Waveform shaping circuit
    42.
    发明授权
    Waveform shaping circuit 失效
    波形整形电路

    公开(公告)号:US07019563B2

    公开(公告)日:2006-03-28

    申请号:US10505629

    申请日:2004-01-21

    IPC分类号: H03B1/00

    摘要: A first control potential setting means (1) generates a first control potential (N2) which reverses the magnitude relationship with a second control potential (N3) when an input signal (IN) reaches the vicinity of a logical threshold value. A second control potential setting means (2) generates the second control potential (N3) which changes in the same direction as the input signal (IN), in accordance with a change in input signal (IN). An output means (3) includes transistors (Q5, Q6), and generates an output signal (OUT) having a predetermined potential on the basis of the first control potential (N2), the second control potential (N3), and a reset signal (RSET). A reset means (4) turns off the transistor (Q6) while a waveform shaping circuit is in operation.

    摘要翻译: 当输入信号(IN)达到逻辑门限值附近时,第一控制电位设定装置(1)产生使与第二控制电位(N 3)的大小关系相反的第一控制电位(N 2)。 第二控制电位设定装置(2)根据输入信号(IN)的变化产生与输入信号(IN)沿相同方向变化的第二控制电位(N 3)。 输出装置(3)包括晶体管(Q 5,Q 6),并且基于第一控制电位(N 2),第二控制电位(N 3)产生具有预定电位的输出信号(OUT) 和复位信号(RSET)。 当波形整形电路处于工作状态时,复位装置(4)关断晶体管(Q 6)。

    High resolution CRT device comprising a cold cathode electron gun
    43.
    发明授权
    High resolution CRT device comprising a cold cathode electron gun 失效
    包括冷阴极电子枪的高分辨率CRT装置

    公开(公告)号:US06943489B2

    公开(公告)日:2005-09-13

    申请号:US10423098

    申请日:2003-04-25

    摘要: The CRT device comprises a cold cathode electron gun that includes cathodes, a peripheral focusing electrode, and an accelerating electrode. The cathode has a structure in which an emitter electrode and a gate electrode are joined together with an insulating layer interposed therebetween. The electric potential difference from the emitter electrode is 60V for the gate electrode, 0V for the peripheral focusing electrode, and 4.6 kV for the accelerating electrode.

    摘要翻译: CRT装置包括一个包含阴极的冷阴极电子枪,外围聚焦电极和加速电极。 阴极具有其中发射极和栅电极之间具有绝缘层而接合在一起的结构。 与发射电极的电位差为栅电极为60V,外围聚焦电极为0V,加速电极为4.6kV。

    Electron gun and cathode-ray tube
    44.
    发明授权

    公开(公告)号:US06661166B2

    公开(公告)日:2003-12-09

    申请号:US10163146

    申请日:2002-06-04

    IPC分类号: H01J162

    CPC分类号: H01J29/04 H01J3/022

    摘要: A cathode includes emitter tips provided on a substrate, a gate electrode with an electric field formed between the gate electrode and the emitter tips, and terminals and leads for supplying voltages to the emitter tips and the gate electrode, respectively. A shield electrode further is provided between the cathode and a control electrode, and the shield electrode has a cylindrical projecting portion projecting toward the cathode, through which electron beams pass. The disturbance of an electric field by the leads influences the electron beams; however, this can be prevented by the projecting portion. Because of this, even if the size of the cathode is reduced, the distortion of an electron beam spot on a phosphor screen can be reduced. As a result, a cathode-ray tube with high resolution can be provided at a low cost.

    Light beam heating system with inert gas shield
    45.
    发明授权
    Light beam heating system with inert gas shield 失效
    带惰性气体屏蔽的光束加热系统

    公开(公告)号:US5397871A

    公开(公告)日:1995-03-14

    申请号:US252068

    申请日:1994-06-01

    申请人: Koji Fujii

    发明人: Koji Fujii

    摘要: A light beam heating system is suited for use in performing local heating. The light beam heating system includes a light source for emitting light, an optical lens assembly for converging the light emitted from the light source on an object to be heated, and a gas cylinder for supplying shielding gas towards the object via a gas regulator, a gas valve, and a gas nozzle. During heating, the oxygen concentration of an atmosphere around the object is maintained to less than 5%. Preferably, the shielding gas is supplied to the object via a temperature regulator so that the shielding gas may be heated to a desired temperature prior to the heating of the object.

    摘要翻译: 光束加热系统适用于执行局部加热。 光束加热系统包括用于发光的光源,用于将从光源发射的光会聚在被加热物上的光学透镜组件和用于经由气体调节器向物体供给保护气体的气瓶, 气阀和气体喷嘴。 在加热过程中,物体周围气氛的氧气浓度保持在5%以下。 优选地,通过温度调节器将保护气体供给到物体,使得保护气体可以在加热物体之前被加热到期望的温度。