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    Direct-write nanolithography method of transporting ink with an elastomeric polymer coated nanoscopic tip to form a structure having internal hollows on a substrate
    2.
    发明授权
    Direct-write nanolithography method of transporting ink with an elastomeric polymer coated nanoscopic tip to form a structure having internal hollows on a substrate 失效
    使用弹性体聚合物涂覆的纳米级尖端输送墨水的直写式纳米光刻方法形成在基底上具有内部空洞的结构

    公开(公告)号：US07491422B2

    公开(公告)日：2009-02-17

    申请号：US11056391

    申请日：2005-02-14

    Applicant: Hua Zhang ,  Robert Elghanian ,  Linette Demers ,  Nabil Amro ,  Sandeep Disawal ,  Sylvain Cruchon-Dupeyrat

    Inventor： Hua Zhang ,  Robert Elghanian ,  Linette Demers ,  Nabil Amro ,  Sandeep Disawal ,  Sylvain Cruchon-Dupeyrat

    IPC: B05D5/00 ,  B05D1/28 ,  B82B1/00 ,  G01N33/00 ,  G03F1/00

    CPC classification number: B81C1/0046 ,  G03F7/0002 ,  G03F7/2049 ,  Y10S977/857 ,  Y10S977/863 ,  Y10S977/879

    Abstract: A novel method of transporting ink to a substrate with dip-pen nanolithographic (DPN) stamp tips coated with polymer (e.g., polydimethylsiloxane (PDMS), etc.). This kind of tip adsorbs chemicals (“inks”) easily and is used to generate DPN nanopatterns that are imaged with the same tip after a DPN process. This method builds a bridge between micro-contact printing (μCP) and DPN, making it possible for one to easily generate smaller structures of any molecules that have been patterned by the μCP technique. The easy tip-coating and writing process enriches the state-of-the-art DPN technique. The sub-100 nm DPN resolution obtained by using this kind of novel tip is comparable to that with a conventional Si3N4 probe tip. Importantly, the unique stamp tip was able to transfer solvent (e.g., liquid “ink”) onto a substrate, resulting in fabrication of hollow nanostructures with only one DPN holding/writing step. Inks comprising metals and sol-gel materials are noted, as well as applications in photomask repair, enhancement, and fabrication.

    Abstract translation: 使用涂覆有聚合物（例如聚二甲基硅氧烷（PDMS）等）的浸笔纳米光刻（DPN）印模尖端将墨输送到基底的新方法。 这种尖端容易吸附化学物质（“油墨”），并用于产生在DPN工艺之后用相同尖端成像的DPN纳米图案。 该方法构建了微接触印刷（muCP）和DPN之间的桥梁，使得可以轻松地生成通过muCP技术图案化的任何分子的较小结构。 简单的涂层和书写过程丰富了最先进的DPN技术。 通过使用这种新型尖端获得的亚100nm DPN分辨率与常规Si 3 N 4探针尖端的分辨率相当。 重要的是，独特的压头能够将溶剂（例如液体“墨”）转移到基底上，从而制造具有仅一个DPN保持/书写步骤的中空纳米结构。 注意到包含金属和溶胶 - 凝胶材料的油墨，以及光掩模修复，增强和制造中的应用。

    Direct write nanolithographic deposition of nucleic acids from nanoscopic tips
    5.
    发明授权
    Direct write nanolithographic deposition of nucleic acids from nanoscopic tips 有权
    从纳米尖端直接写入纳米光刻的核酸

    公开(公告)号：US07951334B2

    公开(公告)日：2011-05-31

    申请号：US12044738

    申请日：2008-03-07

    Applicant: Chad A. Mirkin ,  Linette Demers ,  David S. Ginger

    Inventor： Chad A. Mirkin ,  Linette Demers ,  David S. Ginger

    IPC: B01L3/02

    CPC classification number: G03F7/0002 ,  G01Q80/00 ,  Y10T436/2575

    Abstract: The use of direct-write nanolithography to generate anchored, nanoscale patterns of nucleic acid on different substrates is described, including electrically conductive and insulating substrates. Modification of nucleic acid, including oligonucleotides, with reactive groups such as thiol groups provides for patterning with use of appropriate scanning probe microscopic tips under appropriate conditions. The reactive groups provide for chemisorption or covalent bonding to the substrate surface. The resulting nucleic acid features, which exhibit good stability, can be hybridized with complementary nucleic acids and probed accordingly with use of, for example, nanoparticles functionalized with nucleic acids. Patterning can be controlled by selection of tip treatment, relative humidity, and nucleic acid structure.

    Abstract translation: 描述了使用直写式纳米光刻技术在不同基底上产生锚定的纳米级核酸图案，包括导电和绝缘基底。 含有反应性基团如硫醇基团的核酸（包括寡核苷酸）的修饰使得在合适的条件下使用合适的扫描探针显微镜尖端进行图案化。 反应性基团提供化学吸附或共价结合到基底表面。 所得到的表现出良好稳定性的核酸特征可与互补核酸杂交，并使用例如用核酸官能化的纳米颗粒进行相应的探测。 可以通过选择尖端处理，相对湿度和核酸结构来控制图案化。

    Direct write nanolithographic deposition of nucleic acids from nanoscopic tips
    7.
    发明授权
    Direct write nanolithographic deposition of nucleic acids from nanoscopic tips 失效
    从纳米尖端直接写入纳米光刻的核酸

    公开(公告)号：US07361310B1

    公开(公告)日：2008-04-22

    申请号：US10307515

    申请日：2002-12-02

    Applicant: Chad A. Mirkin ,  Linette Demers ,  David S. Ginger

    Inventor： Chad A. Mirkin ,  Linette Demers ,  David S. Ginger

    IPC: B01L3/02

    CPC classification number: G03F7/0002 ,  G01Q80/00 ,  Y10T436/2575

    Abstract: The use of direct-write nanolithography to generate anchored, nanoscale patterns of nucleic acid on different substrates is described, including electrically conductive and insulating substrates. Modification of nucleic acid, including oligonucleotides, with reactive groups such as thiol groups provides for patterning with use of appropriate scanning probe microscopic tips under appropriate conditions. The reactive groups provide for chemisorption or covalent bonding to the substrate surface. The resulting nucleic acid features, which exhibit good stability, can be hybridized with complementary nucleic acids and probed accordingly with use of, for example, nanoparticles functionalized with nucleic acids. Patterning can be controlled by selection of tip treatment, relative humidity, and nucleic acid structure.

    Abstract translation: 描述了使用直写式纳米光刻技术在不同基底上产生锚定的纳米级核酸图案，包括导电和绝缘基底。 含有反应性基团如硫醇基团的核酸（包括寡核苷酸）的修饰使得在合适的条件下使用合适的扫描探针显微镜尖端进行图案化。 反应性基团提供化学吸附或共价结合到基底表面。 所得到的表现出良好稳定性的核酸特征可与互补核酸杂交，并使用例如用核酸官能化的纳米颗粒进行相应的探测。 可以通过选择尖端处理，相对湿度和核酸结构来控制图案化。

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