公开(公告)号：US08088440B2

公开(公告)日：2012-01-03

申请号：US10996066

申请日：2004-11-24

申请人： Henry A. Luten

发明人： Henry A. Luten

IPC分类号： C23C16/00

CPC分类号： C03C17/42 ,  C03C2217/76 ,  C03C2217/77 ,  C03C2218/15

摘要： A coated article is provided with a coating including at least one underlayer and a hydrophobic layer over at least the underlayer. The hydrophobic layer may have properties such as high contact angle θ. Hydrophobic properties of a multi-layer coating may be improved by depositing the underlayer(s) using flame pyrolysis.

摘要翻译： 涂覆制品设置有至少一层底层和至少在底层上的疏水层的涂层。 疏水层可具有如接触角高的特性。 通过使用火焰热解沉积底层可以改善多层涂层的疏水性。

公开(公告)号：US07183559B2

公开(公告)日：2007-02-27

申请号：US10986456

申请日：2004-11-12

申请人： Henry A. Luten ,  Vijayen S. Veerasamy

发明人： Henry A. Luten ,  Vijayen S. Veerasamy

IPC分类号： H01J27/00

CPC分类号： H01J37/08 ,  H01J3/04 ,  H01J27/143

摘要： In certain example embodiments of this invention, there is provide an ion source including an anode and a cathode. In certain example embodiments, the cathode does not overhang over the anode, or vice versa. Since no, or fewer, areas of overhang are provided between the anode and cathode, there is less undesirable build-up on the anode and/or cathode during operation of the ion source so that the source can run more efficiently. Moreover, in certain example embodiments, an insulator such as a ceramic or the like is provided between the anode and cathode.

摘要翻译： 在本发明的某些示例实施例中，提供了包括阳极和阴极的离子源。 在某些示例性实施例中，阴极不会悬在阳极上，反之亦然。 由于在阳极和阴极之间没有或更少的突出区域被提供，所以在离子源操作期间在阳极和/或阴极上的不希望的积聚较少，使得源可以更有效地运行。 此外，在某些示例性实施例中，在阳极和阴极之间设置诸如陶瓷等的绝缘体。

公开(公告)号：US06368665B1

公开(公告)日：2002-04-09

申请号：US09067975

申请日：1998-04-29

申请人： Andrew T. Hunt ,  Subramaniam Shanmugham ,  William D. Danielson ,  Henry A. Luten ,  Tzyy Jiuan Hwang ,  Girish Deshpande

发明人： Andrew T. Hunt ,  Subramaniam Shanmugham ,  William D. Danielson ,  Henry A. Luten ,  Tzyy Jiuan Hwang ,  Girish Deshpande

IPC分类号： C23C1600

CPC分类号： C23C16/45519 ,  B05D1/08 ,  C23C16/14 ,  C23C16/18 ,  C23C16/30 ,  C23C16/342 ,  C23C16/36 ,  C23C16/406 ,  C23C16/409 ,  C23C16/453 ,  C23C16/45561 ,  C23C16/45576 ,  C23C16/45595 ,  C23C16/50

摘要： An improved chemical vapor deposition apparatus and procedure is disclosed. The technique provides improved shielding of the reaction and deposition zones involved in providing CVD coatings, whereby coatings can be produced, at atmospheric pressure, of materials which are sensitive to components in the atmosphere on substrates which are sensitive to high temperatures and which are too large, or inconvenient, to process in vacuum or similar chambers. The improved technique can be used with various energy sources and is particularly compatible with Combustion Chemical Vapor Deposition (CCVD) techniques.

摘要翻译： 公开了一种改进的化学气相沉积设备和方法。 该技术提供了提供CVD涂层所涉及的反应和沉积区的改进的屏蔽，由此在大气压下可以在对高温敏感的基底上的大气中对组分敏感并且太大的材料 或不方便，以在真空或类似的室中进行处理。 改进的技术可以与各种能源一起使用，并且与燃烧化学气相沉积（CCVD）技术特别相容。