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公开(公告)号：US08088299B2
公开(公告)日：2012-01-03
申请号：US12955803
申请日：2010-11-29
CPC分类号： B24B37/30
摘要： A carrier head for chemical mechanical polishing of a substrate includes a base and a flexible membrane extending beneath the base. The flexible membrane includes a central portion with an outer surface providing a substrate receiving surface, a perimeter portion connecting the central portion to the base, and at least one flap extending from an inner surface of the central portion. The flap divides a volume between the flexible membrane and the base into a plurality of chambers, and the flap includes a laterally extending first section and an angled second section extending beneath the first section and connecting the laterally extending first section to the central portion.
摘要翻译： 用于基板的化学机械抛光的承载头包括基部和在基部下方延伸的柔性膜。 柔性膜包括具有提供基板接收表面的外表面的中心部分，将中心部分连接到基部的周边部分和从中心部分的内表面延伸的至少一个折片。 翼片将柔性膜和基部之间的体积分成多个室，并且该翼片包括横向延伸的第一部分和在第一部分下方延伸并且将横向延伸的第一部分连接到中心部分的成角度的第二部分。
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公开(公告)号：US08021215B2
公开(公告)日：2011-09-20
申请号：US12698009
申请日：2010-02-01
IPC分类号： B24B41/06
摘要： A carrier head that has a housing, a base assembly, a retaining ring, a carrier ring, and a flexible membrane is described. The base assembly is vertically movable relative to the housing. The retaining ring is connected to and vertically movable relative to the base assembly and has a lower surface configured to contact a polishing pad and an inner surface configured to circumferentially surround the edge of a substrate to retain the substrate. The carrier ring is connected to and vertically fixed relative to the base assembly, circumferentially surrounds the retaining ring to prevent lateral motion of the retaining ring, and has a bottom surface configured to contact a polishing pad.
摘要翻译： 描述了具有壳体，基座组件，保持环，载体环和柔性膜的承载头。 基座组件相对于外壳可垂直移动。 保持环相对于基座组件连接并且可垂直移动，并且具有被配置为接触抛光垫的下表面和被配置为周向围绕衬底的边缘以保持衬底的内表面。 承载环相对于基座组件连接并且垂直固定，周向地包围保持环以防止保持环的横向运动，并且具有构造成接触抛光垫的底表面。
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公开(公告)号：US20110197814A1
公开(公告)日：2011-08-18
申请号：US12982843
申请日：2010-12-30
IPC分类号： C23C4/00
CPC分类号： C23C16/45565 , C23C16/509 , H01J37/32082 , H01J37/32431 , H01J37/3244
摘要： Embodiments of the present invention generally relate to apparatus for reducing arcing and parasitic plasma in substrate processing chambers. The apparatus generally include a processing chamber having a substrate support, a backing plate, and a showerhead disposed therein. A showerhead suspension electrically couples the backing plate to the showerhead. An electrically conductive bracket is coupled to the backing plate and spaced apart from the showerhead. The electrically conductive bracket may include a plate, a lower portion, an upper portion, and a vertical extension. The electrically conductive bracket contacts an electrical isolator.
摘要翻译： 本发明的实施例一般涉及用于减少衬底处理室中的电弧和寄生等离子体的装置。 该设备通常包括处理室，其具有设置在其中的基板支撑件，背板和喷头。 喷头悬挂将背板电连接到喷头。 导电支架联接到背板并与喷头间隔开。 导电支架可以包括板，下部，上部和垂直延伸部。 导电支架接触电隔离器。
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公开(公告)号：US20110164955A1
公开(公告)日：2011-07-07
申请号：US12835511
申请日：2010-07-13
申请人： John M. White , Jeonghoon Oh , Tom K. Cho , Silja James , Uday Pai , Oscar Lopez , Alexander S. Polyak
发明人： John M. White , Jeonghoon Oh , Tom K. Cho , Silja James , Uday Pai , Oscar Lopez , Alexander S. Polyak
IPC分类号： H01L21/683 , F16M11/00
CPC分类号： H01L21/68742
摘要： Embodiments of a method and apparatus for processing large area substrates including a translational wear plate and/or bushing assembly are provided for reducing the stress on a lift pin used to space substrates from a substrate support in a processing or other type of chamber. In another embodiment, an apparatus for processing substrates includes processing chamber comprising a substrate support disposed in a chamber body. A bushing assembly is disposed in the substrate support. A lift pin is disposed through the bushing assembly. A wear plate is provided that is coupled to the chamber body and aligned with the lift pin. The wear plate is movable laterally relative to a centerline of the chamber body to accommodate lateral motion of the lift pin when contacting the wear plate.
摘要翻译： 提供了用于处理包括平移耐磨板和/或衬套组件的大面积衬底的方法和装置的实施例，用于减小用于将衬底从处理或其它类型的室中的衬底支撑件定位的升降销上的应力。 在另一个实施例中，一种用于处理衬底的设备包括处理室，其包括设置在室主体中的衬底支撑件。 衬套组件设置在衬底支撑件中。 提升销设置穿过套管组件。 提供了耐磨板，其连接到腔室主体并与提升销对准。 耐磨板相对于室主体的中心线横向运动，以在接触耐磨板时适应提升销的横向运动。
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公开(公告)号：US07901273B2
公开(公告)日：2011-03-08
申请号：US12698912
申请日：2010-02-02
IPC分类号： B24B21/18
CPC分类号： B24B37/32
摘要： A carrier head that has a base assembly, a retaining ring assembly, a carrier ring, and a flexible membrane is described. A carrier ring has an annular upper portion and an annular lower portion having a lower surface with a smaller inner diameter than the upper surface of the annular upper portion, wherein the carrier ring circumferentially surrounds a retaining ring and has a lower surface to contact a polishing pad.
摘要翻译： 描述了具有基座组件，保持环组件，载体环和柔性膜的承载头。 承载环具有环形上部和环形下部，其具有比环形上部的上表面更小的内径的下表面，其中承载环周向地包围保持环并且具有接触抛光的下表面 垫。
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公开(公告)号：US20090021024A1
公开(公告)日：2009-01-22
申请号：US11780335
申请日：2007-07-19
IPC分类号： B65D45/32
CPC分类号： B24B37/32 , H01L21/68721 , Y10T292/205
摘要： Retaining rings with curved surfaces are described. The curved surfaces prevent damage to a fixed abrasive polishing pad when the retaining ring is used in a polishing process. The curved surfaces are on the bottom surface of the ring, such as along the outer diameter and/or along the sidewalls of channels formed in the bottom of the ring.
摘要翻译： 描述具有弯曲表面的保持环。 当在抛光过程中使用保持环时，弯曲表面可防止固定磨料抛光垫的损坏。 弯曲表面位于环的底表面上，例如沿着形成在环的底部的通道的外径和/或沿着通道的侧壁。
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公开(公告)号：US20070272356A1
公开(公告)日：2007-11-29
申请号：US11837412
申请日：2007-08-10
申请人： Hung Chen , Jeonghoon Oh , Tsz-Sin Siu , Thomas Brezoczky , Steven Zuniga
发明人： Hung Chen , Jeonghoon Oh , Tsz-Sin Siu , Thomas Brezoczky , Steven Zuniga
IPC分类号： C23F1/00
CPC分类号： B24B37/30
摘要： A carrier head for chemical mechanical polishing of a substrate includes a base and a flexible membrane extending beneath the base. The flexible membrane includes a central portion with an outer surface providing a substrate receiving surface, a perimeter portion connecting the central portion to the base, and at least one flap extending from an inner surface of the central portion. The flap divides a volume between the flexible membrane and the base into a plurality of chambers, and the flap includes a laterally extending first section and an angled second section extending beneath the first section and connecting the laterally extending first section to the central portion.
摘要翻译： 用于基板的化学机械抛光的承载头包括基部和在基部下方延伸的柔性膜。 柔性膜包括具有提供基板接收表面的外表面的中心部分，将中心部分连接到基部的周边部分和从中心部分的内表面延伸的至少一个折片。 翼片将柔性膜和基部之间的体积分成多个室，并且该翼片包括横向延伸的第一部分和在第一部分下方延伸并且将横向延伸的第一部分连接到中心部分的成角度的第二部分。
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公开(公告)号：US20070202785A1
公开(公告)日：2007-08-30
申请号：US11614940
申请日：2006-12-21
申请人： Jeonghoon Oh , Tsz-Sin Siu , Hung Chen , Andrew Nagengast , Steven Zuniga , Thomas Brezoczky
发明人： Jeonghoon Oh , Tsz-Sin Siu , Hung Chen , Andrew Nagengast , Steven Zuniga , Thomas Brezoczky
IPC分类号： B24B41/06
CPC分类号： B24B37/30 , B24B41/06 , B29C33/424 , B29C35/02 , B29K2023/00 , B29K2083/00 , B29K2995/0074 , B29L2031/755
摘要： A flexible membrane for use in a carrier head has a generally circular main portion with a lower surface, an annular outer portion for connection to a base assembly, and an annular flap extending from the main portion on a side opposite the lower surface for connection to the base assembly. At least one surface of the flap has a surface texture to prevent adhesion.
摘要翻译： 用于载体头部的柔性膜具有大致圆形的主要部分，具有下表面，用于连接到基座组件的环形外部部分和从主体部分在与下表面相对的一侧延伸的环形挡片，用于连接到 基座组件。 翼片的至少一个表面具有表面纹理以防止粘附。
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公开(公告)号：US07198561B2
公开(公告)日：2007-04-03
申请号：US11321006
申请日：2005-12-28
申请人： Hung Chih Chen , Jeonghoon Oh , Steven M. Zuniga
发明人： Hung Chih Chen , Jeonghoon Oh , Steven M. Zuniga
IPC分类号： B24B29/00
CPC分类号： B24B37/30
摘要： A flexible membrane for use with a carrier head of a substrate chemical mechanical polishing apparatus has a central portion with an outer surface providing a substrate receiving surface, a perimeter portion for connecting the central portion to a base of the carrier head, and at least one flap extending from an inner surface of the central portion. The flap includes a laterally extending first section and a vertically extending second section connecting the laterally extending first section to the central portion.
摘要翻译： 用于与基底化学机械抛光装置的载体头一起使用的柔性膜具有中心部分，其外表面提供基底接收表面，周边部分用于将中心部分连接到载体头部的基部，以及至少一个 翼片从中心部分的内表面延伸。 翼片包括横向延伸的第一部分和将横向延伸的第一部分连接到中心部分的垂直延伸的第二部分。
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公开(公告)号：US20050211377A1
公开(公告)日：2005-09-29
申请号：US10810784
申请日：2004-03-26
申请人： Hung Chen , Jeonghoon Oh , Tsz-Sin Siu , Thomas Brezoczky , Steven Zuniga
发明人： Hung Chen , Jeonghoon Oh , Tsz-Sin Siu , Thomas Brezoczky , Steven Zuniga
CPC分类号： B24B37/30
摘要： A carrier head for chemical mechanical polishing of a substrate includes a base and a flexible membrane extending beneath the base. The flexible membrane includes a central portion with an outer surface providing a substrate receiving surface, a perimeter portion connecting the central portion to the base, and at least one flap extending from an inner surface of the central portion. The flap divides a volume between the flexible membrane and the base into a plurality of chambers, and the flap includes a laterally extending first section and an angled second section extending beneath the first section and connecting the laterally extending first section to the central portion.
摘要翻译： 用于基板的化学机械抛光的承载头包括基部和在基部下方延伸的柔性膜。 柔性膜包括具有提供基板接收表面的外表面的中心部分，将中心部分连接到基部的周边部分和从中心部分的内表面延伸的至少一个折片。 翼片将柔性膜和基部之间的体积分成多个室，并且该翼片包括横向延伸的第一部分和在第一部分下方延伸并且将横向延伸的第一部分连接到中心部分的成角度的第二部分。
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