公开(公告)号：US20070181442A1

公开(公告)日：2007-08-09

申请号：US11346891

申请日：2006-02-03

申请人： Renhe Jia ,  Jie Diao ,  You Wang ,  Stan Tsai ,  Lakshmanan Karuppiah

发明人： Renhe Jia ,  Jie Diao ,  You Wang ,  Stan Tsai ,  Lakshmanan Karuppiah

IPC分类号： B23H7/00

CPC分类号： B23H5/08 ,  B24B53/001 ,  B24B53/017 ,  C25F7/00

摘要： The embodiments of the invention generally relate to a method and apparatus for processing a substrate where reduced defect formation is desired. Embodiments of the invention may be beneficially practiced in chemical mechanical polishing and electrochemical mechanical polishing processes, among other processes where reduction in defect formation due to foam formation is desired. In one embodiment, a processing system for planarizing a substrate is provided that includes a platen, a pad disposed on the platen, a carrier head configured to retain the substrate against the pad while contacting an electronically conductive processing solution; and a foam removal assembly. The foam removal assembly is configured to remove foam from the electrically conductive processing solution, wherein a gap exists between a surface of the electrically conductive processing solution and a bottom edge of the foam removal assembly.

摘要翻译： 本发明的实施例一般涉及用于处理需要减少缺陷形成的衬底的方法和装置。 在化学机械抛光和电化学机械抛光工艺中，本发明的实施例以及其它需要减少形成泡沫的缺陷形成工艺也是有益的。 在一个实施例中，提供了一种用于平坦化衬底的处理系统，其包括压板，设置在压板上的衬垫，构造成在接触电子导电处理溶液的同时将衬底保持抵靠衬垫的载体头; 和泡沫去除组件。 泡沫去除组件被配置为从导电处理溶液中除去泡沫，其中在导电处理溶液的表面和泡沫去除组件的底部边缘之间存在间隙。

公开(公告)号：US20070151866A1

公开(公告)日：2007-07-05

申请号：US11326636

申请日：2006-01-05

申请人： Zhihong Wang ,  You Wang ,  Renhe Jia ,  Stan Tsai

发明人： Zhihong Wang ,  You Wang ,  Renhe Jia ,  Stan Tsai

IPC分类号： B23H9/00 ,  B23H5/06 ,  C25F7/00 ,  B23H7/00

CPC分类号： B23H5/08 ,  B24B37/042 ,  C25F3/02

摘要： A method for processing a surface of a substrate is provided. In one embodiment, the method includes pretreating a conductive layer of the substrate by exposing the substrate to a pretreatment fluid, and planarizing the pre-treated substrate in the system.

摘要翻译： 提供了一种处理基板表面的方法。 在一个实施例中，该方法包括通过将衬底暴露于预处理流体并且对系统中的预处理衬底进行平坦化来预处理衬底的导电层。

公开(公告)号：US20070034527A1

公开(公告)日：2007-02-15

申请号：US11503376

申请日：2006-08-11

申请人： Stephen Diaz ,  Jeffrey Anderson

发明人： Stephen Diaz ,  Jeffrey Anderson

IPC分类号： B23H7/00

CPC分类号： C25F7/00 ,  A61F2/82 ,  C25F3/16

摘要： An electropolishing device for polishing a cylindrical medical device such as a stent includes anodes in the form of rollers arranged to contact an exterior surface of the device. A drive mechanism rotates the anodes periodically during the electropolishing process to change a contact point between the anodes and the medical device. A tilting mechanism can also be used for periodically tilting the anodes during the electropolishing process to allow bubbles to escape from one end of the stent.

摘要翻译： 用于抛光诸如支架的圆柱形医疗装置的电抛光装置包括布置为接触装置的外表面的辊形式的阳极。 驱动机构在电抛光过程期间周期性地旋转阳极以改变阳极和医疗装置之间的接触点。 倾斜机构还可用于在电抛光过程期间周期性地倾斜阳极以允许气泡从支架的一端逸出。

公开(公告)号：US20070023398A1

公开(公告)日：2007-02-01

申请号：US11355165

申请日：2006-02-16

申请人： Hiroyuki Kobayashi ,  Masatoshi Miyake ,  Kenetsu Yokogawa ,  Masaru Izawa

发明人： Hiroyuki Kobayashi ,  Masatoshi Miyake ,  Kenetsu Yokogawa ,  Masaru Izawa

IPC分类号： B23H7/00 ,  B23H1/00

CPC分类号： H01J37/32678 ,  H01J37/32027 ,  H01J37/32082 ,  H01J37/32706 ,  H01J2237/335

摘要： A plasma processing apparatus which can remove foreign particles over an object to be processed during or before/after the discharging is provided. The plasma processing apparatus includes a processing chamber; a processing gas supplying unit for supplying a processing gas into the processing chamber, an antenna electrode for supplying a radio frequency electric power into the processing chamber and forming a plasma, a vacuum evacuating unit for evacuating the inside of the processing chamber; a disposing electrode for disposing the object into the processing chamber and holding the object therein; and a DC power supply for supplying a negative electric potential to the antenna electrode.

摘要翻译： 提供一种等离子体处理装置，其可以在放电期间或之后去除待处理物体上的异物。 等离子体处理装置包括处理室; 用于将处理气体供给到处理室中的处理气体供给单元，用于向处理室供给射频电力并形成等离子体的天线电极，用于抽出处理室内部的真空排气单元; 设置电极，用于将物体放置在处理室中并将物体保持在其中; 以及用于向天线电极提供负电位的直流电源。

公开(公告)号：US20060237330A1

公开(公告)日：2006-10-26

申请号：US11475583

申请日：2006-06-27

申请人： Antoine Manens ,  Alain Duboust ,  Siew Neo ,  Liang-Yuh Chen

发明人： Antoine Manens ,  Alain Duboust ,  Siew Neo ,  Liang-Yuh Chen

IPC分类号： B23H7/00

CPC分类号： B24B49/04 ,  B23H5/06 ,  B23H5/08 ,  B24B37/013 ,  B24B37/042 ,  B24B37/046 ,  B24B49/16 ,  C25F3/02 ,  C25F7/00 ,  G05B2219/45232 ,  G05B2219/49085 ,  H04N1/00

摘要： Method and apparatus for process control of electro-processes. The method includes electro-processing a wafer by the application of two or more biases and determining an amount of charge removed as a result of each bias, separately. In one embodiment, an endpoint is determined for each bias when the amount of charge removed for a bias substantially equals a respective target charge calculated for the bias.

公开(公告)号：US5428199A

公开(公告)日：1995-06-27

申请号：US108386

申请日：1993-08-18

申请人： Hansruedi Berger ,  Fritz Fankhauser

发明人： Hansruedi Berger ,  Fritz Fankhauser

IPC分类号： B23H7/00 ,  B23H7/02 ,  B23H11/00 ,  B23Q1/00 ,  B23Q1/01 ,  B23H1/00

CPC分类号： B23H11/003 ,  B23H7/02

摘要： A frame member, comprising a pair substantially parallel base members connected by a pair substantially parallel intermediate members extending therebetween, has its base members formed of the same material as the machine bed wherein the material is a cast mineral material comprising a synthetic binder and mineral fillers. It is a particular feature that the base members of the frame member be cast with the machine bed as a unitary structure out of the cast mineral material.

摘要翻译： 框架构件包括一对基本上平行的基座构件，通过一对连接的基本上平行的中间构件连接在一起，其基部构件与机床形成相同的材料，其中材料是包含合成粘合剂和矿物填料的铸造矿物材料 。 这是一个特殊的特征，即框架构件的基部构件与机床一起作为铸造矿物材料的整体结构铸造。

公开(公告)号：US5406043A

公开(公告)日：1995-04-11

申请号：US73041

申请日：1993-06-08

申请人： Masatoshi Banji

发明人： Masatoshi Banji

IPC分类号： B23H7/00 ,  B23H9/06 ,  B29C33/42 ,  B23H1/00 ,  B23H9/12

CPC分类号： B23H9/06 ,  B29C33/424 ,  B29L2031/54 ,  B29L2031/545

摘要： A method for forming a master die from a conductive material using electrical discharge machining. The conductive material is created to have a plurality of dimples that are non-circular in a direction perpendicular to the spherical surface of a conductive material and/or in a vertical cross section. The plurality of dimples being formed by electric discharge machining using an electrode that is moved in a direction perpendicular to the surface of the material.

摘要翻译： 一种使用放电加工从导电材料形成母模的方法。 导电材料被制造成具有多个在垂直于导电材料的球形表面的方向上和/或在垂直横截面中的非圆形凹坑。 多个凹坑通过使用在垂直于材料表面的方向移动的电极的放电加工形成。

公开(公告)号：US5401931A

公开(公告)日：1995-03-28

申请号：US104904

申请日：1993-08-12

申请人： Hidehito Hori

发明人： Hidehito Hori

IPC分类号： B23H7/00 ,  B23H7/02 ,  B23H11/00

CPC分类号： B23H11/00 ,  B23H7/02

摘要： A wire-cut electroerosion apparatus comprising a work tank (6) for containing a dielectric fluid, the tank having at least one wall with an opening (36) therein, and a lower arm (15) which is supported at one end on the outside of the work tank and extending through the opening into the tank, the tank being movable relative to the lower arm. The work tank includes a base container member (12) and at least one movable frame member (13,14). The base container member includes a rear wall with the above-noted opening therein and a low wall formed along the other three sides, the low wall being lower than the bottom of the workpiece. The movable frame member(s) can be raised and lowered using a pantograph (20) to thereby easily access the workpiece and electrode wire.

摘要翻译： 一种切线电腐蚀装置，包括用于容纳电介质流体的工作罐（6），所述罐具有至少一个壁，其中具有开口（36），以及下臂（15），所述下臂在一端支撑在外部 的工作罐并且通过开口延伸到罐中，罐可相对于下臂移动。 工作箱包括底座容器构件（12）和至少一个活动框架构件（13,14）。 底座容器构件包括在其中具有上述开口的后壁和沿其它三个侧面形成的低壁，低壁低于工件的底部。 可移动框架构件可以使用集电弓（20）升高和降低，从而容易地接近工件和电极线。

公开(公告)号：US4417843A

公开(公告)日：1983-11-29

申请号：US223812

申请日：1981-01-09

申请人： Benno I. Bonga

发明人： Benno I. Bonga

IPC分类号： B23Q5/22 ,  B23H7/00 ,  B23Q1/00 ,  B23Q1/38 ,  B23Q1/44 ,  B23Q1/48 ,  B23Q5/26 ,  B23Q5/36 ,  B23Q5/40 ,  G05B19/408 ,  B23Q7/00

CPC分类号： G05B19/408 ,  B23Q1/4809 ,  G05B2219/33263 ,  G05B2219/35354 ,  G05B2219/35516 ,  G05B2219/49288

摘要： A machine tool provided with a movable table supported by a stationary table, the movable table being displaceable relative to the stationary table in all directions and being supported by the stationary table by pressurized fluid bearing. The movable table is positioned by at least three actuators pivotally connected at one end to the stationary table and at their other end to the movable table such that the lengths of the actuators, controlled by an appropriate numerical control system, result in a predetermined position of the movable table relative to a reference position.

摘要翻译： 一种具有由固定台支撑的可移动台的机床，所述可移动台可相对于固定台在所有方向上移动，并且由加压流体轴承由固定台支撑。 可移动工作台由至少三个致动器定位，一个端部枢转地连接到固定工作台上，另一端位于可动工作台上，使得由适当的数控系统控制的致动器的长度导致预定的位置 相对于参考位置的可移动台。

公开(公告)号：US3801770A

公开(公告)日：1974-04-02

申请号：US3801770D

申请日：1971-06-14

申请人： CONNOR T O

发明人： O CONNOR T

IPC分类号： B23H1/00 ,  B23H7/00 ,  B23P1/08 ,  B23Q1/04 ,  B23Q3/04

CPC分类号： B23H7/00 ,  B23H1/00 ,  B23H2400/10

摘要： A machine tool comprising a large elongated fluid tank, dry chamber boxes at each end of the tank supporting spindles having electrodes secured thereto for reciprocal movement toward and away from a workpiece positioned between the dry chambers in the middle of the fluid tank. Means for moving the dry chamber and the spindle and electrode carried thereby toward and away from the workpiece and for simultaneously rotating the spindles and electrodes. An electrical machining power supply with each spindle at each end of the dielectric tank, servo means for controlling the movement of the spindles and separate fluid supply means for passing fluid through the spindles to the electrodes. Adjusting bolt and abutment structure at one end of the tank to align the spindles at the opposite ends of the tank. Structures for hydraulically clamping a workpiece between the electrodes and for leveling a work table in position beneath the electrodes in the tank. The method including moving a pair of electrodes toward a workpiece from the opposite sides thereof, maintaining a predetermined gap between the electrodes and workpiece while simultaneously rotating the electrodes and passing an electric signal between the electrodes and workpiece in the presence of a dielectric or an electrolyte.

摘要翻译： 一种包括大型细长流体箱的机床，在罐的每个端部处具有固定在其上的电极的干燥室箱，其具有固定到其上的电极，以便朝向和远离位于流体箱中间的干燥室之间的工件往复移动。 用于将干燥室和主轴和电极移动的装置用于移动和移出工件并同时旋转主轴和电极。