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69 条记录 (耗时 0.042 秒)

    Device for cutting and holding a cornea during a transplant procedure
    51.
    发明授权
    Device for cutting and holding a cornea during a transplant procedure 失效
    移植手术期间切割和保持角膜的装置

    公开(公告)号：US07147648B2

    公开(公告)日：2006-12-12

    申请号：US10615059

    申请日：2003-07-08

    申请人： James Lin

    发明人： James Lin

    IPC分类号： A61B17/32

    CPC分类号： A61F9/013 ,  A61F2/142 ,  A61F9/0133

    摘要： A device and surgical method for promoting suitable grafting between a healthy donor cornea button and a recipient's healthy corneal tissue. The device is a cornea transplanter comprising a cutting device, a support block having a removable base plate, and a vacuum device. The cornea transplanter is capable of retaining healthy donor corneal tissue as it is buttoned and placed onto the recipient's eye, with minimal physical manipulation of the donor corneal tissue. Once the cornea button is properly positioned, sutures may be symmetrically placed around the cornea button, using suture grooves that guide the suture needle to a particular depth and length of pass.

    摘要翻译： 用于促进健康供体角膜按钮和接受者健康角膜组织之间适当接枝的装置和手术方法。 该装置是角膜移植器，其包括切割装置，具有可移除底板的支撑块和真空装置。 角膜移植器能够保持健康的供体角膜组织，因为它被扣上并放置在受体的眼睛上，对供体角膜组织进行最小的物理操作。 一旦角膜按钮被正确定位，缝线可以对角地放置在角膜按钮周围，使用将缝合针引导到特定深度和长度的缝合槽。

    Integrated circuits with multiple low dielectric-constant inter-metal dielectrics
    52.
    发明授权
    Integrated circuits with multiple low dielectric-constant inter-metal dielectrics 有权

    公开(公告)号：US06770975B2

    公开(公告)日：2004-08-03

    申请号：US09328646

    申请日：1999-06-09

    申请人： Shi-Qing Wang ,  Henry Chung ,  James Lin

    发明人： Shi-Qing Wang ,  Henry Chung ,  James Lin

    IPC分类号： H01L2348

    CPC分类号： H01L21/76832 ,  H01L21/76808 ,  H01L21/7681 ,  H01L21/76825 ,  H01L21/76828 ,  H01L21/76829 ,  H01L21/76835 ,  H01L21/76843 ,  H01L21/76849 ,  H01L23/5329 ,  H01L2924/0002 ,  H01L2924/00

    摘要： The invention provides processes for the formation of structures in microelectronic devices such as integrated circuit devices. More particularly, the invention relates to the formation of vias, interconnect metallization and wiring lines using multiple low dielectric-constant inter-metal dielectrics. The processes use two or more dissimilar low-k dielectrics for the inter-metal dielectrics of Cu-based dual damascene backends of integrated circuits. The use of both organic and inorganic low-k dielectrics offers advantages due to the significantly different plasma etch characteristics of the two kinds of dielectrics. One dielectric serves as the etchstop in etching the other dielectric so that no additional etchstop layer is required. Exceptional performance is achieved due to the lower parasitic capacitance resulting from the use of low-k dielectrics. An integrated circuit structure is formed having a substrate; an inorganic layer on the substrate which is composed of a pattern of metal lines on the substrate and an inorganic dielectric on the substrate between the metal lines; and an organic layer on the inorganic layer which is composed of an organic dielectric having metal filled vias therethrough which connect to the metal lines of the inorganic layer.

    Electrical plug/socket
    53.
    发明授权
    Electrical plug/socket 失效
    电插头/插座

    公开(公告)号：US06375493B1

    公开(公告)日：2002-04-23

    申请号：US09739868

    申请日：2000-12-20

    申请人： James Lin

    发明人： James Lin

    IPC分类号： H01R1358

    CPC分类号： H01R13/5841 ,  Y10S439/915

    摘要： An improved electrical plug/socket includes a seat being a fixed-shaped structure, one end thereof having an insert electrode, the other end thereof having a depression forming a seat chamber, the center having a through hole, a seat edge of an outer periphery being recessed to form a plurality of seat grooves; at least two insert electrodes formed from electrically conductive metal; and a lead wire connected to the insert electrodes and extending out of the through hole, and having an outer diameter corresponding to the seat groove so as to be insertable in the seat groove for guiding orientation.

    摘要翻译： 一种改进的电插座包括固定形结构的座，其一端具有插入电极，其另一端具有形成座腔的凹部，该中心具有通孔，外周的座边缘 凹入以形成多个座槽; 由导电金属形成的至少两个插入电极; 以及与所述插入电极连接并从所述通孔延伸出的导线，并且具有与所述座槽相对应的外径，以便能够插入所述座槽中以引导取向。

    Integrated circuits with multiple low dielectric-constant inter-metal dielectrics
    54.
    发明授权
    Integrated circuits with multiple low dielectric-constant inter-metal dielectrics 失效
    具有多个低介电常数金属间电介质的集成电路

    公开(公告)号：US06287955B1

    公开(公告)日：2001-09-11

    申请号：US09718787

    申请日：2000-11-22

    申请人： Shi-Qing Wang ,  Henry Chung ,  James Lin

    发明人： Shi-Qing Wang ,  Henry Chung ,  James Lin

    IPC分类号： H01L214763

    CPC分类号： H01L21/76832 ,  H01L21/76808 ,  H01L21/7681 ,  H01L21/76825 ,  H01L21/76828 ,  H01L21/76829 ,  H01L21/76835 ,  H01L21/76843 ,  H01L21/76849 ,  H01L23/5329 ,  H01L2924/0002 ,  H01L2924/00

    摘要： The invention provides processes for the formation of structures in microelectronic devices such as integrated circuit devices. More particularly, the invention relates to the formation of vias, interconnect metallization and wiring lines using multiple low dielectric-constant inter-metal dielectrics. The processes use two or more dissimilar low-k dielectrics for the inter-metal dielectrics of Cu-based dual damascene backends of integrated circuits. The use of both organic and inorganic low-k dielectrics offers advantages due to the significantly different plasma etch characteristics of the two kinds of dielectrics. One dielectric serves as the etchstop in etching the other dielectric so that no additional etchstop layer is required. Exceptional performance is achieved due to the lower parasitic capacitance resulting from the use of low-k dielectrics. An integrated circuit structure is formed having a substrate; an inorganic layer on the substrate which is composed of a pattern of metal lines on the substrate and an inorganic dielectric on the substrate between the metal lines; and an organic layer on the inorganic layer which is composed of an organic dielectric having metal filled vias therethrough which connect to the metal lines of the inorganic layer.

    摘要翻译： 本发明提供了在诸如集成电路器件的微电子器件中形成结构的方法。 更具体地，本发明涉及使用多个低介电常数金属间电介质形成通孔，互连金属化和布线。 该方法使用两个或多个不同的低k电介质用于集成电路的Cu基双镶嵌后端的金属间电介质。 由于两种电介质的等离子体蚀刻特性明显不同，因此使用有机和无机低k电介质都有优势。 一个电介质用作蚀刻其它电介质的蚀刻步骤，因此不需要额外的蚀刻阻挡层。 由于使用低k电介质导致较低的寄生电容，实现了卓越的性能。 形成具有基板的集成电路结构; 在基板上的无机层，由基板上的金属线图案和金属线之间的基板上的无机电介质构成; 以及无机层上的有机层，其由具有金属填充的通孔的有机电介质组成，其连接到无机层的金属线。

    VEHICLE LEANING MECHANISM WITH GRAVITY-ASSIST SELF-RIGHTING MEANS
    55.
    发明申请
    VEHICLE LEANING MECHANISM WITH GRAVITY-ASSIST SELF-RIGHTING MEANS 有权

    公开(公告)号：US20210197916A1

    公开(公告)日：2021-07-01

    申请号：US17132993

    申请日：2020-12-23

    申请人： James Lin

    发明人： James Lin

    IPC分类号： B62K5/10 ,  B62K5/06

    摘要： A multi-tracked segmented narrow-body vehicle where one segment leans relative to the other non-leaning segment in order to stabilize the vehicle during turning maneuvers. The vehicle segments and leaning dynamics are defined by a rotating structural swivel pivot, positioning guide track(s), and positioning locating wheel assembly (or assemblies) that define the vehicle leaning behavior. The swivel pivot, positioning guide track(s), and positioning locating wheel assembly (or assemblies) also manage the vehicle center of gravity to create gravitational potential energy and a gravitational torque during the vehicle leaning to automatically self-right and recover the vehicle from a dynamic leaning configuration to a stable upright configuration without additional force inputs.

    SELF-RIGHTING MEANS FOR LEANING VEHICLES; PRIMARILY BY GRAVITY
    57.
    发明申请
    SELF-RIGHTING MEANS FOR LEANING VEHICLES; PRIMARILY BY GRAVITY 审中-公开
    自行车辆的自主权; 主要原则

    公开(公告)号：US20150021865A1

    公开(公告)日：2015-01-22

    申请号：US13947023

    申请日：2013-07-20

    申请人： James Lin

    发明人： James Lin

    IPC分类号： B60G21/00

    CPC分类号： B60G21/005 ,  B60G2300/122 ,  B60G2300/45 ,  B60G2300/60 ,  B60G2400/63 ,  B62J27/00 ,  B62K5/027 ,  B62K5/10

    摘要： A low cost leaning vehicle stability and self-righting system that primarily uses gravity to return a leaning vehicle position to its original stable upright position. The system accomplishes this by increasing the leaning vehicle's Center of Gravity (CG) above the resting upright position—thus increasing the CG energy state—the more the vehicle leans. The system stores energy—a combination of additional and recovered energy normally lost when the vehicle leans—primarily in the form of gravitational potential energy to automatically return the vehicle from a leaning position to the upright stable position.

    摘要翻译： 一种低成本的倾斜车辆稳定性和自我调整系统，其主要使用重力将倾斜车辆位置返回到其原始稳定的直立位置。 该系统通过将倾斜车辆的重心（CG）增加到静止直立位置以上，从而增加CG能量状态 - 车辆倾斜越多，从而实现了这一点。 该系统存储能量 - 当车辆倾斜时主要以重力势能的形式通常损失的额外和恢复的能量的组合，以使车辆从倾斜位置自动返回到直立的稳定位置。