.2 is a hydrogen atom, an alkyl, alkenyl or aryl radical or the group (R.sup.1 --SO.sub.2 --O--).sub.n X--,R.sup.3 is a cycloalkylenedialkyl, cycloalkenylenedialkyl, arylenedialkyl, heteroarylenedialkyl group, alkylene, alkenylene, alkynylene, cycloalkylene or arylene group,X is an alkylene, cycloalkylene or arylene group Y is O, S, CO, CO--O, SO.sub.2, SO.sub.2 --O, NR.sup.4, CO--NH, O--CO--NR.sup.5, NH--CO--NR.sup.5 or NR.sup.5 --CO--O,Z is O, CO--NR.sup.6, O--CO--NR.sup.6 or NH--CO--NR.sup.6,R.sup.4 is an acyl radical,R.sup.5 is a hydrogen atom or an alkyl-, cycloalkyl, alkenyl, alkynyl or aryl radical,R.sup.6 is an alkyl, cycloalkyl, alkenyl, alkynyl or aryl radical,k is 0, 1, 2, 3 or 4,m is an integer greater than 1 andn is 1, 2 or 3,generate sulfonic acids under irradiation and are cleavable by the latter. In combination with alkali-soluble binders, they give positive-working mixtures which are used especially in recording materials for UV radiation and high-energy radiation. The recording materials are distinguished by a high resolution in conjunction with high image contrast and excellent storage stability.