公开(公告)号：US4831366A

公开(公告)日：1989-05-16

申请号：US152489

申请日：1988-02-05

申请人： Tadashi Iino

发明人： Tadashi Iino

IPC分类号： G02B27/00 ,  G02B27/01

CPC分类号： G02B27/0101 ,  G02B27/01 ,  G02B27/0149 ,  B60K2350/2052 ,  B60K2350/405 ,  G02B2027/0154 ,  G02B2027/0165 ,  G02B2027/0169 ,  G02B2027/0187

摘要： In a head up display apparatus for an automotive vehicle including a projector unit disposed at the ceiling of the automotive vehicle to project display images and a half-mirror reflector unit for reflecting the projected display images to the driver, the height of the half-mirror reflector unit and the angular position of the projector unit are automatically adjusted according to vehicle speed, so that virtual display images can be appropriately seen by the driver ahead of the half-mirror reflector unit along the driver's eye direction variable according to vehicle speed, by use of a relatively small half-mirror reflector unit.

摘要翻译： 在一种用于机动车辆的抬头显示装置中，包括设置在机动车辆的天花板上的投影仪单元以投影显示图像，以及用于将投影的显示图像反映到驾驶员的半透明反射器单元，半透视镜的高度 反射器单元和投影仪单元的角度位置根据车辆速度自动调整，使得虚拟显示图像可以由半镜反射器单元之前的驾驶员沿着驾驶员眼睛方向根据车辆速度可变地适当地看到，通过 使用相对较小的半反射镜单元。

公开(公告)号：US07896973B2

公开(公告)日：2011-03-01

申请号：US10779397

申请日：2004-02-13

申请人： Naoki Shindo ,  Tadashi Iino

发明人： Naoki Shindo ,  Tadashi Iino

IPC分类号： B08B3/00 ,  B08B7/04

CPC分类号： H01L21/6708 ,  Y10S134/902

摘要： This substrate processing apparatus supplies wafers W accommodated in a closed processing container 10 with ozone gas and steam for processing the wafers W. The apparatus includes an ozone-gas generator 40 for supplying the ozone gas into the processing container 10, a steam generator 30 for supplying the steam into the processing container 10 and a steam nozzle 35 arranged in the processing container 10 and connected to the steam generator 30. The steam nozzle 35 is equipped with a nozzle body 35a having a plurality of steam ejecting orifices 35f formed at appropriate intervals and a heater 35h for preventing dewdrops of the steam from being produced in the nozzle body 35a. Consequently, it is possible to prevent the formation of dewdrops of solvent steam, which may produce origins of particles in the closed processing container, unevenness in cleaning (etching), etc., and also possible to improve the processing efficiency.

摘要翻译： 该基板处理装置将容纳在封闭处理容器10内的晶片W供给臭氧气体和蒸汽用于处理晶片W.该装置包括用于向处理容器10供给臭氧气体的臭氧气体发生器40，用于 将蒸汽供给到处理容器10和设置在处理容器10中并连接到蒸汽发生器30的蒸汽喷嘴35.蒸汽喷嘴35配备有喷嘴体35a，喷嘴体35a具有以适当间隔形成的多个蒸汽喷射孔35f 以及用于防止在喷嘴体35a中产生蒸汽的露珠的加热器35h。 因此，可以防止在封闭的加工容器中产生颗粒的起因，清洗（蚀刻）等不均匀的溶剂蒸汽的露珠的形成，也可以提高加工效率。

公开(公告)号：US07338730B2

公开(公告)日：2008-03-04

申请号：US11058283

申请日：2005-02-16

申请人： Masayuki Noguchi ,  Tomoaki Kobayashi ,  Tadashi Iino

发明人： Masayuki Noguchi ,  Tomoaki Kobayashi ,  Tadashi Iino

IPC分类号： H01M2/02

CPC分类号： H01M8/0221 ,  B82Y30/00 ,  H01M8/0213 ,  H01M8/0226 ,  Y02P70/56

摘要： There is provided a conductive curable resin composition comprising (A) a curable resin composition comprising an elastomer with a Mooney viscosity (ML1+4 (100° C.)) of 25 or greater at 2-80 wt % and (B) a carbon material, with a weight ratio of component (A) to component (B) of 70-5:30-95. The curable resin composition of component (A) preferably comprises (A1) an elastomer at 80-2 wt %, (A2) a radical reactive resin at 20-98 wt % and (A3) an organic peroxide at 0.2-10 parts by weight to 100 parts by weight of (A1+A2). Also provided are a process for production of a conductive cured resin by shaping and curing of the conductive curable resin composition, and a fuel cell separator, an assembly for a cell, an electrode or a heat releasing plate, obtained thereby.

摘要翻译： 提供一种导电性固化性树脂组合物，其包含（A）包含门尼粘度（ML 1 + 4（100℃））的弹性体的固化性树脂组合物的摩尔比为25以上，2-80 （B）的重量比为70-5:30-95的（B）碳材料。 组分（A）的可固化树脂组合物优选包含（A 1）80-2重量％的弹性体，（A 2）20-98重量％的自由基反应性树脂和（A 3）0.2-10的有机过氧化物 （A 1 + A 2）100重量份。 还提供了通过导电性固化性树脂组合物的成形和固化以及由此获得的燃料电池隔板，电池组，电极或散热板来制造导电性固化树脂的方法。

公开(公告)号：US20070178349A1

公开(公告)日：2007-08-02

申请号：US10582366

申请日：2004-12-22

申请人： Tadashi Iino ,  Zenichiro Izumi

发明人： Tadashi Iino ,  Zenichiro Izumi

IPC分类号： H01M8/02 ,  B29C69/00 ,  B29C59/02

CPC分类号： H01M8/0213 ,  H01M8/0206 ,  H01M8/0221 ,  H01M8/0226 ,  H01M8/0228 ,  Y02P70/56

摘要： A fuel cell separator having a surface layer on one side or both sides thereof. The surface layer includes at least two layers, wherein the surface layer includes a low-elastic modulus layer (1) having a bending elastic modulus of 1.0×10 1 -6.0×10 3 MPa, and a bending strain of 1% or more; and a high-elastic modulus layer (2) having a bending elastic modulus exceeding 6.0×10 3 MPa, as at least one layer constituting the surface layer, other than the low-elastic modulus layer (1).

摘要翻译： 一种在其一侧或两侧具有表面层的燃料电池隔板。 所述表面层包括至少两层，其中所述表面层包括弯曲弹性模量为1.0×10 -6 -6.0×10 -3 /秒的低弹性模量层（1） 弯曲应变为1％以上; 和低弹性模量层（1）以外的至少一层构成表面层的弯曲弹性模量超过6.0×10 3 MPa的高弹性模量层（2）。

公开(公告)号：US20070107751A1

公开(公告)日：2007-05-17

申请号：US10581729

申请日：2004-12-16

申请人： Yoshichika Tokuno ,  Norihiro Ito ,  Takehiko Orii ,  Mitsunori Nakamori ,  Tadashi Iino ,  Hiroki Ohno ,  Yusuke Saito

发明人： Yoshichika Tokuno ,  Norihiro Ito ,  Takehiko Orii ,  Mitsunori Nakamori ,  Tadashi Iino ,  Hiroki Ohno ,  Yusuke Saito

IPC分类号： B08B7/04 ,  C23G1/00 ,  B08B3/00

CPC分类号： H01L21/68721 ,  B01D53/002 ,  B01D2257/106 ,  C01B13/10 ,  H01L21/6715 ,  H01L21/68742 ,  H01L21/68785

摘要： Water vapor is mixed to O3 gas generated by an ozone generator of discharge type. The mixed fluid is cooled by a cooler, thereby impurities such as metals and nitrogen oxides contained in the O3 gas dissolve into condensed water. Subsequently, a gas-liquid separator separates the O3 gas from the condensed water. Water vapor is mixed with the O3 gas again. The mixed fluid passes through a metal trap composed of a container containing plural silicon chips as a metal adsorbent, thereby to remove the remaining metals therefrom.

摘要翻译： 将水蒸汽与由放电型臭氧发生器产生的O 3气体混合。 混合流体由冷却器冷却，由此含有的O 3 3气体中的杂质如金属和氮氧化物溶解在冷凝水中。 随后，气液分离器从冷凝水中分离出O 3 N 3气体。 水蒸汽再次与O 3 3气体混合。 混合流体通过金属捕集器，该金属捕集器由含有多个硅芯片的容器组成，作为金属吸附剂，从而从其中除去剩余的金属。

公开(公告)号：US20070074747A1

公开(公告)日：2007-04-05

申请号：US10579423

申请日：2004-12-07

申请人： Takayuki Toshima ,  Tadashi Iino ,  Yusuke Saito ,  Mitsunori Nakamori ,  Noritaka Uchida ,  Takehiko Orii

发明人： Takayuki Toshima ,  Tadashi Iino ,  Yusuke Saito ,  Mitsunori Nakamori ,  Noritaka Uchida ,  Takehiko Orii

IPC分类号： B08B3/00

CPC分类号： G03F7/427 ,  H01L21/31138

摘要： A substrate processing method which removes an ArF resist film from a wafer having the ArF resist film. As an ultraviolet irradiation process is performed on the ArF resist film, and then an ozone gas and water vapor are fed to the ArF resist film, the ArF resist film is altered in a water-soluble state. Thereafter, the ArF resist film is removed from the substrate by feeding pure water to the ArF resist film altered into the water-soluble state.

摘要翻译： 从具有ArF抗蚀剂膜的晶片去除ArF抗蚀剂膜的基板处理方法。 由于在ArF抗蚀剂膜上进行紫外线照射处理，然后向ArF抗蚀剂膜供给臭氧气体和水蒸汽，所以ArF抗蚀剂膜变为水溶性状态。 此后，通过将纯水供给到改变成水溶性状态的ArF抗蚀剂膜，从基板除去ArF抗蚀剂膜。

公开(公告)号：US07086410B2

公开(公告)日：2006-08-08

申请号：US10384089

申请日：2003-03-07

申请人： Yasuhiro Chouno ,  Norihiro Ito ,  Keigo Satake ,  Tadashi Iino

发明人： Yasuhiro Chouno ,  Norihiro Ito ,  Keigo Satake ,  Tadashi Iino

IPC分类号： G05D16/20

CPC分类号： H01L21/67253 ,  H01L21/67017 ,  Y10S134/902 ,  Y10S438/935 ,  Y10T137/0396 ,  Y10T137/7761 ,  Y10T137/87917

摘要： A common solvent vapor supply source 41 and a common processing gas supply source 42 supply ozone gas and steam to a plurality of processing vessels 30A, 30B. Pressures in the processing vessels are regulated by adjusting the openings of the valuable throttle valves 50A, 50B, which are placed in exhaust lines 80A, 80B, respectively.

摘要翻译： 常见的溶剂蒸气供给源41和公共处理气体供应源42向多个处理容器30A，30B供应臭氧气体和蒸汽。处理容器中的压力通过调节有价值的节流阀50A的开口来调节 ，50B，它们分别放置在排气管线80A，80B中。

公开(公告)号：US20060079096A1

公开(公告)日：2006-04-13

申请号：US11244684

申请日：2005-10-05

申请人： Mitsunori Nakamori ,  Tadashi Iino ,  Noritaka Uchida ,  Takehiko Orii

发明人： Mitsunori Nakamori ,  Tadashi Iino ,  Noritaka Uchida ,  Takehiko Orii

IPC分类号： H01L21/302 ,  H01L21/461

CPC分类号： G03F7/423 ,  G03F7/42 ,  H01L21/31133 ,  H01L21/67051 ,  H01L21/67178

摘要： A substrate processing method for removing a resist film from a substrate having the resist film formed thereon comprises maintaining the inner region of the chamber at a prescribed temperature by putting a substrate in a chamber, denaturing the resist film by supplying ozone and a water vapor in such a manner that ozone is supplied into the chamber while a water vapor is supplied into the chamber at a prescribed flow rate, the amount of ozone relative to the amount of the water vapor being adjusted such that the dew formation within the chamber is prevented, and processing the substrate with a prescribed liquid material so as to remove the denatured resist film from the substrate.

摘要翻译： 一种用于从其上形成有抗蚀剂膜的基板去除抗蚀剂膜的基板处理方法包括通过将基板放置在室中来将室的内部区域保持在规定温度，通过将臭氧和水蒸气供给而使抗蚀剂膜变性 这样一种方式是将臭氧以规定的流量供给到室中，同时将臭氧量相对于水蒸气量调节到室内的露点形成， 并用规定的液体材料处理基板，以从基板上除去变性的抗蚀剂膜。

公开(公告)号：US20050087133A1

公开(公告)日：2005-04-28

申请号：US10779397

申请日：2004-02-13

申请人： Naoki Shindo ,  Tadashi Iino

发明人： Naoki Shindo ,  Tadashi Iino

IPC分类号： H01L21/304 ,  H01L21/00 ,  C23C16/00

CPC分类号： H01L21/6708 ,  Y10S134/902

摘要： This substrate processing apparatus supplies wafers W accommodated in a closed processing container 10 with ozone gas and steam for processing the wafers W. The apparatus includes an ozone-gas generator 40 for supplying the ozone gas into the processing container 10, a steam generator 30 for supplying the steam into the processing container 10 and a steam nozzle 35 arranged in the processing container 10 and connected to the steam generator 30. The steam nozzle 35 is equipped with a nozzle body 35a having a plurality of steam ejecting orifices 35f formed at appropriate intervals and a heater 35h for preventing dewdrops of the steam from being produced in the nozzle body 35a. Consequently, it is possible to prevent the formation of dewdrops of solvent steam, which may produce origins of particles in the closed processing container, unevenness in cleaning (etching), etc., and also possible to improve the processing efficiency.

摘要翻译： 该基板处理装置将容纳在封闭处理容器10内的晶片W供给臭氧气体和蒸汽用于处理晶片W.该装置包括用于向处理容器10供给臭氧气体的臭氧气体发生器40，用于 将蒸汽供应到处理容器10中，以及布置在处理容器10中并连接到蒸汽发生器30的蒸汽喷嘴35.蒸汽喷嘴35配备有喷嘴体35a，喷嘴体35a具有形成在多个蒸汽喷射孔35f 适当的间隔和加热器35h，用于防止在喷嘴体35a中产生蒸汽的露珠。 因此，可以防止在封闭的加工容器中产生颗粒的起因，清洗（蚀刻）等不均匀的溶剂蒸汽的露珠的形成，也可以提高加工效率。

公开(公告)号：US20050051246A1

公开(公告)日：2005-03-10

申请号：US10957003

申请日：2004-10-01

申请人： Takayuki Toshima ,  Naoki Shindo ,  Tadashi Iino

发明人： Takayuki Toshima ,  Naoki Shindo ,  Tadashi Iino

IPC分类号： G03F7/42 ,  B08B5/00 ,  H01L21/00 ,  H01L21/027 ,  H01L21/302 ,  H01L21/304 ,  H01L21/3065 ,  H01L21/311 ,  C22B9/05

CPC分类号： H01L21/6708 ,  H01L21/31138 ,  Y10S134/902

摘要： Resists can be removed while metal contamination of wafers, etc. and generation of particles, and growth of oxide films are suppressed. An ozone gas feed system 40 for feeding ozone gas 2 into a processing vessel 10 holding wafers W, and a steam feed means 30 for feeding steam 1 into the processing vessel 10 are provided. An on-off valve 49 inserted in the ozone gas feed pipe 42, an on-off valve 36 inserted in the steam feed pipe 34 and a switch 48 and an on-off valve 49 of ozone gas generator 41 are connected to CPU 100 which is control means and are controlled by the CPU 100. Ozone gas 2 is fed into the processing vessel 10 to pressurize the atmosphere surrounding the wafers W, and then steam 1 is fed into the processing vessel 10 while ozone gas 2 is fed into the processing vessel 10, whereby a resist of the wafers W can be removed with the steam 1 and the ozone 2 while metal corrosion, etc. can be prevented.

摘要翻译： 可以去除抗蚀剂，同时抑制晶片等的金属污染和颗粒的产生以及氧化膜的生长被抑制。 提供用于将臭氧气体2供给到保持晶片W的处理容器10中的臭氧气体供给系统40，以及用于将蒸汽1供给到处理容器10中的蒸汽供给装置30。 插入臭氧气体供给管42的开闭阀49，插入蒸汽供给管34的开关阀36，臭氧气体发生器41的开关48和开关阀49连接到CPU100，CPU100 是控制装置，由CPU100控制。臭氧气体2被送入处理容器10中以对周围的晶片W加压，然后将蒸汽1送入处理容器10，同时将臭氧气体2送入处理 容器10，由此可以用蒸汽1和臭氧2除去晶片W的抗蚀剂，同时可以防止金属腐蚀等。