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41.发明授权公开(公告)号：US09046773B2
公开(公告)日：2015-06-02
申请号：US12409825
申请日：2009-03-24
CPC分类号： G03F7/0397 , G03F7/0045 , G03F7/0046 , G03F7/0758 , G03F7/2041 , G03F7/30
摘要： An actinic ray-sensitive or radiation-sensitive resin composition and a pattern forming method using the composition are provided, the composition including (A) a resin containing a repeating unit having a group represented by formula (1) as defined in the specification, the resin being capable of increasing a solubility of the resin in an alkali developer by an action of an acid, and (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation; and a polymerizable compound represented by formula (M-1) as defined in the specification and a polymer compound obtained by polymerizing the polymerizable compound are provided.
摘要翻译： 提供了光化射线敏感性或辐射敏感性树脂组合物和使用该组合物的图案形成方法，该组合物包含（A）含有具有本说明书中定义的式（1）所示基团的重复单元的树脂， 树脂能够通过酸的作用增加树脂在碱性显影剂中的溶解度，和（B）在用光化射线或辐射照射时能够产生酸的化合物; 和由本说明书中定义的式（M-1）表示的可聚合化合物和通过聚合可聚合化合物获得的高分子化合物。
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42.发明授权Actinic-ray- or radiation-sensitive resin composition, compound and method of forming pattern using the composition 有权光化学射线或辐射敏感性树脂组合物，使用该组合物形成图案的化合物和方法公开(公告)号：US08557499B2
公开(公告)日：2013-10-15
申请号：US12832747
申请日：2010-07-08
IPC分类号： C07C311/02
CPC分类号： C07C311/02 , C07C25/18 , C07C43/225 , C07C311/48 , C07C317/44 , C07C381/12 , C07C2601/08 , C07C2601/14 , C07C2602/10 , C07C2602/42 , C07C2603/18 , C07C2603/74 , C07D211/74 , C07D217/06 , C07D285/15 , C07D295/185 , C07D333/46 , C07D333/76 , G03F7/0045 , G03F7/0397 , G03F7/2041 , Y10S430/121 , Y10S430/122
摘要： According to one embodiment, an actinic-ray- or radiation-sensitive resin composition includes a compound (A) that when exposed to actinic rays or radiation, generates any of the acids of general formula (II) below and a resin (B) whose rate of dissolution into an alkali developer is increased by the action of an acid.(The characters used in general formula (I) have the meanings mentioned in the description.)
摘要翻译： 根据一个实施方案，光化射线或辐射敏感性树脂组合物包括化合物（A），其当暴露于光化射线或辐射时，产生下述通式（II）的任何酸和树脂（B），其中 通过酸的作用，溶解到碱性显影剂中的速率增加。 （通式（I）中使用的字符具有说明书中提及的含义。）
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43.发明申请ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN USING THE COMPOSITION 有权丙酰胺或辐射敏感性树脂组合物和使用组合物形成图案的方法公开(公告)号：US20120156617A1
公开(公告)日：2012-06-21
申请号：US13392836
申请日：2010-08-27
CPC分类号： G03F7/0397 , G03F7/0045 , G03F7/0046 , G03F7/0758 , G03F7/11 , G03F7/2041
摘要： According to one embodiment, an actinic-ray- or radiation-sensitive resin composition includes any of the compounds of general formula (I) below, a compound that when exposed to actinic rays or radiation, generates an acid and a hydrophobic resin. (The characters used in general formula (I) have the meanings mentioned in the description.) RN-A−X+ (I)
摘要翻译： 根据一个实施方案，光化射线或辐射敏感性树脂组合物包含以下通式（I）的任何化合物：当暴露于光化射线或辐射时产生酸和疏水性树脂的化合物。 （通式（I）中使用的字符具有说明书中提及的含义。）RN-A-X +（I）
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44.发明申请ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMING METHOD USING THE SAME 有权化学敏感性或辐射敏感性树脂组合物和使用其的图案形成方法公开(公告)号：US20120015302A1
公开(公告)日：2012-01-19
申请号：US13260777
申请日：2010-03-26
申请人： Naohiro Tango , Michihiro Shirakawa , Mitsuhiro Fujita , Shuhei Yamaguchi , Akinori Shibuya , Shohei Kataoka
发明人： Naohiro Tango , Michihiro Shirakawa , Mitsuhiro Fujita , Shuhei Yamaguchi , Akinori Shibuya , Shohei Kataoka
CPC分类号： G03F7/0045 , C08F220/18 , C08F220/28 , C08F220/42 , G03F7/0397 , G03F7/2041 , C08F220/22
摘要： An actinic ray-sensitive or radiation-sensitive resin composition includes: (A) a resin capable of increasing a solubility of the resin (A) in an alkali developer by an action of an acid; and (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation, wherein (B) the compound capable of generating an acid upon irradiation with an actinic ray or radiation is contained in an amount of 10 to 30 mass % based on the entire solid content of the actinic ray-sensitive or radiation-sensitive resin composition, and a pattern forming method uses the composition.
摘要翻译： 光化射线敏感或辐射敏感性树脂组合物包括：（A）能够通过酸的作用增加树脂（A）在碱性显影剂中的溶解度的树脂; 和（B）能够在用光化射线或辐射照射时能够产生酸的化合物，其中（B）当以光化射线或辐射照射时能够产生酸的化合物的含量为10〜30质量％ 基于光化射线敏感性或辐射敏感性树脂组合物的全部固体含量，并且图案形成方法使用该组合物。
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45.发明申请ACTINIC-RAY-OR RADIATION-SENSITIVE RESIN COMPOSITION, COMPOUND AND METHOD OF FORMING PATTERN USING THE COMPOSITION 有权化合物或辐射敏感性树脂组合物，使用组合物形成图案的化合物和方法公开(公告)号：US20110008731A1
公开(公告)日：2011-01-13
申请号：US12832747
申请日：2010-07-08
IPC分类号： G03F7/004 , G03F7/20 , C07C311/00 , C07C317/00
CPC分类号： C07C311/02 , C07C25/18 , C07C43/225 , C07C311/48 , C07C317/44 , C07C381/12 , C07C2601/08 , C07C2601/14 , C07C2602/10 , C07C2602/42 , C07C2603/18 , C07C2603/74 , C07D211/74 , C07D217/06 , C07D285/15 , C07D295/185 , C07D333/46 , C07D333/76 , G03F7/0045 , G03F7/0397 , G03F7/2041 , Y10S430/121 , Y10S430/122
摘要： According to one embodiment, an actinic-ray- or radiation-sensitive resin composition includes a compound (A) that when exposed to actinic rays or radiation, generates any of the acids of general formula (II) below and a resin (B) whose rate of dissolution into an alkali developer is increased by the action of an acid.(The characters used in general formula (I) have the meanings mentioned in the description.)
摘要翻译： 根据一个实施方案，光化射线或辐射敏感性树脂组合物包括化合物（A），其当暴露于光化射线或辐射时，产生下述通式（II）的任何酸和树脂（B），其中 通过酸的作用，溶解到碱性显影剂中的速率增加。 （通式（I）中使用的字符具有说明书中提及的含义。）
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公开(公告)号：US07648817B2
公开(公告)日：2010-01-19
申请号：US12037135
申请日：2008-02-26
申请人： Takayuki Kato , Akinori Shibuya
发明人： Takayuki Kato , Akinori Shibuya
IPC分类号： G03F7/004 , G03F7/30 , C08F8/34 , C08F220/28 , C08F2/42
CPC分类号： G03F7/0397
摘要： A positive working resist composition comprises a specific resin. The specific resin comprises: a repeating unit having a first specific group; and a repeating unit having a second specific group, the first specific group being different from the second specific group; and a specific structure in an end terminal of the resin. The specific resin decomposes by action of an acid to increase its solubility in an alkaline developer.
摘要翻译： 正性抗蚀剂组合物包含特定的树脂。 特定树脂包括：具有第一特定基团的重复单元; 和具有第二特定基团的重复单元，所述第一特定基团不同于所述第二特定基团; 和树脂末端的具体结构。 特定树脂通过酸的作用而分解，以增加其在碱性显影剂中的溶解度。
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47.发明授权Positive photosensitive composition, polymer compounds for use in the positive photosensitive composition, manufacturing method of the polymer compounds, compounds for use in the manufacture of the polymer compounds, and pattern-forming method using the positive photosensitive composition 失效正性感光性组合物，用于正性感光性组合物的高分子化合物，高分子化合物的制造方法，高分子化合物的制造中使用的化合物，以及使用正性感光性组合物的图案形成方法公开(公告)号：US07629107B2
公开(公告)日：2009-12-08
申请号：US11857178
申请日：2007-09-18
申请人： Akinori Shibuya , Takayuki Kato
发明人： Akinori Shibuya , Takayuki Kato
IPC分类号： G03F7/004 , G03F7/30 , C08F2/42 , C07C323/22
CPC分类号： G03F7/0397 , C08F2/38 , Y10S430/106 , Y10S430/111
摘要： A positive photosensitive composition comprises: a polymer compound having an acid-decomposable structure on a terminal of the polymer compound; and a compound capable of generating an acid upon irradiation with actinic ray or radiation.
摘要翻译： 正型感光性组合物包含：高分子化合物的末端具有酸分解性结构的高分子化合物; 以及能够在用光化射线或辐射照射时能够产生酸的化合物。
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48.发明申请ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, PATTERN FORMING METHOD USING THE SAME, POLYMERIZABLE COMPOUND AND POLYMER COMPOUND OBTAINED BY POLYMERIZING THE POLYMERIZABLE COMPOUND 有权丙烯酸类敏感性或辐射敏感性树脂组合物，使用其的图案形成方法，可聚合化合物和通过聚合可聚合化合物获得的聚合物化合物公开(公告)号：US20090246695A1
公开(公告)日：2009-10-01
申请号：US12409825
申请日：2009-03-24
CPC分类号： G03F7/0397 , G03F7/0045 , G03F7/0046 , G03F7/0758 , G03F7/2041 , G03F7/30
摘要： An actinic ray-sensitive or radiation-sensitive resin composition and a pattern forming method using the composition are provided, the composition including (A) a resin containing a repeating unit having a group represented by formula (1) as defined in the specification, the resin being capable of increasing a solubility of the resin in an alkali developer by an action of an acid, and (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation; and a polymerizable compound represented by formula (M-1) as defined in the specification and a polymer compound obtained by polymerizing the polymerizable compound are provided.
摘要翻译： 提供了光化射线敏感性或辐射敏感性树脂组合物和使用该组合物的图案形成方法，该组合物包含（A）含有具有本说明书中定义的式（1）所示基团的重复单元的树脂， 树脂能够通过酸的作用增加树脂在碱性显影剂中的溶解度，和（B）在用光化射线或辐射照射时能够产生酸的化合物; 和由本说明书中定义的式（M-1）表示的可聚合化合物和通过聚合可聚合化合物获得的高分子化合物。
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公开(公告)号：US20080206669A1
公开(公告)日：2008-08-28
申请号：US12037135
申请日：2008-02-26
申请人： Takayuki Kato , Akinori Shibuya
发明人： Takayuki Kato , Akinori Shibuya
CPC分类号： G03F7/0397
摘要： A positive working resist composition comprises a specific resin. The specific resin comprises: a repeating unit having a first specific group; and a repeating unit having a second specific group, the first specific group being different from the second specific group; and a specific structure in an end terminal of the resin. The specific resin decomposes by action of an acid to increase its solubility in an alkaline developer.
摘要翻译： 正性抗蚀剂组合物包含特定的树脂。 特定树脂包括：具有第一特定基团的重复单元; 和具有第二特定基团的重复单元，所述第一特定基团不同于所述第二特定基团; 和树脂末端的具体结构。 特定树脂通过酸的作用而分解，以增加其在碱性显影剂中的溶解度。
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50.发明授权公开(公告)号：US07232644B2
公开(公告)日：2007-06-19
申请号：US10645796
申请日：2003-08-22
申请人： Akinori Shibuya , Kazuto Kunita
发明人： Akinori Shibuya , Kazuto Kunita
CPC分类号： B41C1/1008 , B41C1/1016 , B41C2201/02 , B41C2201/14 , B41C2210/04 , B41C2210/06 , B41C2210/22 , B41C2210/24 , G03F7/033 , G03F7/0388 , Y10S430/165
摘要： The invention provides a polymerizable composition comprising: a binder polymer containing at least an acid group having an acid dissociation constant (pKa) of 5.5 or more and a radical addition polymerizable group, and a radical-generating compound capable of generating a radical with light or heat. Further, the invention provides a negative-working planographic printing plate precursor which has a recording layer containing the polymerizable composition. Use of the polymerizable composition of the invention provides a planographic printing plate precursor that is capable of forming high-quality images free from stains in non-image portions, and further has high strength in formed image portions and excellent printing endurance.
摘要翻译： 本发明提供一种可聚合组合物，其包含：至少含有酸解离常数（pKa）为5.5以上的酸基和自由基加成聚合性基团的粘合剂聚合物和能够产生光的自由基的自由基产生化合物 热。 此外，本发明提供一种具有含有可聚合组合物的记录层的负性平版印刷版原版。 使用本发明的聚合性组合物提供能够形成无图像部分中的污渍的高质量图像的平版印刷版前体，并且在成像图像部分中还具有高强度和优异的印刷耐久性。
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