公开(公告)号：US20200207615A1

公开(公告)日：2020-07-02

申请号：US16237316

申请日：2018-12-31

Applicant: Palo Alto Research Center Incorporated

Inventor： Anne Plochowietz ,  Eugene M. Chow ,  Jengping Lu ,  Julie A. Bert ,  David K. Biegelsen ,  Bradley Rupp ,  Sourobh Raychaudhuri

IPC: B81C3/00 ,  B81C1/00

Abstract: Disclosed are methods and systems of controlling the placement of micro-objects on the surface of a micro-assembler. Control patterns may be used to cause phototransistors or electrodes of the micro-assembler to generate dielectrophoretic (DEP) and electrophoretic (EP) forces which may be used to manipulate, move, position, or orient one or more micro-objects on the surface of the micro-assembler.

公开(公告)号：US20180282151A1

公开(公告)日：2018-10-04

申请号：US15476843

申请日：2017-03-31

Applicant: Palo Alto Research Center Incorporated

Inventor： Jeng Ping Lu ,  Eugene M. Chow ,  David K. Biegelsen ,  Sourobh Raychaudhuri

IPC: B81C1/00 ,  B82Y30/00 ,  B82Y40/00 ,  H01L21/027 ,  H01L21/06 ,  H01L29/06 ,  H01L31/0236 ,  H01L31/0352

CPC classification number: B81C1/00031 ,  B81B2207/05 ,  B81B2207/056 ,  B81C1/00015 ,  B81C2201/0149 ,  B82Y30/00 ,  B82Y40/00 ,  H01L21/027 ,  H01L21/06 ,  H01L29/0665 ,  Y02E10/50

Abstract: A method of manufacturing and using micro assembler systems are described. A method of manufacturing includes disposing a first plurality of electrodes above a first zone of the substrate, wherein the first plurality of electrodes has a first range of spacing. The method further includes disposing a second plurality of electrodes above a second zone of the substrate, wherein the second plurality of electrodes has a second range of spacing that is less than the first range of spacing. A method of using micro assembler systems includes disposing a mobile particle at least partially submersed in an assembly medium above a substrate, a first plurality of electrodes and a second plurality of electrodes. The method further includes conducting a field through individual electrodes of the first plurality of electrodes and the second plurality of electrodes to generate electrophoretic forces or dielectrophoretic forces on the mobile particle.

公开(公告)号：US10043687B2

公开(公告)日：2018-08-07

申请号：US15391140

申请日：2016-12-27

Applicant: Palo Alto Research Center Incorporated

Inventor： Julie A. Bert ,  David K. Biegelsen ,  Sourobh Raychaudhuri

IPC: H01L21/67 ,  H01L25/065 ,  H01L21/68 ,  H01L21/683 ,  H01L21/687 ,  H01L25/00 ,  H01L23/00 ,  B81C99/00 ,  B81C3/00

Abstract: An apparatus including a bumped electrode array and a method of fabricating a bumped electrode array is disclosed. The method includes providing a substrate for the electrode array. The method also includes disposing a plurality of non-planar structures including electrodes above the substrate of the electrode array. The method further includes disposing a dielectric layer above the plurality of non-planar structures having a defined radius of curvature.

公开(公告)号：US09126452B2

公开(公告)日：2015-09-08

申请号：US13953674

申请日：2013-07-29

Applicant: Palo Alto Research Center Incorporated ,  Xerox Corporation

Inventor： Timothy D. Stowe ,  Sourobh Raychaudhuri ,  Carolyn P. Moorlag ,  Michael Y. Young

IPC: B44C1/22 ,  B41N10/02 ,  B41N1/00 ,  B41N1/12 ,  H01L21/311 ,  B41N1/22 ,  B41N10/00 ,  B41C1/04 ,  B41C1/05 ,  B41C1/10 ,  B41M1/06

CPC classification number: B41N10/02 ,  B41C1/04 ,  B41C1/05 ,  B41C1/1033 ,  B41M1/06 ,  B41N1/003 ,  B41N1/12 ,  B41N1/22 ,  B41N10/00 ,  H01L21/31111

Abstract: A method of forming an imaging blanket for a printing apparatus comprises preparing a support structure (e.g., mold) for receipt of a polymer blanket compound, introducing the polymer blanket compound in liquid state over the support structure, curing the polymer blanket compound to produce an imaging blanket, releasing the imaging blanket from the support structure, and etching a surface of the imaging blanket to form a texture pattern therein, the surface forming an imaging surface of said imaging blanket. An imaging surface providing desirable dampening fluid retention is provided. Wet etch, dry etch or a combination of both may be used. The polymer may be a silicone compound, may include 3 percent by weight granular material.

Abstract translation: 形成用于印刷设备的成像覆盖层的方法包括制备用于接收聚合物覆盖层化合物的支撑结构（例如，模具），将液体状态的聚合物覆盖层化合物引入载体结构上，固化聚合物覆盖层化合物以产生 成像覆盖层，从支撑结构释放成像覆盖层，以及蚀刻成像覆盖层的表面以在其中形成纹理图案，所述表面形成所述成像覆盖层的成像表面。 提供了提供期望的润版液保留的成像表面。 可以使用湿蚀刻，干蚀刻或两者的组合。 聚合物可以是硅氧烷化合物，可以包括3重量％的颗粒材料。

公开(公告)号：US20150241798A1

公开(公告)日：2015-08-27

申请号：US14186562

申请日：2014-02-21

Applicant: Palo Alto Research Center Incorporated

Inventor： Timothy D. Stowe ,  David K. Biegelsen ,  Sourobh Raychaudhuri

IPC: G03F7/20

CPC classification number: G03F7/70891 ,  G03F7/70291 ,  G03F7/70425 ,  G03F7/7055 ,  G03F7/70558 ,  G03F7/70858 ,  G03F7/70875

Abstract: A method and system is provided to extend operational life of a mirror array of an image generating system, wherein the image generating system further includes a high intensity power light source to cause light to impinge on the mirror array, sufficient to cause deleterious plastic deformation of associated hinges of the mirror array, and an image output generating section configured to receive light from the mirror array. Image date is received by the image generating system image data to control mirrors of the mirror array and to generate an output image. A required level of illumination is provided from the mirror array to the image output generating section over a predetermined time period, in accordance with the received image data. Then during at least a portion of the same predetermined time period of providing the required level of illumination from the mirror array to the image output generating section, de-stress switching operations are performed for selected ones of the mirrors of the mirror array to reduce the plastic deformation of the associated hinges. Next, an output image is generated based on the received image data, wherein the de-stress switching operations occurring during at least a portion of the providing of the desired level of illumination is undetected.

Abstract translation: 提供了一种方法和系统来延长图像产生系统的反射镜阵列的使用寿命，其中图像产生系统还包括高强度光源，以使光线撞击在镜阵列上，足以引起有害的塑性变形 反射镜阵列的相关联的铰链，以及被配置为从反射镜阵列接收光的图像输出生成部。 图像生成系统图像数据接收图像日期以控制反射镜阵列的反射镜并生成输出图像。 根据接收到的图像数据，在预定时间段内从镜阵列到图像输出生成部分提供所需的照明水平。 然后在从反射镜阵列向图像输出产生部分提供所需等级的照明的相同预定时间段的至少一部分中，对反射镜阵列的所选反射镜执行去应力切换操作，以减少 相关铰链的塑性变形。 接下来，基于接收到的图像数据生成输出图像，其中在提供期望的照明级别的至少一部分期间发生的去应力切换操作未被检测到。

公开(公告)号：US20150027982A1

公开(公告)日：2015-01-29

申请号：US13953674

申请日：2013-07-29

Applicant: Xerox Corporation ,  Palo Alto Research Center Incorporated

Inventor： Timothy D. Stowe ,  Sourobh Raychaudhuri ,  Carolyn P. Moorlag ,  Michael Y. Young

IPC: B41N10/02

CPC classification number: B41N10/02 ,  B41C1/04 ,  B41C1/05 ,  B41C1/1033 ,  B41M1/06 ,  B41N1/003 ,  B41N1/12 ,  B41N1/22 ,  B41N10/00 ,  H01L21/31111

Abstract: A method of forming an imaging blanket for a printing apparatus comprises preparing a support structure (e.g., mold) for receipt of a polymer blanket compound, introducing the polymer blanket compound in liquid state over the support structure, curing the polymer blanket compound to produce an imaging blanket, releasing the imaging blanket from the support structure, and etching a surface of the imaging blanket to form a texture pattern therein, the surface forming an imaging surface of said imaging blanket. An imaging surface providing desirable dampening fluid retention is provided. Wet etch, dry etch or a combination of both may be used. The polymer may be a silicone compound, may include 3 percent by weight granular material.

Abstract translation: 形成用于印刷设备的成像覆盖层的方法包括制备用于接收聚合物覆盖层化合物的支撑结构（例如，模具），将液体状态的聚合物覆盖层化合物引入载体结构上，固化聚合物覆盖层化合物以产生 成像覆盖层，从支撑结构释放成像覆盖层，以及蚀刻成像覆盖层的表面以在其中形成纹理图案，所述表面形成所述成像覆盖层的成像表面。 提供了提供期望的润版液保留的成像表面。 可以使用湿蚀刻，干蚀刻或两者的组合。 聚合物可以是硅氧烷化合物，可以包括3重量％的颗粒材料。