公开(公告)号：US20120039211A1

公开(公告)日：2012-02-16

申请号：US13147029

申请日：2010-01-29

申请人： Yuichiro Nakamura ,  Yasuhiro Kawabe ,  Masafumi Masuda

发明人： Yuichiro Nakamura ,  Yasuhiro Kawabe ,  Masafumi Masuda

IPC分类号： H04W24/00 ,  H04L12/26

CPC分类号： H04W72/048 ,  H04W76/27

摘要： A radio controller 03 of the present invention includes a threshold value holding unit 11 configured to associate a traffic channel configuration with at least one threshold value and hold these associated traffic channel configuration and threshold value, a threshold value extraction unit 13 configured to extract at least one threshold value associated with a traffic channel configuration of a mobile station and a threshold value determination unit 14 configured to determine whether or not to change the traffic channel configuration of the mobile station by comparing the extracted threshold value with a communication state at a predetermined timing.

摘要翻译： 本发明的无线控制器03包括阈值保持单元11，其被配置为将业务信道配置与至少一个阈值相关联并保持这些相关联的业务信道配置和阈值;阈值提取单元13，被配置为至少提取 与移动站的业务信道配置相关联的一个阈值和阈值确定单元14，其被配置为通过将提取的阈值与预定定时的通信状态进行比较来确定是否改变移动站的业务信道配置 。

公开(公告)号：US09328412B2

公开(公告)日：2016-05-03

申请号：US13816043

申请日：2011-08-05

申请人： Shin-ichi Ogino ,  Yuichiro Nakamura

发明人： Shin-ichi Ogino ,  Yuichiro Nakamura

IPC分类号： C23C14/34 ,  G11B5/851 ,  H01F41/18 ,  H01J37/34 ,  H01F1/06 ,  C23C14/14

CPC分类号： C23C14/3414 ,  C23C14/14 ,  G11B5/851 ,  H01F1/068 ,  H01F41/183 ,  H01J37/3405 ,  H01J37/3426 ,  H01J37/3429

摘要： An Fe—Pt-based ferromagnetic material sputtering target comprising a metal and a metal oxide, wherein the metal has a composition in which Pt is contained in an amount of 5 mol % or more and 60 mol % or less and the remainder is Fe. An object of the present invention is to provide a ferromagnetic material sputtering target, which enables to form a magnetic recording layer composed of a magnetic phase such as an Fe—Pt alloy, and a non-magnetic phase to isolate the magnetic phase, and in which a metal oxide is used as one of the materials for the non-magnetic phase. Provided is a ferromagnetic material sputtering target wherein an inadvertent release of the metal oxide during sputtering and particle generation due to abnormal electrical discharge starting at a void inherently included in the target are suppressed, the adherence between the metal oxide and the matrix alloy is enhanced, and its density is increased.

摘要翻译： 包含金属和金属氧化物的Fe-Pt系铁磁材料溅射靶，其中，所述金属的含量为5摩尔％以上且60摩尔％以下且余量为Fe的组成。 本发明的目的是提供一种铁磁材料溅射靶，其能够形成由诸如Fe-Pt合金的磁相和非磁性相组成的磁记录层以隔离磁相，并且在 其中使用金属氧化物作为非磁性相的材料之一。 本发明提供一种强磁性材料溅射靶，其特征在于，抑制溅射时的金属氧化物的无意的释放以及由于靶内固有地形成的空穴而产生的异常放电而产生的粒子，从而提高了金属氧化物与基体合金之间的粘附性， 其密度增加。

公开(公告)号：US09181617B2

公开(公告)日：2015-11-10

申请号：US13808938

申请日：2011-01-28

申请人： Shin-ichi Ogino ,  Atsushi Sato ,  Yuichiro Nakamura ,  Atsutoshi Arakawa

发明人： Shin-ichi Ogino ,  Atsushi Sato ,  Yuichiro Nakamura ,  Atsutoshi Arakawa

IPC分类号： H01F41/18 ,  C23C14/34 ,  C22C1/04 ,  C22C19/07 ,  C22C32/00 ,  C22F1/10 ,  G11B5/851 ,  H01F10/16

CPC分类号： C23C14/3407 ,  C22C1/0433 ,  C22C19/07 ,  C22C32/0026 ,  C22F1/10 ,  C23C14/3414 ,  G11B5/851 ,  H01F10/16 ,  H01F41/18

摘要： Provided is a sputtering target of ferromagnetic material comprising a metal having a composition containing 20 mol % or less of Cr, and Co as the remainder; wherein the target structure includes a phase (A) which is a basis metal, and metal phases (B) having a component composition different from the peripheral texture within the phase (A), the area ratio occupied by oxides within 1 μm from the most outer periphery of metal phases (B) is 80% or less, and the average grain size of the metal phases (B) is 10 μm or more and 150 μm or less. Provided is a sputtering target of ferromagnetic material capable of inhibiting the generation of particles during sputtering, and improving the pass-through flux to achieve a stable electrical discharge with a magnetron sputtering device.

摘要翻译： 提供一种铁磁材料的溅射靶，其包含具有20摩尔％以下的Cr的组成的金属，余量为Co; 其特征在于，所述目标结构体包括作为基础金属的相（A）和具有与相（A）以外的周边构造不同的成分组成的金属相（B），最大范围内的氧化物占所述面积比1μm以内 金属相（B）的外周的平均粒径为80％以下，金属相（B）的平均粒径为10μm以上且150μm以下。 本发明提供能够抑制溅射时粒子产生的强磁性材料的溅射靶，提高通过磁通以通过磁控溅射装置实现稳定的放电。

公开(公告)号：US08663402B2

公开(公告)日：2014-03-04

申请号：US13025207

申请日：2011-02-11

申请人： Yuichiro Nakamura ,  Akira Hisano

发明人： Yuichiro Nakamura ,  Akira Hisano

IPC分类号： C22C19/07

CPC分类号： C23C14/3414 ,  C23C14/3407 ,  Y10T29/49989

摘要： A sputtering target and surface processing method is provided. Intermetallic compounds, oxides, carbides, carbonitrides and other substances without ductility exist in the target surface in a highly ductile matrix phase at a volume ratio of 1 to 50%. The target surface is preliminarily subjected to primary processing of cutting work, and then subsequently subjected to finish processing via polishing. The sputtering target subject to this surface processing has an improved target surface with numerous substances without ductility and prevents or suppresses the generation of nodules and particles upon sputtering.

摘要翻译： 提供溅射靶和表面处理方法。 金属间化合物，氧化物，碳化物，碳氮化物和其他没有延展性的物质以高达延性基体相的体积比为1〜50％存在于靶表面。 目标表面预先进行切割加工的一次加工，然后通过研磨进行精加工。 受到这种表面处理的溅射靶具有改进的目标表面，具有许多没有延展性的物质，并且防止或抑制溅射时产生结节和颗粒。

公开(公告)号：US20130213802A1

公开(公告)日：2013-08-22

申请号：US13878438

申请日：2011-12-02

申请人： Atsushi Sato ,  Yuichiro Nakamura

发明人： Atsushi Sato ,  Yuichiro Nakamura

IPC分类号： C23C14/34

CPC分类号： C23C14/3407 ,  B22F3/14 ,  C22C1/10 ,  C22C19/07 ,  C22C30/00 ,  C22C32/0026 ,  C22F1/10 ,  C23C14/3414 ,  G11B5/851

摘要： A sintered compact sputtering target is provided and contains Co and Cr as metal components and includes oxides dispersed in the structure formed of the metal components. The structure of the sputtering target has a region (A) containing Co oxides dispersed in Co and a region (D) containing Cr oxides in a periphery of the region (A). In addition a method of producing the above referenced sintered compact sputtering target is provided and includes the steps of mixing a powder prepared by pulverizing a sintered compact containing Co oxide dispersed in Co, a Co powder, and a Cr power and pressure-sintering the resulting powder mixture to provide a sputtering target.

摘要翻译： 提供了一种烧结微型溅射靶，其包含Co和Cr作为金属成分，并且包括分散在由金属成分形成的结构中的氧化物。 溅射靶的结构具有分布在Co中的Co氧化物的区域（A）和区域（A）的周围含有Cr氧化物的区域（D）。 此外，提供了制造上述烧结体的溅射靶的方法，包括以下步骤：将通过粉碎分散在Co中的Co氧化物的烧结体，Co粉末和Cr粉末进行粉碎而制备的粉末，并将所得到的粉末进行加压烧结 粉末混合物以提供溅射靶。

公开(公告)号：US20130206591A1

公开(公告)日：2013-08-15

申请号：US13880865

申请日：2011-11-09

申请人： Hideo Takami ,  Atsushi Nara ,  Shin-ichi Ogino ,  Yuichiro Nakamura

发明人： Hideo Takami ,  Atsushi Nara ,  Shin-ichi Ogino ,  Yuichiro Nakamura

IPC分类号： C23C14/34

CPC分类号： C23C14/3414 ,  B22F2998/10 ,  C22C1/101 ,  C22C19/07 ,  C22C38/002 ,  C22C2202/02 ,  C22F1/00 ,  C22F1/16 ,  G11B5/851 ,  H01F41/183 ,  B22F9/04 ,  C22C1/05 ,  B22F3/10

摘要： Provided is a sputtering target for a magnetic recording film containing SiO2, wherein the sputtering target for a magnetic recording film contains B (boron) in an amount of 10 to 1000 wtppm. An object of this invention is to obtain a sputtering target for a magnetic recording film capable of inhibiting the formation of cristobalites in the target which cause the generation of particles during sputtering, shortening the burn-in time, and realizing a stable discharge with a magnetron sputtering device.

摘要翻译： 提供了一种用于含有SiO 2的磁记录膜的溅射靶，其中用于磁记录膜的溅射靶含有10至1000重量ppm的B（硼）。 本发明的目的是获得能够抑制溅射中产生颗粒的目标中形成方英石的磁记录膜的溅射靶，缩短烧结时间，并且用磁控管实现稳定的放电 溅射装置。

公开(公告)号：US20130065053A1

公开(公告)日：2013-03-14

申请号：US13641536

申请日：2011-04-27

申请人： Takeyasu Kikuchi ,  Kazumasa Morita ,  Koji Higashi ,  Yuichiro Nakamura

发明人： Takeyasu Kikuchi ,  Kazumasa Morita ,  Koji Higashi ,  Yuichiro Nakamura

IPC分类号： B29C47/00

CPC分类号： B29C47/0066 ,  B29B9/06 ,  B29B9/065 ,  B29B9/12 ,  B29B9/14 ,  B29B9/16 ,  B29C47/0004 ,  B29C47/0011 ,  B29C47/0042 ,  B29C47/10 ,  B29C47/1009 ,  B29C47/1018 ,  B29C47/1027 ,  B29C47/1081 ,  B29C47/30 ,  B29C47/362 ,  B29C47/366 ,  B29C47/369 ,  B29C47/40 ,  B29C47/767 ,  B29C2793/0027 ,  B29C2793/009 ,  B29K2105/04 ,  B29K2105/16 ,  B29K2105/251 ,  B29K2711/14 ,  Y10T428/2982 ,  Y10T428/2991 ,  Y10T428/2998

摘要： Disclosed are composite pellets for extrusion molding wherein fusion does not occur between the pellets, and there is no variation in size and density. A molten material obtained by an extruder for a raw material containing a thermoplastic resin and wood powder is extruded into a strand shape through a die nozzle of the extruder, and cut into a predetermined length to form a pellet. At this time, the extrusion amount, the diameter of each nozzle hole, and the number of nozzle holes are adjusted so that the linear velocity (νd) of the molten material in each nozzle hole of the die nozzle is in the range of 12 to 50 cm/sec. Further, regardless of the variations in particle diameter, etc., a stable amount of the composite pellets are supplied to the extruder, and smoothly introduced to a screw of the extruder. The composite pellets and 12-hydroxystearic acid containing a metal of Ca, Mg, or Zn are agitated together, and 0.03 to 0.4 mass % of the 12-hydroxystearic acid is attached to the periphery of 100 mass % of the composite pellet, and the pellets are used for extrusion molding.

摘要翻译： 公开了用于挤出成型的复合颗粒，其中在颗粒之间不发生熔融，并且尺寸和密度没有变化。 通过挤出机将含有热塑性树脂和木粉的原料获得的熔融材料通过挤出机的模头喷嘴挤出成股线状，并切割成预定长度以形成丸粒。 此时，调整挤出量，每个喷嘴孔的直径和喷嘴孔的数量，使得在模具喷嘴的每个喷嘴孔中的熔融材料的线速度（＆ngr; d）在 12至50厘米/秒。 此外，不管粒径等的变化如何，将稳定量的复合颗粒供给到挤出机中，并且平稳地引入挤出机的螺杆。 将复合粒料和含有Ca，Mg或Zn的金属的12-羟基硬脂酸一起搅拌，将0.03〜0.4质量％的12-羟基硬脂酸附着在复合粒料的100质量％的周边， 颗粒用于挤出成型。

公开(公告)号：US20120097535A1

公开(公告)日：2012-04-26

申请号：US13320840

申请日：2010-09-30

申请人： Shin-ichi Ogino ,  Atsushi Sato ,  Yuichiro Nakamura ,  Atsutoshi Arakawa

发明人： Shin-ichi Ogino ,  Atsushi Sato ,  Yuichiro Nakamura ,  Atsutoshi Arakawa

IPC分类号： C23C14/06

CPC分类号： C23C14/3414 ,  B22F2998/00 ,  C22C19/07 ,  C22C32/00 ,  C22C2202/02 ,  H01F41/183 ,  C22C32/0026 ,  B22F9/082

摘要： A ferromagnetic sputtering target comprising metal having a composition containing 20 mol % or less of Cr, and Co as the remainder; wherein the target structure includes a basis metal (A), and flat phases (B), containing 90 wt % or more of Co, within the basis metal (A), the average grain size of the phases (B) is 10 μm or more and 150 μm or less, and the average aspect ratio of the phases (B) is 1:2 to 1:10. Provided is a ferromagnetic sputtering target capable of inhibiting the generation of particles during sputtering, and improving the pass-through flux to achieve a stable electrical discharge with a magnetron sputtering device.

摘要翻译： 一种铁磁溅射靶，其包含具有20摩尔％以下的Cr的组成的金属，余量为Co; 其特征在于，在所述基体金属（A）中，所述基体金属（A）和含有90重量％以上的Co的平坦相（B），所述相（B）的平均粒径为10μm， 多于150μm以下，相（B）的平均纵横比为1:2〜1:10。 本发明提供能够抑制溅射时的粒子产生的铁磁性溅射靶，提高通过磁通以通过磁控溅射装置实现稳定的放电。

公开(公告)号：US20110284373A1

公开(公告)日：2011-11-24

申请号：US13147782

申请日：2010-07-27

申请人： Atsushi Sato ,  Yuichiro Nakamura

发明人： Atsushi Sato ,  Yuichiro Nakamura

IPC分类号： C23C14/35

CPC分类号： G11B5/851 ,  C23C14/3414

摘要： Provided is an inorganic-particle-dispersed sputtering target in which inorganic particles are dispersed in a Co base material, wherein the inorganic particles have an electric resistivity of 1×101 Ω·m or less and the volume ratio of the inorganic particles in the target is 50% or less. The sputtering target thus adjusted is advantageous in that, when sputtering is performed using a magnetron sputtering device comprising a DC power source, the inorganic particles are less charged, and arcing occurs less frequently. Accordingly, by using the sputtering target of the present invention, the occurrence of particles attributable to the arcing reduces, and a significant effect of improving the yield in forming a thin film is obtained.

摘要翻译： 本发明提供一种无机粒子分散溅射靶，其中无机颗粒分散在Co基材料中，其中无机颗粒的电阻率为1×10 11Ω·m·m·m以下，无机颗粒的体积比 目标是50％以下。 如此调整的溅射靶的优点在于，当使用包括直流电源的磁控管溅射装置进行溅射时，无机颗粒的带电少，并且电弧放电频率较低。 因此，通过使用本发明的溅射靶，可以减少由于电弧引起的粒子的发生，并且获得提高薄膜形成的显着效果。

公开(公告)号：US20070001336A1

公开(公告)日：2007-01-04

申请号：US10569300

申请日：2003-08-26

申请人： Sadao Nishibori ,  Tatsumi Kobayashi ,  Maki Shirai ,  Yuichiro Nakamura

发明人： Sadao Nishibori ,  Tatsumi Kobayashi ,  Maki Shirai ,  Yuichiro Nakamura

IPC分类号： D21J3/00

CPC分类号： A47C27/122 ,  A47C27/12 ,  B62J1/18 ,  B62J1/26 ,  D04H3/037 ,  D04H3/16

摘要： There is provided a method for producing a cushion material composed of a resin molded article with a spring structure which is so moldable as to allow the mold take any shape and size, is cheap, and resistant to collapsing, does not cause fatigue even after prolonged use, and has high shock absorbing capability and load capacity, and thus suitably used as a material of any supports on which one can sit, rest or mount such as seats of automotive vehicles, motor cycles, bicycles, electric trains, and aircraft, saddles for horse riding, chairs, sofas and beds, and a method for producing a cushion material requiring only a low cost for its disposal.

摘要翻译： 提供一种用于制造由具有弹性结构的树脂模制品制成的缓冲材料的方法，该弹性结构是可模制的，以使得模具具有任何形状和尺寸，便宜且耐塌陷，即使在延长之后也不会引起疲劳 使用并且具有高的冲击吸收能力和负载能力，因此适合用作任何可以坐在，休息或安装的支撑物的材料，例如机动车辆，摩托车，自行车，电动火车和飞机的座椅，鞍座 用于骑马，椅子，沙发和床，以及用于生产仅需要低成本处理的衬垫材料的方法。