公开(公告)号：US09176375B2

公开(公告)日：2015-11-03

申请号：US14176565

申请日：2014-02-10

Applicant: Sang-hyun Kim ,  Seong-sue Kim ,  Dong-gun Lee ,  Chalykh Roman ,  Mun-ja Kim

Inventor： Sang-hyun Kim ,  Seong-sue Kim ,  Dong-gun Lee ,  Chalykh Roman ,  Mun-ja Kim

IPC: G03F1/72 ,  G03F1/74

CPC classification number: G03F1/72 ,  G03F1/38 ,  G03F1/42 ,  G03F1/74 ,  Y10T428/24802

Abstract: Methods of reducing a registration error of a photomask are provided. A method of reducing a registration error of a photomask may include identifying the registration error with respect to a pattern element in a pattern region of the photomask. Moreover, the method may include reducing a thickness of a portion of a non-pattern region of the photomask by irradiating an energy beam onto a location of the non-pattern region of the photomask that is spaced apart from the pattern element, to generate stress at the pattern element. Related photomasks and methods of manufacturing an integrated circuit are also provided.

Abstract translation: 提供降低光掩模的配准误差的方法。 降低光掩模的配准误差的方法可以包括识别相对于光掩模的图案区域中的图案元素的配准误差。 此外，该方法可以包括通过将能量束照射到与图案元件间隔开的光掩模的非图案区域的位置上来减小光掩模的非图案区域的一部分的厚度，以产生应力 在图案元素。 还提供了相关的光掩模和制造集成电路的方法。

公开(公告)号：US08335038B2

公开(公告)日：2012-12-18

申请号：US12910605

申请日：2010-10-22

Applicant: Dong-gun Lee ,  Seong-sue Kim

Inventor： Dong-gun Lee ,  Seong-sue Kim

IPC: G01B11/30 ,  G02B27/44 ,  G03F7/20 ,  G21K1/06

CPC classification number: G21K1/062 ,  B82Y10/00 ,  B82Y40/00 ,  G03F1/24 ,  G03F1/84 ,  G21K2201/061

Abstract: An apparatus for measuring an image of a pattern to be formed on a semiconductor by scanning the pattern using a scanner, the apparatus including an EUV mask including the pattern, a zoneplate lens on a first side of the EUV mask and adapted to focus EUV light on a portion of the EUV mask at a same angle as an angle at which the scanner will be disposed with respect to a normal line of the EUV mask, and a detector arranged on another side of the EUV mask and adapted to sense energy of the EUV light from the EUV mask, wherein NAzoneplate=NAscanner/n and NAdetector=NAscanner/n*σ, where NAzoneplate denotes a NA of the zoneplate lens, NAdetector denotes a NA of the detector, and NAscanner denotes a NA of the scanner, σ denotes an off-axis degree of the scanner, and n denotes a reduction magnification of the scanner.

Abstract translation: 一种用于通过使用扫描仪扫描图案来测量要在半导体上形成的图案的图像的装置，该装置包括包含图案的EUV掩模，在EUV掩模的第一侧上的偏光透镜，并且适于聚焦EUV光 在EUV掩模的一部分上以与扫描仪将相对于EUV掩模的法线配置的角度相同的角度，以及检测器，布置在EUV掩模的另一侧上，并且适于感测 来自EUV掩模的EUV光，其中NAzoneplate = NAscanner / n和NAdetector = NAscanner / n *＆sgr;其中NAzoneplate表示该区域透镜的NA，NAdetector表示检测器的NA，NAscanner表示扫描仪的NA， ＆sgr 表示扫描仪的离轴度，n表示扫描仪的缩小倍率。

公开(公告)号：US08080402B2

公开(公告)日：2011-12-20

申请号：US11622158

申请日：2007-01-11

Applicant: Moon-Hee Sung ,  Seung-Pyo Hong ,  Jong-Su Lee ,  Chang-Min Jung ,  Kyung-Soo Hahm ,  Dong-Gun Lee ,  Yoon Kyung Park ,  Chul-Joong Kim ,  Ha-Ryoung Poo

Inventor： Moon-Hee Sung ,  Seung-Pyo Hong ,  Jong-Su Lee ,  Chang-Min Jung ,  Kyung-Soo Hahm ,  Dong-Gun Lee ,  Yoon Kyung Park ,  Chul-Joong Kim ,  Ha-Ryoung Poo

IPC: C12N15/00 ,  C12N1/21 ,  A61K48/00

CPC classification number: C07K14/32

Abstract: The present invention relates to a method for expressing each of peptide antibiotics P5 3 and Anal3 35 having amphiphilicity and showing antibacterial, antifungal and anticancer activities 61, 63, 65, 67, 69, 71, on the microbial surface, using a vector containing outer membrane protein genes (pgsBCA) that are derived from Bacillus sp. strains and involved in the synthesis of poly-gamma-glutamate. Moreover, the present invention relates to lactic acid-forming bacteria having each of the peptide antibiotics P5 15 and Anal3 43 expressed on their surface, and the use thereof. According to the present invention, the peptide antibiotics can be expressed on the surface of various microorganisms transformed with the surface expression vectors. The inventive method for the surface expression of the peptide antibiotics allows the peptide antibiotics to be mass-produced without a purification process. Thus, the inventive method has very high industrial applicability. Further, the present invention can be applied to other peptide antibiotics besides P5 3 and Anal 3 35.

Abstract translation: 本发明涉及在微生物表面上表达具有两亲性的肽抗生素P5 3和Anal335各自表现出抗菌，抗真菌，抗癌活性的方法， 来自芽孢杆菌属的膜蛋白基因（pgsBCA） 菌株并参与了聚-γ-谷氨酸的合成。 此外，本发明涉及在其表面表达的各肽抗生素P515和Anal343各自的乳酸形成细菌及其用途。 根据本发明，肽抗生素可以在用表面表达载体转化的各种微生物的表面上表达。 肽抗生素表面表达的本发明方法允许肽抗生素在没有纯化过程的情况下批量生产。 因此，本发明的方法具有非常高的工业实用性。 此外，除了P5 3和Anal 3 35之外，本发明可以应用于其它肽抗生素。

公开(公告)号：US20110275013A1

公开(公告)日：2011-11-10

申请号：US13069758

申请日：2011-03-23

Applicant: Dong-Gun Lee ,  Seong-Sue Kim ,  Tae-Geun Kim

Inventor： Dong-Gun Lee ,  Seong-Sue Kim ,  Tae-Geun Kim

IPC: G03F1/00

CPC classification number: G03F1/24 ,  B82Y10/00 ,  B82Y40/00

Abstract: According to example embodiments, a reflective EUV mask may include a mask substrate, a patterned structure and a non-patterned structure on the mask substrate. At least one of the patterned structure and the non-patterned structure may include a thermally treated region configured to reduce a reflectivity of the respective patterned and non-patterned structure.

Abstract translation: 根据示例实施例，反射型EUV掩模可以包括掩模基板，图案化结构和掩模基板上的非图案化结构。 图案化结构和非图案化结构中的至少一个可以包括被配置为减少相应的图案化和非图案化结构的反射率的热处理区域。

公开(公告)号：US20110033025A1

公开(公告)日：2011-02-10

申请号：US12910605

申请日：2010-10-22

Applicant: DONG-GUN LEE ,  Seong-sue Kim

Inventor： DONG-GUN LEE ,  Seong-sue Kim

IPC: G21K5/00

CPC classification number: G21K1/062 ,  B82Y10/00 ,  B82Y40/00 ,  G03F1/24 ,  G03F1/84 ,  G21K2201/061

Abstract: An apparatus for measuring an image of a pattern to be formed on a semiconductor by scanning the pattern using a scanner, the apparatus including an EUV mask including the pattern, a zoneplate lens on a first side of the EUV mask and adapted to focus EUV light on a portion of the EUV mask at a same angle as an angle at which the scanner will be disposed with respect to a normal line of the EUV mask, and a detector arranged on another side of the EUV mask and adapted to sense energy of the EUV light from the EUV mask, wherein NAzoneplate=NAscanner/n and NAdetector=NAscanner/n*σ, where NAzoneplate denotes a NA of the zoneplate lens, NAdetector denotes a NA of the detector, and NAscanner denotes a NA of the scanner, σ denotes an off-axis degree of the scanner, and n denotes a reduction magnification of the scanner.

Abstract translation: 一种用于通过使用扫描仪扫描图案来测量要在半导体上形成的图案的图像的装置，该装置包括包含该图案的EUV掩模，在EUV掩模的第一侧上的偏光透镜，并且适于聚焦EUV光 在EUV掩模的一部分上以与扫描仪将相对于EUV掩模的法线配置的角度相同的角度，以及检测器，布置在EUV掩模的另一侧上，并且适于感测 来自EUV掩模的EUV光，其中NAzoneplate = NAscanner / n和NAdetector = NAscanner / n *＆sgr;其中NAzoneplate表示该区域透镜的NA，NAdetector表示检测器的NA，NAscanner表示扫描仪的NA， ＆sgr 表示扫描仪的离轴度，n表示扫描仪的缩小倍率。

公开(公告)号：US07821714B1

公开(公告)日：2010-10-26

申请号：US12659261

申请日：2010-03-02

Applicant: Dong-gun Lee ,  Seong-sue Kim

Inventor： Dong-gun Lee ,  Seong-sue Kim

IPC: G02B27/44 ,  G03F7/20 ,  G21K1/06

CPC classification number: G21K1/062 ,  B82Y10/00 ,  B82Y40/00 ,  G03F1/24 ,  G03F1/84 ,  G21K2201/061

Abstract: An apparatus for measuring an image of a pattern to be formed on a semiconductor by scanning the pattern using a scanner, the apparatus including an EUV mask including the pattern, a zoneplate lens on a first side of the EUV mask and adapted to focus EUV light on a portion of the EUV mask at a same angle as an angle at which the scanner will be disposed with respect to a normal line of the EUV mask, and a detector arranged on another side of the EUV mask and adapted to sense energy of the EUV light from the EUV mask, wherein NAzoneplate=NAscanner/n and NAdetector=NAscanner/n*σ, where NAzoneplate denotes a NA of the zoneplate lens, NAdetector denotes a NA of the detector, and NAscanner denotes a NA of the scanner, σ denotes an off-axis degree of the scanner, and n denotes a reduction magnification of the scanner.

Abstract translation: 一种用于通过使用扫描仪扫描图案来测量要在半导体上形成的图案的图像的装置，该装置包括包含图案的EUV掩模，在EUV掩模的第一侧上的偏光透镜，并且适于聚焦EUV光 在EUV掩模的一部分上以与扫描仪将相对于EUV掩模的法线配置的角度相同的角度，以及检测器，布置在EUV掩模的另一侧上，并且适于感测 来自EUV掩模的EUV光，其中NAzoneplate = NAscanner / n和NAdetector = NAscanner / n *＆sgr;其中NAzoneplate表示该区域透镜的NA，NAdetector表示检测器的NA，NAscanner表示扫描仪的NA， ＆sgr 表示扫描仪的离轴度，n表示扫描仪的缩小倍率。

公开(公告)号：US20090191475A1

公开(公告)日：2009-07-30

申请号：US12383640

申请日：2009-03-26

Applicant: Myoung-soo Lee ,  Young-su Sung ,  Hee-bom Kim ,  Min-kyung Lee ,  Dong-gun Lee

Inventor： Myoung-soo Lee ,  Young-su Sung ,  Hee-bom Kim ,  Min-kyung Lee ,  Dong-gun Lee

IPC: G03F1/00

CPC classification number: G21K1/062 ,  B82Y10/00 ,  G03F1/70 ,  G03F7/70625 ,  G21K2201/061

Abstract: A method of manufacturing a photomask includes: providing a photomask; exposing the photomask to obtain an aerial image of the photomask and evaluating the photomask using the aerial image; and altering an optical parameter of the photomask associated with the aerial image according to the result of evaluation.

Abstract translation: 制造光掩模的方法包括：提供光掩模; 曝光光掩模以获得光掩模的空间图像，并使用空中图像评估光掩模; 以及根据评估结果改变与空中图像相关联的光掩模的光学参数。

公开(公告)号：US06800727B2

公开(公告)日：2004-10-05

申请号：US10081418

申请日：2002-02-22

Applicant: Kyung-Soo Hahm ,  Dong Gun Lee ,  YoonKyung Park

Inventor： Kyung-Soo Hahm ,  Dong Gun Lee ,  YoonKyung Park

IPC: A61K3800

CPC classification number: C07K14/43563 ,  A61K38/00 ,  C07K14/435 ,  C07K14/463 ,  C07K2319/00

Abstract: The present invention relates to novel peptides with increased + charge and hydrophobicity by substituting one or more amino acids of CA-MA peptide in which cecropin A (CA) and magainin 2(MA) were conjugated and pharmaceutical compositions containing thereof. More precisely, the present invention relates to synthetic peptides prepared by substituting one or more amino acids of CA-MA peptide represented by the SEQ. ID. NO: 1 with amino acids having + charge and hydrophobicity and anti-bacterial, anti-fungal and anticancer compositions containing thereof. The synthetic peptides of the present invention have no cytotoxicity but have excellent anti-bacterial, anti-fungal and anticancer activity, leading in an effective use thereof as a safe anticancer agent and antibiotics.

Abstract translation: 本发明涉及通过取代一种或多种CA-MA肽的氨基酸，其中螯合了天蚕素A（CA）和magainin 2（MA）和其含有的药物组合物，其具有增加的+电荷和疏水性的新型肽。 更准确地说，本发明涉及通过用SEQ ID NO：1所示的CA-MA肽取代一个或多个氨基酸制备的合成肽。 ID。 NO：1，其具有+电荷和疏水性的氨基酸和含有它们的抗细菌，抗真菌和抗癌组合物。 本发明的合成肽不具有细胞毒性，但具有优良的抗细菌，抗真菌，抗癌活性，有效地用作安全抗癌剂和抗生素。