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41.发明授权Fluorinated silsesquioxane polymers and use thereof in lithographic photoresist compositions 有权氟化倍半硅氧烷聚合物及其在平版光刻胶组合物中的应用公开(公告)号：US07261992B2
公开(公告)日：2007-08-28
申请号：US10079289
申请日：2002-02-19
CPC分类号： G03F7/0757 , G03F7/0045 , G03F7/0046
摘要： Fluorocarbinol- and/or fluoroacid-functionalized silsesquioxane polymers and copolymers are provided. The polymers are substantially transparent to ultraviolet radiation (UV), i.e., radiation of a wavelength less than 365 nm and are also substantially transparent to deep ultraviolet radiation (DUV), i.e., radiation of a wavelength less than 250 nm, including 157 nm, 193 nm and 248 nm radiation, and are thus useful in single and bilayer, positive and negative, lithographic photoresist compositions, providing improved sensitivity and resolution. A process for using the composition to generate resist images on a substrate is also provided, i.e., in the manufacture of integrated circuits or the like.
摘要翻译： 提供氟代甲醇和/或氟酸官能化的倍半硅氧烷聚合物和共聚物。 聚合物对紫外线（UV）基本上是透明的，即波长小于365nm的辐射，并且对深紫外辐射（DUV）也是基本透明的，即波长小于250nm（包括157nm）的辐射， 193 nm和248 nm辐射，因此可用于单层和双层，正面和负面，平版印刷光刻胶组合物，提供更高的灵敏度和分辨率。 还提供了使用该组合物在衬底上产生抗蚀剂图像的方法，即在集成电路等的制造中。
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公开(公告)号：US5985524A
公开(公告)日：1999-11-16
申请号：US828921
申请日：1997-03-28
CPC分类号： G03F7/0758 , G03F7/0045 , Y10S430/111
摘要： The invention relates to a process for forming bilayer resist images with a chemically-amplified, radiation-sensitive bilayer resist. The bilayer resist is disposed on a substrate and comprises (i) a top imaging layer comprising a radiation-sensitive acid generator and a vinyl polymer having an acid-cleavable silylethoxy group and (ii) an organic underlayer. The bilayer resist is used in the manufacture of integrated circuits.
摘要翻译： 本发明涉及用化学放大的辐射敏感双层抗蚀剂形成双层抗蚀剂图像的方法。 双层抗蚀剂设置在基材上，并且包括（i）包含辐射敏感酸产生剂和具有酸可裂解的甲硅烷基乙氧基的乙烯基聚合物和（ii）有机底层的顶部成像层。 双层抗蚀剂用于集成电路的制造。
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公开(公告)号：US08857629B2
公开(公告)日：2014-10-14
申请号：US12837148
申请日：2010-07-15
IPC分类号： B01D71/56 , B01D71/38 , B01D69/02 , B01D69/12 , C02F101/10 , B01D61/02 , C02F1/44 , B01D61/00 , C02F103/08
CPC分类号： B01D69/125 , B01D61/00 , B01D61/002 , B01D61/025 , B01D61/027 , B01D69/02 , B01D69/12 , B01D71/56 , B01D71/68 , B01D2323/30 , C02F1/44 , C02F1/441 , C02F1/444 , C02F2101/103 , C02F2101/108 , C02F2101/12 , C02F2101/20 , C02F2103/08
摘要： A polymeric membrane includes an active layer on a support. The active layer includes at least two chemically distinct crosslinked, polyamide films, and the films are crosslinked with each other at an interface.
摘要翻译： 聚合物膜包括载体上的活性层。 有源层包括至少两个化学上不同的交联聚酰胺膜，并且膜在界面处彼此交联。
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公开(公告)号：US08431670B2
公开(公告)日：2013-04-30
申请号：US12550683
申请日：2009-08-31
申请人： Robert David Allen , Phillip Joe Brock , Blake W. Davis , Qinghuang Lin , Robert Dennis Miller , Alshakim Nelson , Ratnam Sooriyakumaran
发明人： Robert David Allen , Phillip Joe Brock , Blake W. Davis , Qinghuang Lin , Robert Dennis Miller , Alshakim Nelson , Ratnam Sooriyakumaran
IPC分类号： C08G77/20
CPC分类号： H05K1/0326 , C09D183/04 , C09D183/14 , H01B3/307 , H01L21/02126 , H01L21/02216 , H01L21/3122 , H01L21/76802 , H01L21/76808 , H01L21/76814 , H05K2201/0162
摘要： Silsesquioxane polymers, silsesquioxane polymers in negative tone photo-patternable dielectric formulations, methods of forming structures using negative tone photo-patternable dielectric formulations containing silsesquioxane polymers, and structures made from silsesquioxane polymers.
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45.发明授权Polymeric films made from polyhedral oligomeric silsesquioxane (POSS) and a hydrophilic comonomer 有权由多面体低聚倍半硅氧烷（POSS）和亲水性共聚单体制成的聚合物薄膜公开(公告)号：US08353410B2
公开(公告)日：2013-01-15
申请号：US12624605
申请日：2009-11-24
CPC分类号： B01D69/12 , B01D69/125 , B01D71/70 , B01D71/82 , B01D2323/34 , B01D2325/20 , C08J7/18
摘要： A composite membrane includes a filtration membrane and a layer on a surface of the filtration membrane. The layer includes a polymer including a polyhedral oligomeric silsesquioxane (POSS) derivative with a hydrophilic moiety attached to at least one vertex thereof. A method for making a composite membrane includes applying to a surface of a filtration membrane a photopolymerizable composition including a POSS compound, a hydrophilic comonomer, and a photoinitiator. The composition is cured to form a hydrophilic layer on the filtration membrane.
摘要翻译： 复合膜包括过滤膜和过滤膜表面上的层。 该层包括聚合物，其包括具有连接到其至少一个顶点的亲水部分的多面体低聚倍半硅氧烷（POSS）衍生物。 制造复合膜的方法包括向过滤膜的表面施加包含POSS化合物，亲水性共聚单体和光引发剂的光聚合性组合物。 固化组合物以在过滤膜上形成亲水层。
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公开(公告)号：US20120012527A1
公开(公告)日：2012-01-19
申请号：US12837148
申请日：2010-07-15
CPC分类号： B01D69/125 , B01D61/00 , B01D61/002 , B01D61/025 , B01D61/027 , B01D69/02 , B01D69/12 , B01D71/56 , B01D71/68 , B01D2323/30 , C02F1/44 , C02F1/441 , C02F1/444 , C02F2101/103 , C02F2101/108 , C02F2101/12 , C02F2101/20 , C02F2103/08
摘要： A polymeric membrane includes an active layer on a support. The active layer includes at least two chemically distinct crosslinked, polyamide films, and the films are crosslinked with each other at an interface.
摘要翻译： 聚合物膜包括载体上的活性层。 有源层包括至少两个化学上不同的交联聚酰胺膜，并且膜在界面处彼此交联。
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公开(公告)号：US08011517B2
公开(公告)日：2011-09-06
申请号：US12624633
申请日：2009-11-24
申请人： Robert David Allen , James Lupton Hedrick , Young-Hye Na , Alshakim Nelson , Ratnam Sooriyakumaran
发明人： Robert David Allen , James Lupton Hedrick , Young-Hye Na , Alshakim Nelson , Ratnam Sooriyakumaran
CPC分类号： B01D71/52 , B01D65/08 , B01D67/0006 , B01D69/02 , B01D69/12 , B01D2321/168 , B01D2323/30 , B01D2323/345 , B01D2325/16 , B01D2325/48
摘要： A composite membrane includes a filtration membrane with a surface; and a layer on the surface of the filtration membrane. The layer includes a polymer including a poly(ethylene glycol) moiety cross-linked with an ammonium salt or a precursor of an ammonium salt.
摘要翻译： 复合膜包括具有表面的过滤膜; 和过滤膜表面上的一层。 该层包括聚合物，其包括与铵盐或铵盐前体交联的聚（乙二醇）部分。
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48.发明申请公开(公告)号：US20110048787A1
公开(公告)日：2011-03-03
申请号：US12550683
申请日：2009-08-31
申请人： Robert David Allen , Phillip Joe Brock , Blake W. Davis , Qinghuang Lin , Robert Dennis Miller , Alshakim Nelson , Ratnam Sooriyakumaran
发明人： Robert David Allen , Phillip Joe Brock , Blake W. Davis , Qinghuang Lin , Robert Dennis Miller , Alshakim Nelson , Ratnam Sooriyakumaran
CPC分类号： H05K1/0326 , C09D183/04 , C09D183/14 , H01B3/307 , H01L21/02126 , H01L21/02216 , H01L21/3122 , H01L21/76802 , H01L21/76808 , H01L21/76814 , H05K2201/0162
摘要： Silsesquioxane polymers, silsesquioxane polymers in negative tone photo-patternable dielectric formulations, methods of forming structures using negative tone photo-patternable dielectric formulations containing silsesquioxane polymers, and structures made from silsesquioxane polymers.
摘要翻译： 倍半硅氧烷聚合物，负色调可光图案化电介质配方中的倍半硅氧烷聚合物，使用含有倍半硅氧烷聚合物的负色调可光阴电介质制剂形成结构的方法，以及由倍半硅氧烷聚合物制成的结构。
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公开(公告)号：US07563558B2
公开(公告)日：2009-07-21
申请号：US11924005
申请日：2007-10-25
申请人： Robert David Allen , Gregory Breyta , Phillip Joe Brock , Richard A. DiPietro , David R. Medeiros , Ratnam Sooriyakumaran
发明人： Robert David Allen , Gregory Breyta , Phillip Joe Brock , Richard A. DiPietro , David R. Medeiros , Ratnam Sooriyakumaran
IPC分类号： G03F7/00 , G03F7/004 , C08F214/18
CPC分类号： G03F7/0046 , C08F220/24 , C08F222/06 , C08F232/08 , G03F7/0382 , G03F7/0392 , G03F7/0395
摘要： The present invention provides polymers that are useful in negative resist compositions. Polymers of the present invention comprise (1) a first monomer having a polar functional group; (2) a second monomer; and optionally, (3) a third monomer that imparts at least one characteristic selected from crosslinkable functionality, etch resistance, and solubility modulation. The first monomer provides an acid catalyzed polarity switch upon elimination of the polar functional group, whereas, the second monomer provides aqueous dissolution. The polymers of the present invention may be incorporated into negative resist compositions, which may also include photoacid generators, crosslinking agents, basic compounds, solvents, dissolution accelerators, photobase generators, latent basic compounds, surfactants, adhesion promoters, and anti-foaming agents.
摘要翻译： 本发明提供了可用于负性抗蚀剂组合物的聚合物。 本发明的聚合物包含（1）具有极性官能团的第一单体; （2）第二单体; 和（3）赋予选自可交联官能团，耐蚀刻性和溶解度调制中的至少一种特性的第三单体。 第一单体在消除极性官能团时提供酸催化的极性开关，而第二单体提供水溶解。 本发明的聚合物可以并入负性抗蚀剂组合物，其还可以包括光酸产生剂，交联剂，碱性化合物，溶剂，溶解促进剂，光碱产生剂，潜碱性化合物，表面活性剂，粘合促进剂和消泡剂。
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50.发明授权公开(公告)号：US07300739B2
公开(公告)日：2007-11-27
申请号：US10449181
申请日：2003-05-29
申请人： Robert David Allen , Gregory Breyta , Phillip Joe Brock , Richard A. DiPietro , David R. Medeiros , Ratnam Sooriyakumaran
发明人： Robert David Allen , Gregory Breyta , Phillip Joe Brock , Richard A. DiPietro , David R. Medeiros , Ratnam Sooriyakumaran
CPC分类号： G03F7/0046 , C08F220/24 , C08F222/06 , C08F232/08 , G03F7/0382 , G03F7/0392 , G03F7/0395
摘要： The present invention provides polymers that are useful in negative resist compositions. Polymers of the present invention comprise (1) a first monomer having a polar functional group; (2) a second monomer; and optionally, (3) a third monomer that imparts at least one characteristic selected from crosslinkable functionality, etch resistance, and solubility modulation. The first monomer provides an acid catalyzed polarity switch upon elimination of the polar functional group, whereas, the second monomer provides aqueous dissolution. The polymers of the present invention may be incorporated into negative resist compositions, which may also include photoacid generators, crosslinking agents, basic compounds, solvents, dissolution accelerators, photobase generators, latent basic compounds, surfactants, adhesion promoters, and anti-foaming agents.
摘要翻译： 本发明提供了可用于负性抗蚀剂组合物的聚合物。 本发明的聚合物包含（1）具有极性官能团的第一单体; （2）第二单体; 和（3）赋予选自可交联官能团，耐蚀刻性和溶解度调制中的至少一种特性的第三单体。 第一单体在消除极性官能团时提供酸催化的极性开关，而第二单体提供水溶解。 本发明的聚合物可以并入负性抗蚀剂组合物中，其还可以包括光酸产生剂，交联剂，碱性化合物，溶剂，溶解促进剂，光碱产生剂，潜碱性化合物，表面活性剂，粘合促进剂和消泡剂。
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