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公开(公告)号：US08282848B2
公开(公告)日：2012-10-09
申请号：US12073048
申请日：2008-02-28
IPC分类号： G01L21/30 , G01R31/00 , C23F1/00 , H01L21/306
CPC分类号： H01L21/67109 , H01J2237/2001 , H01L21/67248
摘要： A plasma processing apparatus includes: a film which is made of an insulative material and constructs a surface of a sample stage on which a sample is put; a disk-shaped member whose upper surface is joined with the film in a lower portion of the film and which is made of a heat conductive member; heaters which are arranged in the film and arranged in a center portion and regions of its outer peripheral side of the film; coolant channels which are arranged in the disk-shaped member and in which a coolant for cooling the disk-shaped member flows; a plurality of power sources each of which adjusts an electric power to each of the heaters in the plurality of regions; and a controller which adjusts outputs from the plurality of power sources by using a result obtained by presuming a temperature of the upper surface of the disk-shaped member.
摘要翻译： 一种等离子体处理装置，包括：由绝缘材料制成的薄膜，构成放置样品的样品台的表面; 其上表面与膜接合在膜的下部并由导热构件制成的盘状构件; 加热器布置在膜中并且布置在膜的中心部分和其外周侧的区域中; 布置在盘状构件中并且用于冷却盘形构件的冷却剂流过的冷却剂通道; 多个电源，其各自调整对所述多个区域中的每个所述加热器的电力; 以及控制器，其通过使用通过假设盘状构件的上表面的温度获得的结果来调整来自多个电源的输出。
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公开(公告)号：US20090321017A1
公开(公告)日：2009-12-31
申请号：US12206021
申请日：2008-09-08
申请人： Tsunehiko Tsubone , Hiroho Kitada , Yosuke Sakai , Ken Yoshioka , Yutaka Omoto , Mamoru Yakushiji , Yutaka Kouzuma
发明人： Tsunehiko Tsubone , Hiroho Kitada , Yosuke Sakai , Ken Yoshioka , Yutaka Omoto , Mamoru Yakushiji , Yutaka Kouzuma
IPC分类号： C23F1/00
CPC分类号： H01L21/67109 , H01J2237/2001 , H01L21/6719 , H01L21/67248 , H01L21/6831
摘要： There is disclosed a plasma processing apparatus wherein a sample placed on the top surface of the sample table located within the processing chamber contained in a vacuum vessel is processed with plasma formed in the processing chamber, comprising a set of ducts cut within the sample table through which cooling medium flows; a film-shaped heater whose heating elements are concentrically embedded in the dielectric film serving as the top surface of the sample table; plural temperature controllers which set up the temperature of the cooling medium flowing through the ducts at different values, respectively; and a control unit which switches over the circulations through the ducts of the cooling medium supplied from the plural temperature controllers.
摘要翻译： 公开了一种等离子体处理装置，其中放置在位于真空容器中的处理室内的样品台的顶表面上的样品用处理室中形成的等离子体进行处理，其包括在样品台内切割的一组导管 哪个冷却介质流动？ 其加热元件同心地嵌入在作为样品台的顶表面的电介质膜中的膜状加热器; 多个温度控制器分别设置以不同的值流过管道的冷却介质的温度; 以及控制单元，其通过从多个温度控制器供给的冷却介质的管道切换循环。
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公开(公告)号：US20090000741A1
公开(公告)日：2009-01-01
申请号：US12230465
申请日：2008-08-29
IPC分类号： C23F1/08
CPC分类号： H01L21/31116 , C23F4/00 , H01J37/32192 , H01J37/32935 , H01J2237/2001 , H01L21/31144 , H01L21/67109 , H01L21/67248 , H01L21/76802 , H01L21/76807 , H01L21/76831
摘要： A vacuum processing apparatus includes a vacuum container which can be depressurized, a sample holder inside of the vacuum container for mounting a sample to be processed, wherein films laid over a surface of the sample are etched with plasma generated in a space above the sample holder. The apparatus further includes a gas supply channel for feeding a heat conducting gas between a sample mounting surface and the backside of the sample, and a pressure control unit for changing stepwise the pressure of the gas supply channel between the sample mounting surface and the backside of the sample in accordance with the progress of the processing of the films of the sample by the etching.
摘要翻译： 真空处理装置包括可以减压的真空容器，用于安装待处理样品的真空容器内部的样品保持器，其中在样品保持器上方的空间中产生的等离子体蚀刻样品表面上的膜 。 该设备还包括用于在样品安装表面和样品的背面之间供给导热气体的气体供给通道，以及用于逐步改变样品安装表面和背面之间的气体供应通道的压力的压力控制单元 样品根据通过蚀刻处理样品膜的进度。
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公开(公告)号：US07296783B2
公开(公告)日：2007-11-20
申请号：US11073652
申请日：2005-03-08
申请人： Hideki Kihara , Tsunehiko Tsubone , Nobuo Nagayasu
发明人： Hideki Kihara , Tsunehiko Tsubone , Nobuo Nagayasu
IPC分类号： F16K3/00
摘要： An inexpensive and reliable vacuum processing apparatus is provided. The vacuum processing apparatus comprises a sealed gate located between two vacuum vessels for allowing them to communicate with each other and a sample subjected to processing to be transferred from one of the vacuum vessels to the other therethrough; and a gate valve located on a path of the gate, the gate valve including a first and second valve body facing a first and second opening, respectively, and a shaft to which the valve bodies are coupled at one end thereof, the gate valve selectively opening and closing each of the openings. The gate valve includes an axial drive section coupled to the other end of the shaft for moving the shaft in the axial direction thereof, and a rotary drive section located between the one end and the other end of the shaft for rotating the shaft about a predetermined pivot crossing the axis of the shaft. The rotating force is transmitted to a spot on the shaft between the pivot and the other end along the axis of the shaft.
摘要翻译： 提供廉价可靠的真空处理装置。 真空处理装置包括位于两个真空容器之间的密封门，用于允许它们彼此连通，并且经受处理的样品从一个真空容器传递到另一个; 以及闸阀，其位于门的路径上，闸阀包括分别面向第一和第二开口的第一和第二阀体以及阀体在其一端连接的轴，选择性地选择阀门 打开和关闭每个开口。 所述闸阀包括与所述轴的另一端连接的轴向驱动部，所述另一端用于沿所述轴的轴向移动所述轴;以及旋转驱动部，位于所述轴的一端与另一端之间，用于使所述轴绕预定 枢轴穿过轴的轴线。 旋转力沿着轴的轴线传递到枢轴和另一端之间的轴上的点。
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45.再颁专利Vacuum processing operating method with wafers, substrates and/or semiconductors 失效具有晶片，基板和/或半导体的真空处理操作方法公开(公告)号：USRE39756E1
公开(公告)日：2007-08-07
申请号：US10062087
申请日：2002-02-01
IPC分类号： F26B5/04
CPC分类号： H01L21/67748 , C23C14/564 , H01L21/67028 , H01L21/67167
摘要： This invention relates to a vacuum processing apparatus having vacuum processing chambers the insides of which must be dry cleaned, and to a method of operating such an apparatus. When the vacuum processing chambers are dry-cleaned, dummy substrates are transferred into the vacuum processing chamber by substrates conveyor means from dummy substrate storage means which is disposed in the air atmosphere together with storage means for storing substrates to be processed, and the inside of the vacuum processing chamber is dry-cleaned by generating a plasma. The dummy substrate is returned to the dummy substrate storage means after dry cleaning is completed. Accordingly, any specific mechanism for only the cleaning purpose is not necessary and the construction of the apparatus can be made simple. Furthermore, the dummy substrates used for dry cleaning and the substrates to be processed do not coexist, contamination of the substrates to be processed due to dust and remaining gas can be prevented and the production yield can be high.
摘要翻译： 本发明涉及一种具有真空处理室的真空处理装置，其内部必须是干式清洁的，以及一种操作这种装置的方法。 当真空处理室被干洗时，虚设基板通过基板传送装置从设置在空气气氛中的虚设基板存储装置与用于存储待处理基板的存储装置一起转移到真空处理室中， 通过产生等离子体对真空处理室进行干洗。 在完成干洗之后，虚拟衬底返回到虚设衬底存储装置。 因此，仅用于清洁目的的特定机构是不必要的，并且可以使装置的结构简单。 此外，用于干洗的虚拟基板和待加工的基板不共存，可以防止由于灰尘和剩余气体而被处理的基板的污染，并且生产率可以高。
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公开(公告)号：US20060169939A1
公开(公告)日：2006-08-03
申请号：US11073652
申请日：2005-03-08
申请人： Hideki Kihara , Tsunehiko Tsubone , Nobuo Nagayasu
发明人： Hideki Kihara , Tsunehiko Tsubone , Nobuo Nagayasu
IPC分类号： F16K25/00
摘要： An inexpensive and reliable vacuum processing apparatus is provided. The vacuum processing apparatus comprises a sealed gate located between two vacuum vessels for allowing them to communicate with each other and a sample subjected to processing to be transferred from one of the vacuum vessels to the other therethrough; and a gate valve located on a path of the gate, the gate valve including a first and second valve body facing a first and second opening, respectively, and a shaft to which the valve bodies are coupled at one end thereof, the gate valve selectively opening and closing each of the openings. The gate valve includes an axial drive section coupled to the other end of the shaft for moving the shaft in the axial direction thereof, and a rotary drive section located between the one end and the other end of the shaft for rotating the shaft about a predetermined pivot crossing the axis of the shaft. The rotating force is transmitted to a spot on the shaft between the pivot and the other end along the axis of the shaft.
摘要翻译： 提供廉价可靠的真空处理装置。 真空处理装置包括位于两个真空容器之间的密封门，用于允许它们彼此连通，并且经受处理的样品从一个真空容器传递到另一个; 以及闸阀，其位于门的路径上，闸阀包括分别面向第一和第二开口的第一和第二阀体以及阀体在其一端连接的轴，选择性地选择阀门 打开和关闭每个开口。 所述闸阀包括与所述轴的另一端连接的轴向驱动部，所述另一端用于沿所述轴的轴向移动所述轴;以及旋转驱动部，位于所述轴的一端与另一端之间，用于使所述轴绕预定 枢轴穿过轴的轴线。 旋转力沿着轴的轴线传递到枢轴和另一端之间的轴上的点。
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公开(公告)号：US06846363B2
公开(公告)日：2005-01-25
申请号：US10139302
申请日：2002-05-07
申请人： Hideyuki Kazumi , Tsutomu Tetsuka , Ryoji Nishio , Masatsugu Arai , Ken Yoshioka , Tsunehiko Tsubone , Akira Doi , Manabu Edamura , Kenji Maeda , Saburo Kanai
发明人： Hideyuki Kazumi , Tsutomu Tetsuka , Ryoji Nishio , Masatsugu Arai , Ken Yoshioka , Tsunehiko Tsubone , Akira Doi , Manabu Edamura , Kenji Maeda , Saburo Kanai
CPC分类号： H01J37/32174 , H01J37/32009 , H01J37/321
摘要： A plasma is generated by feeding an antenna with radio-frequency electric power generated by a radio-frequency power source, and one end of the antenna is grounded to the earth through a capacitor of variable capacitance. A Faraday shield is electrically isolated from the earth, and the capacitance of the variable capacitor is determined to be such a value that the voltage at the two ends of the antenna may be equal in absolute values and inverted to reduce the partial removal of the wall after the plasma ignition. At the time of igniting the plasma, the capacitance of the capacitor is adjusted to a larger or smaller value than that minimizing the damage of the wall.
摘要翻译： 通过向天线馈送由射频电源产生的射频电力产生等离子体，并且天线的一端通过可变电容的电容器接地到地球。 法拉第屏蔽与地电隔离，可变电容器的电容被确定为这样一个值，即天线两端的电压可以相等于绝对值并反转以减少壁的部分去除 等离子体点火后。 在点燃等离子体时，电容器的电容被调整到比将壁损坏最小化的更大或更小的值。
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公开(公告)号：US06833051B2
公开(公告)日：2004-12-21
申请号：US10139281
申请日：2002-05-07
申请人： Hideyuki Kazumi , Tsutomu Tetsuka , Ryoji Nishio , Masatsugu Arai , Ken Yoshioka , Tsunehiko Tsubone , Akira Doi , Manabu Edamura , Kenji Maeda , Saburo Kanai
发明人： Hideyuki Kazumi , Tsutomu Tetsuka , Ryoji Nishio , Masatsugu Arai , Ken Yoshioka , Tsunehiko Tsubone , Akira Doi , Manabu Edamura , Kenji Maeda , Saburo Kanai
IPC分类号： H05H100
CPC分类号： H01J37/32174 , H01J37/32009 , H01J37/321
摘要： A plasma processing apparatus includes a vacuum chamber having a structure that surrounds a space where plasma is generated, a sample stage disposed in the chamber on which a sample to be processed is placed and coil antenna providing an electric field to the space. The structure has a non-conductive member surrounding the space and a conductive member covering the non-conductive member, both of which are disposed between the antenna and the space. The conductive member is electrically floated at least when the plasma is generated.
摘要翻译： 等离子体处理装置包括具有围绕产生等离子体的空间的结构的真空室，设置在其上放置待处理样品的室中的样品台和向该空间提供电场的线圈天线。 该结构具有围绕空间的非导电构件和覆盖非导电构件的导电构件，两者都设置在天线和空间之间。 至少当产生等离子体时，导电构件电漂浮。
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公开(公告)号：US06634116B2
公开(公告)日：2003-10-21
申请号：US09781452
申请日：2001-02-13
IPC分类号： F26B1330
CPC分类号： H01L21/67748 , B01J3/006 , B41J2/36 , B41J2/365 , C23C14/564 , H01L21/67028 , H01L21/67167 , H01L21/67253 , H01L21/67736 , Y10S134/902 , Y10S414/137 , Y10S414/139 , Y10S414/14
摘要： A wafer conveyor system for use in a vacuum processing apparatus wherein the conveyor structure is provided with a transfer structure, and a robot apparatus is arranged on the transfer structure. The robot provides for rotation of the wafer in a horizontally from a position in a cassette to an opposite position of the cassette.
摘要翻译： 一种用于真空处理设备的晶片输送系统，其中输送机结构设有转移结构，机器人装置设置在转移结构上。 机器人将水平地从盒中的位置旋转晶片到盒的相对位置。
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公开(公告)号：US06625899B2
公开(公告)日：2003-09-30
申请号：US09766597
申请日：2001-01-23
IPC分类号： F26B1330
CPC分类号： H01L21/67748 , B01J3/006 , B41J2/36 , B41J2/365 , C23C14/564 , H01L21/67028 , H01L21/67167 , H01L21/67253 , H01L21/67736 , Y10S134/902 , Y10S414/137 , Y10S414/139 , Y10S414/14
摘要： A vacuum processing apparatus which includes a means for transferring substrates from a loader with a transferring device to a double lock chamber and then to a selected vacuum processing chamber. The substrates are then returned to a substrate by the vacuum loader and back into the substrate table. The surfaces of the substrates are maintained in a horizontal position during processing.
摘要翻译： 一种真空处理装置，其包括用于将基板从装载机转移到双重锁定室，然后到选定的真空处理室的装置。 然后通过真空装载机将基板返回到基板并返回到基板台中。 在处理期间，基板的表面保持在水平位置。
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