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60 条记录 (耗时 0.019 秒)

    Positive-tone photoresist containing diester dissolution inhibitors
    42.
    发明授权
    Positive-tone photoresist containing diester dissolution inhibitors 失效
    含有二酯溶解抑制剂的正色光致抗蚀剂

    公开(公告)号：US5532106A

    公开(公告)日：1996-07-02

    申请号：US299213

    申请日：1994-08-31

    申请人： Jean M. J. Frechet ,  Sze-Ming Lee

    发明人： Jean M. J. Frechet ,  Sze-Ming Lee

    IPC分类号： G03F7/004 ,  G03F7/023

    CPC分类号： G03F7/0045 ,  Y10S430/143 ,  Y10S430/168

    摘要： A positive-tone photoresist is provided. The photoresist comprises a polymer, a photoactive agent, and a dissolution inhibitor. The dissolution inhibitor comprises a compound of Formula I: ##STR1## wherein R.sub.1 is a C.sub.1 -C.sub.20 alkyl, cyclo alkyl, bensyl, phenyl, alkyl substituted cyclo alkyl, alkoxy substituted cyclo alky, alkyl substituted phenyl, alkoxy substituted phenyl, acetoxy substituted phenyl, hydroxy substituted phenyl, t-butyloxycarbonyloxy substituted phenyl, diphenyl alkyl, alkyl substituted diphenyl, alkoxy substituted diphenyl, alkyl substituted diphenyl alkyl, or alkoxy substituted diphenyl alkyl; and R.sub.2 is a C.sub.1 -C.sub.20 alkyl, cyclo alkyl, benzyl, phenyl, alkyl substituted cyclo alkyl, alkoxy substituted cyclo alkyl, alkyl substituted phenyl, alkoxy substituted phenyl, hydroxy substituted phenyl, acetoxy substituted phenyl, or t-butyloxycarbonyloxy substituted phenyl.The present invention also provides a method of making microelectronic structures.

    摘要翻译： 提供正色光致抗蚀剂。 光致抗蚀剂包括聚合物，光活性剂和溶解抑制剂。 溶解抑制剂包括式I化合物：其中R 1是C 1 -C 20烷基，环烷基，苯甲基，苯基，烷基取代的环烷基，烷氧基取代的环烷基，烷基取代的苯基，烷氧基取代的苯基， 乙酰氧基取代的苯基，羟基取代的苯基，叔丁氧基羰氧基取代的苯基，二苯基烷基，烷基取代的二苯基，烷氧基取代的二苯基，烷基取代的二苯基烷基或烷氧基取代的二苯基烷基; 烷氧基取代的环烷基，烷基取代的苯基，烷氧基取代的苯基，羟基取代的苯基，乙酰氧基取代的苯基，或叔丁氧基羰基氧基取代的苯基，其中R 2是C 1 -C 20烷基，环烷基，苄基，苯基，烷基取代的环烷基。 本发明还提供了一种制造微电子结构的方法。

    Preparation of graft copolymers from macromolecules containing reactive tertiary structures
    44.
    发明授权
    Preparation of graft copolymers from macromolecules containing reactive tertiary structures 失效
    从含有反应性三级结构的大分子制备接枝共聚物

    公开(公告)号：US5214105A

    公开(公告)日：1993-05-25

    申请号：US774838

    申请日：1991-10-11

    申请人： Jean M. J. Frechet

    发明人： Jean M. J. Frechet

    IPC分类号： C08F8/00

    CPC分类号： C08F8/00 ,  Y10S525/918

    摘要： Novel styrene derivatives are disclosed of the formula: ##STR1## wherein R.sub.1 and R.sub.2 are the same or different and each represents a saturated aliphatic hydrocarbon group or an aromatic hydrocarbon group, and R.sub.3 is --OH, Cl, or a group of the formula --OR.sub.4 or ##STR2## wherein R.sub.4 represents a saturated aliphatic hydrocarbon group or an aromatic hydrocarbon groups. The functionalized styrene monomers I as well as polymers and copolymers incorporating such monomer units are useful as initiators, or precursors thereof, for the polymerization of isobutylene under cationic conditions to give graft copolymers containing both styrenic and isobutylenic units. These copolymers have commercial applications such as rubbers, coatings, and luricants.

    摘要翻译： 公开了新的苯乙烯衍生物，其具有下式：其中R 1和R 2相同或不同，并且各自表示饱和脂族烃基或芳族烃基，R 3是-OH，Cl或一组 式-OR4或者其中R4代表饱和脂族烃基或芳族烃基的式。 官能化苯乙烯单体I以及掺入这种单体单元的聚合物和共聚物可用作引发剂或其前体，用于在阳离子条件下聚合异丁烯以产生含有苯乙烯和异丁烯单元的接枝共聚物。 这些共聚物具有商业应用，例如橡胶，涂料和润肤剂。

    Thermally stable photoresists with high sensitivity
    45.
    发明授权
    Thermally stable photoresists with high sensitivity 失效
    热稳定的光致抗蚀剂具有高灵敏度

    公开(公告)号：US4939070A

    公开(公告)日：1990-07-03

    申请号：US215966

    申请日：1988-07-07

    申请人： William R. Brunsvold ,  Ming-Fea Chow ,  Willard E. Conley ,  Dale M. Crockatt ,  Jean M. J. Frechet ,  George J. Hefferon ,  Hiroshi Ito ,  Nancy E. Iwamoto ,  Carlton G. Willson

    发明人： William R. Brunsvold ,  Ming-Fea Chow ,  Willard E. Conley ,  Dale M. Crockatt ,  Jean M. J. Frechet ,  George J. Hefferon ,  Hiroshi Ito ,  Nancy E. Iwamoto ,  Carlton G. Willson

    IPC分类号： G03F7/039

    CPC分类号： G03F7/039 ,  Y10S430/143 ,  Y10S430/168

    摘要： The present invention discloses particular lithographic polymeric materials and methods of using these materials, wherein the polymeric materials have acid labile or photolabile groups pendant to the polymer backbone. The polymeric materials are sufficiently transparent to deep UV radiation to permit deep UV imaging, can be used to produce resist structures having thermal stability at temperatures greater than about 160.degree. C., and are sufficiently resistant to excessive crosslinking when heated to temperatures ranging from about 160.degree. C. to about 250.degree. C. that they remain soluble in common lithographic developers and strippers.The present invention also discloses resists comprising substituted polyvinyl benzoates which, after imaging, exhibit unexpectedly high thermal stability, in terms of plastic flow. These resists cannot be imaged using deep UV because they exhibit such a high degree of opacity below 280 nm; however, they are useful as the top, imaging layer in a bilayer resist process wherein the top layer acts as a mask during deep UV exposure of the bottom layer.

    摘要翻译： 本发明公开了特定的平版印刷聚合物材料和使用这些材料的方法，其中聚合物材料具有垂直于聚合物主链的酸不稳定性或光不稳定性基团。 聚合物材料对于深紫外线辐射具有足够的透明度以允许深紫外成像，可用于生产在大于约160℃的温度下具有热稳定性的抗蚀剂结构，并且当加热至约 160℃至约250℃，它们仍溶于普通的平版印刷显影剂和剥离剂。 本发明还公开了包含取代的聚乙烯基苯甲酸酯的抗蚀剂，其在成像之后，在塑性流动方面表现出意想不到的高热稳定性。 这些抗蚀剂不能使用深紫外成像，因为它们在280nm以下表现出如此高的不透明度; 然而，它们可用作双层抗蚀剂工艺中的顶部成像层，其中顶层在底层的深紫外线曝光期间用作掩模。

    Surface tension mediated conversion of light to work
    48.
    发明授权
    Surface tension mediated conversion of light to work 有权
    表面张力介导光转换工作

    公开(公告)号：US08899044B2

    公开(公告)日：2014-12-02

    申请号：US13069131

    申请日：2011-03-22

    申请人： David Okawa ,  Stefan J. Pastine ,  Alexander K. Zettl ,  Jean M. J. Frechet

    发明人： David Okawa ,  Stefan J. Pastine ,  Alexander K. Zettl ,  Jean M. J. Frechet

    IPC分类号： B60K16/00 ,  F03G6/00 ,  A61N5/00 ,  G21G5/00 ,  B82Y15/00 ,  B82Y30/00

    CPC分类号： B82Y15/00 ,  B82Y30/00 ,  Y02E10/46

    摘要： Disclosed are a method and apparatus for converting light energy to mechanical energy by modification of surface tension on a supporting fluid. The apparatus comprises an object which may be formed as a composite object comprising a support matrix and a highly light absorptive material. The support matrix may comprise a silicon polymer. The highly light absorptive material may comprise vertically aligned carbon nanotubes (VANTs) embedded in the support matrix. The composite object is supported on a fluid. By exposing the highly light absorptive material to light, heat is generated, which changes the surface tension of the composite object, causing it to move physically within the fluid.

    摘要翻译： 公开了一种通过修改支撑流体上的表面张力将光能转换成机械能的方法和装置。 该装置包括可以形成为包括支撑矩阵和高光吸收材料的复合物体的物体。 载体基质可以包含硅聚合物。 高光吸收材料可以包括嵌入支撑基质中的垂直排列的碳纳米管（VANT）。 复合物体支撑在流体上。 通过将高光吸收材料暴露于光，产生热量，这会改变复合物体的表面张力，使其在流体内物理移动。

    Microcapsule and methods of making and using microcapsules
    49.
    发明授权
    Microcapsule and methods of making and using microcapsules 有权
    微胶囊和制备和使用微胶囊的方法

    公开(公告)号：US08822618B2

    公开(公告)日：2014-09-02

    申请号：US13393183

    申请日：2010-09-02

    申请人： David C. Okawa ,  Stefan J. Pastine ,  Alexander K. Zettl ,  Jean M. J. Frechet

    发明人： David C. Okawa ,  Stefan J. Pastine ,  Alexander K. Zettl ,  Jean M. J. Frechet

    IPC分类号： C08F32/06 ,  B29D11/00 ,  C09K3/00 ,  B01J13/16 ,  C09B67/02

    CPC分类号： B01J13/16 ,  C09B67/0097 ,  Y10S977/742 ,  Y10S977/762 ,  Y10S977/773 ,  Y10S977/774

    摘要： An embodiment of a microcapsule includes a shell surrounding a space, a liquid within the shell, and a light absorbing material within the liquid. An embodiment of a method of making microcapsules includes forming a mixture of a light absorbing material and an organic solution. An emulsion of the mixture and an aqueous solution is then formed. A polymerization agent is added to the emulsion, which causes microcapsules to be formed. Each microcapsule includes a shell surrounding a space, a liquid within the shell, and light absorbing material within the liquid. An embodiment of a method of using microcapsules includes providing phototriggerable microcapsules within a bulk material. Each of the phototriggerable microcapsules includes a shell surrounding a space, a chemically reactive material within the shell, and a light absorbing material within the shell. At least some of the phototriggerable microcapsules are exposed to light, which causes the chemically reactive material to release from the shell and to come into contact with bulk material.

    摘要翻译： 微胶囊的一个实施方案包括围绕空间的壳体，壳体内的液体和液体内的光吸收材料。 制造微胶囊的方法的一个实施方案包括形成光吸收材料和有机溶液的混合物。 然后形成混合物的乳液和水溶液。 向乳液中加入聚合剂，导致形成微胶囊。 每个微胶囊包括围绕空间的壳体，壳体内的液体和液体内的光吸收材料。 使用微胶囊的方法的一个实施方案包括在散装材料内提供可光触发的微胶囊。 每个可光触发的微胶囊包括围绕空间的外壳，壳内的化学反应性材料，以及壳内的光吸收材料。 至少一些可光触发的微胶囊暴露于光，这导致化学反应性材料从壳体释放并与散装材料接触。