公开(公告)号：US20060262382A1

公开(公告)日：2006-11-23

申请号：US11135230

申请日：2005-05-23

Applicant: Satyadev Patel ,  Jianglong Zhang

Inventor： Satyadev Patel ,  Jianglong Zhang

IPC: G02B26/00

CPC classification number: G02B26/0841

Abstract: A microelectromechanical device having a movable element with low mass inertia is disclosed herein. The movable element is held on a substrate such that the element is capable of rotating relative to the substrate; and the element has a mass inertia of 1.2×10−24 kg.m2 or less.

Abstract translation: 本文公开了具有低质量惯性的可移动元件的微机电装置。 可移动元件被保持在基板上，使得元件能够相对于基板旋转; 并且所述元件的质量惯量为1.2×10 -2 -24m 2 /小于或等于2。

公开(公告)号：US20060232785A1

公开(公告)日：2006-10-19

申请号：US11110557

申请日：2005-04-19

Applicant: Regis Grasser ,  Satyadev Patel ,  Andrew Huibers

Inventor： Regis Grasser ,  Satyadev Patel ,  Andrew Huibers

IPC: G01B11/02

CPC classification number: G01B9/02063 ,  G01B9/02058 ,  G01J3/453

Abstract: The present invention provides a microstructure device comprising multiple substrates with the components of the device formed on the substrates. In order to maintain uniformity of the gap between the substrates, a plurality of pillars is provided and distributed in the gap so as to prevent decrease of the gap size. The increase of the gap size can be prevented by bonding the pillars to the components of the microstructure. Alternatively, the increase of the gap size can be prevented by maintaining the pressure inside the gap below the pressure under which the microstructure will be in operation. Electrical contact of the substrates on which the micromirrors and electrodes are formed can be made through many ways, such as electrical contact areas, electrical contact pads and electrical contact springs.

公开(公告)号：US20060232784A1

公开(公告)日：2006-10-19

申请号：US11109994

申请日：2005-04-19

Applicant: Regis Grasser ,  Satyadev Patel ,  Andrew Huibers

Inventor： Regis Grasser ,  Satyadev Patel ,  Andrew Huibers

IPC: G01B11/02

CPC classification number: G01B9/02063 ,  G01B9/02058

Abstract: The present invention provides a microstructure device comprising multiple substrates with the components of the device formed on the substrates. In order to maintain uniformity of the gap between the substrates, a plurality of pillars is provided and distributed in the gap so as to prevent decrease of the gap size. The increase of the gap size can be prevented by bonding the pillars to the components of the microstructure. Alternatively, the increase of the gap size can be prevented by maintaining the pressure inside the gap below the pressure under which the microstructure will be in operation. Electrical contact of the substrates on which the micromirrors and electrodes are formed can be made through many ways, such as electrical contact areas, electrical contact pads and electrical contact springs.

公开(公告)号：US20060193029A1

公开(公告)日：2006-08-31

申请号：US11069408

申请日：2005-02-28

Applicant: Satyadev Patel ,  James Dunphy ,  Peter Richards ,  Michel Combes

Inventor： Satyadev Patel ,  James Dunphy ,  Peter Richards ,  Michel Combes

IPC: G02B26/00

CPC classification number: G02B26/0841

Abstract: Disclosed herein is method of operating a device that comprises an array of micromirrors. The method comprises a process usable for repairing stuck micromirrors of the micromirror array during the operation. The reparation process applies, at the ON state, two consecutive refresh voltages to the mirror plates of the micromirrors in the array with the pulses being separated in time longer than the characteristic oscillation time of the micromirrors. The reparation process can be applied independently to the micromirrors. Alternatively, the reparation process can be incorporated with a bias inversion process.

公开(公告)号：US20060171014A1

公开(公告)日：2006-08-03

申请号：US11327697

申请日：2006-01-05

Applicant: Andrew Huibers ,  Satyadev Patel

Inventor： Andrew Huibers ,  Satyadev Patel

IPC: G02B26/00

CPC classification number: G02B26/0841

Abstract: A micromirror of a micromirror array of a spatial light modulator used in display systems comprises a mirror plate attached to a hinge that is supported by two posts formed on a substrate. Also the mirror plate is operable to rotate along a rotation axis that is parallel to but offset from a diagonal of the mirror plate when viewed from the top. An imaginary line connecting the two posts is not parallel to either diagonal of the mirror plate.

公开(公告)号：US20060115923A1

公开(公告)日：2006-06-01

申请号：US11332018

申请日：2006-01-12

Applicant: Peter Richards ,  Andrew Huibers ,  Satyadev Patel

Inventor： Peter Richards ,  Andrew Huibers ,  Satyadev Patel

IPC: H01L21/00

CPC classification number: B82Y30/00 ,  G02B26/0841 ,  H04N5/7458

Abstract: A projection system is disclosed herein. The projection system employs a spatial light modulator comprising an array of individually addressable pixels for modulating the incident light based on image data. The modulated light is projected on a screen for viewing.

Abstract translation: 本文公开了一种投影系统。 投影系统采用包括可单独寻址的像素阵列的空间光调制器，用于基于图像数据调制入射光。 调制光投影在屏幕上以供观看。

公开(公告)号：US20050286045A1

公开(公告)日：2005-12-29

申请号：US10875760

申请日：2004-06-23

Applicant: Igor Volfman ,  Andrew Huibers ,  Satyadev Patel ,  Peter Richards ,  Leonid Frenkel ,  Jim Dunphy ,  Regis Grasser ,  Greg Schaadt

Inventor： Igor Volfman ,  Andrew Huibers ,  Satyadev Patel ,  Peter Richards ,  Leonid Frenkel ,  Jim Dunphy ,  Regis Grasser ,  Greg Schaadt

IPC: G01N21/55 ,  G01N21/88 ,  G01N21/95

CPC classification number: G01N21/55 ,  G01N21/95

Abstract: The invention provides a method and apparatus for evaluating the product quality and performances of micromirror array devices through measurements of the electromechanical responses of the individual micromirrors to the driving forces of electric fields. The electromechanical responses of the micromirrors according to the present invention are described in terms of the rotational angles associated with the operational states, such as the ON and OFF state angles of the ON and OFF state when the micromirror array device is operated in the binary-state mode, and the response speed (i.e. the time interval required for a micromirror device to transit form one state to another) of the individual micromirrors to the driving fields.

Abstract translation: 本发明提供一种用于通过测量各个微镜对电场驱动力的机电响应来评估微镜阵列器件的产品质量和性能的方法和装置。 根据本发明的微反射镜的机电响应以与操作状态相关联的旋转角度进行描述，例如当微镜阵列器件在二进制编码器中操作时，ON和OFF状态的ON和OFF状态角， 状态模式以及各个微镜对驱动场的响应速度（即，微镜器件从一个状态转移到另一个状态所需的时间间隔）。

公开(公告)号：US20050231789A1

公开(公告)日：2005-10-20

申请号：US11034399

申请日：2005-01-11

Applicant: Satyadev Patel ,  Andrew Huibers

Inventor： Satyadev Patel ,  Andrew Huibers

IPC: B81C20060101 ,  G02B26/00 ,  G02B26/08 ,  G02F1/29 ,  H04N5/74

CPC classification number: B82Y30/00 ,  G02B26/0841 ,  H04N5/7458

Abstract: A spatial light modulator is disclosed, along with a method for making such a modulator that comprises an array of micromirror devices. The center-to-center distance and the gap between adjacent micromirror devices are determined corresponding to the light source being used so as to optimize optical efficiency and performance quality. The micromirror device comprises a hinge support formed on a substrate and a hinge that is held by the hinge support. A mirror plate is connected to the hinge via a contact, and the distance between the mirror plate and the hinge is determined according to desired maximum rotation angle of the mirror plate, the optimum gap and pitch between the adjacent micromirrors. In a method of fabricating such spatial light modulator, one sacrificial layer is deposited on a substrate followed by forming the mirror plates, and another sacrificial layer is deposited on the mirror plates followed by forming the hinge supports. The two sacrificial layers are removed via the small gap between adjacent mirror devices with spontaneous vapor phase chemical etchant. Also disclosed is a projection system that comprises such a spatial light modulator, as well as a light source, condensing optics, wherein light from the light source is focused onto the array of micromirrors, projection optics for projecting light selectively reflected from the array of micromirrors onto a target, and a controller for selectively actuating the micromirrors in the array.

Abstract translation: 公开了一种空间光调制器，以及用于制造这样的调制器的方法，该调制器包括微镜器件阵列。 根据所使用的光源确定中心到中心的距离和相邻的微反射镜装置之间的间隙，以优化光学效率和性能质量。 微反射镜装置包括形成在基底上的铰链支撑件和由铰链支撑件保持的铰链。 镜板通过触点连接到铰链，并且根据镜板的期望的最大旋转角度，相邻微镜之间的最佳间隙和间距来确定镜板和铰链之间的距离。 在制造这种空间光调制器的方法中，将一个牺牲层沉积在衬底上，随后形成镜板，并且另一牺牲层沉积在镜板上，随后形成铰链支架。 通过具有自发气相化学蚀刻剂的相邻反射镜装置之间的小间隙去除两个牺牲层。 还公开了一种投影系统，其包括这样的空间光调制器以及光源，聚光光学器件，其中来自光源的光聚焦到微镜阵列上，用于投射从微镜阵列反射的光的投影光学器件 以及用于选择性地致动阵列中的微镜的控制器。

公开(公告)号：US20050231788A1

公开(公告)日：2005-10-20

申请号：US11034398

申请日：2005-01-11

Applicant: Andrew Huibers ,  Satyadev Patel

Inventor： Andrew Huibers ,  Satyadev Patel

IPC: B81C20060101 ,  G02B26/00 ,  G02B26/08 ,  G02F1/29 ,  H04N5/74

CPC classification number: B82Y30/00 ,  G02B26/0841 ,  H04N5/7458

Abstract: A spatial light modulator is disclosed, along with a method for making such a modulator that comprises an array of micromirror devices. The center-to-center distance and the gap between adjacent micromirror devices are determined corresponding to the light source being used so as to optimize optical efficiency and performance quality. The micromirror device comprises a hinge support formed on a substrate and a hinge that is held by the hinge support. A mirror plate is connected to the hinge via a contact, and the distance between the mirror plate and the hinge is determined according to desired maximum rotation angle of the mirror plate, the optimum gap and pitch between the adjacent micromirrors. In a method of fabricating such spatial light modulator, one sacrificial layer is deposited on a substrate followed by forming the mirror plates, and another sacrificial layer is deposited on the mirror plates followed by forming the hinge supports. The two sacrificial layers are removed via the small gap between adjacent mirror devices with spontaneous vapor phase chemical etchant. Also disclosed is a projection system that comprises such a spatial light modulator, as well as a light source, condensing optics, wherein light from the light source is focused onto the array of micromirrors, projection optics for projecting light selectively reflected from the array of micromirrors onto a target, and a controller for selectively actuating the micromirrors in the array.

Abstract translation: 公开了一种空间光调制器，以及用于制造这样的调制器的方法，该调制器包括微镜器件阵列。 根据所使用的光源确定中心到中心的距离和相邻的微反射镜装置之间的间隙，以优化光学效率和性能质量。 微反射镜装置包括形成在基底上的铰链支撑件和由铰链支撑件保持的铰链。 镜板通过触点连接到铰链，并且根据镜板的期望的最大旋转角度，相邻微镜之间的最佳间隙和间距来确定镜板和铰链之间的距离。 在制造这种空间光调制器的方法中，将一个牺牲层沉积在衬底上，随后形成镜板，并且另一牺牲层沉积在镜板上，随后形成铰链支架。 通过具有自发气相化学蚀刻剂的相邻反射镜装置之间的小间隙去除两个牺牲层。 还公开了一种投影系统，其包括这样的空间光调制器以及光源，聚光光学器件，其中来自光源的光聚焦到微镜阵列上，用于投射从微镜阵列反射的光的投影光学器件 以及用于选择性地致动阵列中的微镜的控制器。

公开(公告)号：US20050214976A1

公开(公告)日：2005-09-29

申请号：US11102108

申请日：2005-04-07

Applicant: Satyadev Patel ,  Andrew Huibers ,  Steve Chiang

Inventor： Satyadev Patel ,  Andrew Huibers ,  Steve Chiang

IPC: B81B3/00 ,  B81B7/00 ,  B81C1/00 ,  B81C99/00 ,  G02B26/08 ,  H01L21/48

CPC classification number: B81C1/00214 ,  B81B7/0077 ,  B81B2201/042 ,  B81C1/00333 ,  B81C1/00896 ,  B81C1/00904 ,  B81C2203/0118 ,  B82Y30/00 ,  G02B26/0833 ,  H01L24/97 ,  H01L2224/48091 ,  H01L2224/97 ,  H01L2924/01005 ,  H01L2924/01006 ,  H01L2924/01013 ,  H01L2924/01018 ,  H01L2924/01019 ,  H01L2924/0102 ,  H01L2924/01023 ,  H01L2924/01027 ,  H01L2924/01033 ,  H01L2924/01039 ,  H01L2924/01049 ,  H01L2924/01054 ,  H01L2924/01058 ,  H01L2924/01072 ,  H01L2924/01074 ,  H01L2924/01077 ,  H01L2924/01079 ,  H01L2924/01082 ,  H01L2924/01322 ,  H01L2924/04953 ,  H01L2924/09701 ,  H01L2924/10253 ,  H01L2924/10329 ,  H01L2924/12036 ,  H01L2924/12042 ,  H01L2924/12044 ,  H01L2924/14 ,  H01L2924/1433 ,  H01L2924/15787 ,  H01L2924/19041 ,  H01L2924/19042 ,  H01L2924/3025 ,  H01L2924/00014 ,  H01L2224/85 ,  H01L2924/00

Abstract: A method for forming a MEMS device is disclosed, where a final release step is performed just prior to a wafer bonding step to protect the MEMS device from contamination, physical contact, or other deleterious external events. Without additional changes to the MEMS structure between release and wafer bonding and singulation, except for an optional stiction treatment, the MEMS device is best protected and overall process flow is improved. The method is applicable to the production of any MEMS device and is particularly beneficial in the making of fragile micromirrors.