公开(公告)号：US07700930B2

公开(公告)日：2010-04-20

申请号：US11898800

申请日：2007-09-14

申请人： Edwin Johan Buis ,  Tjarko Adriaan Rudolf Van Empel

发明人： Edwin Johan Buis ,  Tjarko Adriaan Rudolf Van Empel

IPC分类号： G21K5/10

CPC分类号： G03F7/70916 ,  B01D45/14 ,  C04B35/522 ,  C04B35/573 ,  C04B35/83 ,  C04B2235/5248 ,  C04B2235/5268 ,  G03F7/70166 ,  G03F7/7095

摘要： A lithographic apparatus including a filter device is disclosed. The filter device has a plurality of foils attached to a holder which is able to rotate around a rotation axis. The foils are arranged substantially parallel to the rotation axis. The foils comprise a uni-directional carbon-fiber composite material selected from the group consisting of carbon-carbon composite (C-C composite) and carbon-silicon carbide composite (C—SiC composite). During operation, the filter device rotates and filters out debris from a radiation source, such as a Sn plasma source. Such a filter device per se may be provided.

摘要翻译： 公开了一种包括过滤装置的光刻设备。 过滤装置具有多个箔片，其附接到能够围绕旋转轴线旋转的保持器。 箔片基本上平行于旋转轴线布置。 箔包含选自由碳 - 碳复合材料（C-C复合材料）和碳 - 碳化硅复合材料（C-SiC复合材料）组成的组的单向碳纤维复合材料。 在操作期间，过滤装置旋转并过滤来自诸如Sn等离子体源的辐射源的碎屑。 可以提供这样的过滤装置本身。

公开(公告)号：US20090207392A1

公开(公告)日：2009-08-20

申请号：US12389077

申请日：2009-02-19

申请人： Albert Pieter RIJPMA ,  Tjarko Adriaan Rudolf Van Empel

发明人： Albert Pieter RIJPMA ,  Tjarko Adriaan Rudolf Van Empel

IPC分类号： G03B27/52

CPC分类号： G03B27/52 ,  G03F7/70875

摘要： A lithographic apparatus is configured to transfer a pattern from a patterning structure, held by a patterning structure holder, onto a substrate that is held by a substrate holder. The apparatus includes a first object holder configured to hold an object, and an object temperature conditioner configured to condition a temperature of the object prior to and/or during transfer of the object to the first object holder. The object temperature conditioner includes a second object holder having a fluid duct system and an electrical temperature conditioner.

摘要翻译： 光刻设备被配置为将图案化结构保持在图案形成结构保持器上的图案转移到由基板保持器保持的基板上。 该装置包括构造成保持物体的第一物体保持器和被配置为在物体转移到第一物体保持器之前和/或期间将物体的温度调节的对象温度调节器。 物体温度调节器包括具有流体管道系统和电温度调节器的第二物体保持器。

公开(公告)号：US20090001288A1

公开(公告)日：2009-01-01

申请号：US11819707

申请日：2007-06-28

申请人： Edwin Johan Buis ,  Vadim Yevgenyevich Banine ,  Tjarko Adriaan Rudolf Van Empel ,  Maarten Marinus Johannes Wilhelmus Van Herpen ,  Wouter Anthon Soer

发明人： Edwin Johan Buis ,  Vadim Yevgenyevich Banine ,  Tjarko Adriaan Rudolf Van Empel ,  Maarten Marinus Johannes Wilhelmus Van Herpen ,  Wouter Anthon Soer

IPC分类号： G03F7/20

CPC分类号： G03F7/70916

摘要： A lithographic apparatus includes a radiation system constructed to provide a beam of radiation from radiation emitted by a radiation source. The radiation system includes a contaminant trap configured to trap material emanating from the radiation source. The contaminant trap includes a contaminant engaging surface arranged in the path of the radiation beam that receives the material emanating from the radiation source during propagation of the radiation beam in the radiation system. The radiation system also includes a liquid tin cooling system constructed to cooling the contaminant trap with liquid tin. The apparatus includes an illumination system configured to condition the radiation beam, a support constructed to support a patterning device configured to impart the radiation beam with a pattern in its cross-section, a substrate table constructed to hold a substrate, and a projection system configured to project the patterned radiation beam onto a target portion of the substrate.

公开(公告)号：US07446849B2

公开(公告)日：2008-11-04

申请号：US10896000

申请日：2004-07-22

申请人： Tjarko Adriaan Rudolf Van Empel ,  Erik Roelof Loopstra ,  Antonius Johannes Van Der Net ,  Yuri Johannes Gabriel Van De Vijver ,  Bernard Gellrich ,  Bauke Jansen ,  Rens Sanderse

发明人： Tjarko Adriaan Rudolf Van Empel ,  Erik Roelof Loopstra ,  Antonius Johannes Van Der Net ,  Yuri Johannes Gabriel Van De Vijver ,  Bernard Gellrich ,  Bauke Jansen ,  Rens Sanderse

IPC分类号： G03B27/52 ,  G03B27/42

CPC分类号： G03F7/70933 ,  G03F7/70908

摘要： A lithographic apparatus is disclosed. The apparatus includes a projection system configured to project a patterned radiation beam onto a target portion of a substrate. The projection system includes a housing and a plurality of optical elements arranged in the housing. The apparatus also includes an inlet for feeding conditioned gas to the housing and a gas exhaust for exhausting the conditioned gas from the housing for providing a gas conditioned environment in the housing. At least one gate is provided for providing communication of the gas conditioned environment with ambient atmosphere. The gate is arranged to provide a predetermined leakage of the conditioned gas to the ambient atmosphere.

摘要翻译： 公开了一种光刻设备。 该装置包括投影系统，其配置成将图案化的辐射束投影到基板的目标部分上。 投影系统包括壳体和布置在壳体中的多个光学元件。 该设备还包括用于将调节气体供给到壳体的入口和用于从壳体排出调节气体的排气口，以在壳体中提供气体调节环境。 提供至少一个门，用于提供气体环境与环境气氛的通信。 门被设置成将经调节的气体预定的泄漏提供给环境大气。

公开(公告)号：US20060158638A1

公开(公告)日：2006-07-20

申请号：US11312654

申请日：2005-12-21

申请人： Koen Maria Zaal ,  Tjarko Adriaan Rudolf Van Empel ,  Hendricus Meijer ,  Joost Ottens ,  Marco Kluse ,  Jan Hopman

发明人： Koen Maria Zaal ,  Tjarko Adriaan Rudolf Van Empel ,  Hendricus Meijer ,  Joost Ottens ,  Marco Kluse ,  Jan Hopman

IPC分类号： G03B27/58

CPC分类号： G03F7/707 ,  G03F7/70708 ,  G03F7/70783

摘要： A lithographic projection apparatus is disclosed. The apparatus includes an illuminator for conditioning a beam of radiation, and an article holder. The article holder includes a plurality of protrusions arranged to provide a substantially flat plane of support for supporting an article to be placed in a beam path of the beam of radiation. The protrusions are generally spaced apart equidistantly at a first distance. The article holder also includes a pair of electrodes for clamping the article to the holder. The electrodes are disposed in substantially the same plane above or below the protrusions, and are spaced apart from one another by a gap. Neighboring protrusions within the plurality of protrusions that are located on opposite sides of the gap are spaced apart by a second distance that is greater than the first distance.

公开(公告)号：US06933513B2

公开(公告)日：2005-08-23

申请号：US10140437

申请日：2002-05-08

申请人： Tjarko Adriaan Rudolf Van Empel ,  Raymond Laurentius Johannes Schrijver ,  Johannes Andreas Henricus Maria Jacobs ,  Nicolaas Rudolf Kemper ,  Nicolaas Franciscus Koppelaars

发明人： Tjarko Adriaan Rudolf Van Empel ,  Raymond Laurentius Johannes Schrijver ,  Johannes Andreas Henricus Maria Jacobs ,  Nicolaas Rudolf Kemper ,  Nicolaas Franciscus Koppelaars

IPC分类号： G03F7/20 ,  G21G5/00 ,  G03B27/42 ,  G03B27/52 ,  G21G4/00

CPC分类号： G03F7/70983 ,  G03F7/70716 ,  G03F7/70858 ,  G03F7/70866 ,  G03F7/70933

摘要： In a lithographic apparatus using exposure radiation of a relatively short wavelength, e.g. 157 or 126 nm, a laminar flow of N2 is provided across parts of the beam path in or adjacent to moving components of the apparatus. A variety of structures may be used to provide the laminar flow including a screen, a settling chamber, an angled inlet port and a flow path having increasing cross-sectional area.

摘要翻译： 在使用相对较短波长的曝光辐射的光刻设备中，例如， 157或126nm，在设备的移动部件中或与其邻近的横梁的横跨两部分提供了N 2层的流动。 可以使用各种结构来提供层流，包括筛网，沉降室，成角度的入口和具有增加的横截面积的流动路径。