Abstract:
A technique includes forming a gradient channel with width and depth gradients. A mask is disposed on top of a substrate. The mask is patterned with at least one elongated channel pattern having different elongated channel pattern widths. A channel is etched in the substrate in a single etching step, the channel having a width gradient and a corresponding depth gradient both simultaneously etched in the single etching step according to the different elongated channel pattern widths in the mask.
Abstract:
Techniques for increasing the capture zone in nano and microchannel-based polymer testing structures using concentric arrangements of nanostructures, such as nanopillars are provided. In one aspect, a testing structure for testing polymers is provided that includes a first fluid reservoir and a second fluid reservoir formed in an electrically insulating substrate; at least one channel formed in the insulating substrate that interconnects the first fluid reservoir and the second fluid reservoir; and an arrangement of nanostructures within either the first fluid reservoir or the second fluid reservoir wherein the nanostructures are arranged so as to form multiple concentric circles inside either the first fluid reservoir or the second fluid reservoir with each of the concentric circles being centered at an entry point of the channel. A method of analyzing a polymer using the testing structure is also provided.
Abstract:
A mechanism is provided for reducing entropy of a polyelectrolyte before the polyelectrolyte moves through a nanopore. A free-standing membrane has the nanopore formed through the membrane. An agarose gel is formed onto either and/or both sides of the nanopore in the membrane. The agarose gel is a porous material. The polyelectrolyte is uncoiled by driving the polyelectrolyte through the porous material of the agarose gel via an electric field. Driving the polyelectrolyte, having been uncoiled and linearized by the agarose gel, into the nanopore is for sequencing.
Abstract:
A mechanism is provided for fabricating nanochannels for a nanodevice. Insulating film is deposited on a substrate. A nanowire is patterned on the film. Insulating material is deposited on the nanowire and film. A first circular hole is formed in the insulating material as an inlet, over a first tip of the nanowire to expose the first tip. A second circular hole is formed as an outlet, over a second tip of the nanowire opposite the first tip to expose the second tip. A nanochannel connects the first and second holes by etching away the nanowire via an etchant in the first and the second holes. A first reservoir is attached over the first hole in connection with the nanochannel at a previous location of the first tip. A second reservoir is attached over the second hole in connection with the nanochannel at a previous location of the second tip.
Abstract:
A mechanism is provided for fabricating nanochannels for a nanodevice. Insulating film is deposited on a substrate. A nanowire is patterned on the film. Insulating material is deposited on the nanowire and film. A first circular hole is formed in the insulating material as an inlet, over a first tip of the nanowire to expose the first tip. A second circular hole is formed as an outlet, over a second tip of the nanowire opposite the first tip to expose the second tip. A nanochannel connects the first and second holes by etching away the nanowire via an etchant in the first and the second holes. A first reservoir is attached over the first hole in connection with the nanochannel at a previous location of the first tip. A second reservoir is attached over the second hole in connection with the nanochannel at a previous location of the second tip.