公开(公告)号：US20120223257A1

公开(公告)日：2012-09-06

申请号：US13474100

申请日：2012-05-17

申请人： Shinji NAGAI ,  Tamotsu Abe ,  Hitoshi Nagano ,  Osamu Wakabayashi

发明人： Shinji NAGAI ,  Tamotsu Abe ,  Hitoshi Nagano ,  Osamu Wakabayashi

IPC分类号： G21K5/04

CPC分类号： H05G2/008 ,  B23K10/00 ,  B23K26/12 ,  B23K26/36 ,  G03B27/32 ,  G03F7/70025 ,  G03F7/70033 ,  G21K1/067 ,  G21K5/00 ,  G21K5/02 ,  G21K2201/064 ,  H05G2/005

摘要： An apparatus for generating extreme ultraviolet light used with a laser apparatus and connected to an external device so as to supply the extreme ultraviolet light thereto includes a chamber provided with at least one inlet through which a laser beam is introduced into the chamber; a target supply unit provided on the chamber configured to supply a target material to a predetermined region inside the chamber; a discharge pump connected to the chamber; at least one optical element provided inside the chamber; an etching gas introduction unit provided on the chamber through which an etching gas passes; and at least one temperature control mechanism for controlling a temperature of the at least one optical element.

摘要翻译： 一种用于产生与激光装置并且连接到外部装置以便提供极紫外光的极紫外光的装置，包括设置有至少一个入口的腔室，激光束通过该入口引入腔室; 设置在所述室上的目标供给单元，其构造成将目标材料供应到所述室内的预定区域; 连接到所述室的排出泵; 设置在所述室内的至少一个光学元件; 蚀刻气体导入单元，设置在所述室上，蚀刻气体通过所述蚀刻气体导入单元; 以及用于控制所述至少一个光学元件的温度的至少一个温度控制机构。

公开(公告)号：US08242474B2

公开(公告)日：2012-08-14

申请号：US13032172

申请日：2011-02-22

申请人： Shinji Nagai ,  Tamotsu Abe ,  Takanobu Ishihara ,  Osamu Wakabayashi

发明人： Shinji Nagai ,  Tamotsu Abe ,  Takanobu Ishihara ,  Osamu Wakabayashi

IPC分类号： G01N21/33 ,  H01J1/50 ,  G21K5/08

CPC分类号： H05G2/003 ,  G01J3/10 ,  G03F7/70033 ,  H05G2/005 ,  H05G2/008

摘要： An extreme ultraviolet light generation apparatus used in combination with a laser system, the apparatus may include: a chamber provided with at least one inlet port for introducing a laser beam outputted from the laser system into the chamber; a target supply unit provided to the chamber for supplying a target material to a predetermined region inside the chamber, where the target material is irradiated with the laser beam; at least one optical element disposed inside the chamber; a magnetic field generation unit for generating a magnetic field around the predetermined region; an ion collection unit disposed in a direction of a line of magnetic force of the magnetic field for collection an ion which is generated when the target material is irradiated with the laser beam and is flowing along the line of magnetic force; and a gas introduction unit for introducing an etching gas into the chamber.

摘要翻译： 一种与激光系统组合使用的极紫外光发生装置，该装置可以包括：设置有至少一个入口的腔室，用于将从激光系统输出的激光束引入腔室; 目标供给单元，其设置在所述室中，用于将所述目标材料供给到所述室内的预定区域，所述目标材料用所述激光束照射; 设置在所述室内的至少一个光学元件; 用于产生围绕预定区域的磁场的磁场产生单元; 离子收集单元，设置在所述磁场的磁力线的方向上，用于收集当所述靶材料被所述激光束照射并沿着所述磁力线流动时产生的离子; 以及用于将蚀刻气体引入到室中的气体引入单元。

公开(公告)号：US06636297B2

公开(公告)日：2003-10-21

申请号：US09842230

申请日：2001-04-26

申请人： Osamu Wakabayashi ,  Tatsuo Enami ,  Shinji Nagai

发明人： Osamu Wakabayashi ,  Tatsuo Enami ,  Shinji Nagai

IPC分类号： G01J300

CPC分类号： G01J9/00 ,  G01J1/4257

摘要： A vacuum ultraviolet laser wavelength measuring apparatus capable of accurately measuring wavelength characteristics of a laser beam. The wavelength measuring apparatus has spectral devices for generating an optical pattern corresponding to wavelength characteristics of an incident laser beam and measuring wavelength characteristics of a laser beam in a vacuum ultraviolet region oscillating from a vacuum ultraviolet laser on the basis of the optical pattern. The apparatus has a fluorescent screen for generating a fluorescent pattern having an intensity distribution corresponding to an intensity distribution of the incident optical pattern, a pattern detector for measuring the intensity distribution of the fluorescent pattern, and arithmetic unit for calculating the wavelength characteristics of the laser beam on the basis of the measured intensity distribution.

摘要翻译： 一种能够精确地测量激光束的波长特性的真空紫外激光波长测量装置。 波长测量装置具有用于产生与入射激光束的波长特性相对应的光学图案的光谱装置，并且基于光学图案测量从真空紫外激光器振荡的真空紫外区域中的激光束的波长特性。 该装置具有用于产生具有对应于入射光学图案的强度分布的强度分布的荧光图案的荧光屏，用于测量荧光图案的强度分布的图案检测器和用于计算激光器的波长特性的算术单元 基于测量的强度分布。

公开(公告)号：US06243163B1

公开(公告)日：2001-06-05

申请号：US09398191

申请日：1999-09-17

申请人： Osamu Wakabayashi ,  Tatsuo Enami ,  Shinji Nagai ,  Toru Suzuki ,  Takeshi Ohta ,  Hirokazu Kubo

发明人： Osamu Wakabayashi ,  Tatsuo Enami ,  Shinji Nagai ,  Toru Suzuki ,  Takeshi Ohta ,  Hirokazu Kubo

IPC分类号： G01J328

CPC分类号： G01J9/00 ,  G01J3/28

摘要： The present invention can accurately detect a wavelength of a light to be detected, which is output from a source of light to be detected, without an error even if there is a change in the characteristic of a spectroscope due to an individual difference among the spectroscopes or a change in the measuring environment. The device according to the invention emits at least two reference lights (Ln, La) having different wavelengths (&lgr;n, &lgr;a) as the reference lights by reference light source. And, actual characteristic value (D) of spectroscope is calculated on the basis of detection positions (Sn, Sa) of the at least two reference lights (Ln, La) on a sensor and the known wavelengths (&lgr;n, &lgr;a) of the at least two reference lights (Ln, La) (D=(&lgr;a−&lgr;n)/(Sa−Sn)). And, on the basis of the detection positions (Sn, SO) of the reference light (Ln) and the light to be detected (LO) on the sensor (10), the calculated actual characteristic value (D) of the spectroscope and the known wavelength (&lgr;n) of the reference light (Ln), wavelength (&lgr;O) of the light to be detected (LO) is calculated (&lgr;O=&lgr;n+(SO−Sn)·D).

摘要翻译： 即使由于各分光器之间的个体差异而导致的分光器的特性发生变化，本发明也能够准确地检测从被检测光源输出的被检测光的波长 或测量环境的变化。 根据本发明的装置通过参考光源发射具有不同波长（lambdn，λ））的至少两个参考光（Ln，La）作为参考光。 并且，基于传感器上的至少两个参考光（Ln，La）的检测位置（Sn，Sa）以及在传感器上的已知波长（lambdn，λ）来计算分光计的实际特征值（D） 至少两个参考光（Ln，La）（D =（λ-lambdn）/（Sa-Sn）））。 并且，基于传感器（10）上的基准光（Ln）和被检测光（LO）的检测位置（Sn，SO），计算出的分光器的实际特性值（D）和 计算参考光（Ln）的已知波长（lambdn），待检测光（LO）的波长（lambd0）（lambdO = lambdn +（SO-Sn）.D）。

公开(公告)号：US20110226745A1

公开(公告)日：2011-09-22

申请号：US13048454

申请日：2011-03-15

申请人： Shinji Nagai ,  Tamotsu Abe ,  Hitoshi Nagano ,  Osamu Wakabayashi

发明人： Shinji Nagai ,  Tamotsu Abe ,  Hitoshi Nagano ,  Osamu Wakabayashi

IPC分类号： B23K26/04

CPC分类号： G03F7/70033 ,  G03F7/70891 ,  G03F7/70916 ,  G03F7/70925 ,  G21K1/06 ,  G21K2201/064 ,  G21K2201/067 ,  H05G2/005 ,  H05G2/008

摘要： An extreme ultraviolet light generation system is an extreme ultraviolet light generation system which is used with a laser apparatus and is connected to an external device so as to supply extreme ultraviolet light thereto, and the extreme ultraviolet light generation system may include: a chamber provided with at least one inlet through which a laser beam is introduced thereinto; a target supply unit provided to the chamber for supplying a target material to a predetermined region inside the chamber; a discharge pump connected to the chamber; at least one optical element disposed inside the chamber; an etching gas introduction unit provided to the chamber through which etching gas passes, the etching gas being introduced to etch debris of the target material which is emitted when the target material is irradiated with the laser beam inside the chamber and adheres to the at least one optical element; and at least one temperature control mechanism for controlling a temperature of the at least one optical element.

摘要翻译： 极紫外光发生系统是与激光装置一起使用并与外部装置连接以向其提供极紫外光的极紫外光发生系统，并且极紫外线发生系统可以包括：室 入射至少一个激光束的入口; 目标供给单元，其设置在所述室中，用于将目标材料供应到所述室内的预定区域; 连接到所述室的排出泵; 设置在所述室内的至少一个光学元件; 蚀刻气体导入单元，其被设置到蚀刻气体通过的室，所述蚀刻气体被引入以蚀刻所述目标材料的碎屑，所述目标材料在所述靶材料被所述室内的所述激光束照射时发射，并且粘附至所述至少一个 光学元件 以及用于控制所述至少一个光学元件的温度的至少一个温度控制机构。

公开(公告)号：US08629417B2

公开(公告)日：2014-01-14

申请号：US13540314

申请日：2012-07-02

申请人： Shinji Nagai ,  Tamotsu Abe ,  Takanobu Ishihara ,  Osamu Wakabayashi

发明人： Shinji Nagai ,  Tamotsu Abe ,  Takanobu Ishihara ,  Osamu Wakabayashi

IPC分类号： G01N21/33 ,  H01J1/50 ,  G21K5/08

CPC分类号： H05G2/003 ,  G01J3/10 ,  G03F7/70033 ,  H05G2/005 ,  H05G2/008

摘要： An extreme ultraviolet light generation apparatus used in combination with a laser system, the apparatus may include: a chamber provided with at least one inlet port for introducing a laser beam outputted from the laser system into the chamber; a target supply unit provided to the chamber for supplying a target material to a predetermined region inside the chamber, where the target material is irradiated with the laser beam; at least one optical element disposed inside the chamber; a magnetic field generation unit for generating a magnetic field around the predetermined region; an ion collection unit disposed in a direction of a line of magnetic force of the magnetic field for collection an ion which is generated when the target material is irradiated with the laser beam and is flowing along the line of magnetic force; and a gas introduction unit for introducing an etching gas into the chamber.

摘要翻译： 一种与激光系统组合使用的极紫外光发生装置，该装置可以包括：设置有至少一个入口的腔室，用于将从激光系统输出的激光束引入腔室; 目标供给单元，其设置在所述室中，用于将所述目标材料供给到所述室内的预定区域，所述目标材料用所述激光束照射; 设置在所述室内的至少一个光学元件; 用于产生围绕预定区域的磁场的磁场产生单元; 离子收集单元，设置在所述磁场的磁力线的方向上，用于收集当所述靶材料被所述激光束照射并沿着所述磁力线流动时产生的离子; 以及用于将蚀刻气体引入到室中的气体引入单元。

公开(公告)号：US08624208B2

公开(公告)日：2014-01-07

申请号：US13048454

申请日：2011-03-15

申请人： Shinji Nagai ,  Tamotsu Abe ,  Hitoshi Nagano ,  Osamu Wakabayashi

发明人： Shinji Nagai ,  Tamotsu Abe ,  Hitoshi Nagano ,  Osamu Wakabayashi

IPC分类号： G21K5/00

CPC分类号： G03F7/70033 ,  G03F7/70891 ,  G03F7/70916 ,  G03F7/70925 ,  G21K1/06 ,  G21K2201/064 ,  G21K2201/067 ,  H05G2/005 ,  H05G2/008

摘要： An extreme ultraviolet light generation system is an extreme ultraviolet light generation system which is used with a laser apparatus and is connected to an external device so as to supply extreme ultraviolet light thereto, and the extreme ultraviolet light generation system may include: a chamber provided with at least one inlet through which a laser beam is introduced thereinto; a target supply unit provided to the chamber for supplying a target material to a predetermined region inside the chamber; a discharge pump connected to the chamber; at least one optical element disposed inside the chamber; an etching gas introduction unit provided to the chamber through which etching gas passes, the etching gas being introduced to etch debris of the target material which is emitted when the target material is irradiated with the laser beam inside the chamber and adheres to the at least one optical element; and at least one temperature control mechanism for controlling a temperature of the at least one optical element.

摘要翻译： 极紫外光发生系统是与激光装置一起使用并与外部装置连接以向其提供极紫外光的极紫外光发生系统，并且极紫外光发生系统可包括：室 入射至少一个激光束的入口; 目标供给单元，其设置在所述室中，用于将目标材料供应到所述室内的预定区域; 连接到所述室的排出泵; 设置在所述室内的至少一个光学元件; 蚀刻气体导入单元，其被设置到蚀刻气体通过的室，所述蚀刻气体被引入以蚀刻所述目标材料的碎屑，所述目标材料在所述靶材料被所述室内的所述激光束照射时发射，并且粘附至所述至少一个 光学元件 以及用于控制所述至少一个光学元件的温度的至少一个温度控制机构。

公开(公告)号：US20110284775A1

公开(公告)日：2011-11-24

申请号：US13196311

申请日：2011-08-02

申请人： Yoshifumi Ueno ,  Shinji Nagai ,  Osamu Wakabayashi

发明人： Yoshifumi Ueno ,  Shinji Nagai ,  Osamu Wakabayashi

IPC分类号： G01J3/10 ,  G21K5/00

CPC分类号： H05G2/003 ,  G03F7/70033 ,  G03F7/70916 ,  H05G2/008

摘要： A chamber apparatus used with a laser apparatus may include: a chamber provided with at least one inlet through which a laser beam outputted from the laser apparatus enters the chamber; a target supply unit provided to the chamber for supplying a target material to a predetermined region inside the chamber; a magnetic field generation unit for generating a magnetic field in the predetermined region; and a charged particle collection unit disposed in a direction of a magnetic flux of the magnetic field for collecting a charged particle thereinto, the charged particle being generated when the target material is irradiated with the laser beam inside the chamber and traveling along the magnetic flux.

摘要翻译： 与激光装置一起使用的室装置可以包括：设置有至少一个入口的室，从激光装置输出的激光束通过该入口进入室; 目标供给单元，其设置在所述室中，用于将目标材料供应到所述室内的预定区域; 用于在预定区域中产生磁场的磁场产生单元; 以及带电粒子收集单元，其设置在所述磁场的磁通方向上，用于收集带电粒子，所述带电粒子是当所述靶材料被所述腔室内的所述激光束照射并且沿着所述磁通量行进时产生的。

公开(公告)号：US06628682B1

公开(公告)日：2003-09-30

申请号：US09716411

申请日：2000-11-21

申请人： Kiwamu Takehisa ,  Kouji Shio ,  Shinji Nagai ,  Yasuaki Iwata ,  Osamu Wakabayashi

发明人： Kiwamu Takehisa ,  Kouji Shio ,  Shinji Nagai ,  Yasuaki Iwata ,  Osamu Wakabayashi

IPC分类号： H01S313

CPC分类号： H01S3/225 ,  H01S3/137 ,  H01S3/139 ,  H01S3/2258

摘要： Of spontaneous emission beams emitted from a laser medium but not line-narrowed, a spontaneous emission beam whose wavelength approximates a narrowed emission beam and whose light intensity is equal to or higher than a certain level is used as a reference light.

摘要翻译： 从激光介质发射而不是线窄的自发发射光束，其波长近似于发射光束并且光强度等于或高于某一水平的自发发射光束被用作参考光。

公开(公告)号：US08872142B2

公开(公告)日：2014-10-28

申请号：US13474100

申请日：2012-05-17

申请人： Shinji Nagai ,  Tamotsu Abe ,  Hitoshi Nagano ,  Osamu Wakabayashi

发明人： Shinji Nagai ,  Tamotsu Abe ,  Hitoshi Nagano ,  Osamu Wakabayashi

IPC分类号： G21K5/00 ,  G21K5/02 ,  H05G2/00 ,  G03F7/20

CPC分类号： H05G2/008 ,  B23K10/00 ,  B23K26/12 ,  B23K26/36 ,  G03B27/32 ,  G03F7/70025 ,  G03F7/70033 ,  G21K1/067 ,  G21K5/00 ,  G21K5/02 ,  G21K2201/064 ,  H05G2/005

摘要： An apparatus for generating extreme ultraviolet light used with a laser apparatus and connected to an external device so as to supply the extreme ultraviolet light thereto includes a chamber provided with at least one inlet through which a laser beam is introduced into the chamber; a target supply unit provided on the chamber configured to supply a target material to a predetermined region inside the chamber; a discharge pump connected to the chamber; at least one optical element provided inside the chamber; an etching gas introduction unit provided on the chamber through which an etching gas passes; and at least one temperature control mechanism for controlling a temperature of the at least one optical element.

摘要翻译： 一种用于产生与激光装置并且连接到外部装置以便提供极紫外光的极紫外光的装置，包括设置有至少一个入口的腔室，激光束通过该入口引入腔室; 设置在所述室上的目标供给单元，其构造成将目标材料供应到所述室内的预定区域; 连接到所述室的排出泵; 设置在所述室内的至少一个光学元件; 蚀刻气体导入单元，设置在所述室上，蚀刻气体通过所述蚀刻气体导入单元; 以及用于控制所述至少一个光学元件的温度的至少一个温度控制机构。