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198 条记录 (耗时 0.042 秒)

    Massively parallel lithography with two-dimensional pen arrays
    52.
    发明授权
    Massively parallel lithography with two-dimensional pen arrays 失效
    大尺寸平行光刻与二维笔阵列

    公开(公告)号：US08192794B2

    公开(公告)日：2012-06-05

    申请号：US12000456

    申请日：2007-12-12

    申请人： Chad A. Mirkin ,  Peng Sun ,  Yuhuang Wang ,  Steven Lenhert

    发明人： Chad A. Mirkin ,  Peng Sun ,  Yuhuang Wang ,  Steven Lenhert

    IPC分类号： B05D5/00 ,  G01N1/28

    CPC分类号： G03F7/0002 ,  G01Q80/00

    摘要： Massive parallel printing of structures and nanostructures, including lipids, at high speed with high resolution and high quality using two dimensional arrays comprising cantilevers and tip-based transfer of material to a surface. The invention provides a nanolithographic method comprising (1) providing a two-dimensional array of a plurality of cantilevers, wherein the array comprises a plurality of base rows, each base row comprising a plurality of cantilevers extending from the base row, wherein each of the cantilevers comprising tips at the cantilever end away from the base row; wherein the two dimensional array has a support; (2) providing a patterning composition, wherein the composition comprises one or more lipids; (3) providing a substrate; (4) coating the tips of the cantilevers with the patterning composition; and (5) depositing at least some of the patterning composition from the tips to the substrate surface.

    摘要翻译： 使用包括悬臂和基于尖端的材料转移到表面的二维阵列，以高分辨率和高质量的高速大规模平行印刷结构和纳米结构，包括脂质。 本发明提供一种纳米光刻方法，其包括（1）提供多个悬臂的二维阵列，其中所述阵列包括多个基列，每个基行包括从所述基列延伸的多个悬臂，其中， 悬臂包括远离基座的悬臂端的尖端; 其中所述二维阵列具有支撑; （2）提供图案化组合物，其中所述组合物包含一种或多种脂质; （3）提供基板; （4）用图案化组合物涂覆悬臂的尖端; 和（5）将至少一些图案化组合物从尖端沉积到​​基底表面。

    Surface and site-specific polymerization by direct-write lithography
    54.
    发明授权
    Surface and site-specific polymerization by direct-write lithography 失效
    通过直写光刻技术进行表面和位点特异性聚合

    公开(公告)号：US08012400B2

    公开(公告)日：2011-09-06

    申请号：US11966764

    申请日：2007-12-28

    申请人： Chad A. Mirkin ,  Xiaogang Liu ,  Shouwu Guo

    发明人： Chad A. Mirkin ,  Xiaogang Liu ,  Shouwu Guo

    IPC分类号： B29C35/08

    CPC分类号： G03F7/0002 ,  G01Q80/00 ,  G03F7/2049 ,  H01J2237/31738 ,  Y10S977/857 ,  Y10S977/882 ,  Y10S977/897

    摘要： Polymeric microstructures and nanostructures can be prepared with use of a tip to pattern a surface. A tip can be used to pattern a structure which can initiate polymerization. The structure can be then exposed to monomer to induce polymerization at the structure. Alternatively, a tip can be used to pattern a surface with a monomer in which the surface is treated with polymerization catalyst so that polymerization occurs at the patterning site. Ring-opening metathesis polymerization can be carried out with use of the tip to control the polymerization. The tip can be a sharp tip as used in for example an atomic force microscope tip. Norbornene types of monomers can be used. Biological macromolecules can be also prepared.

    摘要翻译： 可以使用尖端来制备聚合物微结构和纳米结构以对表面进行图案化。 尖端可用于图案化可引发聚合的结构。 然后将该结构暴露于单体以在结构处引发聚合。 或者，可以使用尖端来用表面用聚合催化剂处理的单体对表面进行图案化，使得在图案化位点发生聚合。 可以使用尖端进行开环易位聚合以控制聚合。 尖端可以是例如原子力显微镜尖端中使用的尖锐尖端。 可以使用降冰片烯类型的单体。 还可制备生物大分子。

    BLOCK COPOLYMER-ASSISTED NANOLITHOGRAPHY
    55.
    发明申请
    BLOCK COPOLYMER-ASSISTED NANOLITHOGRAPHY 审中-公开
    嵌段共聚物辅助纳米尺度

    公开(公告)号：US20110165341A1

    公开(公告)日：2011-07-07

    申请号：US12959105

    申请日：2010-12-02

    申请人： Chad A. Mirkin ,  Jinan Chai ,  Fengwei Huo ,  Zijian Zheng ,  Louise R. Giam

    发明人： Chad A. Mirkin ,  Jinan Chai ,  Fengwei Huo ,  Zijian Zheng ,  Louise R. Giam

    IPC分类号： B05D5/00 ,  B05D1/28 ,  B05D3/10 ,  B82Y40/00 ,  B82Y99/00

    CPC分类号： G03F7/0002 ,  B82Y10/00 ,  B82Y40/00

    摘要： In accordance with an embodiment of the disclosure, a method for forming submicron size nanostructures on a substrate surface includes contacting a substrate with a tip coated with an ink comprising a block copolymer matrix and a nanostructure precursor to form a printed feature comprising the block copolymer matrix and the nanostructure precursor on the substrate, and reducing the nanostructure precursor of the printed feature to form a nanostructure having a diameter (or line width) of less than 1 μm.

    摘要翻译： 根据本公开的实施例，用于在衬底表面上形成亚微米级纳米结构的方法包括使基底与涂覆有包含嵌段共聚物基质和纳米结构前体的油墨的末端接触，以形成包含嵌段共聚物基质 和纳米结构前体，并且还原印刷特征的纳米结构前体以形成直径（或线宽）小于1μm的纳米结构。

    Force Feedback Leveling of Tip Arrays for Nanolithography
    56.
    发明申请
    Force Feedback Leveling of Tip Arrays for Nanolithography 有权
    用于纳米光刻的尖端阵列的力反馈调平

    公开(公告)号：US20110165329A1

    公开(公告)日：2011-07-07

    申请号：US12960439

    申请日：2010-12-03

    申请人： Chad A. Mirkin ,  Xing Liao ,  Adam B. Braunschweig

    发明人： Chad A. Mirkin ,  Xing Liao ,  Adam B. Braunschweig

    IPC分类号： B05D5/00 ,  B05D1/28 ,  G01L1/06 ,  B82Y99/00

    CPC分类号： G03F7/0002

    摘要： A method of leveling a polymer pen array includes contacting a pen array with a surface and measuring a total force exerted on the surface by the pen array, the pen array being disposed at a first angle with respect to a first axis of the surface and a second angle with respect to a second axis of the surface; tilting one or both of the pen array and the surface to vary the first and second angles of the pen array with respect to the surface; measuring the total force exerted by the tilted pen array on the surface; and repeating the tilting and measuring steps until a global maximum of the total force exerted on the surface by the pen array is measured, thereby determining first and second angles which correspond to a leveled position of the pen array with respect to the surface.

    摘要翻译： 调整聚合物笔阵列的方法包括使笔阵列与表面接触并且通过笔阵列测量施加在表面上的总力，笔阵列相对于表面的第一轴线以第一角度设置， 相对于表面的第二轴线的第二角度; 倾斜笔阵列和表面中的一个或两个以改变笔阵列相对于表面的第一和第二角度; 测量由倾斜笔阵列施加在表面上的总力; 并且重复倾斜和​​测量步骤，直到测量由笔阵列施加在表面上的总力的全局最大值，从而确定对应于笔阵列相对于表面的调平位置的第一和第二角度。

    Direct write nanolithographic deposition of nucleic acids from nanoscopic tips
    57.
    发明授权
    Direct write nanolithographic deposition of nucleic acids from nanoscopic tips 有权
    从纳米尖端直接写入纳米光刻的核酸

    公开(公告)号：US07951334B2

    公开(公告)日：2011-05-31

    申请号：US12044738

    申请日：2008-03-07

    申请人： Chad A. Mirkin ,  Linette Demers ,  David S. Ginger

    发明人： Chad A. Mirkin ,  Linette Demers ,  David S. Ginger

    IPC分类号： B01L3/02

    CPC分类号： G03F7/0002 ,  G01Q80/00 ,  Y10T436/2575

    摘要： The use of direct-write nanolithography to generate anchored, nanoscale patterns of nucleic acid on different substrates is described, including electrically conductive and insulating substrates. Modification of nucleic acid, including oligonucleotides, with reactive groups such as thiol groups provides for patterning with use of appropriate scanning probe microscopic tips under appropriate conditions. The reactive groups provide for chemisorption or covalent bonding to the substrate surface. The resulting nucleic acid features, which exhibit good stability, can be hybridized with complementary nucleic acids and probed accordingly with use of, for example, nanoparticles functionalized with nucleic acids. Patterning can be controlled by selection of tip treatment, relative humidity, and nucleic acid structure.

    摘要翻译： 描述了使用直写式纳米光刻技术在不同基底上产生锚定的纳米级核酸图案，包括导电和绝缘基底。 含有反应性基团如硫醇基团的核酸（包括寡核苷酸）的修饰使得在合适的条件下使用合适的扫描探针显微镜尖端进行图案化。 反应性基团提供化学吸附或共价结合到基底表面。 所得到的表现出良好稳定性的核酸特征可与互补核酸杂交，并使用例如用核酸官能化的纳米颗粒进行相应的探测。 可以通过选择尖端处理，相对湿度和核酸结构来控制图案化。