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65 条记录 (耗时 0.033 秒)

    Method and apparatus for forming thin film
    42.
    发明授权
    Method and apparatus for forming thin film 失效
    用于形成薄膜的方法和装置

    公开(公告)号：US4901669A

    公开(公告)日：1990-02-20

    申请号：US47328

    申请日：1987-05-08

    申请人： Takashi Yamamoto ,  Shozo Kaneko ,  Tadashi Gengo ,  Joji Ichinari ,  Hiroshi Fujiyama ,  Yoshio Kayumi ,  Masayoshi Murata

    发明人： Takashi Yamamoto ,  Shozo Kaneko ,  Tadashi Gengo ,  Joji Ichinari ,  Hiroshi Fujiyama ,  Yoshio Kayumi ,  Masayoshi Murata

    IPC分类号： C23C16/517 ,  H01L21/205

    CPC分类号： C23C16/517 ,  H01L21/02532 ,  H01L21/0262

    摘要： The present invention is directed to a method for forming a thin film on a substrate by the use of a glow discharge plasma which comprises generating a magnetic field in a direction which crosses an electric field for discharge at right angles and fluctuating the magnetic field. The present invention is also directed to an apparatus for practicing the above method, which apparatus is composed of a reaction vessel, means for reducing the pressure in the reaction vessel and means for introducing the feed of reaction gases to the reaction vessel, electrodes for discharge disposed face to face in the reaction vessel, a power source from which a voltage for causing a glow discharge is fed to the electrodes for discharge, a coil surrounding the electrodes for discharge, for generating a magnetic field in a direction crossing at right angles to an electric field generated between the electrodes for discharge, and an AC power source for generating a magnetic field fed to the coil, whereby a thin film is formed on a base plate supported outside the range of the discharge electric field and in parallel with the direction of the electric field.

    摘要翻译： 本发明涉及一种通过使用辉光放电等离子体在衬底上形成薄膜的方法，该方法包括在与电场交叉的方向上产生磁场，以便以直角放电并使磁场发生波动。 本发明还涉及一种用于实施上述方法的装置，该装置由反应容器，用于降低反应容器内的压力的装置和将反应气体进料引入反应容器的装置，排出电极 面对面设置在反应容器内，将用于引起辉光放电的电压供给到放电用电极的电源，围绕放电用电极的线圈，用于沿垂直方向交叉的方向产生磁场 在用于放电的电极之间产生的电场和用于产生馈送到线圈的磁场的AC电源，由此在支撑在放电电场的范围外并与该方向平行的基板上形成薄膜 的电场。

    Pyrimidones as cardiotonic, anti hypertensive, cerebrovascular vasodilator and anti-platelet agents
    43.
    发明授权
    Pyrimidones as cardiotonic, anti hypertensive, cerebrovascular vasodilator and anti-platelet agents 失效
    嘧啶酮作为强心剂，抗高血压药，脑血管扩张剂和抗血小板剂

    公开(公告)号：US4824851A

    公开(公告)日：1989-04-25

    申请号：US173584

    申请日：1988-03-25

    申请人： Takao Takaya ,  Masayoshi Murata ,  Kiyotaka Ito

    发明人： Takao Takaya ,  Masayoshi Murata ,  Kiyotaka Ito

    IPC分类号： C07D239/47 ,  A61K31/513 ,  A61P7/02 ,  A61P9/04 ,  A61P9/12 ,  C07D239/46 ,  A61K31/495 ,  C07D239/24

    CPC分类号： C07D239/47

    摘要： New pyrimidine derivatives of the formula: ##STR1## wherein Z is a group selected from ##STR2## in which R.sup.1 and R.sup.2 are each hydrogen, alkenyl, ar(lower)alkyl or lower alkyl optionally substituted with epoxy, hydroxy, amino and/or lower alkylamino and R.sup.5 is lower alkyl,R.sup.3 is hydrogen, aryl optionally substituted with lower alkyl, lower alkoxy and/or halogen, or pyridyl optionally substituted with lower alkyl,R.sup.4 is hydrogen, lower alkyl or phenyl optionally substituted with lower alkoxy, andY is.dbd.O, .dbd.S or .dbd.N--R.sup.6, in which R.sup.6 is lower alkyl; cyclo(lower)alkyl; ar(lower)alkyl optionally substituted with lower alkoxy; N-containing unsaturated heterocyclic group optionally substituted with lower alkyl; or aryl optionally substituted with hydroxy, lower alkyl, halogen or lower alkoxy, in which lower alkoxy substituent may be substituted with epoxy, hydroxy, amino and/or lower alkylamino,provided that Y is.dbd.N--R.sup.6 when R.sup.3 and R.sup.4 are each hydrogen, and Y is.dbd.S or.dbd.N--R.sup.6 when R.sup.1 and R.sup.2 are each hydrogen or lower alkyl and R.sup.3 is phenyl, and pharmaceutically acceptable salts thereof, and processes for preparation thereof and pharmaceutical composition comprising the same.These derivatives and salts thereof are useful as cardiotonic, antihypertensive agent, cerebrovascular vasodilator and anti-platelet agent.

    HIGH FREQUENCY PLASMA CVD APPARATUS, HIGH FREQUENCY PLASMA CVD METHOD AND SEMICONDUCTOR THIN FILM MANUFACTURING METHOD
    47.
    发明申请
    HIGH FREQUENCY PLASMA CVD APPARATUS, HIGH FREQUENCY PLASMA CVD METHOD AND SEMICONDUCTOR THIN FILM MANUFACTURING METHOD 审中-公开
    高频等离子体CVD装置，高频等离子体CVD法和半导体薄膜制造方法

    公开(公告)号：US20100239757A1

    公开(公告)日：2010-09-23

    申请号：US12734163

    申请日：2008-09-08

    申请人： Masayoshi Murata

    发明人： Masayoshi Murata

    IPC分类号： C23C16/00

    CPC分类号： C23C16/509 ,  C23C16/24 ,  H01J37/32091

    摘要： Provided are large area and uniform VHF plasma CVD apparatus and method wherein a plasma generating source constitutes the VHF plasma CVD apparatus for manufacturing a tandem-type thin film silicon solar cell, and influences of standing waves, generation of harmful plasma other than between a pair of electrodes and supply power consumption other than between the pair of electrodes are suppressed. First and second power feed points are arranged on an electrode at positions facing each other. A distance between the power feed points is set at an integral multiple of a half of the wavelength of the using power, and a pulse power separated in terms of time is supplied. The pulse power is outputted from two phase-variable double output high frequency power supplies which can perform pulse modulation. Thus, a first standing wave wherein the anti-node position matches with positions of the first and the second power feed points, and a second standing wave wherein the node position matches with positions of the first and the second power feed points are alternately generated in terms of time.

    摘要翻译： 提供了大面积均匀的甚高频等离子体CVD装置和方法，其中等离子体发生源构成用于制造串联型薄膜硅太阳能电池的VHF等离子体CVD装置，以及驻波的影响，除了一对之外的有害等离子体的产生 的电极和不同于一对电极之间的电力消耗被抑制。 第一和第二馈电点布置在彼此面对的位置处的电极上。 供电点之间的距离被设定为使用功率的波长的一半的整数倍，并且提供在时间上分离的脉冲功率。 脉冲功率从可以执行脉冲调制的两个可变双输出高频电源输出。 因此，其中反节点位置与第一和第二馈电点的位置匹配的第一驻波和其中节点位置与第一和第二馈电点的位置匹配的第二驻波交替地生成在 时间条件

    Apparatus and method for treating exhaust gas and pulse generator used therefor
    48.
    发明授权
    Apparatus and method for treating exhaust gas and pulse generator used therefor 失效
    用于处理废气的设备和方法及用于其的脉冲发生器

    公开(公告)号：US06274006B1

    公开(公告)日：2001-08-14

    申请号：US09369843

    申请日：1999-08-09

    申请人： Keisuke Kawamura ,  Tetsuro Shigemizu ,  Hirohisa Yoshida ,  Masayoshi Murata

    发明人： Keisuke Kawamura ,  Tetsuro Shigemizu ,  Hirohisa Yoshida ,  Masayoshi Murata

    IPC分类号： B01J1908

    CPC分类号： F01N3/0892 ,  B01D53/32 ,  B01D2259/818 ,  B01J19/088 ,  B01J2219/0807 ,  B01J2219/0875 ,  B01J2219/0894

    摘要： An apparatus and method for treating exhaust gases. A plurality of stages of reactor chambers are connected in series in the direction of an exhaust gas flow. High-voltage power supplies are connected to the reactor chambers In each of these reactor chambers, a streamer discharger plasma is generated. The more downstream a reactor chamber of a stage is placed, the lower energy to be cast into the reactor chamber becomes. The density of electrons generated in a gas decomposition unit is higher on the upstream side of the exhaust gas flow and the electron density is lower on the downstream side. A pulse generator is provided in which a high voltage, which is an output voltage of a D.C. charger (V0), is simultaneously applied to a plurality of distributed constant lines, which are connected in parallel with one another, by a signal shortcircuit switch (S1).

    摘要翻译： 一种处理废气的设备和方法。 多个级的反应室在废气流的方向上串联连接。 高压电源连接到反应室在这些反应室的每一个中，产生流光放电器等离子体。 放置一个反应室的反应室下游越多，要投入反应器室的能量就越低。 在气体分解单元中产生的电子密度在废气流的上游侧较高，并且下游侧的电子密度较低。 提供了一种脉冲发生器，其中作为直流充电器（V0）的输出电压的高电压被同时施加到通过信号短路开关（彼此并联连接）的多个分布常数线路 S1）。