公开(公告)号：US20100141043A1

公开(公告)日：2010-06-10

申请号：US12703002

申请日：2010-02-09

申请人： Andras Kuthi ,  Martin A. Gundersen

发明人： Andras Kuthi ,  Martin A. Gundersen

IPC分类号： H03K3/00

CPC分类号： H03K17/74 ,  C12M35/02 ,  H03K3/57 ,  H03K5/12

摘要： A pulse generator circuit may include a diode configured to operate as an opening switch, a tank circuit in series with the diode having an admittance that is switchable from a first value to a second value that is different from the first value, and a switching system configured to cause the tank circuit to switch between the first value and the second value. The diode may saturate in less than 100 nanoseconds. A saturable core transformer may operate as a switch that controls the opening of the diode. The pulse generator may generate a plurality of pulses, each having a length of no more than 3 nanoseconds and an amplitude of at least 1 kilovolt. Electrodes may be connected to the pulse generator to deliver the plurality of pulses to biological cells.

摘要翻译： 脉冲发生器电路可以包括被配置为作为打开开关操作的二极管，与具有可从第一值切换到不同于第一值的第二值的导纳的二极管串联的储能电路，以及开关系统 被配置为使得所述储能电路在所述第一值和所述第二值之间切换。 二极管可能在小于100纳秒内饱和。 可饱和铁芯变压器可以作为控制二极管开路的开关来工作。 脉冲发生器可以产生多个脉冲，每个脉冲具有不超过3纳秒的长度和至少1千伏的振幅。 电极可以连接到脉冲发生器以将多个脉冲传送到生物细胞。

公开(公告)号：US07691278B2

公开(公告)日：2010-04-06

申请号：US11237477

申请日：2005-09-27

申请人： Hyungsuk Alexander Yoon ,  John Boyd ,  Andras Kuthi ,  Andrew D. Bailey, III

发明人： Hyungsuk Alexander Yoon ,  John Boyd ,  Andras Kuthi ,  Andrew D. Bailey, III

IPC分类号： H01L21/302

CPC分类号： H01L21/02087 ,  B08B7/0035

摘要： An apparatus generating a plasma for removing fluorinated polymer from a substrate is disclosed. The embodiment includes a powered electrode assembly, including a powered electrode, a first dielectric layer, and a first wire mesh disposed between the powered electrode and the first dielectric layer. The embodiment also includes a grounded electrode assembly disposed opposite the powered electrode assembly so as to form a cavity wherein the plasma is generated, the first wire mesh being shielded from the plasma by the first dielectric layer when the plasma is present in the cavity, the cavity having an outlet at one end for providing the plasma to remove the fluorinated polymer.

摘要翻译： 公开了一种从衬底生成用于除去氟化聚合物的等离子体的装置。 该实施例包括动力电极组件，其包括供电电极，第一介电层和设置在电源电极和第一介电层之间的第一丝网。 该实施例还包括与动力电极组件相对设置的接地电极组件，以便形成其中产生等离子体的空腔，当等离子体存在于空腔中时，第一金属丝网被第一介电层与等离子体屏蔽， 空腔在一端具有出口，用于提供等离子体以除去氟化聚合物。

公开(公告)号：US20090315596A1

公开(公告)日：2009-12-24

申请号：US12142062

申请日：2008-06-19

申请人： Andres Leming ,  Andras Kuthi ,  Thomas Anderson

发明人： Andres Leming ,  Andras Kuthi ,  Thomas Anderson

IPC分类号： H03B19/00

CPC分类号： H03B21/00

摘要： A complex waveform frequency matching device is disclosed. In various embodiments, the matching device comprises a plurality of radio frequency generators coupled in parallel with one another. Each subsequent one of the plurality of radio frequency generators is configured to produce a harmonic frequency related by an integral multiple to a frequency produced by any lower-frequency producing radio frequency generator, thereby generating a complex waveform. A plurality of frequency splitter circuits is coupled to an output of the plurality of radio frequency generators, and each of a plurality of matching networks has an input coupled to an output of one of the plurality of frequency splitter circuits and an output configured to be coupled to a plasma chamber.

摘要翻译： 公开了一种复杂的波形频率匹配装置。 在各种实施例中，匹配装置包括彼此并联耦合的多个射频发生器。 多个射频发生器中的后续一个被配置为产生与由任何较低频产生的射频发生器产生的频率的整数倍相关的谐波频率，从而产生复合波形。 多个分频器电路耦合到多个射频发生器的输出，并且多个匹配网络中的每一个具有耦合到多个分频器电路之一的输出的输入和被配置为耦合的输出 到等离子体室。

公开(公告)号：US20090114244A1

公开(公告)日：2009-05-07

申请号：US11758576

申请日：2007-06-05

申请人： Gregory S. Sexton ,  Andrew D. Bailey, III ,  Andras Kuthi

发明人： Gregory S. Sexton ,  Andrew D. Bailey, III ,  Andras Kuthi

IPC分类号： C25F1/00

CPC分类号： H01L21/02087 ,  B08B7/0035 ,  H01J37/32091 ,  H01J37/32174 ,  H01J37/32541 ,  H01L21/67069

摘要： The embodiments provide structures and mechanisms for removal of etch byproducts, dielectric films and metal films on and near the substrate bevel edge, and chamber interior to avoid the accumulation of polymer byproduct and deposited films and to improve process yield. In an exemplary embodiment, a plasma processing chamber configured to clean a bevel edge of a substrate is provided. The plasma processing chamber includes a bottom electrode configured to receive the substrate, wherein the bottom electrode is coupled to a radio frequency (RF) power supply. The plasma processing chamber also includes a top edge electrode surrounding an insulating plate opposing the bottom electrode. The top edge electrode is electrically grounded. The plasma processing chamber further includes a bottom edge electrode surrounding the bottom electrode. The bottom edge electrode opposes the top edge electrode. The top edge electrode, the substrate disposed on the bottom electrode, and the bottom edge electrode are configured to generate a cleaning plasma to clean the bevel edge of the substrate. The bottom edge electrode and the bottom electrode are electrically coupled to one another through an RF circuit tunable to adjust the amount of RF current going between the substrate disposed on the bottom electrode, the bottom edge electrode and the top edge electrode.

摘要翻译： 这些实施例提供用于去除基板斜边缘上和附近的蚀刻副产物，电介质膜和金属膜的结构和机构，以及室内，以避免聚合物副产物和沉积膜的积聚并提高工艺产率。 在示例性实施例中，提供了构造成清洁基板的斜边缘的等离子体处理室。 等离子体处理室包括被配置为接收衬底的底部电极，其中底部电极耦合到射频（RF）电源。 等离子体处理室还包括围绕与底部电极相对的绝缘板的顶部边缘电极。 顶边电极电接地。 等离子体处理室还包括围绕底部电极的底部边缘电极。 底边电极与顶边缘电极相对。 上边缘电极，设置在底部电极上的基板和底部边缘电极被配置为产生清洁等离子体以清洁基板的斜边缘。 底边电极和底电极通过可调谐的RF电路彼此电耦合，以调节在设置在底部电极，底部边缘电极和顶部边缘电极之间的衬底之间的RF电流的量。

公开(公告)号：US07480571B2

公开(公告)日：2009-01-20

申请号：US10966549

申请日：2004-10-15

申请人： Arthur M. Howald ,  Andras Kuthi ,  Andrew D. Bailey, III

发明人： Arthur M. Howald ,  Andras Kuthi ,  Andrew D. Bailey, III

IPC分类号： C23F1001/00

CPC分类号： H01J37/32082 ,  H01J37/32183 ,  H01J37/3299 ,  H03H7/40 ,  H05H1/46

摘要： Methods for improving the stability of RF power delivery to a plasma load are disclosed. The method includes adding an RF resistor and/or a power attenuator at one of many specific locations in the RF power system to lower the impedance derivatives while keeping the matching circuit substantially in tune with the RF transmission line.

摘要翻译： 公开了用于提高RF功率输送到等离子体负载的稳定性的方法。 该方法包括在RF功率系统中的许多特定位置之一处添加RF电阻器和/或功率衰减器，以降低阻抗导数，同时保持匹配电路与RF传输线基本一致。

公开(公告)号：US07413673B2

公开(公告)日：2008-08-19

申请号：US11109921

申请日：2005-04-19

申请人： Shrikant P. Lohokare ,  Andras Kuthi ,  Andrew D. Bailey, III

发明人： Shrikant P. Lohokare ,  Andras Kuthi ,  Andrew D. Bailey, III

IPC分类号： H03J3/12

CPC分类号： H01J37/321 ,  H01J37/32174 ,  H01J37/32431 ,  H01J37/32623

摘要： An apparatus and method for adjusting the voltage applied to a Faraday shield of an inductively coupled plasma etching apparatus is provided. An appropriate voltage is easily and variably applied to a Faraday shield such that sputtering of a plasma can be controlled to prevent and mitigate deposition of non-volatile reaction products that adversely affect an etching process. The appropriate voltage for a particular etching process or step is applied to the Faraday shield by simply adjusting a tuning capacitor. It is not necessary to mechanically reconfigure the etching apparatus to adjust the Faraday shield voltage.

摘要翻译： 提供了一种用于调整施加到电感耦合等离子体蚀刻装置的法拉第屏蔽的电压的装置和方法。 适当的电压容易且可变地施加到法拉第屏蔽，使得可以控制等离子体的溅射以防止和减轻不利地影响蚀刻工艺的非挥发性反应产物的沉积。 通过简单地调整调谐电容器，将特定蚀刻工艺或步骤的适当电压施加到法拉第屏蔽。 不需要机械地重新配置蚀刻装置来调节法拉第屏蔽电压。

公开(公告)号：US20070072433A1

公开(公告)日：2007-03-29

申请号：US11237477

申请日：2005-09-27

申请人： Hyungsuk Yoon ,  John Boyd ,  Andras Kuthi

发明人： Hyungsuk Yoon ,  John Boyd ,  Andras Kuthi

IPC分类号： H01L21/302 ,  G03C1/00 ,  H01L21/461

CPC分类号： H01L21/02087 ,  B08B7/0035

摘要： An apparatus generating a plasma for removing fluorinated polymer from a substrate is disclosed. The embodiment includes a powered electrode assembly, including a powered electrode, a first dielectric layer, and a first wire mesh disposed between the powered electrode and the first dielectric layer. The embodiment also includes a grounded electrode assembly disposed opposite the powered electrode assembly so as to form a cavity wherein the plasma is generated, the first wire mesh being shielded from the plasma by the first dielectric layer when the plasma is present in the cavity, the cavity having an outlet at one end for providing the plasma to remove the fluorinated polymer.

摘要翻译： 公开了一种从衬底生成用于除去氟化聚合物的等离子体的装置。 该实施例包括动力电极组件，其包括供电电极，第一介电层和设置在电源电极和第一介电层之间的第一丝网。 该实施例还包括与动力电极组件相对设置的接地电极组件，以便形成其中产生等离子体的空腔，当等离子体存在于空腔中时，第一金属丝网被第一介电层与等离子体屏蔽， 空腔在一端具有出口，用于提供等离子体以除去氟化聚合物。

公开(公告)号：US20070031959A1

公开(公告)日：2007-02-08

申请号：US11279697

申请日：2006-04-13

申请人： Andras Kuthi ,  Martin Gundersen

发明人： Andras Kuthi ,  Martin Gundersen

IPC分类号： C12M1/00

CPC分类号： H03K17/74 ,  C12M35/02 ,  H03K3/57 ,  H03K5/12

摘要： A pulse generator circuit may include a diode configured to operate as an opening switch, a tank circuit in series with the diode having an admittance that is switchable from a first value to a second value that is different from the first value, and a switching system configured to cause the tank circuit to switch between the first value and the second value. The diode may saturate in less than 100 nanoseconds. A saturable core transformer may operate as a switch that controls the opening of the diode. The pulse generator may generate a plurality of pulses, each having a length of no more than 3 nanoseconds and an amplitude of at least 1 kilovolt. Electrodes may be connected to the pulse generator to deliver the plurality of pulses to biological cells.

摘要翻译： 脉冲发生器电路可以包括被配置为作为打开开关操作的二极管，与具有可从第一值切换到不同于第一值的第二值的导纳的二极管串联的储能电路，以及开关系统 被配置为使得所述储能电路在所述第一值和所述第二值之间切换。 二极管可能在小于100纳秒内饱和。 可饱和铁芯变压器可以作为控制二极管开路的开关来工作。 脉冲发生器可以产生多个脉冲，每个脉冲具有不超过3纳秒的长度和至少1千伏的振幅。 电极可以连接到脉冲发生器以将多个脉冲传送到生物细胞。

公开(公告)号：US20060000487A1

公开(公告)日：2006-01-05

申请号：US11217523

申请日：2005-08-31

申请人： John Boyd ,  Andras Kuthi ,  Michael Smith ,  Thomas Anderson ,  William Thie

发明人： John Boyd ,  Andras Kuthi ,  Michael Smith ,  Thomas Anderson ,  William Thie

IPC分类号： B08B3/12

CPC分类号： H01L21/67253 ,  B06B1/0253 ,  B06B2201/71 ,  B08B3/10 ,  B08B3/12 ,  H01L21/67057 ,  Y10S134/902

摘要： A system and method of cleaning a substrate includes a megasonic chamber that includes a transducer and a substrate. The transducer is being oriented toward the substrate. A variable distance d separates the transducer and the substrate. The system also includes a dynamically adjustable RF generator that has an output coupled to the transducer.

摘要翻译： 清洁衬底的系统和方法包括包括换能器和衬底的兆声波室。 换能器朝向基板。 可变距离d分离换能器和基板。 该系统还包括具有耦合到换能器的输出的动态可调的RF发生器。

公开(公告)号：US20050191769A1

公开(公告)日：2005-09-01

申请号：US11112334

申请日：2005-04-22

申请人： Thomas Anderson ,  Andras Kuthi

发明人： Thomas Anderson ,  Andras Kuthi

IPC分类号： H01L21/00 ,  B08B6/00 ,  C25F5/00

CPC分类号： H01L21/67253 ,  H01L21/67057

摘要： A method of dynamically adjusting a RF generator to an instantaneous resonant frequency of a transducer includes providing an RF input signal from an oscillator to the RF generator and measuring a supply voltage applied to the RF generator. A peak voltage in the RF generator is also measured. A frequency control signal is produced when the peak voltage is not equal to a selected ratio of the supply voltage. The frequency control signal is applied to a frequency control input of the oscillator.

摘要翻译： 将RF发生器动态地调节到换能器的瞬时谐振频率的方法包括从RF振荡器向RF发生器提供RF输入信号并测量施加到RF发生器的电源电压。 还测量RF发生器中的峰值电压。 当峰值电压不等于所选择的电源电压比时，产生频率控制信号。 频率控制信号被施加到振荡器的频率控制输入。