利索-全球专利检索

  1. 登录
  2. 注册

搜索结果

63 条记录 (耗时 0.026 秒)

    OPTICAL DEVICE WITH STIFF HOUSING
    54.
    发明申请
    OPTICAL DEVICE WITH STIFF HOUSING 审中-公开
    带有外壳的光学设备

    公开(公告)号：US20090219497A1

    公开(公告)日：2009-09-03

    申请号：US12390849

    申请日：2009-02-23

    申请人： Armin Schoeppach ,  Jens Kugler

    发明人： Armin Schoeppach ,  Jens Kugler

    IPC分类号： G03B27/70 ,  G02B7/182 ,  G02B27/64

    CPC分类号： G03B27/00 ,  G02B7/028 ,  G03F7/70825

    摘要： The disclosure relates to an optical device, such as for microlithography, that includes an optical module and a supporting structure. The disclosure also relates to an optical module that includes an optical element and a carrier structure for the optical element. the carrier structure can be connected to the optical element via at least one holding element. The carrier structure can be fixed to the supporting structure and produced, for example, from a material having a coefficient of thermal expansion α

    摘要翻译： 本发明涉及一种诸如用于微光刻的光学装置，其包括光学模块和支撑结构。 本公开还涉及一种包括光学元件和用于光学元件的载体结构的光学模块。 载体结构可以经由至少一个保持元件连接到光学元件。 载体结构可以固定到支撑结构上，例如由具有热膨胀系数α<0.2 * 10-6K-1的材料制成。

    Optical arrangement in a microlithographic projection exposure apparatus
    55.
    发明授权
    Optical arrangement in a microlithographic projection exposure apparatus 有权
    微光刻投影曝光装置中的光学布置

    公开(公告)号：US09250417B2

    公开(公告)日：2016-02-02

    申请号：US13467760

    申请日：2012-05-09

    申请人： Dirk Schaffer ,  Stefan Hembacher ,  Jens Kugler

    发明人： Dirk Schaffer ,  Stefan Hembacher ,  Jens Kugler

    IPC分类号： G03B27/54 ,  G02B7/182 ,  G03F7/20

    CPC分类号： G02B7/182 ,  G02B7/1827 ,  G03F7/70316

    摘要： The disclosure relates to optical arrangements in a microlithographic projection exposure apparatus. In accordance with one aspect, an optical arrangement has at least one mirror segment arrangement including a plurality of separate mirror segments. The mirror segments are connected to a carrying structure of the projection exposure apparatus via mounting elements. At least one of the mounting elements, which is assigned to a first one of the mirror segments, extends, on the opposite side to the optically active surface of the mirror segment arrangement, at least partly into the region of a second mirror segment of the mirror segment arrangement. The second mirror segment is adjacent to the first mirror segment.

    摘要翻译： 本公开涉及微光刻投影曝光装置中的光学装置。 根据一个方面，一种光学装置具有至少一个包括多个分离镜片段的镜片段布置。 镜片段通过安装元件连接到投影曝光设备的承载结构。 分配给第一反射镜段的安装元件中的至少一个在反射镜分段装置的与光学有效表面相反的一侧上至少部分地延伸到第二反射镜段的区域中 镜片段布置。 第二镜片段与第一镜片段相邻。

    Protection module for EUV lithography apparatus, and EUV lithography apparatus
    56.
    发明授权
    Protection module for EUV lithography apparatus, and EUV lithography apparatus 有权
    EUV光刻设备的保护模块和EUV光刻设备

    公开(公告)号：US08698999B2

    公开(公告)日：2014-04-15

    申请号：US13041989

    申请日：2011-03-07

    申请人： Dirk Heinrich Ehm ,  Timo Laufer ,  Ben Banney ,  Jens Kugler ,  Ulrich Nieken ,  Franz Keller

    发明人： Dirk Heinrich Ehm ,  Timo Laufer ,  Ben Banney ,  Jens Kugler ,  Ulrich Nieken ,  Franz Keller

    IPC分类号： B60R1/06 ,  G03B27/52 ,  G03B27/54

    CPC分类号： G03F7/70933 ,  G03F7/70883 ,  G03F7/70916 ,  G03F7/70983

    摘要： In EUV lithography apparatuses (10), it is proposed, in order to lengthen the lifetime of contamination-sensitive components, to arrange them in a protection module. The protection module comprises a housing (23-29) having at least one opening (37-47), in which at least one component (13a, 13b, 15, 16, 18, 19) is arranged and at which one or more gas feeds (30-36) are provided in order to introduce a gas flow into the housing (23-29), which emerges through the at least one opening (37-47). In order to effectively prevent contaminating substances from penetrating into the protection module, a light source (48-56) is arranged at the at least one opening (37-47), which light source illuminates the opening (37-47) with one or more wavelengths by which the contaminating substances can be dissociated before they penetrate through the opening (37-47).

    摘要翻译： 在EUV光刻设备（10）中，为了延长污染敏感元件的寿命，提出将它们安置在保护模块中。 保护模块包括具有至少一个开口（37-47）的壳体（23-29），其中布置有至少一个部件（13a，13b，15,16,18,19），并且一个或多个气体 提供进料（30-36）以便将气流引入通过至少一个开口（37-47）出现的壳体（23-29）中。 为了有效地防止污染物质渗透到保护模块中，光源（48-56）布置在至少一个开口（37-47）处，该光源照射开口（37-47），其中一个或 污染物质在穿透开口（37-47）之前可以分解的更多波长。

    PROJECTION OBJECTIVE FOR MICROLITHOGRAPHY
    60.
    发明申请
    PROJECTION OBJECTIVE FOR MICROLITHOGRAPHY 有权
    投影目标的微观算法

    公开(公告)号：US20100201964A1

    公开(公告)日：2010-08-12

    申请号：US12724496

    申请日：2010-03-16

    申请人： Jens Kugler ,  Tilman Schwertner

    发明人： Jens Kugler ,  Tilman Schwertner

    IPC分类号： G03B27/54 ,  G02B7/02

    CPC分类号： G03F7/70825 ,  G02B7/023 ,  G02B7/1822 ,  G03F7/70816

    摘要： An optical system includes an optical element having adjusting elements. The optical element is connected to a rotatable carrying ring via at least one connecting member arranged on the carrying ring directly or via one or a plurality of intermediate elements to the optical element. The rotatable carrying ring is borne in a manner freely rotatable about an axis relative to a fixed outer mount or the optical element via a rotating device. The outer mount, the rotatable carrying ring and the connecting members are constructed as rotatable kinematics in the form of parallel kinematics.

    摘要翻译： 光学系统包括具有调节元件的光学元件。 光学元件通过直接或经由一个或多个中间元件布置在承载环上的至少一个连接构件连接到可转动的承载环到光学元件。 可旋转承载环以相对于固定的外部安装件或光学元件经由旋转装置绕轴线自由旋转的方式承载。 外部安装件，可旋转承载环和连接构件被构造为平行运动学形式的可旋转运动学。