公开(公告)号：US06787595B1

公开(公告)日：2004-09-07

申请号：US09695317

申请日：2000-10-25

申请人： Hiroshi Yamada ,  Yuichiro Nakamura

发明人： Hiroshi Yamada ,  Yuichiro Nakamura

IPC分类号： C08K304

CPC分类号： C08K3/04 ,  C08K5/25 ,  Y10T152/10495 ,  C08L21/00

摘要： A first object of the present invention is to provide a rubber composition which improves both wear resistance and low heat-buildup property, and a second object is to provide a tire in which low heat-buildup property (low fuel consumption) and tear resistance are improved without impairing wear resistance. In order to achieve the first object, a first aspect of the present invention is a rubber composition comprising a rubber component selected from at least one of natural rubber and a diene-based synthetic rubber, and a carbon black. The carbon black has a dibutyl phthalate absorption amount (DBP) of 140 to 200 ml/ 100 g. An aggregate of the carbon black has a ratio (Dw/Dn) of weight average diameter (Dw) to number average diameter (Dn) of 1.80 to 2.40, and the carbon black has a specific tinting strength (Tint) satisfying an inequality: Tint ≧0.100× nitrogen absorption specific surface area (N2SA)+93. In order to achieve the second object, a second aspect of the present invention is a tire which has at least a tread, and the tread is made of the rubber composition of the first aspect of the invention.

摘要翻译： 本发明的第一个目的是提供一种提高耐磨性和低发热性的橡胶组合物，第二个目的是提供一种轮胎，其低发热性（低燃料消耗）和抗撕裂性是 改进而不损害耐磨性。 为了实现第一目的，本发明的第一方面是一种橡胶组合物，其包含选自天然橡胶和二烯系合成橡胶中的至少一种的橡胶成分和炭黑。 炭黑的邻苯二甲酸二丁酯吸收量（DBP）为140〜200ml / 100g。 炭黑的聚集体的重均粒径（Dw）与数均粒径（Dn）的比（Dw / Dn）为1.80〜2.40，炭黑具有满足不等式的特定着色强度（Tint）：Tint > = 0.100x氮吸收比表面积（N2SA）+93。 为了实现第二目的，本发明的第二方面是至少具有胎面的轮胎，并且胎面由本发明的第一方面的橡胶组合物制成。

公开(公告)号：US06691311B1

公开(公告)日：2004-02-10

申请号：US09499993

申请日：2000-02-08

申请人： Haruhiko Yata ,  Yuichiro Nakamura ,  Hirofumi Yuchi

发明人： Haruhiko Yata ,  Yuichiro Nakamura ,  Hirofumi Yuchi

IPC分类号： H04N720

CPC分类号： H04N21/4383 ,  H04N7/16 ,  H04N7/20 ,  H04N21/235 ,  H04N21/4344 ,  H04N21/4345 ,  H04N21/435 ,  H04N21/84

摘要： A digital signal receiving apparatus for receiving a digital broadcast signal having a first information table and a second information table is disclosed, the first information table representing the relation between physical information of transmission paths and deliverable data, the second information table representing deliverable data, the apparatus comprising a means for successively searching services represented with the second information table, a means for generating a list that represents services represented with the first information table, and a means for performing a predetermined process corresponding to the generated list.

摘要翻译： 公开了一种用于接收具有第一信息表和第二信息表的数字广播信号的数字信号接收装置，表示传输路径的物理信息与可交付数据之间的关系的第一信息表，表示可交付数据的第二信息表， 装置，包括用于连续地搜索由第二信息表表示的服务的装置，用于生成表示由第一信息表表示的服务的列表的装置，以及用于执行与所生成的列表相对应的预定处理的装置。

公开(公告)号：US09034155B2

公开(公告)日：2015-05-19

申请号：US13147782

申请日：2010-07-27

申请人： Atsushi Sato ,  Yuichiro Nakamura

发明人： Atsushi Sato ,  Yuichiro Nakamura

IPC分类号： C23C14/34 ,  G11B5/851

CPC分类号： G11B5/851 ,  C23C14/3414

摘要： Provided is an inorganic-particle-dispersed sputtering target in which inorganic particles are dispersed in a Co base material, wherein the inorganic particles have an electric resistivity of 1×101 Ω·m or less and the volume ratio of the inorganic particles in the target is 50% or less. The sputtering target thus adjusted is advantageous in that, when sputtering is performed using a magnetron sputtering device comprising a DC power source, the inorganic particles are less charged, and arcing occurs less frequently. Accordingly, by using the sputtering target of the present invention, the occurrence of particles attributable to the arcing reduces, and a significant effect of improving the yield in forming a thin film is obtained.

摘要翻译： 本发明提供一种无机粒子分散溅射靶，其中无机颗粒分散在Co基材料中，其中无机颗粒的电阻率为1×10 11Ω·m·m·m以下，无机颗粒的体积比 目标是50％以下。 如此调整的溅射靶的优点在于，当使用包括直流电源的磁控管溅射装置进行溅射时，无机颗粒的带电少，并且电弧放电频率较低。 因此，通过使用本发明的溅射靶，可以减少由于电弧引起的粒子的发生，并且获得提高薄膜形成的显着效果。

公开(公告)号：US08871345B2

公开(公告)日：2014-10-28

申请号：US13641536

申请日：2011-04-27

申请人： Takeyasu Kikuchi ,  Kazumasa Morita ,  Koji Higashi ,  Yuichiro Nakamura

发明人： Takeyasu Kikuchi ,  Kazumasa Morita ,  Koji Higashi ,  Yuichiro Nakamura

IPC分类号： B32B5/16

CPC分类号： B29C47/0066 ,  B29B9/06 ,  B29B9/065 ,  B29B9/12 ,  B29B9/14 ,  B29B9/16 ,  B29C47/0004 ,  B29C47/0011 ,  B29C47/0042 ,  B29C47/10 ,  B29C47/1009 ,  B29C47/1018 ,  B29C47/1027 ,  B29C47/1081 ,  B29C47/30 ,  B29C47/362 ,  B29C47/366 ,  B29C47/369 ,  B29C47/40 ,  B29C47/767 ,  B29C2793/0027 ,  B29C2793/009 ,  B29K2105/04 ,  B29K2105/16 ,  B29K2105/251 ,  B29K2711/14 ,  Y10T428/2982 ,  Y10T428/2991 ,  Y10T428/2998

摘要： Disclosed are composite pellets for extrusion molding wherein fusion does not occur between the pellets, and there is no variation in size and density. A molten material obtained by an extruder for a raw material containing a thermoplastic resin and wood powder is extruded into a strand shape through a die nozzle of the extruder, and cut into a predetermined length to form a pellet. At this time, the extrusion amount, the diameter of each nozzle hole, and the number of nozzle holes are adjusted so that the linear velocity (νd) of the molten material in each nozzle hole of the die nozzle is in the range of 12 to 50 cm/sec. Further, regardless of the variations in particle diameter, etc., a stable amount of the composite pellets are supplied to the extruder, and smoothly introduced to a screw of the extruder. The composite pellets and 12-hydroxystearic acid containing a metal of Ca, Mg, or Zn are agitated together, and 0.03 to 0.4 mass % of the 12-hydroxystearic acid is attached to the periphery of 100 mass % of the composite pellet, and the pellets are used for extrusion molding.

摘要翻译： 公开了用于挤出成型的复合颗粒，其中在颗粒之间不发生熔融，并且尺寸和密度没有变化。 通过挤出机将含有热塑性树脂和木粉的原料获得的熔融材料通过挤出机的模头喷嘴挤出成股线状，并切割成预定长度以形成丸粒。 此时，调整挤出量，每个喷嘴孔的直径和喷嘴孔的数量，使得模具喷嘴的每个喷嘴孔中的熔融材料的线速度（＆ngr; d）在 12至50厘米/秒。 此外，不管粒径等的变化如何，将稳定量的复合颗粒供给到挤出机中，并且平稳地引入挤出机的螺杆。 将复合粒料和含有Ca，Mg或Zn的金属的12-羟基硬脂酸一起搅拌，将0.03〜0.4质量％的12-羟基硬脂酸附着在复合粒料的100质量％的周边， 颗粒用于挤出成型。

公开(公告)号：US20140001038A1

公开(公告)日：2014-01-02

申请号：US14004227

申请日：2012-04-06

申请人： Shin-ichi Ogino ,  Atsushi Sato ,  Atsutoshi Arakawa ,  Yuichiro Nakamura

发明人： Shin-ichi Ogino ,  Atsushi Sato ,  Atsutoshi Arakawa ,  Yuichiro Nakamura

IPC分类号： C23C14/34

CPC分类号： C23C14/3414 ,  C22C19/07 ,  C23C14/35 ,  G11B5/851

摘要： Provided is a nonmagnetic-material-dispersed sputtering target having a metal composition comprising 20 mol % or less of Cr and the balance of Co. The target has a structure including a phase (A) in which a nonmagnetic oxide material is dispersed in the basis metal, and a metal phase (B) containing 40 mol % or more of Co; the area proportion of grains of the nonmagnetic oxide material in the phase (A) is 50% or less; and when a minimum-area rectangle circumscribed to the phase (B) is assumed, the proportion of the circumscribed rectangle having a short side of 2 to 300 μm is 90% or more of all of the phases (B). The ferromagnetic sputtering target can suppress particle generation during sputtering and can improve leakage magnetic flux to allow stable electrical discharge with a magnetron sputtering apparatus.

摘要翻译： 本发明提供一种非磁性材料分散溅射靶，其具有包含20mol％以下的Cr和余量的Co的金属组成物。靶具有包括其中非磁性氧化物材料分散在基材中的相（A）的结构 金属和含有40摩尔％以上的Co的金属相（B） 相（A）中非磁性氧化物材料的面积比例为50％以下; 并且当假设包围相（B）的最小面积矩形时，具有2〜300μm的短边的外接矩形的比例为所有相（B）的90％以上。 铁磁性溅射靶可以抑制溅射时的粒子产生，能够提高漏磁通，能够通过磁控溅射装置进行稳定的放电。

公开(公告)号：US20130112555A1

公开(公告)日：2013-05-09

申请号：US13808938

申请日：2011-01-28

申请人： Shin-ichi Ogino ,  Atsushi SATO ,  Yuichiro Nakamura ,  Atsutoshi Arakawa

发明人： Shin-ichi Ogino ,  Atsushi SATO ,  Yuichiro Nakamura ,  Atsutoshi Arakawa

IPC分类号： C23C14/34

CPC分类号： C23C14/3407 ,  C22C1/0433 ,  C22C19/07 ,  C22C32/0026 ,  C22F1/10 ,  C23C14/3414 ,  G11B5/851 ,  H01F10/16 ,  H01F41/18

摘要： Provided is a sputtering target of ferromagnetic material comprising a metal having a composition containing 20 mol % or less of Cr, and Co as the remainder; wherein the target structure includes a phase (A) which is a basis metal, and metal phases (B) having a component composition different from the peripheral texture within the phase (A), the area ratio occupied by oxides within 1 μm from the most outer periphery of metal phases (B) is 80% or less, and the average grain size of the metal phases (B) is 10 μm or more and 150 μm or less. Provided is a sputtering target of ferromagnetic material capable of inhibiting the generation of particles during sputtering, and improving the pass-through flux to achieve a stable electrical discharge with a magnetron sputtering device.

摘要翻译： 提供一种铁磁材料的溅射靶，其包含具有20摩尔％以下的Cr的组成的金属，余量为Co; 其特征在于，所述目标结构体包括作为基础金属的相（A）和具有与相（A）以外的周边构造不同的成分组成的金属相（B），最大范围内的1um以内的氧化物占据的面积比 金属相（B）的外周边为80％以下，金属相（B）的平均粒径为10μm以上且150μm以下。 本发明提供能够抑制溅射时粒子产生的强磁性材料的溅射靶，提高通过磁通以通过磁控溅射装置实现稳定的放电。

公开(公告)号：US20120241317A1

公开(公告)日：2012-09-27

申请号：US13513898

申请日：2010-10-13

申请人： Yuki Ikeda ,  Yuichiro Nakamura ,  Shin-ichi Ogino

发明人： Yuki Ikeda ,  Yuichiro Nakamura ,  Shin-ichi Ogino

IPC分类号： C23C14/08 ,  H01F1/01 ,  C23C14/34

CPC分类号： G11B5/851 ,  C23C14/3414 ,  G11B5/65 ,  H01F10/16 ,  H01F41/183

摘要： A sputtering target comprising an oxide phase is dispersed in Co or a Co alloy phase, wherein the sputtering target is configured from a metal matrix phase containing Co, and a phase containing SiO2 and having an oxide which forms particles and is dispersed in an amount of 6 to 14 mol % (hereinafter referred to as the “oxide phase”), the sputtering target contains, in addition to components configuring the metal matrix phase and the oxide phase, a Cr oxide scattered in or on a surface of the oxide phase in an amount of 0.3 mol % or more and less than 1.0 mol %, and an average area of the respective particles contained in the oxide phase is 2.0 μm2 or less. The provided sputtering target comprising an oxide phase is dispersed in Co or a Co alloy phase can reduce arcing, obtain a stable discharge in a magnetron sputtering device, and reduce the amount of particles that is generated during high density sputtering.

摘要翻译： 包含氧化物相的溅射靶分散在Co或Co合金相中，其中溅射靶由含有Co的金属基体相和含有SiO 2的相构成，并且具有形成颗粒的氧化物并以一定量的 6〜14摩尔％（以下称为“氧化物相”），溅射靶除了构成金属基体相和氧化物相的成分以外还含有分散在氧化物相的表面上或其表面的Cr氧化物 0.3摩尔％以上且小于1.0摩尔％，氧化物相中所含的各粒子的平均面积为2.0μm2以下。 提供的包含氧化物相的溅射靶分散在Co或Co合金相中可以减少电弧，在磁控溅射装置中获得稳定的放电，并且减少在高密度溅射期间产生的颗粒的量。

公开(公告)号：US20110162971A1

公开(公告)日：2011-07-07

申请号：US13119867

申请日：2010-02-24

申请人： Yuichiro Nakamura ,  Akira Hisano ,  Junnosuke Sekiguchi

发明人： Yuichiro Nakamura ,  Akira Hisano ,  Junnosuke Sekiguchi

IPC分类号： C23C14/34 ,  C25D5/00 ,  C25D7/00 ,  B05D5/12 ,  C23C16/06 ,  B05D3/00 ,  C23C16/44

CPC分类号： C23C14/3414

摘要： A sputtering target with low generation of particles in which oxides, carbides, nitrides, borides, intermetallic compounds, carbonitrides, and other substances without ductility exist in a matrix phase made of a highly ductile substance at a volume ratio of 1 to 50%, wherein a highly ductile and conductive metal coating layer is formed on an outermost surface of the target. Provided are a sputtering target capable of improving the target surface in which numerous substances without ductility exist and preventing or inhibiting the generation of nodules and particles during sputtering, and a method of producing such a sputtering

摘要翻译： 在体积比为1〜50％的高延展性物质的基体相中，存在低产生粒子的溅射靶，其中氧化物，碳化物，氮化物，硼化物，金属间化合物，碳氮化物和其他物质不具有延性，其中 在目标的最外表面上形成高度延展且导电的金属涂层。 提供能够改善目前表面的溅射靶，其中存在许多无延展性的物质，并且防止或抑制溅射期间结核和颗粒的产生，以及制造这种溅射的方法

公开(公告)号：US07909949B2

公开(公告)日：2011-03-22

申请号：US10598502

申请日：2005-02-15

申请人： Yuichiro Nakamura ,  Akira Hisano

发明人： Yuichiro Nakamura ,  Akira Hisano

IPC分类号： C22F1/16 ,  C22C19/07

CPC分类号： C23C14/3414 ,  C23C14/3407 ,  Y10T29/49989

摘要： Provided is a surface processing method of a sputtering target, wherein a target surface in which intermetallic compounds, oxides, carbides, carbonitrides and other substances without ductility exist in a highly ductile matrix phase at a volume ratio of 1 to 50% is preliminarily subject to the primary processing of cutting work, then subsequently subject to finish processing via polishing. The sputtering target subject to this surface processing method is able to improve the target surface having numerous substances without ductility, and prevent or suppress the generation of nodules and particles upon sputtering.

摘要翻译： 提供一种溅射靶的表面处理方法，其中在高度延性基体相中以1〜50％的体积比存在金属间化合物，氧化物，碳化物，碳氮化物和其它没有延展性的物质的目标表面预先受 主要加工切割工作，然后经抛光处理。 经受该表面处理方法的溅射靶能够改善具有无延展性的多种物质的目标表面，并且可防止或抑制溅射时产生结节和颗粒。

公开(公告)号：US20070187236A1

公开(公告)日：2007-08-16

申请号：US10598997

申请日：2005-02-15

申请人： Yuichiro Nakamura ,  Akira Hisano

发明人： Yuichiro Nakamura ,  Akira Hisano

IPC分类号： C23C14/00

CPC分类号： C22C19/07 ,  C22F1/10 ,  C23C14/3414 ,  H01F10/16 ,  H01F41/183

摘要： Provided is a Co—Cr—Pt—B alloy sputtering target comprising an island-shaped rolled structure formed from a Co-rich phase based on the primary crystal formed upon casting, and a Co—Cr—Pt—B alloy sputtering target in which the island-shaped rolled structure has an average size of 200 μm or less. This Co—Cr—Pt—B alloy sputtering target has an uniform and fine rolled structure with minimal segregation and residual stress upon casting, and the present invention aims to enable the stable and inexpensive manufacture of the target, prevent or suppress the generation of particles, and to improve the production yield of deposition.

摘要翻译： 提供了一种Co-Cr-Pt-B合金溅射靶，其包括由铸造时形成的基体上的富Co相形成的岛状卷绕结构和Co-Cr-Pt-B合金溅射靶，其中 岛状轧制结构的平均尺寸为200μm以下。 该Co-Cr-Pt-B合金溅射靶具有均匀且细小的轧制结构，铸造时的偏析和残余应力极小，本发明的目的在于能够稳定且廉价地制造靶，防止或抑制颗粒的产生 ，并提高沉积的产量。