公开(公告)号：US20050185165A1

公开(公告)日：2005-08-25

申请号：US11062024

申请日：2005-02-18

Applicant: Yutaka Watanabe

Inventor： Yutaka Watanabe

IPC: G21K1/06 ,  G02B19/00 ,  G03B27/54 ,  G03F7/20 ,  G21K5/00 ,  G21K5/02 ,  H01L21/027

CPC classification number: G03B27/54 ,  G03F7/70075

Abstract: An illumination apparatus for illuminating a target surface using light includes a light source that emits the light, a reflection integrator that forms plural secondary light sources using the light from the light source, and an optical unit that differentiates Helmholtz-Lagrange invariants in two orthogonal directions with respect to the light incident upon the reflection integrator.

Abstract translation: 用于使用光照射目标表面的照明装置包括发射光的光源，使用来自光源的光形成多个次级光源的反射积分器，以及在两个正交方向上区分亥姆霍兹 - 拉格朗日不变量的光学单元 相对于反射积分器发生的光线。

公开(公告)号：US20050109426A1

公开(公告)日：2005-05-26

申请号：US10939555

申请日：2004-09-14

Applicant: Manabu Inoue ,  Ryo Nakajima ,  Kazuhiro Watanabe ,  Toyoji Watanabe ,  Fumie Watanabe ,  Yutaka Watanabe ,  Takeshi Watanabe ,  Kimitaka Watanabe

Inventor： Manabu Inoue ,  Ryo Nakajima ,  Kazuhiro Watanabe ,  Toyoji Watanabe ,  Fumie Watanabe ,  Yutaka Watanabe ,  Takeshi Watanabe ,  Kimitaka Watanabe

IPC: C23C22/17 ,  C23C22/47 ,  C23C22/53

CPC classification number: C23C22/17 ,  C23C22/47 ,  C23C22/53 ,  C23C2222/10

Abstract: It is an object of the present invention to provide a processing solution used for forming a hexavalent chromium free, black conversion film, which is applied onto the surface of zinc or zinc alloy plating layers, and which has corrosion resistance identical to or higher than that achieved by the conventional hexavalent chromium-containing conversion film. According to an aspect of the present invention, there is provided a processing solution for forming a hexavalent chromium free, black conversion film on zinc or zinc alloy plating layers, the processing solution comprising: nitrate ions and trivalent chromium in a mole ratio (NO3−/Cr3+) of less than 0.5/1, wherein the trivalent chromium is present in the form of a water-soluble complex with a chelating agent; and cobalt ions and/or nickel ions, wherein the cobalt ions and/or nickel ions are stably present in the processing solution without causing any precipitation by forming a hardly soluble metal salt with the chelating agent; wherein the solution reacts with zinc when it is brought into contact with the zinc or zinc alloy plating to form a hexavalent chromium free, black conversion film containing zinc, chromium, cobalt and/or nickel, and the chelating agent on the plating.

Abstract translation: 本发明的目的是提供一种用于形成六价铬无黑变换膜的处理溶液，其被施加到锌或锌合金镀层的表面上，并且具有与之相同或更高的耐蚀性 通过常规的六价含铬转化膜实现。 根据本发明的一个方面，提供一种用于在锌或锌合金镀层上形成六价铬的黑色转换膜的处理溶液，所述处理溶液包括：摩尔比（NO < 其中三价铬以与螯合剂的水溶性络合物的形式存在;其中三价铬以水溶性络合物的形式存在于螯合剂中; 和钴离子和/或镍离子，其中钴离子和/或镍离子稳定地存在于处理溶液中，而不会通过与螯合剂形成难溶的金属盐而引起任何沉淀; 其中当与锌或锌合金镀层接触时，溶液与锌反应，以形成含有锌，铬，钴和/或镍的六价铬无黑色转化膜和电镀上的螯合剂。

公开(公告)号：US06324250B1

公开(公告)日：2001-11-27

申请号：US09425224

申请日：1999-10-22

Applicant: Mitsuaki Amemiya ,  Shunichi Uzawa ,  Yutaka Watanabe

Inventor： Mitsuaki Amemiya ,  Shunichi Uzawa ,  Yutaka Watanabe

IPC: H01L2130

CPC classification number: G03F7/70425 ,  G03F1/22 ,  G03F1/50 ,  G03F7/2022

Abstract: An exposure method for transferring a pattern of a mask onto a workpiece in a proximity exposure system, includes a first exposure step for exposing a predetermined portion of the workpiece, while maintaining a first spacing between the mask and the workpiece, and a second exposure step for exposing the predetermined portion of the workpiece, while maintaining a second spacing, different from the first spacing, between the mask and the workpiece, wherein exposures in the first and second exposure steps are performed superposedly, prior to a development process.

Abstract translation: 一种用于在接近曝光系统中将掩模图案转印到工件上的曝光方法包括：第一曝光步骤，用于在保持掩模和工件之间的第一间隔的同时保持工件的预定部分，以及第二曝光步骤 用于在所述掩模和所述工件之间保持与所述第一间隔不同的第二间隔的情况下暴露所述工件的预定部分，其中在显影处理之前，重叠地执行所述第一和第二曝光步骤中的曝光。

公开(公告)号：US06219400B1

公开(公告)日：2001-04-17

申请号：US09062014

申请日：1998-04-17

Applicant: Takayuki Hasegawa ,  Yutaka Watanabe

Inventor： Takayuki Hasegawa ,  Yutaka Watanabe

IPC: G21K500

CPC classification number: G21K1/06 ,  G03F7/70058 ,  G03F7/7085

Abstract: An X-ray optical system includes an X-ray illumination system having at least two mirrors, a driving system for moving the at least two mirrors, a detecting system having at least one sensor, for detecting at least one of tilt and incidence position of X-rays in the X-ray illumination system, and a control system for controlling movements of the at least two mirrors by the driving system on the basis of detection by the detecting system.

Abstract translation: X射线光学系统包括具有至少两个反射镜的X射线照明系统，用于移动至少两个反射镜的驱动系统，具有至少一个传感器的检测系统，用于检测至少两个反射镜的倾斜和入射位置 X射线照射系统中的X射线，以及用于根据检测系统的检测来控制驱动系统的至少两个反射镜的移动的控制系统。

公开(公告)号：US5975709A

公开(公告)日：1999-11-02

申请号：US234948

申请日：1994-04-28

Applicant: Ryuichi Ebinuma ,  Yutaka Watanabe

Inventor： Ryuichi Ebinuma ,  Yutaka Watanabe

IPC: G02B5/10 ,  G02B7/182 ,  G03F7/20 ,  G21K1/06 ,  G21K5/02 ,  G02B5/08

CPC classification number: G03F7/702 ,  G02B5/10 ,  G02B7/182 ,  G03F7/70233 ,  G03F7/70891 ,  G21K1/06 ,  G21K2201/067

Abstract: A reflection system, includes a reflecting member having a mirror-finished reflection surface of a spherical shape; and a base member having a base surface of a predetermined shape; and wherein the reflection member and the base member are adhered to each other with one of the bottom surface of the reflection member and the base surface of the base member being made to follow the other to cause deformation of the spherical shape, whereby the reflection surface is formed into an aspherical shape.

Abstract translation: 反射系统包括具有球面形状的镜面反射面的反射部件， 以及具有预定形状的基面的基底构件; 并且其中所述反射构件和所述基底构件通过所述反射构件的底表面中的一个并且所述基底构件的所述基面彼此粘合以引起所述球形的变形，由此所述反射面 形成为非球面形状。

公开(公告)号：US5892118A

公开(公告)日：1999-04-06

申请号：US947160

申请日：1997-10-08

Applicant: Junji Kawachi ,  Hironori Matsubara ,  Yoshinori Nakahara ,  Yutaka Watanabe

Inventor： Junji Kawachi ,  Hironori Matsubara ,  Yoshinori Nakahara ,  Yutaka Watanabe

IPC: C07C45/46 ,  C07C213/02 ,  C07C215/80 ,  C08G73/22 ,  C07C215/78 ,  C07C209/58

CPC classification number: C08G73/22 ,  C07C213/02 ,  C07C45/46

Abstract: A process for producing 4,6-diaminoresorcinols comprises the steps of:subjecting a dioxime of the formula (4) ##STR1## wherein R is an alkyl or phenyl group, to Beckmann rearrangement to thereby produce 4,6-diacylaminoresorcinol of the formula (5) ##STR2## wherein R is as defined above, and subjecting the 4,6-diacylaminoresorcinol to hydrolysis and recovering the product 4,6-diaminoresorcinol (6) ##STR3## or a salt thereof.

Abstract translation: 制备4,6-二氨基间苯二酚的方法包括以下步骤：使式（4）的肟基（4）其中R是烷基或苯基进行贝克曼重排，从而产生4,6-二酰基氨基间苯二酚 式（5）其中R如上定义，并且使4,6-二酰基氨基间苯二酚水解并回收产物4,6-二氨基间苯二酚（6）或其盐 。

公开(公告)号：US5790630A

公开(公告)日：1998-08-04

申请号：US697863

申请日：1996-08-30

Applicant: Yutaka Watanabe ,  Shigeru Terashima

Inventor： Yutaka Watanabe ,  Shigeru Terashima

IPC: G21K5/00 ,  G21K5/02 ,  G21K5/04 ,  H01J5/18 ,  H05H7/00 ,  H05H13/04 ,  G21K1/00

CPC classification number: G21K5/04 ,  H01J5/18 ,  H05H7/00

Abstract: A radiation window includes a radiation transmitting window material, a supporting frame for gas-tightly supporting an outer periphery of the radiation transmitting window material, a flange for gas-tightly supporting an outer periphery of the supporting frame, and a structure for reducing a stress related to mounting the supporting frame onto the flange.

Abstract translation: 辐射窗包括辐射透射窗材料，用于气密地支撑辐射透射窗材料的外周的支撑框架，用于气密地支撑支撑框架的外周的凸缘和用于降低应力的结构 涉及将支撑框架安装到凸缘上。

公开(公告)号：US5761486A

公开(公告)日：1998-06-02

申请号：US638771

申请日：1996-04-29

Applicant: Yutaka Watanabe ,  Yasuaki Muraki ,  Takashi Nakagawa

Inventor： Yutaka Watanabe ,  Yasuaki Muraki ,  Takashi Nakagawa

IPC: G06F11/25 ,  G06F11/34 ,  G06F13/00 ,  G06F15/00 ,  H04L12/26 ,  G06F9/455

CPC classification number: H04L12/26 ,  H04L43/00 ,  G06F11/3457

Abstract: A simulator apparatus collects communication information on a transmission line by a line information collecting module, extracts the communication information between a server and clients from the collected communication information by an information extracting module, and further discriminates the communication information necessary for a simulation on a protocol unit basis from the communication information and converts to a simulating procedure by a procedure converting module. A simulation processing module performs a simulating operation of the client for the server in accordance with a simulation definition file of the simulating procedure and operating conditions and stores an operating situation to a performance log file.

Abstract translation: 模拟器装置通过线路信息采集模块收集传输线上的通信信息，通过信息提取模块从所收集的通信信息中提取服务器与客户端之间的通信信息，并进一步鉴别协议模拟所需的通信信息 从通信信息的单位基础，并通过程序转换模块转换成模拟过程。 模拟处理模块根据模拟过程和操作条件的模拟定义文件对服务器的客户端进行模拟操作，并将运行状况存储到演奏日志文件。

公开(公告)号：US5657113A

公开(公告)日：1997-08-12

申请号：US384373

申请日：1995-02-03

Applicant: Katsuhiko Ono ,  Tsuyoshi Seto ,  Yutaka Watanabe

Inventor： Katsuhiko Ono ,  Tsuyoshi Seto ,  Yutaka Watanabe

IPC: G03B27/52 ,  G03B27/54 ,  G03G15/00 ,  G03G15/04 ,  G03G15/043 ,  G03G21/00

CPC classification number: G03G15/043 ,  G03G15/605

Abstract: A document exposure apparatus includes a glass plate on which a document original is located, a press cover for covering the glass plate, an open/close discriminating unit for discriminating an open state and a close state of the press cover, an exposure unit, disposed under the glass plate, for illuminating the original with light, and a control unit for controlling the illuminating operation of the exposure unit according to an open/close state of the press cover, which is discriminated by the open/close discriminating unit.

Abstract translation: 文件曝光装置包括：文档原稿所在的玻璃板，用于覆盖玻璃板的压盖，用于识别压盖的打开状态和关闭状态的打开/关闭判别单元，设置在曝光单元 在玻璃板下面，用于用光照射原稿;以及控制单元，用于根据由打开/关闭识别单元区分的按压盖的打开/关闭状态来控制曝光单元的照明操作。

公开(公告)号：US5641593A

公开(公告)日：1997-06-24

申请号：US592607

申请日：1996-01-26

Applicant: Yutaka Watanabe ,  Masami Hayashida

Inventor： Yutaka Watanabe ,  Masami Hayashida

IPC: G03F1/22 ,  G03F1/24 ,  G03F1/32 ,  G03F1/54 ,  G03F1/68 ,  G03F7/20 ,  H01L21/027 ,  G03F9/00

CPC classification number: G03F1/24 ,  B82Y10/00 ,  B82Y40/00 ,  G03F1/32 ,  G03F1/54 ,  G03F7/2039 ,  G03F7/70233 ,  G03F7/70283 ,  G03F7/70575

Abstract: A reflection type mask includes a reflective portion effective to reflect soft X-rays or vacuum ultraviolet rays, and an absorbent material pattern formed on the reflecting portion, wherein, when the wavelength of the soft X-rays or vacuum ultraviolet rays is denoted by .lambda. and the optical constant of the material constituting the absorbent material pattern is denoted by 1-.delta.-ik (where .delta. and k are real numbers while i is an imaginary number), a relation 0.29

Abstract translation: 反射型掩模包括有效地反射软X射线或真空紫外线的反射部分和形成在反射部分上的吸收材料图案，其中当软X射线或真空紫外线的波长由λ 并且构成吸收材料图案的材料的光学常数由1-Δ-ik（其中δ和k是实数，而i是虚数）表示，关系0.29