CHEMICAL SENSOR WITH CONDUCTIVE CUP-SHAPED SENSOR SURFACE
    51.
    发明申请
    CHEMICAL SENSOR WITH CONDUCTIVE CUP-SHAPED SENSOR SURFACE 审中-公开
    具有导电杯形传感器表面的化学传感器

    公开(公告)号:US20140220697A1

    公开(公告)日:2014-08-07

    申请号:US14260818

    申请日:2014-04-24

    CPC classification number: G01N27/4145 C12Q1/6869 G01N27/414 Y10T436/143333

    Abstract: A system includes a sensor including a sensor pad and a well wall structure defining a well operatively coupled to the sensor pad. The well is further defined by a lower surface disposed over the sensor pad. The well wall structure defines an upper surface and defines a wall surface extending between the upper surface and the lower surface. The system further includes a conductive layer disposed over the lower surface and the wall surface.

    Abstract translation: 一种系统包括传感器,其包括传感器垫和井壁结构,其限定了良好地操作地耦合到传感器垫的结构。 该井由设置在传感器垫上的下表面进一步限定。 井壁结构限定了上表面并且限定了在上表面和下表面之间延伸的壁表面。 该系统还包括设置在下表面和壁表面上的导电层。

    METHODS FOR MANUFACTURING WELL STRUCTURES FOR LOW-NOISE CHEMICAL SENSORS
    52.
    发明申请
    METHODS FOR MANUFACTURING WELL STRUCTURES FOR LOW-NOISE CHEMICAL SENSORS 有权
    用于制造低噪声化学传感器的良好结构的方法

    公开(公告)号:US20140191293A1

    公开(公告)日:2014-07-10

    申请号:US13736566

    申请日:2013-01-08

    CPC classification number: G01N27/414 G01N27/4145 G01N27/4148

    Abstract: In one implementation, a method for manufacturing a chemical detection device is described. The method includes forming a chemical sensor having a sensing surface. A dielectric material is deposited on the sensing surface. A first etch process is performed to partially etch the dielectric material to define an opening over the sensing surface and leave remaining dielectric material on the sensing surface. An etch protect material is formed on a sidewall of the opening. A second etch process is then performed to selectively etch the remaining dielectric material using the etch protect material as an etch mask, thereby exposing the sensing surface.

    Abstract translation: 在一个实施方式中,描述了用于制造化学检测装置的方法。 该方法包括形成具有感测表面的化学传感器。 电介质材料沉积在感测表面上。 执行第一蚀刻工艺以部分地蚀刻介电材料以在感测表面上限定开口,并将剩余的电介质材料留在感测表面上。 蚀刻保护材料形成在开口的侧壁上。 然后执行第二蚀刻工艺以使用蚀刻保护材料作为蚀刻掩模来选择性地蚀刻剩余的电介质材料,从而暴露感测表面。

    CHEMICALLY SENSITIVE SENSORS WITH SAMPLE AND HOLD CAPACITORS
    53.
    发明申请
    CHEMICALLY SENSITIVE SENSORS WITH SAMPLE AND HOLD CAPACITORS 有权
    具有样品和保持电容器的化学感应传感器

    公开(公告)号:US20130264611A1

    公开(公告)日:2013-10-10

    申请号:US13922149

    申请日:2013-06-19

    Abstract: Methods and apparatus relating to very large scale FET arrays for analyte measurements. ChemFET (e.g., ISFET) arrays may be fabricated using conventional CMOS processing techniques based on improved FET pixel and array designs that increase measurement sensitivity and accuracy, and at the same time facilitate significantly small pixel sizes and dense arrays. Improved array control techniques provide for rapid data acquisition from large and dense arrays. Such arrays may be employed to detect a presence and/or concentration changes of various analyte types in a wide variety of chemical and/or biological processes. In one example, chemFET arrays facilitate DNA sequencing techniques based on monitoring changes in hydrogen ion concentration (pH), changes in other analyte concentration, and/or binding events associated with chemical processes relating to DNA synthesis.

    Abstract translation: 与用于分析物测量的非常大规模的FET阵列相关的方法和装置。 可以使用基于提高测量灵敏度和精度的改进的FET像素和阵列设计的传统CMOS处理技术来制造ChemFET(例如,ISFET)阵列,并且同时促进显着小的像素尺寸和致密阵列。 改进的阵列控制技术提供了从大型和密集阵列的快速数据采集。 可以使用这样的阵列来检测各种化学和/或生物过程中各种分析物类型的存在和/或浓度变化。 在一个实例中,chemFET阵列基于监测氢离子浓度(pH),其他分析物浓度变化和/或与DNA合成相关的化学过程相关联的结合事件的变化来促进DNA测序技术。

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