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118 条记录 (耗时 0.041 秒)

    Method for partial nuclear hydrogenation of aromatic hydrocarbon compounds and a hydrogenation catalyst therefor
    41.
    发明授权
    Method for partial nuclear hydrogenation of aromatic hydrocarbon compounds and a hydrogenation catalyst therefor 失效
    芳烃化合物的部分核氢化方法及其加氢催化剂。

    公开(公告)号：US4495373A

    公开(公告)日：1985-01-22

    申请号：US582565

    申请日：1984-02-22

    申请人： Shuichi Niwa ,  Juichi Imamura ,  Fujio Mizukami ,  Kazuo Shimizu ,  Yoshio Orito

    发明人： Shuichi Niwa ,  Juichi Imamura ,  Fujio Mizukami ,  Kazuo Shimizu ,  Yoshio Orito

    IPC分类号： B01J23/00 ,  B01J23/46 ,  C07B61/00 ,  C07C1/00 ,  C07C5/11 ,  C07C13/20 ,  C07C67/00 ,  C07C5/02

    CPC分类号： B01J23/462 ,  C07C5/11 ,  C07C2521/04 ,  C07C2521/08 ,  C07C2521/12 ,  C07C2523/46 ,  C07C2523/72

    摘要： The invention provides an improvement in the partial nuclear hydrogenation of an aromatic hydrocarbon compound in the liquid phase with admixture of water catalyzed by a ruthenium-containing solid catalyst. The scope of the invention is in the use of a novel ruthenium-containing catalyst supported on a silica gel and the like carrier and the catalyst is prepared by the hydrolysis and gelation of an alkoxide of silicon or aluminum in a solution containing a ruthenium compound, e.g. ruthenium alkoxide, followed by drying of the gelled material so that the resultant catalyst is very uniformly impregnated with the ruthenium ingredient to be imparted with greatly improved catalytis activity and selectivity for the intended reaction over conventional ruthenium-containing catalysts prepared by post-impregnation of a preformed silica gel carrier.

    摘要翻译： 本发明提供了通过含钌固体催化剂催化的水的混合在液相中芳族烃化合物的部分核氢化的改进。 本发明的范围是使用负载在硅胶等载体上的新型含钌催化剂，并且通过在含有钌化合物的溶液中水解和凝胶化硅或铝的醇盐来制备催化剂， 例如 钌醇盐，然后干燥凝胶材料，使得所得到的催化剂非常均匀地浸渍钌成分，与所用的含钌催化剂相比，通过后浸渍法制备的催化剂活性和选择性大大提高。 预制的硅胶载体。

    (aza)indolizine derivative and pharmaceutical use thereof
    42.
    发明授权
    (aza)indolizine derivative and pharmaceutical use thereof 有权

    公开(公告)号：US09643969B2

    公开(公告)日：2017-05-09

    申请号：US13824147

    申请日：2011-09-28

    申请人： Masato Iizuka ,  Kazuo Shimizu

    发明人： Masato Iizuka ,  Kazuo Shimizu

    IPC分类号： C07D487/04 ,  C07D471/04

    CPC分类号： C07D487/04 ,  C07D471/04

    摘要： (Aza)indolizine derivatives represented by Formula (I) having xanthine oxidase inhibitory activities and useful as agents for the prevention or treatment of a disease associated with abnormality of serum uric acid level, prodrugs thereof, salts thereof or the like. In Formula (I), 0 to 2 of X1, X2, X3 and X4 are a nitrogen atom and the others are CR1; one of T1 and T2 represents cyano and the other represents a group represented by Formula (A), with the proviso that when T1 is cyano, at least one of X1 to X4 is a nitrogen atom; R1 independently represents a hydrogen atom, a halogen atom, a hydroxy group, C1-6 alkyl, C1-6 alkoxy or the like; ring U represents a benzene ring or the like; m represents integral number from 0 to 2; R2 independently represents a fluorine atom, a hydroxy group or the like.

    Nitrogenous fused-ring derivatives, medicinal compositions containing the derivatives, and use thereof as drugs
    44.
    发明授权
    Nitrogenous fused-ring derivatives, medicinal compositions containing the derivatives, and use thereof as drugs 有权
    含氮稠环衍生物，含有衍生物的药物组合物及其作为药物的用途

    公开(公告)号：US07998975B2

    公开(公告)日：2011-08-16

    申请号：US12032411

    申请日：2008-02-15

    申请人： Nobuhiko Fushimi ,  Hirotaka Teranishi ,  Kazuo Shimizu ,  Shigeru Yonekubo ,  Fumiaki Ito ,  Masayuki Isaji

    发明人： Nobuhiko Fushimi ,  Hirotaka Teranishi ,  Kazuo Shimizu ,  Shigeru Yonekubo ,  Fumiaki Ito ,  Masayuki Isaji

    IPC分类号： A61K31/44 ,  A61K31/405 ,  A01N43/38

    CPC分类号： A61K31/7056 ,  A61K31/706 ,  C07H17/02

    摘要： The present invention provides nitrogen-containing fused-ring derivatives represented by the following general formula, or pharmaceutically acceptable salts thereof, or prodrugs thereof, which exhibit an excellent inhibitory activity in human SGLT and are useful as agents for the prevention or treatment of a disease associated with hyperglycemia such as diabetes, postprandial hyperglycemia, impaired glucose tolerance, diabetic complications or obesity, in the formula R1 represent H, an optionally substituted alkyl group, an alkenyl group, etc.; R2 represent H, a halogen atom or an alkyl group; R3 and R4 represent H, OH, a halogen atom, an optionally substituted alkyl group, etc.; Y represents CH or N; Q represents alkylene, alkenylene, etc.; ring A represents an aryl group or a heteroaryl group; G represents a group represented by the following general formula (G-1) or (G-2) (in which E1 represents H, F or OH; and E2 represents H, F, a methyl group, etc.), and pharmaceutical compositions comprising the same, and pharmaceutical uses thereof.

    摘要翻译： 本发明提供由以下通式表示的含氮稠环衍生物或其药学上可接受的盐或其前药，其在人SGLT中表现出优异的抑制活性，并且可用作预防或治疗疾病的药剂 与糖尿病，餐后高血糖症，葡萄糖耐量降低，糖尿病并发症或肥胖症等高血糖相关，在式R 1中表示H，任选取代的烷基，烯基等; R2表示H，卤素原子或烷基; R3和R4代表H，OH，卤素原子，任选取代的烷基等; Y表示CH或N; Q表示亚烷基，亚烯基等; 环A表示芳基或杂芳基; G表示由以下通式（G-1）或（G-2）表示的基团（其中E1表示H，F或OH; E2表示H，F，甲基等）和药物组合物 包括它们的药物用途。

    Polishing apparatus and polishing pad
    48.
    发明授权
    Polishing apparatus and polishing pad 失效
    抛光设备和抛光垫

    公开(公告)号：US07081044B2

    公开(公告)日：2006-07-25

    申请号：US10450647

    申请日：2002-06-12

    申请人： Shinro Ohta ,  Kazuo Shimizu

    发明人： Shinro Ohta ,  Kazuo Shimizu

    IPC分类号： B24B1/00 ,  B24D11/00

    CPC分类号： B24B37/205 ,  H01L21/30625

    摘要： A polishing pad (10) has an upper-layer pad (11) having a hole (11a) defined therein, a light-transmittable window (41) disposed in the hole (11a) for allowing light to pass therethrough, and a lower-layer pad (12) disposed below the upper-layer pad (11) and having a light passage hole (12a) defined therein which has substantially the same diameter as the hole (11a) in the upper-layer pad (11). A transparent film (13) with an adhesive agent applied to upper and lower surfaces thereof is interposed between the upper-layer pad (11) and the lower-layer pad (12). The hole (11a) defined in the upper-layer pad (11) and the light passage hole (12a) defined in the lower-layer pad (12) have substantially the same size as each other.

    摘要翻译： 抛光垫（10）具有其中限定有孔（11a）的上层衬垫（11），设置在孔（11a）中以允许光通过的透光窗（41）和 下层焊盘（12），其设置在上层焊盘（11）的下方，并且具有限定在其中的光通过孔（12a），其具有与上层焊盘（11）中的孔（11a）基本相同的直径 ）。 在上层衬垫（11）和下层衬垫（12）之间插入具有施加到其上表面和下表面的粘合剂的透明膜（13）。 限定在上层衬垫（11）中限定的孔（11a）和限定在下层衬垫（12）中的光通孔（12a）具有大致相同的尺寸。

    Polishing apparatus
    50.
    发明授权
    Polishing apparatus 有权
    抛光设备

    公开(公告)号：US06558229B2

    公开(公告)日：2003-05-06

    申请号：US09760823

    申请日：2001-01-17

    申请人： Norio Kimura ,  Hideji Isobe ,  Kazuo Shimizu ,  Hiroyuki Osawa

    发明人： Norio Kimura ,  Hideji Isobe ,  Kazuo Shimizu ,  Hiroyuki Osawa

    IPC分类号： B24B4910

    CPC分类号： B24B37/013 ,  B24B49/04 ,  B24B49/10 ,  H01L21/30625

    摘要： A polishing apparatus is used for polishing a substrate such as a semiconductor wafer, and has a sensor capable of continuously detecting the thickness of an electrically conductive layer. The polishing apparatus includes a polishing table having a polishing surface, and a top ring for holding and pressing the substrate against the polishing surface to polish the surface of the substrate. A sensor such as an eddy-current sensor is disposed below the polishing surface of the polishing table for measuring the thickness of a conductive layer formed on the surface of the substrate.

    摘要翻译： 抛光装置用于抛光诸如半导体晶片的基板，并且具有能够连续地检测导电层的厚度的传感器。 抛光装置包括具有抛光表面的抛光台和用于将基板保持并压靠在抛光表面上以抛光基板的表面的顶环。 诸如涡电流传感器的传感器设置在抛光台的抛光表面下方，用于测量在基板表面上形成的导电层的厚度。