公开(公告)号：US20070224538A1

公开(公告)日：2007-09-27

申请号：US11597696

申请日：2005-05-24

申请人： Hideo Hada ,  Masaru Takeshita ,  Satoshi Yamada

发明人： Hideo Hada ,  Masaru Takeshita ,  Satoshi Yamada

IPC分类号： G03F7/039 ,  C08F220/18

CPC分类号： G03F7/0397

摘要： A positive resist composition that includes a resin component (A) and an acid-generator component (B), wherein the component (A) is a copolymer that includes a structural unit (a1) derived from a mono(α-lower alkyl)acrylate that contains an acid-dissociable, dissolution-inhibiting group, a structural unit (b1) derived from a mono(α-lower alkyl)acrylate that contains a lactone ring, and a structural unit (c1) derived from a poly(α-lower alkyl)acrylate. A positive resist composition that includes a resin component (A) and an acid generator component (B), wherein the component (A) is a star polymer that includes a core that contains acid-dissociable, dissolution-inhibiting groups, and arms that are bonded to the core.

摘要翻译： 包含树脂组分（A）和酸产生剂组分（B）的正型抗蚀剂组合物，其中组分（A）是包含衍生自单（α-低级烷基）丙烯酸酯的结构单元（a1）的共聚物 其包含酸解离的溶解抑制基团，衍生自含有内酯环的单（α-低级烷基）丙烯酸酯的结构单元（b1）和衍生自聚（α-低级）的结构单元（c1） 烷基）丙烯酸酯。 包含树脂组分（A）和酸产生剂组分（B）的正型抗蚀剂组合物，其中组分（A）是包含含有酸解离的，溶解抑制基团的核心的星形聚合物，和 绑定到核心。

公开(公告)号：US20070111135A1

公开(公告)日：2007-05-17

申请号：US10561830

申请日：2004-06-28

申请人： Ryotaro Hayashi ,  Masaru Takeshita ,  Takeshi Iwai

发明人： Ryotaro Hayashi ,  Masaru Takeshita ,  Takeshi Iwai

IPC分类号： G03C1/00

CPC分类号： G03F7/0397

摘要： A positive resist composition which includes a resin component (A) that exhibits increased alkali solubility under the action of acid, an acid generator component (B) that generates acid on exposure, and an organic solvent (C). The component (A) includes (i) a structural unit (a1), which contains an acid dissociable, dissolution inhibiting group and is derived from a (meth)acrylate ester, (ii) a structural unit (a2), which contains an acid dissociable, dissolution inhibiting group that is less readily dissociated than the acid dissociable, dissolution inhibiting group contained in the structural unit (a1), and is derived from a (meth)acrylate ester, and (iii) a structural unit (a3), which contains a lactone functional group and is derived from a (meth)acrylate ester.

摘要翻译： 含有在酸作用下表现出增加的碱溶性的树脂组分（A），暴露时产生酸的酸产生剂组分（B）和有机溶剂（C））的正型抗蚀剂组合物。 组分（A）包括（i）含有酸解离的溶解抑制基团并衍生自（甲基）丙烯酸酯的结构单元（a1），（ii）含有酸的结构单元（a2） 可解离的溶解抑制基团，其比结构单元（a1）中所含的酸解离，溶解抑制基团更容易解离，并且衍生自（甲基）丙烯酸酯，和（iii）结构单元（a3），其结构单元 含有内酯官能团并衍生自（甲基）丙烯酸酯。

公开(公告)号：US20060141382A1

公开(公告)日：2006-06-29

申请号：US10531883

申请日：2003-12-18

申请人： Masaru Takeshita ,  Miwa Miyairi ,  Hideo Hada ,  Takeshi Iwai

发明人： Masaru Takeshita ,  Miwa Miyairi ,  Hideo Hada ,  Takeshi Iwai

IPC分类号： G03C1/76

CPC分类号： G03F7/0392 ,  G03F7/0045 ,  G03F7/0397

摘要： There are provided a resist composition that produces a resist pattern of good shape, and a method of forming a resist pattern that uses such a resist composition. The resist composition comprises a resin component (A) that undergoes a change in alkali solubility under the action of acid, an acid generator component (B) that generates acid on exposure, and an organic solvent (C), wherein the component (B) comprises a compound represented by a general formula (I) shown below [wherein, R1 to R3 each represent, independently, a methyl group or an ethyl group; and X− represents an anion].

摘要翻译： 提供了产生良好形状的抗蚀剂图案的抗蚀剂组合物，以及形成使用这种抗蚀剂组合物的抗蚀剂图案的方法。 抗蚀剂组合物包含在酸作用下碱溶性变化的树脂组分（A），暴露时产生酸的酸产生剂组分（B）和有机溶剂（C），其中组分（B） 包含由以下所示的通式（I）表示的化合物[其中，R 1至R 3各自独立地表示甲基或乙基; 和X - 代表阴离子]。

公开(公告)号：US20060127801A1

公开(公告)日：2006-06-15

申请号：US10543914

申请日：2004-01-29

申请人： Hikaru Momose ,  Atsushi Ootake ,  Akifumi Ueda ,  Tadayuki Fujiwara ,  Masaru Takeshita ,  Ryotaro Kayashi ,  Takeshi Iwai

发明人： Hikaru Momose ,  Atsushi Ootake ,  Akifumi Ueda ,  Tadayuki Fujiwara ,  Masaru Takeshita ,  Ryotaro Kayashi ,  Takeshi Iwai

IPC分类号： G03C1/76

CPC分类号： C08F220/28 ,  G03F7/0397 ,  Y10S430/111

摘要： The resist polymer of the present invention comprises a specific constitutional unit having a cyano group, a constitutional unit having an acid-dissociable group, and a specific constitutional unit having a lactone skeleton. When the above polymer is used as a resist resin in DUV excimer laser lithography or electron beam lithography, it exhibits high sensitivity and high resolution, and provides a good resist pattern shape, having a small degree of occurrence of line edge roughness or generation of microgels.

公开(公告)号：US4516451A

公开(公告)日：1985-05-14

申请号：US487278

申请日：1983-04-21

申请人： Masaru Takeshita ,  Toshio Tokunaga ,  Yuichiro Ogawa

发明人： Masaru Takeshita ,  Toshio Tokunaga ,  Yuichiro Ogawa

IPC分类号： B29B15/00 ,  B26D1/04 ,  B26D3/00 ,  B26D3/02 ,  B26D7/02 ,  B26D7/10 ,  B29C37/00 ,  B29D30/46 ,  B26D7/26

CPC分类号： B26D3/02 ,  B26D1/045 ,  B29D30/46 ,  Y10T83/293 ,  Y10T83/7507 ,  Y10T83/7772 ,  Y10T83/8773 ,  Y10T83/8822

摘要： For cutting an elongate rubbery strip, there is disclosed an apparatus which largely comprises transmitting means operative to transmit the elongate rubbery strip to a predetermined position, an anvil located underneath the predetermined position and formed with an elongated groove extending at angle with respect to the transverse direction of the rubbery strip, the angle between the longitudinal direction of the elongated groove and the transverse direction of the rubbery strip being variable by means of adjusting means. The apparatus for cutting the elongate rubbery strip further comprises a cutting mechanism operative to cut the elongate rubbery strip on bias throughout the width thereof in cooperation with the anvil.

摘要翻译： 为了切割细长的橡胶条，公开了一种装置，其主要包括传送装置，其可操作地将细长橡胶条传送到预定位置，位于预定位置下方的砧座，并形成有相对于横向 橡胶条的方向，细长槽的纵向方向与橡胶条的横向之间的角度可通过调节装置而变化。 用于切割细长橡胶条的装置还包括切割机构，该切割机构可操作以在与砧座协作的情况下在其整个宽度上偏置地切割细长橡胶条。

公开(公告)号：US08614049B2

公开(公告)日：2013-12-24

申请号：US13313990

申请日：2011-12-07

申请人： Yoshiyuki Utsumi ,  Masaru Takeshita ,  Hiroaki Shimizu ,  Syo Abe ,  Yoshitaka Komuro

发明人： Yoshiyuki Utsumi ,  Masaru Takeshita ,  Hiroaki Shimizu ,  Syo Abe ,  Yoshitaka Komuro

IPC分类号： G03F7/00 ,  G03F7/004 ,  G03F7/028

CPC分类号： G03F7/0397 ,  G03F7/0045

摘要： A resist composition including a base component (A) which exhibits changed solubility in a developing solution under action of acid, a nitrogen-containing organic compound (C) containing a compound (C1) represented by general formula (c1) shown below and an acid-generator component (B) which generates acid upon exposure (excluding the compound (C1)) (R1 represents an alicyclic group of 5 or more carbon atoms which may have a substituent; X represents a divalent linking group; Y represents a linear, branched or cyclic alkylene group or an arylene group; Rf represents a hydrocarbon group containing a fluorine atom; and M+ represents an organic cation).

摘要翻译： 一种抗蚀剂组合物，其含有在酸作用下在显影液中溶解度变化的碱成分（A），含有下述通式（c1）表示的化合物（C1）的含氮有机化合物（C）和酸 发生器组分（B）（不包括化合物（C1））（R1表示可具有取代基的碳原子数为5以上的脂环族基团）; X表示二价连接基团; Y表示直链状，支链状的 或环状亚烷基或亚芳基; Rf表示含氟原子的烃基，M +表示有机阳离子。

公开(公告)号：US08535868B2

公开(公告)日：2013-09-17

申请号：US13177390

申请日：2011-07-06

申请人： Masaru Takeshita ,  Yoshiyuki Utsumi

发明人： Masaru Takeshita ,  Yoshiyuki Utsumi

IPC分类号： G03F7/004 ,  G03F7/28 ,  G03F7/039 ,  G03F7/26

CPC分类号： G03F7/0397 ,  G03F7/0045 ,  G03F7/2041

摘要： A positive resist composition including a resin component (A1) having a structural unit (a1) derived from an acrylate ester which may have an atom other than hydrogen or a group bonded to the carbon atom on the α position and containing an acid dissociable, dissolution inhibiting group, and a structural unit (a0) containing an —SO2— containing cyclic group; a compound (C1) represented by general formula (c1) shown below; and an acid-generator component (B) which generates acid upon exposure, wherein R represents a hydrogen atom, an alkyl group of 1 to 5 carbon atoms or a halogenated alkyl group of 1 to 5 carbon atoms; Y1 represents a divalent aliphatic hydrocarbon group; R1 represents a hydrogen atom, a fluorine atom, an alkyl group or a fluorinated alkyl group; p represents an integer of 1 to 10; and A+ represents an organic cation.

摘要翻译： 一种正型抗蚀剂组合物，其包含具有来自丙烯酸酯的结构单元（a1）的树脂组分（A1），所述结构单元（a1）可以具有除氢之外的原子或与α位上的碳原子键合的基团，并且含有酸可离解的溶解 和含有-SO 2的环状基团的结构单元（a0）; 由下述通式（c1）表示的化合物（C1） 和暴露后产生酸的酸发生剂组分（B），其中R表示氢原子，1至5个碳原子的烷基或1至5个碳原子的卤代烷基; Y1表示二价脂族烃基; R1表示氢原子，氟原子，烷基或氟代烷基; p表示1〜10的整数， 而A +代表有机阳离子。

公开(公告)号：US20130017500A1

公开(公告)日：2013-01-17

申请号：US13467549

申请日：2012-05-09

申请人： Jiro Yokoya ,  Tsuyoshi Nakamura ,  Hiroaki Shimizu ,  Masaru Takeshita ,  Hideto Nito ,  Hirokuni Saito

发明人： Jiro Yokoya ,  Tsuyoshi Nakamura ,  Hiroaki Shimizu ,  Masaru Takeshita ,  Hideto Nito ,  Hirokuni Saito

IPC分类号： G03F7/20

CPC分类号： G03F7/0045 ,  G03F7/0397 ,  G03F7/203 ,  G03F7/2041 ,  G03F7/26 ,  G03F7/38

摘要： A method of forming a resist pattern, including forming a resist film on a substrate using a resist composition comprising a base component that exhibits increased solubility in an alkali developing solution and a photo-base generator component; exposing the resist film; baking the exposed resist film, such that, at an exposed portion thereof, the base generated from the photo-base generator component upon the exposure and an acid provided to the resist film are neutralized, and at an unexposed portion of the resist film, the solubility of the base component in an alkali developing solution is increased by the acid provided to the resist film; and subjecting the resist film to alkali development, thereby forming a negative-tone resist pattern in which the unexposed portion of the resist film has been dissolved and removed.

摘要翻译： 一种形成抗蚀剂图案的方法，包括使用包含在碱性显影液中显示出增加的溶解度的基础成分的抗蚀剂组合物和光产生剂组分在基材上形成抗蚀剂膜; 曝光抗蚀膜; 烘烤曝光的抗蚀剂膜，使得在曝光部分，曝光时由光产生器部件产生的基底和提供给抗蚀剂膜的酸被中和，并且在抗蚀剂膜的未曝光部分， 碱性成分在碱性显影液中的溶解度通过提供于抗蚀剂膜的酸而增加; 并对抗蚀剂膜进行碱显影，从而形成抗蚀剂膜的未曝光部分已被溶解并除去的负色调抗蚀剂图案。

公开(公告)号：US08268529B2

公开(公告)日：2012-09-18

申请号：US12687430

申请日：2010-01-14

申请人： Takahiro Dazai ,  Daiju Shiono ,  Tomoyuki Hirano ,  Tasuku Matsumiya ,  Masaru Takeshita

发明人： Takahiro Dazai ,  Daiju Shiono ,  Tomoyuki Hirano ,  Tasuku Matsumiya ,  Masaru Takeshita

IPC分类号： G03F7/039 ,  G03F7/20 ,  G03F7/30 ,  C08F28/06

CPC分类号： C08F220/26 ,  C08F228/06 ,  G03F7/0045 ,  G03F7/0397

摘要： A positive resist composition including a base component (A) which exhibits changed solubility in an alkali developing solution under the action of acid and an acid-generator component (B) which generates acid upon exposure dissolved in an organic solvent (S), the base component (A) containing a polymeric compound (A1) including a structural unit (a0) derived from an acrylate ester having a cyclic group containing a sulfonyl group on the side chain thereof, a structural unit (a1) derived from an acrylate ester containing an acid dissociable, dissolution inhibiting group and a structural unit (a5) represented by general formula (a5-1) (Y1 represents an aliphatic hydrocarbon group; Z represents a monovalent organic group; a represents an integer of 1 to 3, and b represents an integer of 0 to 2, provided that a+b=1 to 3).

摘要翻译： 一种正性抗蚀剂组合物，其包含在碱的作用下在碱性显影液中的溶解度变化的碱成分（A）和暴露于有机溶剂（S）时产生酸的酸产生剂成分（B），所述碱 含有由侧链上具有含有磺酰基的环状基团的丙烯酸酯衍生的结构单元（a0）的高分子化合物（A1）的组分（A），来源于丙烯酸酯的结构单元（a1） 酸解离，溶解抑制基团和由通式（a5-1）表示的结构单元（a5）（Y1表示脂族烃基; Z表示一价有机基团; a表示1〜3的整数，b表示 0〜2的整数，条件是a + b = 1〜3）。

公开(公告)号：US07968276B2

公开(公告)日：2011-06-28

申请号：US12351759

申请日：2009-01-09

申请人： Masaru Takeshita

发明人： Masaru Takeshita

IPC分类号： G03F7/20 ,  G03F7/30 ,  G03F7/039

CPC分类号： G03F7/0397

摘要： A positive resist composition used to form a second resist film in a method of forming a positive resist pattern, including: applying a positive resist composition on the substrate on which a first resist pattern formed of a first resist film is formed to form a second resist film; and selectively exposing the second resist film and alkali-developing the second resist film to form a resist pattern; whereinthe positive resist composition includes a resin component (A) having a structural unit (a0-1) represented by general formula (a0-1) and a structural unit (a0-2) represented by general formula (a0-2), which exhibits increased solubility in an alkali developing solution under action of acid, an acid-generator component (B) which generates acid upon exposure, and an organic solvent (S) which does not dissolve the first resist film, and the resin component (A) and the acid-generator component (B) are dissolved in the organic solvent (S).

摘要翻译： 一种正性抗蚀剂组合物，用于在形成正性抗蚀剂图案的方法中形成第二抗蚀剂膜，包括：在其上形成由第一抗蚀剂膜形成的第一抗蚀剂图案的基板上施加正性抗蚀剂组合物，以形成第二抗蚀剂 电影; 并且选择性地暴露第二抗蚀剂膜并对第二抗蚀剂膜进行碱显影以形成抗蚀剂图案; 其中正型抗蚀剂组合物包括具有由通式（a0-1）表示的结构单元（a0-1）和由通式（a0-2）表示的结构单元（a0-2））的树脂组分（A），其中 在酸的作用下在碱性显影液中的溶解度增加，暴露时产生酸的酸发生剂组分（B）和不溶解第一抗蚀剂膜的有机溶剂（S），树脂组分（A） 和酸发生剂组分（B）溶解在有机溶剂（S）中。