公开(公告)号：US06962825B2

公开(公告)日：2005-11-08

申请号：US09819673

申请日：2001-03-29

申请人： Eiichi Murakami

发明人： Eiichi Murakami

IPC分类号： G03F7/20 ,  G03F9/00 ,  H01L21/027 ,  H01L21/00 ,  G03B27/52

CPC分类号： G03F9/7096 ,  G03F7/70883 ,  G03F9/7026 ,  Y10S438/947

摘要： Disclosed is an exposure apparatus for printing, by exposure, a pattern of an original on a substrate, which includes a housing tightly filled with a predetermined ambience and for accommodating therein at least a portion of an exposure light optical axis, and a detection system having an optical system, wherein a portion of a light path of the detection system is disposed in a first space enclosed by the housing, and wherein at least another portion of the detection system including an electric element thereof is disposed in a second space outside the housing.

摘要翻译： 公开了一种曝光装置，用于通过曝光将原稿的图案印刷在基板上，该基板包括紧密填充有预定环境的外壳并且用于在其中容纳曝光光轴的至少一部分，以及检测系统，其具有 光学系统，其中所述检测系统的光路的一部分设置在由所述壳体包围的第一空间中，并且其中所述检测系统的至少另一部分包括其电气元件设置在所述壳体外部的第二空间中 。

公开(公告)号：US06633362B2

公开(公告)日：2003-10-14

申请号：US09533377

申请日：2000-03-22

申请人： Eiichi Murakami ,  Osamu Kakuchi

发明人： Eiichi Murakami ,  Osamu Kakuchi

IPC分类号： G03B2742

CPC分类号： G01M11/0264 ,  G01M11/0271 ,  G03B27/42 ,  G03F7/70058 ,  G03F7/706

摘要： A projection exposure apparatus includes an illumination optical system for illuminating a pattern formed on a first object, with light, a projection optical system for projecting the pattern of the first object, illuminated by the illumination optical system, onto a second object for exposure of the same with the pattern, a main system including the illumination optical system and the projection optical system, and an interferometer for use in measurement of an optical characteristic of the projection optical system and being mounted on the main system.

摘要翻译： 投影曝光装置包括用于照亮形成在第一物体上的图案的照明光学系统，具有用于将由照明光学系统照明的第一物体的图案投射到第二物体上的投影光学系统，用于曝光 与图案相同，包括照明光学系统和投影光学系统的主系统，以及用于测量投影光学系统的光学特性并安装在主系统上的干涉仪。

公开(公告)号：US06611376B1

公开(公告)日：2003-08-26

申请号：US09089480

申请日：1998-06-02

申请人： Eiichi Murakami ,  Seiji Takeuchi

发明人： Eiichi Murakami ,  Seiji Takeuchi

IPC分类号： G02B2744

CPC分类号： G03F7/70216 ,  G02B5/1847 ,  Y10S359/90

摘要： The present invention discloses a diffractive optical element whose optical axis can be precisely positioned, and a method of manufacturing the diffractive optical element. The diffractive optical element includes a region provided with a concentric uneven pattern and having a predetermined light bending characteristic, and a peripheral section worked so that the optical axis of the diffractive optical element determined by the light bending characteristic of the region aligns with the center of the profile of the diffractive optical element.

摘要翻译： 本发明公开了一种可精确定位其光轴的衍射光学元件，以及制造衍射光学元件的方法。 衍射光学元件包括设置有同心凹凸图案并具有预定光弯曲特性的区域，并且加工周边部分，使得由该区域的光弯曲特性确定的衍射光学元件的光轴与 衍射光学元件的轮廓。

公开(公告)号：US5896596A

公开(公告)日：1999-04-27

申请号：US956121

申请日：1997-10-22

申请人： Eiichi Murakami

发明人： Eiichi Murakami

IPC分类号： A47K3/10 ,  A47K3/02

CPC分类号： A47K3/10

摘要： An apparatus for generating a high power water stream performing an effective massage without producing undesired vibration and noise including an outer tub 1, an inner tub 2 arranged within the outer tub, passages 3 formed in a bottom wall of the outer tub, passages 2c formed in a side wall of the inner tub, a tubular members 4 provided at the passages 2c and having inner diameters which are gradually increased toward an inner space S3, a pump 5 arranged between a space S2 between side walls of outer and inner tubs and having jet nozzles 8 which are positioned at inlets of the jet nozzles, and a motor 7 coupled with the pump 5 by means of a drive shaft assembly 6. When the motor 7 is energized to drive the pump 5, water streams are projected at a very high speed from the jet nozzles into the tubular members 4. Then, the water in the space S2 is sucked into the inlets of the tubular members, and the water streams are projected from the outlets of the tubular members 4 at a very high speed. These water streams have a sufficiently high velocity, and thus the massaging efficiency is very high.

摘要翻译： 一种用于产生执行有效按摩而不产生不期望的振动和噪音的大功率水流的装置，包括外桶1，布置在外桶内的内桶2，形成在外桶的底壁中的通道3，形成的通道2c 在内桶的侧壁中，设置在通道2c处并且具有朝向内部空间S3逐渐增加的内径的管状构件4，布置在外桶和内桶的侧壁之间的空间S2之间并具有 定位在喷嘴的入口处的喷嘴8以及通过驱动轴组件6与泵5联接的马达7.当马达7通电以驱动泵5时，将水流投射到非常 从喷嘴喷射到管状构件4中的高速度。然后，空间S2中的水被吸入管状构件的入口中，并且水流从管状构件4的出口以非常高的sp eed。 这些水流具有足够高的速度，因此按摩效率非常高。

公开(公告)号：US5858863A

公开(公告)日：1999-01-12

申请号：US722944

申请日：1996-09-27

申请人： Natsuki Yokoyama ,  Yoshifumi Kawamoto ,  Eiichi Murakami ,  Fumihiko Uchida ,  Kenichi Mizuishi ,  Yoshio Kawamura

发明人： Natsuki Yokoyama ,  Yoshifumi Kawamoto ,  Eiichi Murakami ,  Fumihiko Uchida ,  Kenichi Mizuishi ,  Yoshio Kawamura

IPC分类号： B65G49/07 ,  B23Q41/00 ,  B23Q41/02 ,  C23C14/56 ,  C23C16/54 ,  G05B19/418 ,  H01L21/00 ,  H01L21/02 ,  H01L21/027 ,  H01L21/205 ,  H01L21/285 ,  H01L21/304 ,  H01L21/3065 ,  H01L21/3205 ,  H01L21/677 ,  H01L21/68

CPC分类号： C23C14/568 ,  C23C16/54 ,  G05B19/41865 ,  H01L21/67161 ,  H01L21/67167 ,  H01L21/67173 ,  H01L21/67184 ,  H01L21/67276 ,  H01L21/67727 ,  H01L21/67745 ,  G05B2219/45031 ,  Y02P90/14 ,  Y02P90/20 ,  Y02P90/28 ,  Y10S414/135 ,  Y10S414/137 ,  Y10S438/908 ,  Y10T29/41

摘要： Disclosed is a fabricating system including a plurality of processing apparatuses connected to each other by means of an inter-apparatus transporter, wherein one group of semiconductor wafers are processed in processing apparatuses and other group of wafers are transported to specified processing apparatuses for a time interval from (To+T) to a time To; and another group of wafers are processed and the remaining group of wafers are transported for a time interval from (To+T) to (To+2T). Since processing apparatuses can receive at least one of works from the inter-apparatus transporter for a time interval T min, the distribution of works from the transporter to processing apparatuses is completed for the time interval T min. The transporter is emptied for each time interval T min, and works are unloaded to the emptied transporter, which makes easy the scheduling, control and management of the transporting of a plurality of works in the fabricating system. Moreover, since the fabricating system including processing apparatuses is periodically controlled at a cycle time T min, the scheduling of a plurality of works can be made easy, to enhance the level of optimization, thus improving the productivity.

摘要翻译： 公开了一种制造系统，其包括通过机构间传送器彼此连接的多个处理装置，其中一组半导体晶片在处理装置中被处理，并且其他组的晶片被传送到指定的处理装置一段时间间隔 从（To + T）到一个时间To; 并且处理另一组晶片，并且剩余的晶片组从（To + T）到（To + 2T）的时间间隔被传输。 由于处理装置可以从时间间隔T min接收来自装置间运送装置的作品中的至少一个，因此在时间间隔T min内完成从运送装置到处理装置的作品的分配。 在每个时间间隔T min内运输运输车被清空，并且卸载到排空运输车，这使得在制造系统中运输多个作业的调度，控制和管理变得容易。 此外，由于包括处理装置的制造系统在周期时间T min周期性地进行控制，因此能够容易地进行多个作业的调度，提高优化等级，提高生产率。

公开(公告)号：US5695897A

公开(公告)日：1997-12-09

申请号：US564615

申请日：1995-11-29

申请人： Noriyuki Mitome ,  Eiichi Murakami ,  Shigeyuki Uzawa

发明人： Noriyuki Mitome ,  Eiichi Murakami ,  Shigeyuki Uzawa

IPC分类号： G03F7/20 ,  G03F9/00

CPC分类号： G03F9/7084 ,  G03F7/70458 ,  G03F9/7003

摘要： An alignment method or an exposure method in an exposure process in which a first stepper having a first reduction magnification and a second stepper having a second reduction magnification, higher than the first reduction magnification, are used in combination. For a global alignment through the first stepper on the basis of alignment marks having been defined through the second stepper in relation to shots thereof, in every shot of the first stepper the position of such alignment mark or marks to be measured is made variable with respect to the shot center.

摘要翻译： 组合使用具有第一缩小倍率的第一步进机和具有高于第一减速倍率的第二减速倍率的第二步进机的曝光处理中的对准方法或曝光方法。 对于通过第一步进机进行的全局对准，其基于已经通过第二步进器相对于其镜头定义的对准标记，在第一步进机的每次镜头中，使这样的对准标记或待测量的标记的位置相对于 到射击中心。

公开(公告)号：US4795911A

公开(公告)日：1989-01-03

申请号：US14033

申请日：1987-02-12

申请人： Michio Kohno ,  Eiichi Murakami ,  Akiyoshi Suzuki

发明人： Michio Kohno ,  Eiichi Murakami ,  Akiyoshi Suzuki

IPC分类号： G01N21/94 ,  G01N21/88

CPC分类号： G01N21/94

摘要： An apparatus usable with an object having a surface with a pattern, for examining the state of the surface, includes a projecting system for directing a light beam to the surface of the object, and a collecting system for collecting scattered light from the surface of the object. A projection of the optical axis of the collecting system onto the surface of the object extends in a direction different from a projection onto the surface of the object of a major portion of light diffracted from the pattern. A light-receiving unit receives the scattered light as collected by the collecting system and for producing an output corresponding to the state of the surface of the object.

摘要翻译： 可用于具有用于检查表面状态的具有图案的表面的物体的装置包括用于将光束引导到物体的表面的投影系统和用于从该物体的表面收集散射光的收集系统 目的。 将收集系统的光轴投射到物体表面上的方向不同于从图案衍射的大部分光的物体的表面上的投影。 光接收单元接收由收集系统收集的散射光并产生与物体表面的状态对应的输出。

公开(公告)号：US20120318069A1

公开(公告)日：2012-12-20

申请号：US13499947

申请日：2011-06-20

申请人： Eiichi Murakami

发明人： Eiichi Murakami

IPC分类号： G01F1/66

CPC分类号： G01F1/667 ,  G01F1/662

摘要： An ultrasonic flowmeter apparatus, which can be mounted on a conduit flowing a fluid whose flow rate is to be measured, has two housing halves coupled swingably about an axis. Free ends of the housing halves include a clamp mechanism for closing and locking the halves in position. The halves have formed therein grooves 1a and 2a, respectively, and a pair of ultrasonic wave transmission and reception elements are provided on an inner wall of the groove 1a. When the conduit is clamped between the grooves, the conduit is urged against the inner walls and deformed into a substantially square cross sectional configuration. An ultrasonic wave beam B is projected from one of the elements into a fluid passing through the conduit, the beam is reflected by an opposite surface of the conduit urged against the groove 2a, and the reflected beam is received by the other element.

摘要翻译： 超声波流量计装置可以安装在流过要测量流体的流体的导管上，具有围绕轴线可摆动地联接的两个壳体半部。 外壳半部的自由端包括用于将半部闭合并锁定就位的夹紧机构。 半部分别形成有槽1a，2a，在槽1a的内壁上设置一对超声波收发元件。 当导管夹紧在凹槽之间时，导管被推靠在内壁上并变形成基本正方形的横截面构型。 超声波波束B从元件中的一个突出到通过导管的流体中，该波束被导管的相对表面反射，并且反射的波束被另一个元件接收。

公开(公告)号：US08093723B2

公开(公告)日：2012-01-10

申请号：US13098648

申请日：2011-05-02

申请人： Takako Funakoshi ,  Eiichi Murakami ,  Kazumasa Yanagisawa ,  Kan Takeuchi ,  Hideo Aoki ,  Hizuru Yamaguchi ,  Takayuki Oshima ,  Kazuyuki Tsunokuni ,  Kousuke Okuyama

发明人： Takako Funakoshi ,  Eiichi Murakami ,  Kazumasa Yanagisawa ,  Kan Takeuchi ,  Hideo Aoki ,  Hizuru Yamaguchi ,  Takayuki Oshima ,  Kazuyuki Tsunokuni ,  Kousuke Okuyama

IPC分类号： H01L23/48 ,  H01L23/52 ,  H01L29/40

CPC分类号： H01L23/53238 ,  H01L21/823871 ,  H01L23/5286 ,  H01L2924/0002 ,  H01L2924/00

摘要： In a semiconductor integrated circuit device having plural layers of buried wirings, it is intended to prevent the occurrence of a discontinuity caused by stress migration at an interface between a plug connected at a bottom thereof to a buried wiring and the buried wiring. For example, in the case where the width of a first Cu wiring is not smaller than about 0.9 μm and is smaller than about 1.44 μm, and the width of a second Cu wiring and the diameter of a plug are about 0.18 μm, there are arranged two or more plugs which connect the first wirings and the second Cu wirings electrically with each other.

摘要翻译： 在具有多层埋地布线的半导体集成电路器件中，旨在防止在其底部连接到埋地布线的插头与埋地布线之间的界面处的应力迁移引起的不连续性的发生。 例如，在第一Cu布线的宽度不小于约0.9μm且小于约1.44μm的情况下，并且第二Cu布线的宽度和塞子的直径为约0.18μm的情况下，存在 布置两个或更多个将第一布线和第二铜布线彼此电连接的插头。

公开(公告)号：US07411301B2

公开(公告)日：2008-08-12

申请号：US11239371

申请日：2005-09-30

申请人： Takako Funakoshi ,  Eiichi Murakami ,  Kazumasa Yanagisawa ,  Kan Takeuchi ,  Hideo Aoki ,  Hizuru Yamaguchi ,  Takayuki Oshima ,  Kazuyuki Tsunokuni ,  Kousuke Okuyama

发明人： Takako Funakoshi ,  Eiichi Murakami ,  Kazumasa Yanagisawa ,  Kan Takeuchi ,  Hideo Aoki ,  Hizuru Yamaguchi ,  Takayuki Oshima ,  Kazuyuki Tsunokuni ,  Kousuke Okuyama

IPC分类号： H01L23/48 ,  H01L23/52

CPC分类号： H01L23/53238 ,  H01L21/823871 ,  H01L23/5286 ,  H01L2924/0002 ,  H01L2924/00

摘要： In a semiconductor integrated circuit device having plural layers of buried wirings, it is intended to prevent the occurrence of a discontinuity caused by stress migration at an interface between a plug connected at a bottom thereof to a buried wiring and the buried wiring. For example, in the case where the width of a first Cu wiring is not smaller than about 0.9 μm and is smaller than about 1.44 μm, and the width of a second Cu wiring and the diameter of a plug are about 0.18 μm, there are arranged two or more plugs which connect the first wirings and the second Cu wirings electrically with each other.

摘要翻译： 在具有多层埋地布线的半导体集成电路器件中，旨在防止在其底部连接到埋地布线的插头与埋地布线之间的界面处的应力迁移引起的不连续性的发生。 例如，在第一Cu布线的宽度不小于约0.9μm且小于约1.44μm的情况下，并且第二Cu布线的宽度和塞子的直径为约0.18μm的情况下，存在 布置两个或更多个将第一布线和第二铜布线彼此电连接的插头。